
Noah P Kamen
Examiner (ID: 110)
| Most Active Art Unit | 3747 |
| Art Unit(s) | 3783, 3741, 3302, 3405, 3747, 3402, 2899, 1802 |
| Total Applications | 4075 |
| Issued Applications | 3515 |
| Pending Applications | 138 |
| Abandoned Applications | 425 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1196160
[patent_doc_number] => 06727033
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-04-27
[patent_title] => 'Positive resist composition'
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[patent_app_date] => 2002-11-01
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[pdf_file] => patents/06/727/06727033.pdf
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Array
(
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[patent_doc_number] => 07326510
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[patent_kind] => B2
[patent_issue_date] => 2008-02-05
[patent_title] => 'Polycarbocyclic derivatives for modification of resist, optical and etch resistance properties'
[patent_app_type] => utility
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/494547 | Polycarbocyclic derivatives for modification of resist, optical and etch resistance properties | Oct 30, 2002 | Issued |
| 10/282994 | Thermal generation of a mask for flexography | Oct 27, 2002 | Abandoned |
Array
(
[id] => 7010605
[patent_doc_number] => 20050064321
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[patent_issue_date] => 2005-03-24
[patent_title] => 'Positive photoresist composition for liquid crystal device'
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[patent_app_number] => 10/494486
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[patent_app_date] => 2002-10-21
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Array
(
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[patent_kind] => A1
[patent_issue_date] => 2005-02-24
[patent_title] => 'Photosensitive resin composition comprising quinonediazide sulfate ester compound'
[patent_app_type] => utility
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[patent_app_date] => 2002-10-21
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/493455 | Photosensitive resin composition comprising quinonediazide sulfate ester compound | Oct 20, 2002 | Abandoned |
Array
(
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[patent_title] => 'Aqueous developable, photosensitive benzocyclobutene-based oligomers and polymers with high moisture resistance'
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[patent_app_number] => 10/273540
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Array
(
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[patent_title] => 'Hybrid compound, resist, and patterning process'
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Array
(
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[patent_title] => 'Support for lithographic printing plate and presensitized plate and method of producing lithographic printing plate'
[patent_app_type] => utility
[patent_app_number] => 10/265323
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/265323 | Support for lithographic printing plate and presensitized plate and method of producing lithographic printing plate | Oct 6, 2002 | Issued |
Array
(
[id] => 1053032
[patent_doc_number] => 06858359
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[patent_issue_date] => 2005-02-22
[patent_title] => 'Thermally sensitive, multilayer imageable element'
[patent_app_type] => utility
[patent_app_number] => 10/264814
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[patent_app_date] => 2002-10-04
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/264814 | Thermally sensitive, multilayer imageable element | Oct 3, 2002 | Issued |
Array
(
[id] => 468446
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[patent_title] => 'Planar inorganic device'
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Array
(
[id] => 496063
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[patent_issue_date] => 2007-04-24
[patent_title] => 'Method of producing a patterned photoresist used to prepare high performance photomasks'
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[patent_app_number] => 10/261972
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/261972 | Method of producing a patterned photoresist used to prepare high performance photomasks | Sep 29, 2002 | Issued |
Array
(
[id] => 6829595
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[patent_title] => 'Novel sulfonyldiazomethanes, photoacid generations, resist compositions, and patterning process'
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Array
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Array
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Array
(
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Array
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Array
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Array
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