
Olivia T. Luk
Examiner (ID: 8315)
| Most Active Art Unit | 2812 |
| Art Unit(s) | 2812 |
| Total Applications | 278 |
| Issued Applications | 256 |
| Pending Applications | 8 |
| Abandoned Applications | 14 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1104722
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[patent_title] => 'Method and system for performing failure analysis on a multilayer silicon-on-insulator (SOI) device'
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[patent_app_number] => 10/313687
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Array
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[patent_issue_date] => 2005-06-07
[patent_title] => 'Soft-landing etching method using doping level control'
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Array
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[patent_title] => 'Method of manufacturing semiconductor device'
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Array
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Array
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[patent_title] => 'Method of correcting non-linearity of metrology tools, and system for performing same'
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Array
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[patent_title] => 'Method of improving etch uniformity in deep silicon etching'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/289432 | Method for preventing reworked photoresist from collapsing | Nov 6, 2002 | Abandoned |
Array
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[patent_title] => 'Gas delivery system for deposition processes, and methods of using same'
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Array
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[patent_title] => 'Lithography system, exposure apparatus and their control method, and device manufacturing method'
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Array
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[patent_title] => 'PLASMA ENHANCED CVD LOW K CARBON-DOPED SILICON OXIDE FILM DEPOSITION USING VHF-RF POWER'
[patent_app_type] => new
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/279367 | Plasma enhanced CVD low k carbon-doped silicon oxide film deposition using VHF-RF power | Oct 22, 2002 | Issued |
Array
(
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[patent_title] => 'Plasma enhanced chemical vapor deposition apparatus and method for forming nitride layer using the same'
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Array
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[patent_title] => 'Thermal activation of fluorine for use in a semiconductor chamber'
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Array
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Array
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Array
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