
Rosemary E. Ashton
Examiner (ID: 16904)
| Most Active Art Unit | 1752 |
| Art Unit(s) | 1752, 1754, 1802 |
| Total Applications | 657 |
| Issued Applications | 602 |
| Pending Applications | 23 |
| Abandoned Applications | 32 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 6892001
[patent_doc_number] => 20010018163
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-08-30
[patent_title] => 'Undercoating composition for photolithographic resist'
[patent_app_type] => new
[patent_app_number] => 09/803907
[patent_app_country] => US
[patent_app_date] => 2001-03-13
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[pdf_file] => publications/A1/0018/20010018163.pdf
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Array
(
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[patent_doc_number] => 06573024
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[patent_kind] => B2
[patent_issue_date] => 2003-06-03
[patent_title] => 'Ammonium salt of organic acid and resist composition containing the same'
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[patent_app_number] => 09/801742
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Array
(
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[patent_issue_date] => 2002-07-09
[patent_title] => 'Composition for lithographic anti-reflection coating, and resist laminate using the same'
[patent_app_type] => B2
[patent_app_number] => 09/799554
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[patent_app_date] => 2001-03-07
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Array
(
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[patent_doc_number] => 20010031428
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[patent_issue_date] => 2001-10-18
[patent_title] => 'Thermosetting anti-reflective coatings comprising aryl urethanes of hydroxypropyl cellulose'
[patent_app_type] => new
[patent_app_number] => 09/798178
[patent_app_country] => US
[patent_app_date] => 2001-03-02
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Array
(
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[patent_issue_date] => 2006-04-04
[patent_title] => 'Monomers, polymers, methods of synthesis thereof and photoresist compositions'
[patent_app_type] => utility
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Array
(
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[patent_title] => 'Chemically amplified positive resist composition'
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Array
(
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[patent_doc_number] => 20020004570
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[patent_issue_date] => 2002-01-10
[patent_title] => 'Polymer and photoresist compositions'
[patent_app_type] => new
[patent_app_number] => 09/792399
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/792399 | Polymer and photoresist compositions | Feb 22, 2001 | Abandoned |
Array
(
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[patent_doc_number] => 06607867
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[patent_kind] => B1
[patent_issue_date] => 2003-08-19
[patent_title] => 'Organometal-containing norbornene monomer, photoresist containing its polymer, manufacturing method thereof, and method of forming photoresist patterns'
[patent_app_type] => B1
[patent_app_number] => 09/790632
[patent_app_country] => US
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/790632 | Organometal-containing norbornene monomer, photoresist containing its polymer, manufacturing method thereof, and method of forming photoresist patterns | Feb 22, 2001 | Issued |
Array
(
[id] => 1122877
[patent_doc_number] => 06794109
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[patent_issue_date] => 2004-09-21
[patent_title] => 'Low abosorbing resists for 157 nm lithography'
[patent_app_type] => B2
[patent_app_number] => 09/791252
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Array
(
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[patent_issue_date] => 2004-10-12
[patent_title] => 'Photoresist compositions comprising blends of photoacid generators'
[patent_app_type] => B2
[patent_app_number] => 09/788106
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/788106 | Photoresist compositions comprising blends of photoacid generators | Feb 16, 2001 | Issued |
Array
(
[id] => 1269427
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[patent_title] => 'Radiation sensitive silicon-containing negative resists and use thereof'
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Array
(
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Array
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Array
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Array
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Array
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Array
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Array
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