
Noah P Kamen
Examiner (ID: 110)
| Most Active Art Unit | 3747 |
| Art Unit(s) | 3783, 3741, 3302, 3405, 3747, 3402, 2899, 1802 |
| Total Applications | 4075 |
| Issued Applications | 3515 |
| Pending Applications | 138 |
| Abandoned Applications | 425 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 5738338
[patent_doc_number] => 20060008728
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-01-12
[patent_title] => 'Photoresist composition'
[patent_app_type] => utility
[patent_app_number] => 11/174872
[patent_app_country] => US
[patent_app_date] => 2005-07-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 2829
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0008/20060008728.pdf
[firstpage_image] =>[orig_patent_app_number] => 11174872
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/174872 | Photoresist composition | Jul 4, 2005 | Issued |
Array
(
[id] => 5738344
[patent_doc_number] => 20060008734
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-01-12
[patent_title] => 'Photosensitive dielectric resin compositions, films formed therefrom and semiconductor and display devices encompassing such films'
[patent_app_type] => utility
[patent_app_number] => 11/171391
[patent_app_country] => US
[patent_app_date] => 2005-07-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 16125
[patent_no_of_claims] => 83
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0008/20060008734.pdf
[firstpage_image] =>[orig_patent_app_number] => 11171391
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/171391 | Photosensitive dielectric resin compositions, films formed therefrom and semiconductor and display devices encompassing such films | Jun 30, 2005 | Issued |
Array
(
[id] => 6977755
[patent_doc_number] => 20050287473
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-12-29
[patent_title] => 'Photosensitive composition and method for forming pattern using the same'
[patent_app_type] => utility
[patent_app_number] => 11/167813
[patent_app_country] => US
[patent_app_date] => 2005-06-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 21434
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 7
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0287/20050287473.pdf
[firstpage_image] =>[orig_patent_app_number] => 11167813
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/167813 | Photosensitive composition and method for forming pattern using the same | Jun 27, 2005 | Issued |
Array
(
[id] => 4859519
[patent_doc_number] => 20080268369
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-10-30
[patent_title] => 'Organic Film Composition and Method for Forming Resist Pattern'
[patent_app_type] => utility
[patent_app_number] => 11/630291
[patent_app_country] => US
[patent_app_date] => 2005-06-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 7527
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0268/20080268369.pdf
[firstpage_image] =>[orig_patent_app_number] => 11630291
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/630291 | Organic Film Composition and Method for Forming Resist Pattern | Jun 20, 2005 | Abandoned |
Array
(
[id] => 415040
[patent_doc_number] => 07279263
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-10-09
[patent_title] => 'Dual-wavelength positive-working radiation-sensitive elements'
[patent_app_type] => utility
[patent_app_number] => 11/157204
[patent_app_country] => US
[patent_app_date] => 2005-06-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 9506
[patent_no_of_claims] => 32
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 57
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/279/07279263.pdf
[firstpage_image] =>[orig_patent_app_number] => 11157204
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/157204 | Dual-wavelength positive-working radiation-sensitive elements | Jun 19, 2005 | Issued |
Array
(
[id] => 7218958
[patent_doc_number] => 20050260526
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-11-24
[patent_title] => 'Radiation sensitive resin composition, cathode separator and EL display device'
[patent_app_type] => utility
[patent_app_number] => 11/154579
[patent_app_country] => US
[patent_app_date] => 2005-06-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 8320
[patent_no_of_claims] => 3
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0260/20050260526.pdf
[firstpage_image] =>[orig_patent_app_number] => 11154579
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/154579 | Radiation sensitive resin composition, cathode separator and EL display device | Jun 16, 2005 | Abandoned |
Array
(
[id] => 4859525
[patent_doc_number] => 20080268375
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-10-30
[patent_title] => 'Positive Resist Composition and Method for Resist Pattern Formation'
[patent_app_type] => utility
[patent_app_number] => 11/570399
[patent_app_country] => US
[patent_app_date] => 2005-06-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 8360
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0268/20080268375.pdf
[firstpage_image] =>[orig_patent_app_number] => 11570399
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/570399 | Positive resist composition and method for resist pattern formation | Jun 16, 2005 | Issued |
Array
(
[id] => 5894715
[patent_doc_number] => 20060003254
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-01-05
[patent_title] => 'Photosensitive composition and method for forming pattern using same'
[patent_app_type] => utility
[patent_app_number] => 11/149209
[patent_app_country] => US
[patent_app_date] => 2005-06-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5707
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0003/20060003254.pdf
[firstpage_image] =>[orig_patent_app_number] => 11149209
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/149209 | Photosensitive composition and method for forming pattern using same | Jun 9, 2005 | Issued |
Array
(
[id] => 6953052
[patent_doc_number] => 20050228147
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-10-13
[patent_title] => 'Aqueous developable, photosensitive benzocyclobutene-based oligomers and polymers with high moisture resistance'
[patent_app_type] => utility
[patent_app_number] => 11/146818
[patent_app_country] => US
[patent_app_date] => 2005-06-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5632
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0228/20050228147.pdf
[firstpage_image] =>[orig_patent_app_number] => 11146818
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/146818 | Aqueous developable, photosensitive benzocyclobutene-based oligomers and polymers with high moisture resistance | Jun 6, 2005 | Issued |
Array
(
[id] => 6966358
[patent_doc_number] => 20050233255
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-10-20
[patent_title] => 'Method for forming pattern'
[patent_app_type] => utility
[patent_app_number] => 11/138216
[patent_app_country] => US
[patent_app_date] => 2005-05-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 6987
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 24
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0233/20050233255.pdf
[firstpage_image] =>[orig_patent_app_number] => 11138216
