Search

Renee R. Berry

Examiner (ID: 18563)

Most Active Art Unit
2818
Art Unit(s)
2829, 1762, 2891, 1109, 1104, 2813, 1792, 2818
Total Applications
592
Issued Applications
546
Pending Applications
22
Abandoned Applications
24

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 1559889 [patent_doc_number] => 06436824 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-08-20 [patent_title] => 'Low dielectric constant materials for copper damascene' [patent_app_type] => B1 [patent_app_number] => 09/346526 [patent_app_country] => US [patent_app_date] => 1999-07-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 3 [patent_no_of_words] => 2370 [patent_no_of_claims] => 28 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 33 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/436/06436824.pdf [firstpage_image] =>[orig_patent_app_number] => 09346526 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/346526
Low dielectric constant materials for copper damascene Jul 1, 1999 Issued
Array ( [id] => 1549697 [patent_doc_number] => 06346451 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-02-12 [patent_title] => 'Laterial thin-film silicon-on-insulator (SOI) device having a gate electrode and a field plate electrode' [patent_app_type] => B1 [patent_app_number] => 09/343912 [patent_app_country] => US [patent_app_date] => 1999-06-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 3 [patent_no_of_words] => 2905 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 204 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/346/06346451.pdf [firstpage_image] =>[orig_patent_app_number] => 09343912 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/343912
Laterial thin-film silicon-on-insulator (SOI) device having a gate electrode and a field plate electrode Jun 29, 1999 Issued
09/337366 METHOD FOR PATTERNING DUAL DAMASCENE INTERCONNECTS USING A SACRIFICAL LIGHT ABSORBING MATERIAL Jun 20, 1999 Abandoned
Array ( [id] => 1553645 [patent_doc_number] => 06348421 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-02-19 [patent_title] => 'Dielectric gap fill process that effectively reduces capacitance between narrow metal lines using HDP-CVD' [patent_app_type] => B1 [patent_app_number] => 09/334288 [patent_app_country] => US [patent_app_date] => 1999-06-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 8 [patent_no_of_words] => 1736 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 113 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/348/06348421.pdf [firstpage_image] =>[orig_patent_app_number] => 09334288 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/334288
Dielectric gap fill process that effectively reduces capacitance between narrow metal lines using HDP-CVD Jun 15, 1999 Issued
Array ( [id] => 4406260 [patent_doc_number] => 06171949 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-01-09 [patent_title] => 'Low energy passivation of conductive material in damascene process for semiconductors' [patent_app_type] => 1 [patent_app_number] => 9/329155 [patent_app_country] => US [patent_app_date] => 1999-06-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 3 [patent_no_of_words] => 2528 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 86 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/171/06171949.pdf [firstpage_image] =>[orig_patent_app_number] => 329155 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/329155
Low energy passivation of conductive material in damascene process for semiconductors Jun 8, 1999 Issued
Array ( [id] => 4271811 [patent_doc_number] => 06323138 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-11-27 [patent_title] => 'Capacitor, methods of forming capacitors, methods for forming silicon nitride layers on silicon-comprising substrates, and methods of densifying silicon nitride layers' [patent_app_type] => 1 [patent_app_number] => 9/328313 [patent_app_country] => US [patent_app_date] => 1999-06-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 6 [patent_no_of_words] => 3159 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 28 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/323/06323138.pdf [firstpage_image] =>[orig_patent_app_number] => 328313 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/328313
Capacitor, methods of forming capacitors, methods for forming silicon nitride layers on silicon-comprising substrates, and methods of densifying silicon nitride layers Jun 7, 1999 Issued
Array ( [id] => 4357629 [patent_doc_number] => 06174812 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-01-16 [patent_title] => 'Copper damascene technology for ultra large scale integration circuits' [patent_app_type] => 1 [patent_app_number] => 9/328246 [patent_app_country] => US [patent_app_date] => 1999-06-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 15 [patent_no_of_words] => 1781 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 118 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/174/06174812.pdf [firstpage_image] =>[orig_patent_app_number] => 328246 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/328246
