Search

Raymond J. Henley Iii

Examiner (ID: 7179, Phone: (571)272-0575 , Office: P/1629 )

Most Active Art Unit
1614
Art Unit(s)
1205, 2899, 1629, 1614, 1621
Total Applications
4324
Issued Applications
3034
Pending Applications
603
Abandoned Applications
710

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 17665625 [patent_doc_number] => 11359306 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2022-06-14 [patent_title] => Method for preparing a SiC ingot and device for preparing a SiC ingot wherein electrical resistance of crucible body is 2.9 ohms or more [patent_app_type] => utility [patent_app_number] => 16/881491 [patent_app_country] => US [patent_app_date] => 2020-05-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 7354 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 265 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16881491 [rel_patent_id] =>[rel_patent_doc_number] =>)
16/881491
Method for preparing a SiC ingot and device for preparing a SiC ingot wherein electrical resistance of crucible body is 2.9 ohms or more May 21, 2020 Issued
Array ( [id] => 18604959 [patent_doc_number] => 11746415 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2023-09-05 [patent_title] => Method for applying a carbon layer to a substrate comprising introducing a process gas into a deposition chamber via a gas inlet and gas activation element [patent_app_type] => utility [patent_app_number] => 16/872394 [patent_app_country] => US [patent_app_date] => 2020-05-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 4319 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 209 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16872394 [rel_patent_id] =>[rel_patent_doc_number] =>)
16/872394
Method for applying a carbon layer to a substrate comprising introducing a process gas into a deposition chamber via a gas inlet and gas activation element May 11, 2020 Issued
Array ( [id] => 17917448 [patent_doc_number] => 20220319844 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2022-10-06 [patent_title] => ANISOTROPIC EPITAXIAL GROWTH [patent_app_type] => utility [patent_app_number] => 17/615877 [patent_app_country] => US [patent_app_date] => 2020-05-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6788 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -17 [patent_words_short_claim] => 59 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17615877 [rel_patent_id] =>[rel_patent_doc_number] =>)
17/615877
Anisotropic epitaxial growth of silicon germanium May 6, 2020 Issued
Array ( [id] => 17022702 [patent_doc_number] => 20210246573 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2021-08-12 [patent_title] => SILICON CARBIDE CRYSTAL GROWING APPARATUS AND CRYSTAL GROWING METHOD THEREOF [patent_app_type] => utility [patent_app_number] => 16/866509 [patent_app_country] => US [patent_app_date] => 2020-05-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3278 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -18 [patent_words_short_claim] => 57 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16866509 [rel_patent_id] =>[rel_patent_doc_number] =>)
16/866509
SILICON CARBIDE CRYSTAL GROWING APPARATUS AND CRYSTAL GROWING METHOD THEREOF May 3, 2020 Abandoned
Array ( [id] => 17761877 [patent_doc_number] => 20220235489 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2022-07-28 [patent_title] => METHOD FOR MANUFACTURING GROUP III COMPOUND SUBSTRATE, AND GROUP III COMPOUND SUBSTRATE [patent_app_type] => utility [patent_app_number] => 17/613653 [patent_app_country] => US [patent_app_date] => 2020-05-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4395 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -7 [patent_words_short_claim] => 51 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17613653 [rel_patent_id] =>[rel_patent_doc_number] =>)
17/613653
METHOD FOR MANUFACTURING GROUP III COMPOUND SUBSTRATE, AND GROUP III COMPOUND SUBSTRATE Apr 30, 2020 Abandoned
Array ( [id] => 16437528 [patent_doc_number] => 20200354854 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2020-11-12 [patent_title] => METHOD OF PRODUCING PARTICLE-SHAPED DIAMOND SINGLE-CRYSTAL USING CHEMICAL VAPOR DEPOSITION [patent_app_type] => utility [patent_app_number] => 16/862018 [patent_app_country] => US [patent_app_date] => 2020-04-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6335 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -9 [patent_words_short_claim] => 91 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16862018 [rel_patent_id] =>[rel_patent_doc_number] =>)
16/862018
METHOD OF PRODUCING PARTICLE-SHAPED DIAMOND SINGLE-CRYSTAL USING CHEMICAL VAPOR DEPOSITION Apr 28, 2020 Abandoned
Array ( [id] => 17780364 [patent_doc_number] => 20220246714 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2022-08-04 [patent_title] => LOW TEMPERATURE ROUTE FOR EPITAXIAL INTEGRATION OF PEROVSKITES ON SILICON [patent_app_type] => utility [patent_app_number] => 17/607726 [patent_app_country] => US [patent_app_date] => 2020-04-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 12220 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -26 [patent_words_short_claim] => 101 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17607726 [rel_patent_id] =>[rel_patent_doc_number] =>)
