| Application number | Title of the application | Filing Date | Status |
|---|
Array
(
[id] => 16630107
[patent_doc_number] => 20210048760
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2021-02-18
[patent_title] => ELECTROSTATIC INK COMPOSITION
[patent_app_type] => utility
[patent_app_number] => 17/051394
[patent_app_country] => US
[patent_app_date] => 2018-11-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 10897
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -12
[patent_words_short_claim] => 24
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17051394
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/051394 | ELECTROSTATIC INK COMPOSITION | Nov 14, 2018 | Abandoned |
Array
(
[id] => 16239965
[patent_doc_number] => 20200257199
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-08-13
[patent_title] => LITHOGRAPHICALLY PATTERNED ELECTRICALLY CONDUCTIVE HYDROGELS, PHOTO-CURABLE COMPOSITIONS, AND ELASTOMERS FORMED FROM SUCH COMPOSITIONS
[patent_app_type] => utility
[patent_app_number] => 16/758347
[patent_app_country] => US
[patent_app_date] => 2018-10-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 18610
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 2
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16758347
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/758347 | LITHOGRAPHICALLY PATTERNED ELECTRICALLY CONDUCTIVE HYDROGELS, PHOTO-CURABLE COMPOSITIONS, AND ELASTOMERS FORMED FROM SUCH COMPOSITIONS | Oct 25, 2018 | Abandoned |
Array
(
[id] => 15270883
[patent_doc_number] => 20190384176
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-12-19
[patent_title] => CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND PHOTORESIST FILM USING THE SAME
[patent_app_type] => utility
[patent_app_number] => 16/480572
[patent_app_country] => US
[patent_app_date] => 2018-10-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5812
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -13
[patent_words_short_claim] => 121
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16480572
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/480572 | Chemically amplified photoresist composition and photoresist film using the same | Oct 24, 2018 | Issued |
Array
(
[id] => 16918171
[patent_doc_number] => 20210191263
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2021-06-24
[patent_title] => METHOD OF MANUFACTURING HIGH-DEFINED PATTERN AND METHOD OF MANUFACTURING DISPLAY DEVICE USING THE SAME
[patent_app_type] => utility
[patent_app_number] => 16/757435
[patent_app_country] => US
[patent_app_date] => 2018-10-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6288
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -15
[patent_words_short_claim] => 2
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16757435
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/757435 | METHOD OF MANUFACTURING HIGH-DEFINED PATTERN AND METHOD OF MANUFACTURING DISPLAY DEVICE USING THE SAME | Oct 16, 2018 | Pending |
Array
(
[id] => 16178615
[patent_doc_number] => 20200225583
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-07-16
[patent_title] => POSITIVE TYPE PHOTOSENSITIVE SILOXANE COMPOSITION AND CURED FILM USING THE SAME
[patent_app_type] => utility
[patent_app_number] => 16/651110
[patent_app_country] => US
[patent_app_date] => 2018-09-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 9978
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -12
[patent_words_short_claim] => 2
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16651110
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/651110 | POSITIVE TYPE PHOTOSENSITIVE SILOXANE COMPOSITION AND CURED FILM USING THE SAME | Sep 23, 2018 | Pending |
Array
(
[id] => 16239963
[patent_doc_number] => 20200257197
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-08-13
[patent_title] => RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
[patent_app_type] => utility
[patent_app_number] => 16/642848
[patent_app_country] => US
[patent_app_date] => 2018-09-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 29184
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -4
[patent_words_short_claim] => 156
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16642848
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/642848 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | Sep 20, 2018 | Abandoned |
Array
(
[id] => 18173788
[patent_doc_number] => 11573492
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2023-02-07
[patent_title] => Photoresist composition
[patent_app_type] => utility
[patent_app_number] => 16/631765
[patent_app_country] => US
[patent_app_date] => 2018-07-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 6084
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 125
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16631765
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/631765 | Photoresist composition | Jul 23, 2018 | Issued |
Array
(
[id] => 16314202
[patent_doc_number] => 20200292940
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-09-17
[patent_title] => SILSESQUIOXANE COMPOSITION WITH BOTH POSITIVE AND NEGATIVE PHOTO RESIST CHARACTERISTICS
[patent_app_type] => utility
[patent_app_number] => 16/621978
[patent_app_country] => US
[patent_app_date] => 2018-06-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5065
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -14
[patent_words_short_claim] => 196
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16621978
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/621978 | SILSESQUIOXANE COMPOSITION WITH BOTH POSITIVE AND NEGATIVE PHOTO RESIST CHARACTERISTICS | Jun 14, 2018 | Abandoned |
Array
(
[id] => 17408515
[patent_doc_number] => 11249395
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2022-02-15
[patent_title] => Pattern forming method, method for manufacturing electronic device, laminate film, and composition for forming upper layer film
[patent_app_type] => utility
[patent_app_number] => 15/994521
[patent_app_country] => US
[patent_app_date] => 2018-05-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 35311
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 376
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15994521
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/994521 | Pattern forming method, method for manufacturing electronic device, laminate film, and composition for forming upper layer film | May 30, 2018 | Issued |
Array
(
