
Noah P Kamen
Examiner (ID: 110)
| Most Active Art Unit | 3747 |
| Art Unit(s) | 3783, 3741, 3302, 3405, 3747, 3402, 2899, 1802 |
| Total Applications | 4075 |
| Issued Applications | 3515 |
| Pending Applications | 138 |
| Abandoned Applications | 425 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 916800
[patent_doc_number] => 07323284
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-01-29
[patent_title] => 'Negative type radiation sensitive resin composition'
[patent_app_type] => utility
[patent_app_number] => 10/171583
[patent_app_country] => US
[patent_app_date] => 2002-06-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 11203
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 127
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/323/07323284.pdf
[firstpage_image] =>[orig_patent_app_number] => 10171583
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/171583 | Negative type radiation sensitive resin composition | Jun 16, 2002 | Issued |
Array
(
[id] => 1199851
[patent_doc_number] => 06723482
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-04-20
[patent_title] => 'Heat-sensitive recording material'
[patent_app_type] => B2
[patent_app_number] => 10/166730
[patent_app_country] => US
[patent_app_date] => 2002-06-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 13301
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 105
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/723/06723482.pdf
[firstpage_image] =>[orig_patent_app_number] => 10166730
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/166730 | Heat-sensitive recording material | Jun 11, 2002 | Issued |
Array
(
[id] => 1062647
[patent_doc_number] => 06849391
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-02-01
[patent_title] => 'Photoresist, photolithography method using the same, and method for producing photoresist'
[patent_app_type] => utility
[patent_app_number] => 10/165317
[patent_app_country] => US
[patent_app_date] => 2002-06-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 25
[patent_no_of_words] => 9245
[patent_no_of_claims] => 2
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 125
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/849/06849391.pdf
[firstpage_image] =>[orig_patent_app_number] => 10165317
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/165317 | Photoresist, photolithography method using the same, and method for producing photoresist | Jun 9, 2002 | Issued |
Array
(
[id] => 6813475
[patent_doc_number] => 20030073025
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-04-17
[patent_title] => 'Recording material'
[patent_app_type] => new
[patent_app_number] => 10/158210
[patent_app_country] => US
[patent_app_date] => 2002-05-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 23481
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 38
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0073/20030073025.pdf
[firstpage_image] =>[orig_patent_app_number] => 10158210
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/158210 | Recording material | May 30, 2002 | Issued |
Array
(
[id] => 1245471
[patent_doc_number] => 06677099
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2004-01-13
[patent_title] => 'Positive type photosensitive polyimide resin composition'
[patent_app_type] => B1
[patent_app_number] => 10/148396
[patent_app_country] => US
[patent_app_date] => 2002-05-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5744
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 210
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/677/06677099.pdf
[firstpage_image] =>[orig_patent_app_number] => 10148396
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/148396 | Positive type photosensitive polyimide resin composition | May 29, 2002 | Issued |
Array
(
[id] => 6869787
[patent_doc_number] => 20030082476
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-05-01
[patent_title] => 'UV-sensitive imaging element for making lithographic printing plates'
[patent_app_type] => new
[patent_app_number] => 10/159408
[patent_app_country] => US
[patent_app_date] => 2002-05-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6148
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 18
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0082/20030082476.pdf
[firstpage_image] =>[orig_patent_app_number] => 10159408
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/159408 | UV-sensitive imaging element for making lithographic printing plates comprising an aryldiazosulfonate polymer and a compound sensitive to UV light | May 29, 2002 | Issued |
Array
(
[id] => 1220104
[patent_doc_number] => 06703178
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-03-09
[patent_title] => 'Chemical amplified photoresist compositions'
[patent_app_type] => B2
[patent_app_number] => 10/154826
[patent_app_country] => US
[patent_app_date] => 2002-05-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 3360
[patent_no_of_claims] => 23
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 79
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/703/06703178.pdf
[firstpage_image] =>[orig_patent_app_number] => 10154826
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/154826 | Chemical amplified photoresist compositions | May 27, 2002 | Issued |
Array
(
[id] => 6821512
[patent_doc_number] => 20030219673
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-11-27
[patent_title] => 'Selected acid generating agents and their use in processes for imaging radiation-sensitive elements'
[patent_app_type] => new
[patent_app_number] => 10/155696
[patent_app_country] => US
[patent_app_date] => 2002-05-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 10675
[patent_no_of_claims] => 41
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 19
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0219/20030219673.pdf
[firstpage_image] =>[orig_patent_app_number] => 10155696
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/155696 | Selected acid generating agents and their use in processes for imaging radiation-sensitive elements | May 23, 2002 | Issued |
Array
(
[id] => 1107192
[patent_doc_number] => 06808857
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-10-26
[patent_title] => 'Negative-working photosensitive composition and negative-working photosensitive lithographic printing plate'
[patent_app_type] => B2
[patent_app_number] => 10/151199
[patent_app_country] => US
[patent_app_date] => 2002-05-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6546
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 76
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/808/06808857.pdf
[firstpage_image] =>[orig_patent_app_number] => 10151199
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/151199 | Negative-working photosensitive composition and negative-working photosensitive lithographic printing plate | May 19, 2002 | Issued |
| 10/130667 | Nitrile/fluoroalcohol-containing photoresists and associated processes for microlithography | May 15, 2002 | Abandoned |
Array
(
[id] => 6791835
[patent_doc_number] => 20030087179
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-05-08