17/607726
LOW TEMPERATURE ROUTE FOR EPITAXIAL INTEGRATION OF PEROVSKITES ON SILICON Apr 28, 2020 Abandoned
Array ( [id] => 19091244 [patent_doc_number] => 11952678 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2024-04-09 [patent_title] => Method for manufacturing etched SiC substrate and grown SiC substrate by material tranportation and method for epitaxial growth by material transportation [patent_app_type] => utility [patent_app_number] => 17/606738 [patent_app_country] => US [patent_app_date] => 2020-04-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 9 [patent_no_of_words] => 9261 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 168 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17606738 [rel_patent_id] =>[rel_patent_doc_number] =>)
17/606738
Method for manufacturing etched SiC substrate and grown SiC substrate by material tranportation and method for epitaxial growth by material transportation Apr 23, 2020 Issued
Array ( [id] => 17705127 [patent_doc_number] => 20220205133 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2022-06-30 [patent_title] => ENHANCED DOPING USING ALLOY BASED SOURCES [patent_app_type] => utility [patent_app_number] => 17/606189 [patent_app_country] => US [patent_app_date] => 2020-04-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5480 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -22 [patent_words_short_claim] => 57 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17606189 [rel_patent_id] =>[rel_patent_doc_number] =>)
17/606189
ENHANCED DOPING USING ALLOY BASED SOURCES Apr 22, 2020 Abandoned
Array ( [id] => 18764360 [patent_doc_number] => 11814747 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2023-11-14 [patent_title] => Gas-phase reactor system-with a reaction chamber, a solid precursor source vessel, a gas distribution system, and a flange assembly [patent_app_type] => utility [patent_app_number] => 16/849793 [patent_app_country] => US [patent_app_date] => 2020-04-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 5871 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 262 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16849793 [rel_patent_id] =>[rel_patent_doc_number] =>)
16/849793
Gas-phase reactor system-with a reaction chamber, a solid precursor source vessel, a gas distribution system, and a flange assembly Apr 14, 2020 Issued
Array ( [id] => 17735175 [patent_doc_number] => 20220220634 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2022-07-14 [patent_title] => DEVICE AND METHOD FOR MANUFACTURING GROUP III NITRIDE SUBSTRATE [patent_app_type] => utility [patent_app_number] => 17/440957 [patent_app_country] => US [patent_app_date] => 2020-03-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7474 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -18 [patent_words_short_claim] => 143 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17440957 [rel_patent_id] =>[rel_patent_doc_number] =>)
17/440957
DEVICE AND METHOD FOR MANUFACTURING GROUP III NITRIDE SUBSTRATE Mar 23, 2020 Abandoned
Array ( [id] => 17490731 [patent_doc_number] => 11280024 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2022-03-22 [patent_title] => Method for producing a group III nitride semiconductor by controlling the oxygen concentration of the furnace internal atmosphere [patent_app_type] => utility [patent_app_number] => 16/814758 [patent_app_country] => US [patent_app_date] => 2020-03-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 29 [patent_no_of_words] => 14132 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 212 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16814758 [rel_patent_id] =>[rel_patent_doc_number] =>)
16/814758
Method for producing a group III nitride semiconductor by controlling the oxygen concentration of the furnace internal atmosphere Mar 9, 2020 Issued
Array ( [id] => 17657583 [patent_doc_number] => 20220178048 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2022-06-09 [patent_title] => METHOD AND APPARATUS FOR PRODUCING SiC SUBSTRATE [patent_app_type] => utility [patent_app_number] => 17/436304 [patent_app_country] => US [patent_app_date] => 2020-03-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8264 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -14 [patent_words_short_claim] => 41 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17436304 [rel_patent_id] =>[rel_patent_doc_number] =>)
17/436304
Method for manufacturing a SiC substrate by simultaneously forming a growth layer on one surface and etching another surface of a SiC base substrate Mar 2, 2020 Issued
