
Noah P Kamen
Examiner (ID: 110)
| Most Active Art Unit | 3747 |
| Art Unit(s) | 3783, 3741, 3302, 3405, 3747, 3402, 2899, 1802 |
| Total Applications | 4075 |
| Issued Applications | 3515 |
| Pending Applications | 138 |
| Abandoned Applications | 425 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 852837
[patent_doc_number] => 07378218
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-05-27
[patent_title] => 'Polymer, resist composition and patterning process'
[patent_app_type] => utility
[patent_app_number] => 11/345325
[patent_app_country] => US
[patent_app_date] => 2006-02-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 12959
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 26
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/378/07378218.pdf
[firstpage_image] =>[orig_patent_app_number] => 11345325
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/345325 | Polymer, resist composition and patterning process | Feb 1, 2006 | Issued |
Array
(
[id] => 5521310
[patent_doc_number] => 20090029291
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-01-29
[patent_title] => 'POSITIVE RESIST COMPOSITION FOR THIN-FILM IMPLANTATION PROCESS AND METHOD FOR FORMING RESIST PATTERN'
[patent_app_type] => utility
[patent_app_number] => 11/815205
[patent_app_country] => US
[patent_app_date] => 2006-02-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 11637
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0029/20090029291.pdf
[firstpage_image] =>[orig_patent_app_number] => 11815205
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/815205 | Positive resist composition for thin-film implantation process and method for forming resist pattern | Jan 31, 2006 | Issued |
Array
(
[id] => 4927296
[patent_doc_number] => 20080166659
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-07-10
[patent_title] => 'Positive Dry Film Photoresist and Composition For Preparing the Same'
[patent_app_type] => utility
[patent_app_number] => 11/814897
[patent_app_country] => US
[patent_app_date] => 2006-02-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 8876
[patent_no_of_claims] => 28
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0166/20080166659.pdf
[firstpage_image] =>[orig_patent_app_number] => 11814897
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/814897 | Positive Dry Film Photoresist and Composition For Preparing the Same | Jan 31, 2006 | Abandoned |
Array
(
[id] => 196318
[patent_doc_number] => 07638258
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-12-29
[patent_title] => 'Positive resist composition and method for resist pattern formation'
[patent_app_type] => utility
[patent_app_number] => 11/814916
[patent_app_country] => US
[patent_app_date] => 2006-01-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 15370
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 115
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/638/07638258.pdf
[firstpage_image] =>[orig_patent_app_number] => 11814916
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/814916 | Positive resist composition and method for resist pattern formation | Jan 24, 2006 | Issued |
Array
(
[id] => 5873851
[patent_doc_number] => 20060166136
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-07-27
[patent_title] => 'Positive resist composition for immersion exposure and pattern-forming method using the same'
[patent_app_type] => utility
[patent_app_number] => 11/335735
[patent_app_country] => US
[patent_app_date] => 2006-01-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 26417
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0166/20060166136.pdf
[firstpage_image] =>[orig_patent_app_number] => 11335735
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/335735 | Positive resist composition for immersion exposure and pattern-forming method using the same | Jan 19, 2006 | Issued |
Array
(
[id] => 239409
[patent_doc_number] => 07592125
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-09-22
[patent_title] => 'Photoresist compositions comprising resin blends'
[patent_app_type] => utility
[patent_app_number] => 11/334939
[patent_app_country] => US
[patent_app_date] => 2006-01-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 2
[patent_no_of_words] => 9093
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 52
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/592/07592125.pdf
[firstpage_image] =>[orig_patent_app_number] => 11334939
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/334939 | Photoresist compositions comprising resin blends | Jan 18, 2006 | Issued |
Array
(
[id] => 4498558
[patent_doc_number] => 07919223
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2011-04-05
[patent_title] => 'Compound for resist and radiation-sensitive composition'
[patent_app_type] => utility
[patent_app_number] => 11/722636
[patent_app_country] => US
[patent_app_date] => 2005-12-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 21482
[patent_no_of_claims] => 37
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 192
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/919/07919223.pdf
[firstpage_image] =>[orig_patent_app_number] => 11722636
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/722636 | Compound for resist and radiation-sensitive composition | Dec 25, 2005 | Issued |
Array
(
[id] => 5655658
[patent_doc_number] => 20060141393
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-06-29
[patent_title] => 'Photosensitive resin composition, thin film panel made with photosensitive composition, and method for manufacturing thin film panel'
[patent_app_type] => utility
[patent_app_number] => 11/318157
[patent_app_country] => US
[patent_app_date] => 2005-12-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 19
[patent_figures_cnt] => 19
[patent_no_of_words] => 17705
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0141/20060141393.pdf
[firstpage_image] =>[orig_patent_app_number] => 11318157
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/318157 | Photosensitive resin composition, thin film panel made with photosensitive composition, and method for manufacturing thin film panel | Dec 22, 2005 | Issued |
Array
(
[id] => 4710977
[patent_doc_number] => 20080299503
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-12-04
[patent_title] => 'Material for Forming Resist Protection Films and Method for Resist Pattern Formation with the Same'
[patent_app_type] => utility
[patent_app_number] => 11/722797
[patent_app_country] => US
[patent_app_date] => 2005-12-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6089
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0299/20080299503.pdf
[firstpage_image] =>[orig_patent_app_number] => 11722797
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/722797 | Material for forming resist protection films and method for resist pattern formation with the same | Dec 21, 2005 | Issued |
Array
(
[id] => 5242065
[patent_doc_number] => 20070020558
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-01-25
[patent_title] => 'Process for the preparation of a photoresist solution'
[patent_app_type] => utility
[patent_app_number] => 11/316056
[patent_app_country] => US
[patent_app_date] => 2005-12-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4881