Copper damascene technology for ultra large scale integration circuits Jun 7, 1999 Issued
Array ( [id] => 4366545 [patent_doc_number] => 06274471 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-08-14 [patent_title] => 'Method for making high-aspect-ratio contacts on integrated circuits using a borderless pre-opened hard-mask technique' [patent_app_type] => 1 [patent_app_number] => 9/325953 [patent_app_country] => US [patent_app_date] => 1999-06-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 6 [patent_no_of_words] => 3362 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 193 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/274/06274471.pdf [firstpage_image] =>[orig_patent_app_number] => 325953 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/325953
Method for making high-aspect-ratio contacts on integrated circuits using a borderless pre-opened hard-mask technique Jun 3, 1999 Issued
Array ( [id] => 1346678 [patent_doc_number] => 06583058 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-06-24 [patent_title] => 'Solid hermetic via and bump fabrication' [patent_app_type] => B1 [patent_app_number] => 09/326215 [patent_app_country] => US [patent_app_date] => 1999-06-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 16 [patent_no_of_words] => 2884 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 114 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/583/06583058.pdf [firstpage_image] =>[orig_patent_app_number] => 09326215 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/326215
Solid hermetic via and bump fabrication Jun 3, 1999 Issued
Array ( [id] => 4408771 [patent_doc_number] => 06309983 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-10-30 [patent_title] => 'Low temperature sacrificial oxide formation' [patent_app_type] => 1 [patent_app_number] => 9/324926 [patent_app_country] => US [patent_app_date] => 1999-06-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 6 [patent_no_of_words] => 3486 [patent_no_of_claims] => 26 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 97 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/309/06309983.pdf [firstpage_image] =>[orig_patent_app_number] => 324926 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/324926
Low temperature sacrificial oxide formation Jun 2, 1999 Issued
Array ( [id] => 1532568 [patent_doc_number] => 06410416 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-06-25 [patent_title] => 'Article comprising a high-resolution pattern on a non-planar surface and method of making the same' [patent_app_type] => B1 [patent_app_number] => 09/322471 [patent_app_country] => US [patent_app_date] => 1999-05-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 18 [patent_no_of_words] => 4127 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 55 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/410/06410416.pdf [firstpage_image] =>[orig_patent_app_number] => 09322471 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/322471
Article comprising a high-resolution pattern on a non-planar surface and method of making the same May 27, 1999 Issued
Array ( [id] => 4360463 [patent_doc_number] => 06302312 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-10-16 [patent_title] => 'Bonding apparatus and method' [patent_app_type] => 1 [patent_app_number] => 9/322801 [patent_app_country] => US [patent_app_date] => 1999-05-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 4 [patent_no_of_words] => 2489 [patent_no_of_claims] => 1 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 166 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/302/06302312.pdf [firstpage_image] =>[orig_patent_app_number] => 322801 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/322801
Bonding apparatus and method May 26, 1999 Issued
Array ( [id] => 1565643 [patent_doc_number] => 06376285 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-04-23 [patent_title] => 'Annealed porous silicon with epitaxial layer for SOI' [patent_app_type] => B1 [patent_app_number] => 09/314983 [patent_app_country] => US [patent_app_date] => 1999-05-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 6 [patent_no_of_words] => 2205 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 90 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/376/06376285.pdf [firstpage_image] =>[orig_patent_app_number] => 09314983 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/314983
Annealed porous silicon with epitaxial layer for SOI May 19, 1999 Issued
Array ( [id] => 4404200 [patent_doc_number] => 06271047 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-08-07 [patent_title] => 'Layer-thickness detection methods and apparatus for wafers and the like, and polishing apparatus comprising same' [patent_app_type] => 1 [patent_app_number] => 9/316082 [patent_app_country] => US [patent_app_date] => 1999-05-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 21 [patent_no_of_words] => 17118 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 139 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/271/06271047.pdf [firstpage_image] =>[orig_patent_app_number] => 316082 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/316082
