Search

Rosemary E. Ashton

Examiner (ID: 16904)

Most Active Art Unit
1752
Art Unit(s)
1752, 1754, 1802
Total Applications
657
Issued Applications
602
Pending Applications
23
Abandoned Applications
32

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 1502893 [patent_doc_number] => 06465150 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-10-15 [patent_title] => 'Radiation-sensitive resin composition' [patent_app_type] => B1 [patent_app_number] => 09/686930 [patent_app_country] => US [patent_app_date] => 2000-10-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 11510 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 254 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/465/06465150.pdf [firstpage_image] =>[orig_patent_app_number] => 09686930 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/686930
Radiation-sensitive resin composition Oct 11, 2000 Issued
Array ( [id] => 7964563 [patent_doc_number] => 06680157 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2004-01-20 [patent_title] => 'Resist methods and materials for UV and electron-beam lithography with reduced outgassing' [patent_app_type] => B1 [patent_app_number] => 09/687189 [patent_app_country] => US [patent_app_date] => 2000-10-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 11294 [patent_no_of_claims] => 46 [patent_no_of_ind_claims] => 9 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/680/06680157.pdf [firstpage_image] =>[orig_patent_app_number] => 09687189 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/687189
Resist methods and materials for UV and electron-beam lithography with reduced outgassing Oct 11, 2000 Issued
Array ( [id] => 1376469 [patent_doc_number] => 06555287 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-04-29 [patent_title] => 'Non-subliming, difunctionalized ultraviolet dyes for use in anti-reflective coatings' [patent_app_type] => B1 [patent_app_number] => 09/684999 [patent_app_country] => US [patent_app_date] => 2000-10-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 1973 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 45 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/555/06555287.pdf [firstpage_image] =>[orig_patent_app_number] => 09684999 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/684999
Non-subliming, difunctionalized ultraviolet dyes for use in anti-reflective coatings Oct 9, 2000 Issued
Array ( [id] => 1323119 [patent_doc_number] => 06602646 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-08-05 [patent_title] => 'Positive-working resist composition' [patent_app_type] => B1 [patent_app_number] => 09/684888 [patent_app_country] => US [patent_app_date] => 2000-10-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 23026 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 286 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/602/06602646.pdf [firstpage_image] =>[orig_patent_app_number] => 09684888 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/684888
Positive-working resist composition Oct 5, 2000 Issued
Array ( [id] => 1489727 [patent_doc_number] => 06416928 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-07-09 [patent_title] => 'Onium salts, photoacid generators, resist compositions, and patterning process' [patent_app_type] => B1 [patent_app_number] => 09/680491 [patent_app_country] => US [patent_app_date] => 2000-10-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 19289 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 21 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/416/06416928.pdf [firstpage_image] =>[orig_patent_app_number] => 09680491 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/680491
Onium salts, photoacid generators, resist compositions, and patterning process Oct 4, 2000 Issued
Array ( [id] => 1439746 [patent_doc_number] => 06495305 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-12-17 [patent_title] => 'Halogenated anti-reflective coatings' [patent_app_type] => B1 [patent_app_number] => 09/679661 [patent_app_country] => US [patent_app_date] => 2000-10-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6399 [patent_no_of_claims] => 44 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 101 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/495/06495305.pdf [firstpage_image] =>[orig_patent_app_number] => 09679661 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/679661
Halogenated anti-reflective coatings Oct 3, 2000 Issued
Array ( [id] => 1489724 [patent_doc_number] => 06416927 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-07-09 [patent_title] => 'Chemically amplified resist compositions' [patent_app_type] => B1 [patent_app_number] => 09/675500 [patent_app_country] => US [patent_app_date] => 2000-09-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 4 [patent_no_of_words] => 2938 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 41 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/416/06416927.pdf [firstpage_image] =>[orig_patent_app_number] => 09675500 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/675500
Chemically amplified resist compositions Sep 28, 2000 Issued
Array ( [id] => 1473809 [patent_doc_number] => 06387590 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-05-14 [patent_title] => 'Positive photoresist composition' [patent_app_type] => B1 [patent_app_number] => 09/671177 [patent_app_country] => US [patent_app_date] => 2000-09-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 21190 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 57 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/387/06387590.pdf [firstpage_image] =>[orig_patent_app_number] => 09671177 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/671177
Positive photoresist composition Sep 27, 2000 Issued
Array ( [id] => 1531666 [patent_doc_number] => 06410204 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-06-25 [patent_title] => 'Positive photoresist composition' [patent_app_type] => B1 [patent_app_number] => 09/669907 [patent_app_country] => US [patent_app_date] => 2000-09-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 11834 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 78 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/410/06410204.pdf [firstpage_image] =>[orig_patent_app_number] => 09669907 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/669907
Positive photoresist composition Sep 26, 2000 Issued
Array ( [id] => 7640461 [patent_doc_number] => 06395451 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-05-28 [patent_title] => 'Photoresist composition containing photo base generator with photo acid generator' [patent_app_type] => B1 [patent_app_number] => 09/666932 [patent_app_country] => US [patent_app_date] => 2000-09-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 7 [patent_no_of_words] => 2506 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 5 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/395/06395451.pdf [firstpage_image] =>[orig_patent_app_number] => 09666932 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/666932
Photoresist composition containing photo base generator with photo acid generator Sep 20, 2000 Issued