[patent_title] => 'Positive photoresist transfer material and method for processing surface of substrate using the transfer material'
[patent_app_type] => new
[patent_app_number] => 10/143567
[patent_app_country] => US
[patent_app_date] => 2002-05-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 17050
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 124
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0087/20030087179.pdf
[firstpage_image] =>[orig_patent_app_number] => 10143567
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/143567 | Positive photoresist transfer material and method for processing surface of substrate using the transfer material | May 12, 2002 | Issued |
Array
(
[id] => 7122257
[patent_doc_number] => 20050014086
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-01-20
[patent_title] => '\"High ortho\" novolak copolymers and composition thereof'
[patent_app_type] => utility
[patent_app_number] => 10/481461
[patent_app_country] => US
[patent_app_date] => 2002-04-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 3476
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0014/20050014086.pdf
[firstpage_image] =>[orig_patent_app_number] => 10481461
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/481461 | High ortho" novolak copolymers and composition thereof | Apr 18, 2002 | Abandoned |
Array
(
[id] => 1188718
[patent_doc_number] => 06733949
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-05-11
[patent_title] => 'Novolak resin mixtures and photosensitive compositions comprising the same'
[patent_app_type] => B2
[patent_app_number] => 10/120893
[patent_app_country] => US
[patent_app_date] => 2002-04-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 5728
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 104
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/733/06733949.pdf
[firstpage_image] =>[orig_patent_app_number] => 10120893
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/120893 | Novolak resin mixtures and photosensitive compositions comprising the same | Apr 10, 2002 | Issued |
Array
(
[id] => 6860917
[patent_doc_number] => 20030091925
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-05-15
[patent_title] => 'Use of cinnamic acid groups containing acetal polymers for radiation-sensitive compositions and lithographic printing plates'
[patent_app_type] => new
[patent_app_number] => 10/119392
[patent_app_country] => US
[patent_app_date] => 2002-04-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 7382
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 31
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0091/20030091925.pdf
[firstpage_image] =>[orig_patent_app_number] => 10119392
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/119392 | Use of cinnamic acid groups containing acetal polymers for radiation-sensitive compositions and lithographic printing plates | Apr 10, 2002 | Issued |
Array
(
[id] => 999445
[patent_doc_number] => 06911293
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-06-28
[patent_title] => 'Photoresist compositions comprising acetals and ketals as solvents'
[patent_app_type] => utility
[patent_app_number] => 10/120952
[patent_app_country] => US
[patent_app_date] => 2002-04-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6318
[patent_no_of_claims] => 26
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 26
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/911/06911293.pdf
[firstpage_image] =>[orig_patent_app_number] => 10120952
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/120952 | Photoresist compositions comprising acetals and ketals as solvents | Apr 10, 2002 | Issued |
Array
(
[id] => 1021161
[patent_doc_number] => 06887642
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-05-03
[patent_title] => 'Multi-layer negative working imageable element'
[patent_app_type] => utility
[patent_app_number] => 10/117569
[patent_app_country] => US
[patent_app_date] => 2002-04-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 9189
[patent_no_of_claims] => 27
[patent_no_of_ind_claims] => 8
[patent_words_short_claim] => 52
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/887/06887642.pdf
[firstpage_image] =>[orig_patent_app_number] => 10117569
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/117569 | Multi-layer negative working imageable element | Apr 4, 2002 | Issued |
Array
(
[id] => 6750195
[patent_doc_number] => 20030044715
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-03-06
[patent_title] => 'Positive photoresist composition'
[patent_app_type] => new
[patent_app_number] => 10/116137
[patent_app_country] => US
[patent_app_date] => 2002-04-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 13886
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 148
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0044/20030044715.pdf
[firstpage_image] =>[orig_patent_app_number] => 10116137
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/116137 | Positive photoresist composition | Apr 4, 2002 | Issued |
Array
(
[id] => 1133161
[patent_doc_number] => 06783913
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-08-31
[patent_title] => 'Polymeric acetal resins containing free radical inhibitors and their use in lithographic printing'
[patent_app_type] => B2
[patent_app_number] => 10/117505
[patent_app_country] => US
[patent_app_date] => 2002-04-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6787
[patent_no_of_claims] => 41
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 247
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/783/06783913.pdf
[firstpage_image] =>[orig_patent_app_number] => 10117505
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/117505 | Polymeric acetal resins containing free radical inhibitors and their use in lithographic printing | Apr 4, 2002 | Issued |
Array
(
[id] => 6404887
[patent_doc_number] => 20020182531
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-12-05
[patent_title] => 'Positive photoresist composition'
[patent_app_type] => new
[patent_app_number] => 10/109899
[patent_app_country] => US
[patent_app_date] => 2002-04-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 6098
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 30
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0182/20020182531.pdf
[firstpage_image] =>[orig_patent_app_number] => 10109899
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/109899 | Positive photoresist composition | Mar 31, 2002 | Issued |
Array
(
[id] => 5858268
[patent_doc_number] => 20020122670
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-09-05
[patent_title] => 'Developing method and developing apparatus'
[patent_app_type] => new
[patent_app_number] => 10/108382
[patent_app_country] => US
[patent_app_date] => 2002-03-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 6357
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 79
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0122/20020122670.pdf
[firstpage_image] =>[orig_patent_app_number] => 10108382
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/108382 | Developing method and developing apparatus | Mar 28, 2002 | Issued |