Layer-thickness detection methods and apparatus for wafers and the like, and polishing apparatus comprising same May 19, 1999 Issued
Array ( [id] => 4259488 [patent_doc_number] => 06258711 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-07-10 [patent_title] => 'Sacrificial deposit to improve damascene pattern planarization in semiconductor wafers' [patent_app_type] => 1 [patent_app_number] => 9/294406 [patent_app_country] => US [patent_app_date] => 1999-04-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 9 [patent_no_of_words] => 3523 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 102 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/258/06258711.pdf [firstpage_image] =>[orig_patent_app_number] => 294406 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/294406
Sacrificial deposit to improve damascene pattern planarization in semiconductor wafers Apr 18, 1999 Issued
Array ( [id] => 4354809 [patent_doc_number] => 06218317 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-04-17 [patent_title] => 'Methylated oxide-type dielectric as a replacement for SiO2 hardmasks used in polymeric low K, dual damascene interconnect integration' [patent_app_type] => 1 [patent_app_number] => 9/294914 [patent_app_country] => US [patent_app_date] => 1999-04-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 4 [patent_no_of_words] => 1202 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 68 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/218/06218317.pdf [firstpage_image] =>[orig_patent_app_number] => 294914 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/294914
Methylated oxide-type dielectric as a replacement for SiO2 hardmasks used in polymeric low K, dual damascene interconnect integration Apr 18, 1999 Issued
Array ( [id] => 1549772 [patent_doc_number] => 06346470 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-02-12 [patent_title] => 'Method for reducing electromigration in semiconductor interconnect lines' [patent_app_type] => B1 [patent_app_number] => 09/294454 [patent_app_country] => US [patent_app_date] => 1999-04-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 5 [patent_no_of_words] => 1778 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 69 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/346/06346470.pdf [firstpage_image] =>[orig_patent_app_number] => 09294454 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/294454
Method for reducing electromigration in semiconductor interconnect lines Apr 18, 1999 Issued
Array ( [id] => 1446638 [patent_doc_number] => 06368957 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-04-09 [patent_title] => 'Semiconductor device and method for manufacturing semiconductor device' [patent_app_type] => B1 [patent_app_number] => 09/292666 [patent_app_country] => US [patent_app_date] => 1999-04-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 15 [patent_no_of_words] => 5635 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 101 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/368/06368957.pdf [firstpage_image] =>[orig_patent_app_number] => 09292666 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/292666
Semiconductor device and method for manufacturing semiconductor device Apr 15, 1999 Issued
Array ( [id] => 4271681 [patent_doc_number] => 06323129 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-11-27 [patent_title] => 'Process for maintaining a semiconductor substrate layer deposition equipment chamber in a preconditioned and low particulate state' [patent_app_type] => 1 [patent_app_number] => 9/285635 [patent_app_country] => US [patent_app_date] => 1999-04-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 3718 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 201 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/323/06323129.pdf [firstpage_image] =>[orig_patent_app_number] => 285635 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/285635
Process for maintaining a semiconductor substrate layer deposition equipment chamber in a preconditioned and low particulate state Apr 1, 1999 Issued
Array ( [id] => 1585645 [patent_doc_number] => 06358847 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-03-19 [patent_title] => 'Method for enabling conventional wire bonding to copper-based bond pad features' [patent_app_type] => B1 [patent_app_number] => 09/282596 [patent_app_country] => US [patent_app_date] => 1999-03-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 11 [patent_no_of_words] => 6080 [patent_no_of_claims] => 33 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 30 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/358/06358847.pdf [firstpage_image] =>[orig_patent_app_number] => 09282596 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/282596
Method for enabling conventional wire bonding to copper-based bond pad features Mar 30, 1999 Issued
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