Application number | Title of the application | Filing Date | Status |
---|
Array
(
[id] => 3990144
[patent_doc_number] => 05985491
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-11-16
[patent_title] => 'Reflectors for photolithographic projection and related systems and methods'
[patent_app_type] => 1
[patent_app_number] => 8/664535
[patent_app_country] => US
[patent_app_date] => 1996-06-17
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/664535 | Reflectors for photolithographic projection and related systems and methods | Jun 16, 1996 | Issued |
08/661850 | ECONOMICAL METHOD FOR FORMING CO-PLANAR CONDUCTOR AND INSULATOR FEATURES USING CHEMICAL MECHANICAL PLANARIZATION | Jun 10, 1996 | Abandoned |
Array
(
[id] => 3981263
[patent_doc_number] => 05861233
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-01-19
[patent_title] => 'Pattern forming method by imparting hydrogen atoms and selectively depositing metal film'
[patent_app_type] => 1
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[patent_app_country] => US
[patent_app_date] => 1996-06-11
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[firstpage_image] =>[orig_patent_app_number] => 662200
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/662200 | Pattern forming method by imparting hydrogen atoms and selectively depositing metal film | Jun 10, 1996 | Issued |
Array
(
[id] => 3922007
[patent_doc_number] => 05914202
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-06-22
[patent_title] => 'Method for forming a multi-level reticle'
[patent_app_type] => 1
[patent_app_number] => 8/660870
[patent_app_country] => US
[patent_app_date] => 1996-06-10
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[firstpage_image] =>[orig_patent_app_number] => 660870
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/660870 | Method for forming a multi-level reticle | Jun 9, 1996 | Issued |
Array
(
[id] => 4046884
[patent_doc_number] => 05869400
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-02-09
[patent_title] => 'Method for dry-etching using gaseous bismuth halide compound'
[patent_app_type] => 1
[patent_app_number] => 8/655182
[patent_app_country] => US
[patent_app_date] => 1996-05-30
[patent_effective_date] => 0000-00-00
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/655182 | Method for dry-etching using gaseous bismuth halide compound | May 29, 1996 | Issued |
08/654337 | POLISHING PAD WITH INCOMPRESSIBLE HIGHLY SOLUBLE PARTICLES FOR CHEMICAL-MECHANICAL PLANARIZATION OF SEMICONDUCTOR WAFERS | May 27, 1996 | Abandoned |
Array
(
[id] => 3990350
[patent_doc_number] => 05985506
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-11-16
[patent_title] => 'Reversal electrophotographic developing method employing recyclable magnetic toner'
[patent_app_type] => 1
[patent_app_number] => 8/653014
[patent_app_country] => US
[patent_app_date] => 1996-05-24
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[firstpage_image] =>[orig_patent_app_number] => 653014
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/653014 | Reversal electrophotographic developing method employing recyclable magnetic toner | May 23, 1996 | Issued |
Array
(
[id] => 3919025
[patent_doc_number] => 05914000
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-06-22
[patent_title] => 'Apparatus for manufacturing semiconductor device and method of removing silicon oxidation film'
[patent_app_type] => 1
[patent_app_number] => 8/651544
[patent_app_country] => US
[patent_app_date] => 1996-05-22
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/651544 | Apparatus for manufacturing semiconductor device and method of removing silicon oxidation film | May 21, 1996 | Issued |
08/647200 | FLUOROPOLYMER LASER MARKING METHOD | May 20, 1996 | Abandoned |
Array
(
[id] => 3978641
[patent_doc_number] => 05948700
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-09-07
[patent_title] => 'Method of planarization of an intermetal dielectric layer using chemical mechanical polishing'
[patent_app_type] => 1
[patent_app_number] => 8/650694
[patent_app_country] => US
[patent_app_date] => 1996-05-20
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[firstpage_image] =>[orig_patent_app_number] => 650694
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/650694 | Method of planarization of an intermetal dielectric layer using chemical mechanical polishing | May 19, 1996 | Issued |
Array
(
[id] => 3938538
[patent_doc_number] => 05872062
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-02-16
[patent_title] => 'Method for etching titanium nitride layers'
[patent_app_type] => 1
[patent_app_number] => 8/650698
[patent_app_country] => US
[patent_app_date] => 1996-05-20
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/872/05872062.pdf
[firstpage_image] =>[orig_patent_app_number] => 650698
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/650698 | Method for etching titanium nitride layers | May 19, 1996 | Issued |
08/591469 | POST TREATMENT OF A COATED SUBSTRATE WITH A GAS CONTAINING EXCITED HALOGEN TO REMOVE RESIDUES | May 8, 1996 | Abandoned |
Array
(
[id] => 3760905
[patent_doc_number] => 05849108
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-12-15
[patent_title] => 'Photovoltaic element with zno layer having increasing fluorine content in layer thickness direction'
[patent_app_type] => 1
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Array
(
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[patent_kind] => NA
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[patent_title] => 'Resist composition with polymeric dissolution inhibitor and alkali soluble resin'
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Array
(
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[patent_kind] => NA
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[patent_app_type] => 1
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Array
(
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[patent_kind] => NA
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[patent_title] => 'Method for forming a dielectric tantalum nitride layer as an anti-reflective coating (ARC)'
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Array
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[patent_kind] => NA
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/629378 | Method of removing damaged crystal regions from silicon wafers | Apr 7, 1996 | Issued |
Array
(
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Array
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/627251 | Photoresist with bleaching effect | Apr 2, 1996 | Issued |
Array
(
[id] => 3685519
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[patent_kind] => NA
[patent_issue_date] => 1997-11-25
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