[id] => 19522446
[patent_doc_number] => 12124166
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2024-10-22
[patent_title] => Negative resist formulation for producing undercut pattern profiles
[patent_app_type] => utility
[patent_app_number] => 16/496986
[patent_app_country] => US
[patent_app_date] => 2018-04-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 11
[patent_no_of_words] => 13345
[patent_no_of_claims] => 30
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 209
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16496986
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/496986 | Negative resist formulation for producing undercut pattern profiles | Apr 22, 2018 | Issued |
Array
(
[id] => 16090573
[patent_doc_number] => 20200199273
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-06-25
[patent_title] => POLY-P-HYDROXYSTYRENE EPOXY RESINS, SYNTHESIS AND APPLICATION THEREOF
[patent_app_type] => utility
[patent_app_number] => 16/612962
[patent_app_country] => US
[patent_app_date] => 2018-04-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 8400
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -13
[patent_words_short_claim] => 81
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16612962
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/612962 | POLY-P-HYDROXYSTYRENE EPOXY RESINS, SYNTHESIS AND APPLICATION THEREOF | Apr 19, 2018 | Pending |
Array
(
[id] => 15530129
[patent_doc_number] => 20200057370
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-02-20
[patent_title] => COMPOUND, RESIST COMPOSITION CONTAINING COMPOUND AND PATTERN FORMATION METHOD USING SAME
[patent_app_type] => utility
[patent_app_number] => 16/498306
[patent_app_country] => US
[patent_app_date] => 2018-03-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 22138
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -10
[patent_words_short_claim] => 45
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16498306
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/498306 | COMPOUND, RESIST COMPOSITION CONTAINING COMPOUND AND PATTERN FORMATION METHOD USING SAME | Mar 29, 2018 | Abandoned |
Array
(
[id] => 15366591
[patent_doc_number] => 20200019060
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-01-16
[patent_title] => PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION FILM, INSULATING FILM, AND ELECTRONIC COMPONENT
[patent_app_type] => utility
[patent_app_number] => 16/494670
[patent_app_country] => US
[patent_app_date] => 2018-03-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 15082
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -13
[patent_words_short_claim] => 224
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16494670
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/494670 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION FILM, INSULATING FILM, AND ELECTRONIC COMPONENT | Mar 11, 2018 | Abandoned |
Array
(
[id] => 15293711
[patent_doc_number] => 20190389991
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-12-26
[patent_title] => POLYMER AND POSITIVE RESIST COMPOSITION
[patent_app_type] => utility
[patent_app_number] => 16/489145
[patent_app_country] => US
[patent_app_date] => 2018-02-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5592
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -3
[patent_words_short_claim] => 91
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16489145
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/489145 | POLYMER AND POSITIVE RESIST COMPOSITION | Feb 20, 2018 | Abandoned |
Array
(
[id] => 14900557
[patent_doc_number] => 20190294044
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-09-26
[patent_title] => POSITIVE PHOTOSENSITIVE COMPOSITION, PATTERN USING SAME, AND METHOD OF MANUFACTURING PATTERN
[patent_app_type] => utility
[patent_app_number] => 16/465097
[patent_app_country] => US
[patent_app_date] => 2017-11-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6195
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 2
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16465097
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/465097 | POSITIVE PHOTOSENSITIVE COMPOSITION, PATTERN USING SAME, AND METHOD OF MANUFACTURING PATTERN | Nov 28, 2017 | Pending |
Array
(
[id] => 16894586
[patent_doc_number] => 11036134
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2021-06-15
[patent_title] => High etch resistance spin-on carbon hard mask composition and patterning method using same
[patent_app_type] => utility
[patent_app_number] => 16/341244
[patent_app_country] => US
[patent_app_date] => 2017-10-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 2839
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 67
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16341244
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/341244 | High etch resistance spin-on carbon hard mask composition and patterning method using same | Oct 11, 2017 | Issued |
Array
(
[id] => 20702719
[patent_doc_number] => 12625428
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2026-05-12
[patent_title] => Stepped substrate coating composition including compound having photocrosslinking group due to unsaturated bond between carbon atoms
[patent_app_type] => utility
[patent_app_number] => 16/083869
[patent_app_country] => US
[patent_app_date] => 2017-03-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 16202
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 62
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16083869
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/083869 | Stepped substrate coating composition including compound having photocrosslinking group due to unsaturated bond between carbon atoms | Mar 6, 2017 | Issued |
Array
(
[id] => 13402923
[patent_doc_number] => 20180253004
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2018-09-06
[patent_title] => PHOTOSENSITIVE RESIN COMPOSITION AND ORGANIC INSULATING FILM PREPARED THEREFROM
[patent_app_type] => utility
[patent_app_number] => 15/755580
[patent_app_country] => US
[patent_app_date] => 2016-08-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6140
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -5
[patent_words_short_claim] => 51
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15755580
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/755580 | PHOTOSENSITIVE RESIN COMPOSITION AND ORGANIC INSULATING FILM PREPARED THEREFROM | Aug 30, 2016 | Abandoned |