Search

Noah P Kamen

Examiner (ID: 110)

Most Active Art Unit
3747
Art Unit(s)
3783, 3741, 3302, 3405, 3747, 3402, 2899, 1802
Total Applications
4075
Issued Applications
3515
Pending Applications
138
Abandoned Applications
425

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 6917974 [patent_doc_number] => 20050095535 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-05-05 [patent_title] => 'Positive type resist composition and resist pattern formation method using same' [patent_app_type] => utility [patent_app_number] => 11/004798 [patent_app_country] => US [patent_app_date] => 2004-12-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 9598 [patent_no_of_claims] => 57 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0095/20050095535.pdf [firstpage_image] =>[orig_patent_app_number] => 11004798 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/004798
Positive type resist composition and resist pattern formation method using same Dec 6, 2004 Issued
Array ( [id] => 894465 [patent_doc_number] => 07341817 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-03-11 [patent_title] => 'Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition' [patent_app_type] => utility [patent_app_number] => 10/993094 [patent_app_country] => US [patent_app_date] => 2004-11-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 31995 [patent_no_of_claims] => 31 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 11 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/341/07341817.pdf [firstpage_image] =>[orig_patent_app_number] => 10993094 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/993094
Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition Nov 21, 2004 Issued
Array ( [id] => 554288 [patent_doc_number] => 07468227 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-12-23 [patent_title] => 'Method of reducing the average process bias during production of a reticle' [patent_app_type] => utility [patent_app_number] => 10/989976 [patent_app_country] => US [patent_app_date] => 2004-11-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 5 [patent_no_of_words] => 8780 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 77 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/468/07468227.pdf [firstpage_image] =>[orig_patent_app_number] => 10989976 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/989976
Method of reducing the average process bias during production of a reticle Nov 15, 2004 Issued
Array ( [id] => 540098 [patent_doc_number] => 07169531 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2007-01-30 [patent_title] => 'Photoresist suitable for use in 157 nm photolithography and including a polymer based on fluorinated norbornene derivatives' [patent_app_type] => utility [patent_app_number] => 10/974726 [patent_app_country] => US [patent_app_date] => 2004-10-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3046 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 11 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/169/07169531.pdf [firstpage_image] =>[orig_patent_app_number] => 10974726 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/974726
Photoresist suitable for use in 157 nm photolithography and including a polymer based on fluorinated norbornene derivatives Oct 27, 2004 Issued
Array ( [id] => 5807604 [patent_doc_number] => 20060093958 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-05-04 [patent_title] => 'Color forming compositions and associated methods' [patent_app_type] => utility [patent_app_number] => 10/976553 [patent_app_country] => US [patent_app_date] => 2004-10-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7091 [patent_no_of_claims] => 45 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0093/20060093958.pdf [firstpage_image] =>[orig_patent_app_number] => 10976553 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/976553
Color forming compositions and associated methods Oct 27, 2004 Abandoned
Array ( [id] => 6952057 [patent_doc_number] => 20050227151 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-10-13 [patent_title] => 'Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating composition for fine pattern formation, and method of fabricating semiconductor device' [patent_app_type] => utility [patent_app_number] => 10/972302 [patent_app_country] => US [patent_app_date] => 2004-10-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 12 [patent_no_of_words] => 11893 [patent_no_of_claims] => 41 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0227/20050227151.pdf [firstpage_image] =>[orig_patent_app_number] => 10972302 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/972302
Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating composition for fine pattern formation, and method of fabricating semiconductor device Oct 22, 2004 Issued
Array ( [id] => 6990760 [patent_doc_number] => 20050089797 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-04-28 [patent_title] => 'Polymers, resist compositions and patterning process' [patent_app_type] => utility [patent_app_number] => 10/968971 [patent_app_country] => US [patent_app_date] => 2004-10-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 12218 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0089/20050089797.pdf [firstpage_image] =>[orig_patent_app_number] => 10968971 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/968971
Polymers, resist compositions and patterning process Oct 20, 2004 Issued
Array ( [id] => 7103773 [patent_doc_number] => 20050106499 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-05-19 [patent_title] => 'Polymers, resist compositions and patterning process' [patent_app_type] => utility [patent_app_number] => 10/969097 [patent_app_country] => US [patent_app_date] => 2004-10-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 12642 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0106/20050106499.pdf [firstpage_image] =>[orig_patent_app_number] => 10969097 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/969097
Polymers, resist compositions and patterning process Oct 20, 2004 Issued
Array ( [id] => 4657453 [patent_doc_number] => 20080026314 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-01-31 [patent_title] => 'Silane Compound, Polysiloxane, and Radiation-Sensitive Resin Composition' [patent_app_type] => utility [patent_app_number] => 10/576075 [patent_app_country] => US [patent_app_date] => 2004-10-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 14783 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0026/20080026314.pdf [firstpage_image] =>[orig_patent_app_number] => 10576075 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/576075
Silane Compound, Polysiloxane, and Radiation-Sensitive Resin Composition Oct 13, 2004 Abandoned
Array ( [id] => 5637342 [patent_doc_number] => 20060068315 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-03-30 [patent_title] => 'Color forming compositions and associated methods' [patent_app_type] => utility [patent_app_number] => 10/956180 [patent_app_country] => US [patent_app_date] => 2004-09-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7991 [patent_no_of_claims] => 36 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0068/20060068315.pdf [firstpage_image] =>[orig_patent_app_number] => 10956180 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/956180