Array ( [id] => 1373467 [patent_doc_number] => 06558871 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-05-06 [patent_title] => 'Photocurable composition containing iodonium salt compound' [patent_app_type] => B1 [patent_app_number] => 09/646700 [patent_app_country] => US [patent_app_date] => 2000-09-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10754 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 289 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/558/06558871.pdf [firstpage_image] =>[orig_patent_app_number] => 09646700 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/646700
Photocurable composition containing iodonium salt compound Sep 18, 2000 Issued
Array ( [id] => 1409559 [patent_doc_number] => 06524770 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-02-25 [patent_title] => 'Hexaaryl biimidazole compounds as photoinitiators, photosensitive composition and method of manufacturing patterns using the compounds' [patent_app_type] => B1 [patent_app_number] => 09/663370 [patent_app_country] => US [patent_app_date] => 2000-09-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 9135 [patent_no_of_claims] => 34 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 35 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/524/06524770.pdf [firstpage_image] =>[orig_patent_app_number] => 09663370 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/663370
Hexaaryl biimidazole compounds as photoinitiators, photosensitive composition and method of manufacturing patterns using the compounds Sep 14, 2000 Issued
Array ( [id] => 1514164 [patent_doc_number] => 06420085 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-07-16 [patent_title] => 'Resist compositions and patterning process' [patent_app_type] => B1 [patent_app_number] => 09/663830 [patent_app_country] => US [patent_app_date] => 2000-09-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10782 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 551 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/420/06420085.pdf [firstpage_image] =>[orig_patent_app_number] => 09663830 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/663830
Resist compositions and patterning process Sep 14, 2000 Issued
Array ( [id] => 1588216 [patent_doc_number] => 06482568 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-11-19 [patent_title] => 'Radiation-sensitive resin composition' [patent_app_type] => B1 [patent_app_number] => 09/662160 [patent_app_country] => US [patent_app_date] => 2000-09-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 19880 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 318 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/482/06482568.pdf [firstpage_image] =>[orig_patent_app_number] => 09662160 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/662160
Radiation-sensitive resin composition Sep 13, 2000 Issued
Array ( [id] => 1477352 [patent_doc_number] => 06451501 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-09-17 [patent_title] => 'Acid sensitive copolymer, resist composition and resist pattern forming method' [patent_app_type] => B1 [patent_app_number] => 09/661027 [patent_app_country] => US [patent_app_date] => 2000-09-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7839 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 44 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/451/06451501.pdf [firstpage_image] =>[orig_patent_app_number] => 09661027 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/661027
Acid sensitive copolymer, resist composition and resist pattern forming method Sep 12, 2000 Issued
Array ( [id] => 4341343 [patent_doc_number] => 06284430 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-09-04 [patent_title] => 'Positive-working chemical-amplification photoresist composition and method for forming a resist pattern using the same' [patent_app_type] => 1 [patent_app_number] => 9/657228 [patent_app_country] => US [patent_app_date] => 2000-09-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4641 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 187 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/284/06284430.pdf [firstpage_image] =>[orig_patent_app_number] => 657228 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/657228
Positive-working chemical-amplification photoresist composition and method for forming a resist pattern using the same Sep 6, 2000 Issued
Array ( [id] => 1417547 [patent_doc_number] => 06506534 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-01-14 [patent_title] => 'Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices' [patent_app_type] => B1 [patent_app_number] => 09/654433 [patent_app_country] => US [patent_app_date] => 2000-09-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 15 [patent_no_of_words] => 30755 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 56 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/506/06506534.pdf [firstpage_image] =>[orig_patent_app_number] => 09654433 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/654433
Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices Aug 31, 2000 Issued
Array ( [id] => 1477297 [patent_doc_number] => 06344305 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-02-05 [patent_title] => 'Radiation sensitive silicon-containing resists' [patent_app_type] => B1 [patent_app_number] => 09/654350 [patent_app_country] => US [patent_app_date] => 2000-09-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4976 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 99 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/344/06344305.pdf [firstpage_image] =>[orig_patent_app_number] => 09654350 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/654350
Radiation sensitive silicon-containing resists Aug 31, 2000 Issued
Array ( [id] => 4324743 [patent_doc_number] => 06319651 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-11-20 [patent_title] => 'Acid sensitive ARC and method of use' [patent_app_type] => 1 [patent_app_number] => 9/650007 [patent_app_country] => US [patent_app_date] => 2000-08-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 8046 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 40 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/319/06319651.pdf [firstpage_image] =>[orig_patent_app_number] => 650007 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/650007
Acid sensitive ARC and method of use Aug 27, 2000 Issued
Array ( [id] => 1588212 [patent_doc_number] => 06482567 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-11-19 [patent_title] => 'Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same' [patent_app_type] => B1 [patent_app_number] => 09/645198 [patent_app_country] => US [patent_app_date] => 2000-08-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6100 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 8 [patent_words_short_claim] => 24 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/482/06482567.pdf [firstpage_image] =>[orig_patent_app_number] => 09645198 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/645198
Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same Aug 24, 2000 Issued
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