
Noah P Kamen
Examiner (ID: 110)
| Most Active Art Unit | 3747 |
| Art Unit(s) | 3783, 3741, 3302, 3405, 3747, 3402, 2899, 1802 |
| Total Applications | 4075 |
| Issued Applications | 3515 |
| Pending Applications | 138 |
| Abandoned Applications | 425 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
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[patent_doc_number] => 20050095535
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[patent_title] => 'Positive type resist composition and resist pattern formation method using same'
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Array
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[patent_issue_date] => 2008-03-11
[patent_title] => 'Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition'
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Array
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Array
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[patent_issue_date] => 2007-01-30
[patent_title] => 'Photoresist suitable for use in 157 nm photolithography and including a polymer based on fluorinated norbornene derivatives'
[patent_app_type] => utility
[patent_app_number] => 10/974726
[patent_app_country] => US
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Array
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Array
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Array
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Array
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[patent_title] => 'Polymers, resist compositions and patterning process'
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Array
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[id] => 4657453
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[patent_title] => 'Silane Compound, Polysiloxane, and Radiation-Sensitive Resin Composition'
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Array
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Array
(
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[patent_title] => 'Photosensitive composition and planographic printing plate precursor'
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Array
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Array
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Array
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Array
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Array
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Array
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