
Noah P Kamen
Examiner (ID: 110)
| Most Active Art Unit | 3747 |
| Art Unit(s) | 3783, 3741, 3302, 3405, 3747, 3402, 2899, 1802 |
| Total Applications | 4075 |
| Issued Applications | 3515 |
| Pending Applications | 138 |
| Abandoned Applications | 425 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 516674
[patent_doc_number] => 07189491
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-03-13
[patent_title] => 'Photoresist composition for deep UV and process thereof'
[patent_app_type] => utility
[patent_app_number] => 10/734022
[patent_app_country] => US
[patent_app_date] => 2003-12-11
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[pdf_file] => patents/07/189/07189491.pdf
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Array
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[patent_doc_number] => 20040170917
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-09-02
[patent_title] => 'Method of forming thick resist pattern'
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[patent_app_number] => 10/480342
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Array
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[patent_kind] => A1
[patent_issue_date] => 2004-05-06
[patent_title] => 'Lithographic printing plate precursor'
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Array
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[patent_issue_date] => 2010-10-26
[patent_title] => 'Method for patterning a low activation energy photoresist'
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Array
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Array
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[patent_title] => 'Photoresist composition and method pattern forming using the same'
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Array
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/716632 | Positive-working photoresist composition | Nov 19, 2003 | Abandoned |
Array
(
[id] => 1045495
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[patent_title] => 'Thermoelastic inkjet actuator with heat conductive pathways'
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Array
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[id] => 606266
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[patent_issue_date] => 2006-12-26
[patent_title] => 'Pattern-forming process using photosensitive resin composition'
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Array
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Array
(
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Array
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Array
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Array
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Array
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