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0020/20070020558.pdf
[firstpage_image] =>[orig_patent_app_number] => 11316056
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/316056 | Process for the preparation of a photoresist solution | Dec 20, 2005 | Abandoned |
Array
(
[id] => 303412
[patent_doc_number] => 07534548
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-05-19
[patent_title] => 'Polymer for immersion lithography and photoresist composition'
[patent_app_type] => utility
[patent_app_number] => 11/304052
[patent_app_country] => US
[patent_app_date] => 2005-12-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 8
[patent_no_of_words] => 2973
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 13
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/534/07534548.pdf
[firstpage_image] =>[orig_patent_app_number] => 11304052
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/304052 | Polymer for immersion lithography and photoresist composition | Dec 14, 2005 | Issued |
Array
(
[id] => 899507
[patent_doc_number] => 07338737
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-03-04
[patent_title] => 'Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel'
[patent_app_type] => utility
[patent_app_number] => 11/302727
[patent_app_country] => US
[patent_app_date] => 2005-12-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 18
[patent_figures_cnt] => 22
[patent_no_of_words] => 17925
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 68
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/338/07338737.pdf
[firstpage_image] =>[orig_patent_app_number] => 11302727
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/302727 | Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel | Dec 12, 2005 | Issued |
Array
(
[id] => 5452551
[patent_doc_number] => 20090068588
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-03-12
[patent_title] => 'POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN'
[patent_app_type] => utility
[patent_app_number] => 11/816272
[patent_app_country] => US
[patent_app_date] => 2005-12-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 12988
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0068/20090068588.pdf
[firstpage_image] =>[orig_patent_app_number] => 11816272
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/816272 | Positive resist composition and method of forming resist pattern | Dec 12, 2005 | Issued |
Array
(
[id] => 4825527
[patent_doc_number] => 20080124654
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-05-29
[patent_title] => 'Positive Type Dry Film Photoresist And Composition For Preparing The Same'
[patent_app_type] => utility
[patent_app_number] => 11/791887
[patent_app_country] => US
[patent_app_date] => 2005-12-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 8292
[patent_no_of_claims] => 41
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0124/20080124654.pdf
[firstpage_image] =>[orig_patent_app_number] => 11791887
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/791887 | Positive type dry film photoresist and composition for preparing the same | Dec 6, 2005 | Issued |
Array
(
[id] => 5619616
[patent_doc_number] => 20060189150
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-08-24
[patent_title] => 'Composition for an organic hard mask and method for forming a pattern on a semiconductor device using the same'
[patent_app_type] => utility
[patent_app_number] => 11/296758
[patent_app_country] => US
[patent_app_date] => 2005-12-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 2787
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0189/20060189150.pdf
[firstpage_image] =>[orig_patent_app_number] => 11296758
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/296758 | Composition for an organic hard mask and method for forming a pattern on a semiconductor device using the same | Dec 6, 2005 | Issued |
Array
(
[id] => 32063
[patent_doc_number] => 07790345
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-09-07
[patent_title] => 'Positive type dry film photoresist'
[patent_app_type] => utility
[patent_app_number] => 11/791886
[patent_app_country] => US
[patent_app_date] => 2005-12-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 5
[patent_no_of_words] => 7538
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 88
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/790/07790345.pdf
[firstpage_image] =>[orig_patent_app_number] => 11791886
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/791886 | Positive type dry film photoresist | Dec 6, 2005 | Issued |
Array
(
[id] => 83028
[patent_doc_number] => 07740996
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-06-22
[patent_title] => 'Photosensitive resin composition and color filter'
[patent_app_type] => utility
[patent_app_number] => 11/817960
[patent_app_country] => US
[patent_app_date] => 2005-12-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 3
[patent_no_of_words] => 7008
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 36
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/740/07740996.pdf
[firstpage_image] =>[orig_patent_app_number] => 11817960
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/817960 | Photosensitive resin composition and color filter | Dec 1, 2005 | Issued |
Array
(
[id] => 5715455
[patent_doc_number] => 20060078818
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-04-13
[patent_title] => 'Near-field exposure photoresist and fine pattern forming method using the same'
[patent_app_type] => utility
[patent_app_number] => 11/289595
[patent_app_country] => US
[patent_app_date] => 2005-11-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 3791
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0078/20060078818.pdf
[firstpage_image] =>[orig_patent_app_number] => 11289595
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/289595 | Near-field exposure photoresist and fine pattern forming method using the same | Nov 29, 2005 | Abandoned |
Array
(
[id] => 7550493
[patent_doc_number] => 08062825
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2011-11-22
[patent_title] => 'Positive resist composition and resist pattern forming method'
[patent_app_type] => utility
[patent_app_number] => 11/719179
[patent_app_country] => US
[patent_app_date] => 2005-11-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 18133
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 248
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/08/062/08062825.pdf
[firstpage_image] =>[orig_patent_app_number] => 11719179
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/719179 | Positive resist composition and resist pattern forming method | Nov 27, 2005 | Issued |
Array
(
[id] => 5747749
[patent_doc_number] => 20060110680
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-05-25
[patent_title] => 'Photosensitive resin composition'
[patent_app_type] => utility
[patent_app_number] => 11/274222
[patent_app_country] => US
[patent_app_date] => 2005-11-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 17209
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0110/20060110680.pdf
[firstpage_image] =>[orig_patent_app_number] => 11274222
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/274222 | Photosensitive resin composition | Nov 15, 2005 | Issued |