| Application number | Title of the application | Filing Date | Status |
|---|
Array
(
[id] => 2942014
[patent_doc_number] => 05254504
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-10-19
[patent_title] => 'Method of manufacturing ferroelectric MOSFET sensors'
[patent_app_type] => 1
[patent_app_number] => 7/755123
[patent_app_country] => US
[patent_app_date] => 1991-09-05
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[pdf_file] => patents/05/254/05254504.pdf
[firstpage_image] =>[orig_patent_app_number] => 755123
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/755123 | Method of manufacturing ferroelectric MOSFET sensors | Sep 4, 1991 | Issued |
Array
(
[id] => 2974866
[patent_doc_number] => 05256581
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-10-26
[patent_title] => 'Silicon film with improved thickness control'
[patent_app_type] => 1
[patent_app_number] => 7/751001
[patent_app_country] => US
[patent_app_date] => 1991-08-28
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[pdf_file] => patents/05/256/05256581.pdf
[firstpage_image] =>[orig_patent_app_number] => 751001
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/751001 | Silicon film with improved thickness control | Aug 27, 1991 | Issued |
Array
(
[id] => 3064866
[patent_doc_number] => 05294557
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-03-15
[patent_title] => 'Implanting impurities in semiconductors and semiconductor implanted with impurities'
[patent_app_type] => 1
[patent_app_number] => 7/749825
[patent_app_country] => US
[patent_app_date] => 1991-08-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[pdf_file] => patents/05/294/05294557.pdf
[firstpage_image] =>[orig_patent_app_number] => 749825
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/749825 | Implanting impurities in semiconductors and semiconductor implanted with impurities | Aug 25, 1991 | Issued |
| 07/751639 | MATERIAL-SAVING PROCESS FOR FABRICATING MIXED CRYSTALS | Aug 25, 1991 | Abandoned |
| 07/748421 | PHOTOELECTRIC CONVERSION DEVICE AND METHOD OF MAKING THE SAME | Aug 21, 1991 | Abandoned |
Array
(
[id] => 2978757
[patent_doc_number] => 05204283
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-04-20
[patent_title] => 'Method of growth II-VI semiconducting compounds'
[patent_app_type] => 1
[patent_app_number] => 7/750432
[patent_app_country] => US
[patent_app_date] => 1991-08-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[pdf_file] => patents/05/204/05204283.pdf
[firstpage_image] =>[orig_patent_app_number] => 750432
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/750432 | Method of growth II-VI semiconducting compounds | Aug 19, 1991 | Issued |
Array
(
[id] => 2933227
[patent_doc_number] => 05229334
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-07-20
[patent_title] => 'Method of forming a gate insulating film involving a step of cleaning using an ammonia-peroxide solution'
[patent_app_type] => 1
[patent_app_number] => 7/744359
[patent_app_country] => US
[patent_app_date] => 1991-08-13
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/229/05229334.pdf
[firstpage_image] =>[orig_patent_app_number] => 744359
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/744359 | Method of forming a gate insulating film involving a step of cleaning using an ammonia-peroxide solution | Aug 12, 1991 | Issued |
Array
(
[id] => 2796121
[patent_doc_number] => 05121531
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1992-06-16
[patent_title] => 'Refractory susceptors for epitaxial deposition apparatus'
[patent_app_type] => 1
[patent_app_number] => 7/742569
[patent_app_country] => US
[patent_app_date] => 1991-08-07
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[pdf_file] => patents/05/121/05121531.pdf
[firstpage_image] =>[orig_patent_app_number] => 742569
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/742569 | Refractory susceptors for epitaxial deposition apparatus | Aug 6, 1991 | Issued |
Array
(
[id] => 2925560
[patent_doc_number] => 05196034
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-03-23
[patent_title] => 'Semiconductor wafer cleaning apparatus'
[patent_app_type] => 1
[patent_app_number] => 7/737666
[patent_app_country] => US
[patent_app_date] => 1991-07-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[pdf_file] => patents/05/196/05196034.pdf
[firstpage_image] =>[orig_patent_app_number] => 737666
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/737666 | Semiconductor wafer cleaning apparatus | Jul 29, 1991 | Issued |
| 07/737796 | METHOD OF FORMING TRENCH ISOLATED REGIONS WITH SIDEWALL DOPING | Jul 24, 1991 | Abandoned |
Array
(
[id] => 2845853
[patent_doc_number] => 05110752
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1992-05-05
[patent_title] => 'Roughened polysilicon surface capacitor electrode plate for high denity dram'
[patent_app_type] => 1
[patent_app_number] => 7/727873
[patent_app_country] => US
[patent_app_date] => 1991-07-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[patent_no_of_claims] => 17
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[pdf_file] => patents/05/110/05110752.pdf
[firstpage_image] =>[orig_patent_app_number] => 727873
