Search

Noah P Kamen

Examiner (ID: 110)

Most Active Art Unit
3747
Art Unit(s)
3783, 3741, 3302, 3405, 3747, 3402, 2899, 1802
Total Applications
4075
Issued Applications
3515
Pending Applications
138
Abandoned Applications
425

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 5575336 [patent_doc_number] => 20090142698 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-06-04 [patent_title] => 'NEGATIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN' [patent_app_type] => utility [patent_app_number] => 11/916651 [patent_app_country] => US [patent_app_date] => 2006-06-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 15003 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0142/20090142698.pdf [firstpage_image] =>[orig_patent_app_number] => 11916651 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/916651
Negative resist composition and method of forming resist pattern Jun 15, 2006 Issued
Array ( [id] => 5521303 [patent_doc_number] => 20090029284 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-01-29 [patent_title] => 'PATTERN COATING MATERIAL AND PATTERN FORMING METHOD' [patent_app_type] => utility [patent_app_number] => 11/993444 [patent_app_country] => US [patent_app_date] => 2006-06-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 15854 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0029/20090029284.pdf [firstpage_image] =>[orig_patent_app_number] => 11993444 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/993444
Pattern coating material and pattern forming method Jun 15, 2006 Issued
Array ( [id] => 4573111 [patent_doc_number] => 07855044 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-12-21 [patent_title] => 'Positive resist composition and method of forming resist pattern' [patent_app_type] => utility [patent_app_number] => 11/993005 [patent_app_country] => US [patent_app_date] => 2006-06-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 12661 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 108 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/855/07855044.pdf [firstpage_image] =>[orig_patent_app_number] => 11993005 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/993005
Positive resist composition and method of forming resist pattern Jun 15, 2006 Issued
Array ( [id] => 21885 [patent_doc_number] => 07799509 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-09-21 [patent_title] => 'Photosensitive resin composition, method of manufacturing a thin-film transistor substrate, and method of manufacturing a common electrode substrate using the same' [patent_app_type] => utility [patent_app_number] => 11/445846 [patent_app_country] => US [patent_app_date] => 2006-06-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 12 [patent_no_of_words] => 8604 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 120 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/799/07799509.pdf [firstpage_image] =>[orig_patent_app_number] => 11445846 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/445846
Photosensitive resin composition, method of manufacturing a thin-film transistor substrate, and method of manufacturing a common electrode substrate using the same Jun 1, 2006 Issued
Array ( [id] => 482040 [patent_doc_number] => 07220520 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2007-05-22 [patent_title] => 'Photosensitive resin compositions' [patent_app_type] => utility [patent_app_number] => 11/445764 [patent_app_country] => US [patent_app_date] => 2006-06-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10750 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 40 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/220/07220520.pdf [firstpage_image] =>[orig_patent_app_number] => 11445764 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/445764
Photosensitive resin compositions Jun 1, 2006 Issued
Array ( [id] => 373212 [patent_doc_number] => 07473515 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-01-06 [patent_title] => 'Thermally reactive near-infrared absorbing acetal copolymers, methods of preparation and methods of use' [patent_app_type] => utility [patent_app_number] => 11/421608 [patent_app_country] => US [patent_app_date] => 2006-06-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 13 [patent_figures_cnt] => 15 [patent_no_of_words] => 9491 [patent_no_of_claims] => 71 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 20 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/473/07473515.pdf [firstpage_image] =>[orig_patent_app_number] => 11421608 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/421608
Thermally reactive near-infrared absorbing acetal copolymers, methods of preparation and methods of use May 31, 2006 Issued
Array ( [id] => 369719 [patent_doc_number] => 07476492 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-01-13 [patent_title] => 'Low activation energy photoresist composition and process for its use' [patent_app_type] => utility [patent_app_number] => 11/441965 [patent_app_country] => US [patent_app_date] => 2006-05-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 6325 [patent_no_of_claims] => 1 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 31 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/476/07476492.pdf [firstpage_image] =>[orig_patent_app_number] => 11441965 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/441965
Low activation energy photoresist composition and process for its use May 25, 2006 Issued
Array ( [id] => 9254373 [patent_doc_number] => 08617784 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-12-31 [patent_title] => 'Increasing photoresist processing throughput' [patent_app_type] => utility [patent_app_number] => 11/441767 [patent_app_country] => US [patent_app_date] => 2006-05-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 2274 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 39 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 11441767 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/441767
Increasing photoresist processing throughput May 25, 2006 Issued
Array ( [id] => 5625217 [patent_doc_number] => 20060263722 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-11-23 [patent_title] => 'Photoresist, photolithography method using the same, and method for producing photoresist' [patent_app_type] => utility [patent_app_number] => 11/439983 [patent_app_country] => US [patent_app_date] => 2006-05-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 9249 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0263/20060263722.pdf [firstpage_image] =>[orig_patent_app_number] => 11439983 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/439983
Photoresist, photolithography method using the same, and method for producing photoresist May 24, 2006 Issued
Array ( [id] => 5608355 [patent_doc_number] => 20060269871 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-11-30 [patent_title] => 'Polymer, resist composition and patterning process' [patent_app_type] => utility [patent_app_number] => 11/440126 [patent_app_country] => US [patent_app_date] => 2006-05-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 13030 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0269/20060269871.pdf [firstpage_image] =>[orig_patent_app_number] => 11440126 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/440126
Polymer, resist composition and patterning process May 24, 2006 Issued
