
Noah P Kamen
Examiner (ID: 110)
| Most Active Art Unit | 3747 |
| Art Unit(s) | 3783, 3741, 3302, 3405, 3747, 3402, 2899, 1802 |
| Total Applications | 4075 |
| Issued Applications | 3515 |
| Pending Applications | 138 |
| Abandoned Applications | 425 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 5850970
[patent_doc_number] => 20060234161
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-10-19
[patent_title] => 'Method of making a lithographic printing plate precursor'
[patent_app_type] => utility
[patent_app_number] => 10/530129
[patent_app_country] => US
[patent_app_date] => 2003-09-12
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Array
(
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[patent_kind] => A1
[patent_issue_date] => 2004-04-01
[patent_title] => 'Polymerizable composition and planogaphic printing plate precursor using the same'
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[patent_app_date] => 2003-09-10
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Array
(
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[patent_doc_number] => 20040166433
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[patent_issue_date] => 2004-08-26
[patent_title] => 'Photoresist composition for deep ultraviolet lithography'
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[patent_app_number] => 10/658840
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[patent_app_date] => 2003-12-17
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Array
(
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[patent_kind] => B2
[patent_issue_date] => 2006-10-10
[patent_title] => 'Diazonium salt and thermal recording material using the same'
[patent_app_type] => utility
[patent_app_number] => 10/653242
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[patent_app_date] => 2003-09-03
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Array
(
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[patent_title] => 'Heat-sensitive recording material'
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Array
(
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[patent_title] => 'Negative resist composition'
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Array
(
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[patent_title] => 'Sulfonydiazomethanes, photoacid generators, resist compositions, and patterning process'
[patent_app_type] => utility
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Array
(
[id] => 7055878
[patent_doc_number] => 20050277052
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[patent_title] => 'Fluorinated polymers having polycyclic groups with fused 4-membered carbocyclic rings, useful as photoresists, and processes for microlithography'
[patent_app_type] => utility
[patent_app_number] => 10/523491
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Array
(
[id] => 657816
[patent_doc_number] => 07105273
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[patent_issue_date] => 2006-09-12
[patent_title] => 'Positive resist composition'
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Array
(
[id] => 7381039
[patent_doc_number] => 20040029032
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[patent_title] => 'Positive photoresist composition'
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Array
(
[id] => 7675425
[patent_doc_number] => 20040126693
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[patent_title] => 'Positive photosensitive composition and method of pattern formation using the same'
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Array
(
[id] => 1021162
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[patent_issue_date] => 2005-05-03
[patent_title] => 'Photosensitive resin precursor composition'
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Array
(
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Array
(
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Array
(
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Array
(
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Array
(
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Array
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Array
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