Array ( [id] => 16091581 [patent_doc_number] => 20200199777 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2020-06-25 [patent_title] => METHOD FOR PRODUCING BULK SILICON CARBIDE BY SUBLIMATION OF A SILICON CARBIDE PRECURSOR PREPARED FROM SILICON AND CARBON PARTICLES OR PARTICULATE SILICON CARBIDE [patent_app_type] => utility [patent_app_number] => 16/803037 [patent_app_country] => US [patent_app_date] => 2020-02-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7731 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -17 [patent_words_short_claim] => 122 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16803037 [rel_patent_id] =>[rel_patent_doc_number] =>)
16/803037
Method for producing bulk silicon carbide by sublimation of a silicon carbide precursor prepared from silicon and carbon particles or particulate silicon carbide Feb 26, 2020 Issued
Array ( [id] => 16098279 [patent_doc_number] => 20200203126 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2020-06-25 [patent_title] => PLASMA ETCHING DEVICE WITH PLASMA ETCH RESISTANT COATING [patent_app_type] => utility [patent_app_number] => 16/799314 [patent_app_country] => US [patent_app_date] => 2020-02-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4049 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -13 [patent_words_short_claim] => 54 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16799314 [rel_patent_id] =>[rel_patent_doc_number] =>)
16/799314
PLASMA ETCHING DEVICE WITH PLASMA ETCH RESISTANT COATING Feb 23, 2020 Abandoned
Array ( [id] => 16098279 [patent_doc_number] => 20200203126 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2020-06-25 [patent_title] => PLASMA ETCHING DEVICE WITH PLASMA ETCH RESISTANT COATING [patent_app_type] => utility [patent_app_number] => 16/799314 [patent_app_country] => US [patent_app_date] => 2020-02-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4049 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -13 [patent_words_short_claim] => 54 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16799314 [rel_patent_id] =>[rel_patent_doc_number] =>)
16/799314
PLASMA ETCHING DEVICE WITH PLASMA ETCH RESISTANT COATING Feb 23, 2020 Abandoned
Array ( [id] => 17593613 [patent_doc_number] => 20220143186 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2022-05-12 [patent_title] => SOLIDIFICATION OR CRYSTALLISATION METHOD [patent_app_type] => utility [patent_app_number] => 17/432068 [patent_app_country] => US [patent_app_date] => 2020-02-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5606 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -17 [patent_words_short_claim] => 2 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17432068 [rel_patent_id] =>[rel_patent_doc_number] =>)
17/432068
SOLIDIFICATION OR CRYSTALLISATION METHOD Feb 18, 2020 Abandoned
Array ( [id] => 17037283 [patent_doc_number] => 20210254241 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2021-08-19 [patent_title] => METHOD FOR RECYCLING SUBSTRATE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE [patent_app_type] => utility [patent_app_number] => 16/790963 [patent_app_country] => US [patent_app_date] => 2020-02-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10344 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -8 [patent_words_short_claim] => 156 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16790963 [rel_patent_id] =>[rel_patent_doc_number] =>)
16/790963
METHOD FOR RECYCLING SUBSTRATE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE Feb 13, 2020 Abandoned
Array ( [id] => 16253944 [patent_doc_number] => 20200263318 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2020-08-20 [patent_title] => PRODUCTION METHOD AND GROWTH ARRANGEMENT FOR PRODUCING BULK SIC SINGLE CRYSTAL [patent_app_type] => utility [patent_app_number] => 16/791028 [patent_app_country] => US [patent_app_date] => 2020-02-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8301 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -19 [patent_words_short_claim] => 403 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16791028 [rel_patent_id] =>[rel_patent_doc_number] =>)
16/791028
Production method and growth arrangement for producing a bulk SiC single crystal by arranging at least two insulation cylinder components to control a variation in a volume element density Feb 13, 2020 Issued
Array ( [id] => 18290102 [patent_doc_number] => 11618968 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2023-04-04 [patent_title] => Apparatus including horizontal flow reactor with a central injector column having separate conduits for low-vapor pressure metalorganic precursors and other precursors for formation of piezoelectric layers on wafers [patent_app_type] => utility [patent_app_number] => 16/784843 [patent_app_country] => US [patent_app_date] => 2020-02-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 7007 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 294 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16784843 [rel_patent_id] =>[rel_patent_doc_number] =>)
16/784843
Apparatus including horizontal flow reactor with a central injector column having separate conduits for low-vapor pressure metalorganic precursors and other precursors for formation of piezoelectric layers on wafers Feb 6, 2020 Issued
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