Color forming compositions and associated methods Sep 29, 2004 Issued
Array ( [id] => 386488 [patent_doc_number] => 07303857 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2007-12-04 [patent_title] => 'Photosensitive composition and planographic printing plate precursor' [patent_app_type] => utility [patent_app_number] => 10/948470 [patent_app_country] => US [patent_app_date] => 2004-09-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 2 [patent_no_of_words] => 14530 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 125 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/303/07303857.pdf [firstpage_image] =>[orig_patent_app_number] => 10948470 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/948470
Photosensitive composition and planographic printing plate precursor Sep 23, 2004 Issued
Array ( [id] => 7050613 [patent_doc_number] => 20050186500 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-08-25 [patent_title] => 'Method of making and structuring a photoresist' [patent_app_type] => utility [patent_app_number] => 10/947121 [patent_app_country] => US [patent_app_date] => 2004-09-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3333 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0186/20050186500.pdf [firstpage_image] =>[orig_patent_app_number] => 10947121 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/947121
Method of making and structuring a photoresist Sep 20, 2004 Abandoned
Array ( [id] => 5759971 [patent_doc_number] => 20060210916 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-09-21 [patent_title] => 'Positive photoresist composition and method of forming resist pattern' [patent_app_type] => utility [patent_app_number] => 10/566425 [patent_app_country] => US [patent_app_date] => 2004-09-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 11309 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0210/20060210916.pdf [firstpage_image] =>[orig_patent_app_number] => 10566425 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/566425
Positive photoresist composition and method of forming resist pattern Sep 16, 2004 Issued
Array ( [id] => 7210240 [patent_doc_number] => 20050053859 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-03-10 [patent_title] => 'Photoresist, photolithography method using the same, and method for producing photoresist' [patent_app_type] => utility [patent_app_number] => 10/938586 [patent_app_country] => US [patent_app_date] => 2004-09-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 9207 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0053/20050053859.pdf [firstpage_image] =>[orig_patent_app_number] => 10938586 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/938586
Photoresist, photolithography method using the same, and method for producing photoresist Sep 12, 2004 Abandoned
Array ( [id] => 6917971 [patent_doc_number] => 20050095532 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-05-05 [patent_title] => 'Photosensitive composition and pattern forming method using the same' [patent_app_type] => utility [patent_app_number] => 10/937270 [patent_app_country] => US [patent_app_date] => 2004-09-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 36486 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0095/20050095532.pdf [firstpage_image] =>[orig_patent_app_number] => 10937270 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/937270
Photosensitive composition and pattern forming method using the same Sep 9, 2004 Issued
Array ( [id] => 645618 [patent_doc_number] => 07119156 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2006-10-10 [patent_title] => 'Resist resin' [patent_app_type] => utility [patent_app_number] => 10/937313 [patent_app_country] => US [patent_app_date] => 2004-09-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 27146 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 27 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/119/07119156.pdf [firstpage_image] =>[orig_patent_app_number] => 10937313 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/937313
Resist resin Sep 9, 2004 Issued
Array ( [id] => 7127193 [patent_doc_number] => 20050058937 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-03-17 [patent_title] => 'Positive resist composition and patterning process' [patent_app_type] => utility [patent_app_number] => 10/936621 [patent_app_country] => US [patent_app_date] => 2004-09-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4737 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0058/20050058937.pdf [firstpage_image] =>[orig_patent_app_number] => 10936621 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/936621
Positive resist composition and patterning process Sep 8, 2004 Issued
Array ( [id] => 7127191 [patent_doc_number] => 20050058935 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-03-17 [patent_title] => 'Sulfonamide compound, polymer compound, resist material and pattern formation method' [patent_app_type] => utility [patent_app_number] => 10/932316 [patent_app_country] => US [patent_app_date] => 2004-09-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 10183 [patent_no_of_claims] => 26 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0058/20050058935.pdf [firstpage_image] =>[orig_patent_app_number] => 10932316 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/932316
Sulfonamide compound, polymer compound, resist material and pattern formation method Sep 1, 2004 Issued
Array ( [id] => 468395 [patent_doc_number] => 07232637 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2007-06-19 [patent_title] => 'Light sensitive media for optical devices using organic mesophasic materials' [patent_app_type] => utility [patent_app_number] => 10/931257 [patent_app_country] => US [patent_app_date] => 2004-09-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6535 [patent_no_of_claims] => 39 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 18 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/232/07232637.pdf [firstpage_image] =>[orig_patent_app_number] => 10931257 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/931257
Light sensitive media for optical devices using organic mesophasic materials Aug 31, 2004 Issued
Array ( [id] => 6990753 [patent_doc_number] => 20050089790 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-04-28 [patent_title] => 'Photoresist composition for a spinless coater and method of forming a photoresist pattern using the same' [patent_app_type] => utility [patent_app_number] => 10/931387 [patent_app_country] => US [patent_app_date] => 2004-09-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 5630 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0089/20050089790.pdf [firstpage_image] =>[orig_patent_app_number] => 10931387 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/931387
Photoresist composition for a spinless coater and method of forming a photoresist pattern using the same Aug 31, 2004 Abandoned
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