Array ( [id] => 196324 [patent_doc_number] => 07638264 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-12-29 [patent_title] => 'Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use' [patent_app_type] => utility [patent_app_number] => 11/438842 [patent_app_country] => US [patent_app_date] => 2006-05-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 4032 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 60 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/638/07638264.pdf [firstpage_image] =>[orig_patent_app_number] => 11438842 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/438842
Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use May 22, 2006 Issued
Array ( [id] => 4459452 [patent_doc_number] => 07879527 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2011-02-01 [patent_title] => 'Method of producing positive resist composition, positive resist composition, and method of forming resist pattern' [patent_app_type] => utility [patent_app_number] => 11/996052 [patent_app_country] => US [patent_app_date] => 2006-05-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 22198 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 122 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/879/07879527.pdf [firstpage_image] =>[orig_patent_app_number] => 11996052 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/996052
Method of producing positive resist composition, positive resist composition, and method of forming resist pattern May 17, 2006 Issued
Array ( [id] => 5608352 [patent_doc_number] => 20060269868 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-11-30 [patent_title] => 'Ester group-containing poly (imide-azomethine) copolymer, ester group-containing poly (amide acid-azomethine) copolymer, and positive photosensitive resin composition' [patent_app_type] => utility [patent_app_number] => 11/433436 [patent_app_country] => US [patent_app_date] => 2006-05-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 9766 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0269/20060269868.pdf [firstpage_image] =>[orig_patent_app_number] => 11433436 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/433436
Ester group-containing poly (imide-azomethine) copolymer, ester group-containing poly (amide acid-azomethine) copolymer, and positive photosensitive resin composition May 14, 2006 Issued
Array ( [id] => 202275 [patent_doc_number] => 07632630 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-12-15 [patent_title] => 'Dyed photoresists and methods and articles of manufacture comprising same' [patent_app_type] => utility [patent_app_number] => 11/418520 [patent_app_country] => US [patent_app_date] => 2006-05-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8976 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 67 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/632/07632630.pdf [firstpage_image] =>[orig_patent_app_number] => 11418520 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/418520
Dyed photoresists and methods and articles of manufacture comprising same May 2, 2006 Issued
Array ( [id] => 5533432 [patent_doc_number] => 20090233220 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-09-17 [patent_title] => 'POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN' [patent_app_type] => utility [patent_app_number] => 11/913912 [patent_app_country] => US [patent_app_date] => 2006-04-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 18103 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0233/20090233220.pdf [firstpage_image] =>[orig_patent_app_number] => 11913912 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/913912
Positive resist composition and method of forming resist pattern Apr 25, 2006 Issued
Array ( [id] => 5444326 [patent_doc_number] => 20090045552 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-02-19 [patent_title] => 'Positive resist composition for recording medium master, and method of producing recording medium master and method of producing stamper using the same' [patent_app_type] => utility [patent_app_number] => 11/918739 [patent_app_country] => US [patent_app_date] => 2006-04-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 10887 [patent_no_of_claims] => 27 [patent_no_of_ind_claims] => 13 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0045/20090045552.pdf [firstpage_image] =>[orig_patent_app_number] => 11918739 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/918739
Positive resist composition for recording medium master, and method of producing recording medium master and method of producing stamper using the same Apr 17, 2006 Abandoned
Array ( [id] => 5508373 [patent_doc_number] => 20090081580 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-03-26 [patent_title] => 'COMPOUND, DISSOLUTION INHIBITOR, POSITIVE TYPE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN' [patent_app_type] => utility [patent_app_number] => 11/911341 [patent_app_country] => US [patent_app_date] => 2006-04-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 14015 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0081/20090081580.pdf [firstpage_image] =>[orig_patent_app_number] => 11911341 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/911341
Compound, dissolution inhibitor, positive type resist composition, and method of forming resist pattern Apr 16, 2006 Issued
Array ( [id] => 121101 [patent_doc_number] => 07709179 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-05-04 [patent_title] => 'Negative resist composition and method for forming resist pattern' [patent_app_type] => utility [patent_app_number] => 11/909071 [patent_app_country] => US [patent_app_date] => 2006-04-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 13483 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 101 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/709/07709179.pdf [firstpage_image] =>[orig_patent_app_number] => 11909071 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/909071
Negative resist composition and method for forming resist pattern Apr 6, 2006 Issued
Array ( [id] => 3813 [patent_doc_number] => 07816066 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-10-19 [patent_title] => 'Positive resist composition and method for forming resist pattern' [patent_app_type] => utility [patent_app_number] => 11/911953 [patent_app_country] => US [patent_app_date] => 2006-04-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 13666 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 48 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/816/07816066.pdf [firstpage_image] =>[orig_patent_app_number] => 11911953 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/911953
Positive resist composition and method for forming resist pattern Apr 6, 2006 Issued
Array ( [id] => 5858560 [patent_doc_number] => 20060228648 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-10-12 [patent_title] => 'Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process' [patent_app_type] => utility [patent_app_number] => 11/397526 [patent_app_country] => US [patent_app_date] => 2006-04-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 37 [patent_figures_cnt] => 37 [patent_no_of_words] => 19172 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0228/20060228648.pdf [firstpage_image] =>[orig_patent_app_number] => 11397526 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/397526
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process Apr 4, 2006 Issued
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