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/727873 | Roughened polysilicon surface capacitor electrode plate for high denity dram | Jul 9, 1991 | Issued |
Array
(
[id] => 2946264
[patent_doc_number] => 05180683
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-01-19
[patent_title] => 'Method of manufacturing stacked capacitor type semiconductor memory device'
[patent_app_type] => 1
[patent_app_number] => 7/727781
[patent_app_country] => US
[patent_app_date] => 1991-07-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 19
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[pdf_file] => patents/05/180/05180683.pdf
[firstpage_image] =>[orig_patent_app_number] => 727781
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/727781 | Method of manufacturing stacked capacitor type semiconductor memory device | Jul 9, 1991 | Issued |
Array
(
[id] => 2973802
[patent_doc_number] => 05225361
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-07-06
[patent_title] => 'Non-volatile semiconductor memory device and a method for fabricating the same'
[patent_app_type] => 1
[patent_app_number] => 7/727125
[patent_app_country] => US
[patent_app_date] => 1991-07-09
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/225/05225361.pdf
[firstpage_image] =>[orig_patent_app_number] => 727125
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/727125 | Non-volatile semiconductor memory device and a method for fabricating the same | Jul 8, 1991 | Issued |
Array
(
[id] => 2898822
[patent_doc_number] => 05217908
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-06-08
[patent_title] => 'Semiconductor device having an insulator film of silicon oxide in which OH ions are incorporated'
[patent_app_type] => 1
[patent_app_number] => 7/718381
[patent_app_country] => US
[patent_app_date] => 1991-06-20
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/217/05217908.pdf
[firstpage_image] =>[orig_patent_app_number] => 718381
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/718381 | Semiconductor device having an insulator film of silicon oxide in which OH ions are incorporated | Jun 19, 1991 | Issued |
Array
(
[id] => 2974278
[patent_doc_number] => 05256550
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-10-26
[patent_title] => 'Fabricating a semiconductor device with strained Si.sub.1-x Ge.sub.x layer'
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[patent_app_number] => 7/715054
[patent_app_country] => US
[patent_app_date] => 1991-06-12
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[pdf_file] => patents/05/256/05256550.pdf
[firstpage_image] =>[orig_patent_app_number] => 715054
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/715054 | Fabricating a semiconductor device with strained Si.sub.1-x Ge.sub.x layer | Jun 11, 1991 | Issued |
Array
(
[id] => 2940924
[patent_doc_number] => 05223445
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-06-29
[patent_title] => 'Large angle ion implantation method'
[patent_app_type] => 1
[patent_app_number] => 7/707801
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[patent_app_date] => 1991-05-30
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/223/05223445.pdf
[firstpage_image] =>[orig_patent_app_number] => 707801
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/707801 | Large angle ion implantation method | May 29, 1991 | Issued |
| 07/701271 | INTEGRATED CIRCUIT | May 15, 1991 | Abandoned |
Array
(
[id] => 2974104
[patent_doc_number] => 05225377
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-07-06
[patent_title] => 'Method for micromachining semiconductor material'
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[patent_app_number] => 7/695185
[patent_app_country] => US
[patent_app_date] => 1991-05-03
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[pdf_file] => patents/05/225/05225377.pdf
[firstpage_image] =>[orig_patent_app_number] => 695185
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/695185 | Method for micromachining semiconductor material | May 2, 1991 | Issued |
Array
(
[id] => 2882133
[patent_doc_number] => 05108949
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1992-04-28
[patent_title] => 'Semiconductor laser and laser fabrication method'
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[patent_app_number] => 7/695219
[patent_app_country] => US
[patent_app_date] => 1991-05-03
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[pdf_file] => patents/05/108/05108949.pdf
[firstpage_image] =>[orig_patent_app_number] => 695219
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/695219 | Semiconductor laser and laser fabrication method | May 2, 1991 | Issued |
Array
(
[id] => 2866273
[patent_doc_number] => 05096839
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1992-03-17
[patent_title] => 'Silicon wafer with defined interstitial oxygen concentration'
[patent_app_type] => 1
[patent_app_number] => 7/693035
[patent_app_country] => US
[patent_app_date] => 1991-04-30
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/096/05096839.pdf
[firstpage_image] =>[orig_patent_app_number] => 693035
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/693035 | Silicon wafer with defined interstitial oxygen concentration | Apr 29, 1991 | Issued |