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/138216 | Method for forming pattern | May 26, 2005 | Issued |
Array
(
[id] => 7249865
[patent_doc_number] => 20050272604
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-12-08
[patent_title] => 'Heat-sensitive recording material'
[patent_app_type] => utility
[patent_app_number] => 11/132454
[patent_app_country] => US
[patent_app_date] => 2005-05-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 16597
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0272/20050272604.pdf
[firstpage_image] =>[orig_patent_app_number] => 11132454
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/132454 | Heat-sensitive recording material | May 18, 2005 | Abandoned |
Array
(
[id] => 7218918
[patent_doc_number] => 20050260518
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-11-24
[patent_title] => 'Heat sensitive recording material and microcapsule'
[patent_app_type] => utility
[patent_app_number] => 11/132340
[patent_app_country] => US
[patent_app_date] => 2005-05-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 21366
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0260/20050260518.pdf
[firstpage_image] =>[orig_patent_app_number] => 11132340
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/132340 | Heat sensitive recording material and microcapsule | May 18, 2005 | Abandoned |
Array
(
[id] => 334111
[patent_doc_number] => 07507522
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-03-24
[patent_title] => 'Photoresists comprising polymers derived from fluoroalcohol-substituted polycyclic monomers'
[patent_app_type] => utility
[patent_app_number] => 11/578278
[patent_app_country] => US
[patent_app_date] => 2005-05-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 14719
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 7
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/507/07507522.pdf
[firstpage_image] =>[orig_patent_app_number] => 11578278
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/578278 | Photoresists comprising polymers derived from fluoroalcohol-substituted polycyclic monomers | May 16, 2005 | Issued |
Array
(
[id] => 5817984
[patent_doc_number] => 20060022297
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-02-02
[patent_title] => 'Photoresist polymer and photoresist composition containing the same'
[patent_app_type] => utility
[patent_app_number] => 11/124762
[patent_app_country] => US
[patent_app_date] => 2005-05-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 2238
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0022/20060022297.pdf
[firstpage_image] =>[orig_patent_app_number] => 11124762
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/124762 | Photoresist polymer and photoresist composition containing the same | May 8, 2005 | Issued |
Array
(
[id] => 867658
[patent_doc_number] => 07364831
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-04-29
[patent_title] => 'Positive resist composition and resist pattern formation method'
[patent_app_type] => utility
[patent_app_number] => 11/123357
[patent_app_country] => US
[patent_app_date] => 2005-05-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6149
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 89
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/364/07364831.pdf
[firstpage_image] =>[orig_patent_app_number] => 11123357
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/123357 | Positive resist composition and resist pattern formation method | May 5, 2005 | Issued |
Array
(
[id] => 468426
[patent_doc_number] => 07232642
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-06-19
[patent_title] => 'Chemically amplified positive resist composition, a haloester derivative and a process for producing the same'
[patent_app_type] => utility
[patent_app_number] => 11/123104
[patent_app_country] => US
[patent_app_date] => 2005-05-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 11633
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 33
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/232/07232642.pdf
[firstpage_image] =>[orig_patent_app_number] => 11123104
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/123104 | Chemically amplified positive resist composition, a haloester derivative and a process for producing the same | May 5, 2005 | Issued |
Array
(
[id] => 4512831
[patent_doc_number] => 07910282
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2011-03-22
[patent_title] => 'Copolymer for semiconductor lithography and producing method thereof, and composition'
[patent_app_type] => utility
[patent_app_number] => 11/587592
[patent_app_country] => US
[patent_app_date] => 2005-04-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 10200
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 154
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/910/07910282.pdf
[firstpage_image] =>[orig_patent_app_number] => 11587592
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/587592 | Copolymer for semiconductor lithography and producing method thereof, and composition | Apr 27, 2005 | Issued |
Array
(
[id] => 5923844
[patent_doc_number] => 20060241004
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-10-26
[patent_title] => 'Use of blended solvents in defectivity prevention'
[patent_app_type] => utility
[patent_app_number] => 11/111211
[patent_app_country] => US
[patent_app_date] => 2005-04-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 3331
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0241/20060241004.pdf
[firstpage_image] =>[orig_patent_app_number] => 11111211
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/111211 | Use of blended solvents in defectivity prevention | Apr 20, 2005 | Issued |
Array
(
[id] => 6925737
[patent_doc_number] => 20050238992
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-10-27
[patent_title] => 'Photosensitive composition, compound used in the same, and patterning method using the same'
[patent_app_type] => utility
[patent_app_number] => 11/108798
[patent_app_country] => US
[patent_app_date] => 2005-04-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 23761
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0238/20050238992.pdf
[firstpage_image] =>[orig_patent_app_number] => 11108798
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/108798 | Photosensitive composition, compound used in the same, and patterning method using the same | Apr 18, 2005 | Issued |
Array
(
[id] => 53415
[patent_doc_number] => 07767377
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-08-03
[patent_title] => 'Positive type resist composition, process for forming resist pattern, and process for performing ion implantation'
[patent_app_type] => utility
[patent_app_number] => 11/587713
[patent_app_country] => US
[patent_app_date] => 2005-04-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 7948
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 101
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/767/07767377.pdf
[firstpage_image] =>[orig_patent_app_number] => 11587713
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/587713 | Positive type resist composition, process for forming resist pattern, and process for performing ion implantation | Apr 18, 2005 | Issued |