
Rosemary E. Ashton
Examiner (ID: 16904)
| Most Active Art Unit | 1752 |
| Art Unit(s) | 1752, 1754, 1802 |
| Total Applications | 657 |
| Issued Applications | 602 |
| Pending Applications | 23 |
| Abandoned Applications | 32 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1477345
[patent_doc_number] => 06451499
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-09-17
[patent_title] => 'Polycyclic resist compositions with increased etch resistance'
[patent_app_type] => B1
[patent_app_number] => 09/604749
[patent_app_country] => US
[patent_app_date] => 2000-06-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 8706
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 159
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/451/06451499.pdf
[firstpage_image] =>[orig_patent_app_number] => 09604749
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/604749 | Polycyclic resist compositions with increased etch resistance | Jun 26, 2000 | Issued |
Array
(
[id] => 1296597
[patent_doc_number] => 06627377
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-09-30
[patent_title] => 'Positive photosensitive poliymide composition'
[patent_app_type] => B1
[patent_app_number] => 09/529382
[patent_app_country] => US
[patent_app_date] => 2000-06-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 36526
[patent_no_of_claims] => 46
[patent_no_of_ind_claims] => 19
[patent_words_short_claim] => 17
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/627/06627377.pdf
[firstpage_image] =>[orig_patent_app_number] => 09529382
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/529382 | Positive photosensitive poliymide composition | Jun 25, 2000 | Issued |
Array
(
[id] => 1577423
[patent_doc_number] => 06447979
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-09-10
[patent_title] => 'Image recording body'
[patent_app_type] => B1
[patent_app_number] => 09/604068
[patent_app_country] => US
[patent_app_date] => 2000-06-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 20
[patent_figures_cnt] => 55
[patent_no_of_words] => 33163
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 37
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/447/06447979.pdf
[firstpage_image] =>[orig_patent_app_number] => 09604068
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/604068 | Image recording body | Jun 25, 2000 | Issued |
Array
(
[id] => 1514163
[patent_doc_number] => 06420084
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-07-16
[patent_title] => 'Mask-making using resist having SIO bond-containing polymer'
[patent_app_type] => B1
[patent_app_number] => 09/602136
[patent_app_country] => US
[patent_app_date] => 2000-06-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5894
[patent_no_of_claims] => 28
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 79
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/420/06420084.pdf
[firstpage_image] =>[orig_patent_app_number] => 09602136
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/602136 | Mask-making using resist having SIO bond-containing polymer | Jun 22, 2000 | Issued |
Array
(
[id] => 1549214
[patent_doc_number] => 06346366
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-02-12
[patent_title] => 'Method for making an advanced guard ring for stacked film using a novel mask design'
[patent_app_type] => B1
[patent_app_number] => 09/596906
[patent_app_country] => US
[patent_app_date] => 2000-06-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 7
[patent_no_of_words] => 2873
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 160
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/346/06346366.pdf
[firstpage_image] =>[orig_patent_app_number] => 09596906
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/596906 | Method for making an advanced guard ring for stacked film using a novel mask design | Jun 18, 2000 | Issued |
Array
(
[id] => 1352619
[patent_doc_number] => 06576394
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-06-10
[patent_title] => 'Negative-acting chemically amplified photoresist composition'
[patent_app_type] => B1
[patent_app_number] => 09/596098
[patent_app_country] => US
[patent_app_date] => 2000-06-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 3515
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 138
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/576/06576394.pdf
[firstpage_image] =>[orig_patent_app_number] => 09596098
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/596098 | Negative-acting chemically amplified photoresist composition | Jun 15, 2000 | Issued |
Array
(
[id] => 1549566
[patent_doc_number] => 06399272
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-06-04
[patent_title] => 'Phenylenediamine derivative-type additive useful for a chemically amplified photoresist'
[patent_app_type] => B1
[patent_app_number] => 09/595434
[patent_app_country] => US
[patent_app_date] => 2000-06-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 5010
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 41
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/399/06399272.pdf
[firstpage_image] =>[orig_patent_app_number] => 09595434
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/595434 | Phenylenediamine derivative-type additive useful for a chemically amplified photoresist | Jun 14, 2000 | Issued |
Array
(
[id] => 1394472
[patent_doc_number] => 06531259
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-03-11
[patent_title] => 'Pattern formation method and pattern formation material'
[patent_app_type] => B1
[patent_app_number] => 09/592937
[patent_app_country] => US
[patent_app_date] => 2000-06-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 7
[patent_no_of_words] => 4679
[patent_no_of_claims] => 37
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 130
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/531/06531259.pdf
[firstpage_image] =>[orig_patent_app_number] => 09592937
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/592937 | Pattern formation method and pattern formation material | Jun 12, 2000 | Issued |
Array
(
[id] => 1520405
[patent_doc_number] => 06413701
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-07-02
[patent_title] => 'Lithographic projection apparatus'
[patent_app_type] => B1
[patent_app_number] => 09/590295
[patent_app_country] => US
[patent_app_date] => 2000-06-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 2
[patent_no_of_words] => 2914
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 92
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/413/06413701.pdf
[firstpage_image] =>[orig_patent_app_number] => 09590295
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/590295 | Lithographic projection apparatus | Jun 8, 2000 | Issued |
Array
(
[id] => 1602430
[patent_doc_number] => 06432608
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-08-13
[patent_title] => 'Resist composition'
[patent_app_type] => B1
[patent_app_number] => 09/589770
[patent_app_country] => US
[patent_app_date] => 2000-06-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 12584
[patent_no_of_claims] => 23
[patent_no_of_ind_claims] => 16
[patent_words_short_claim] => 23
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/432/06432608.pdf
[firstpage_image] =>[orig_patent_app_number] => 09589770
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/589770 | Resist composition | Jun 8, 2000 | Issued |
Array
(
[id] => 1433263
[patent_doc_number] => 06340553
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-01-22
[patent_title] => 'Positive-working photoresist composition'
[patent_app_type] => B1
[patent_app_number] => 09/585616
[patent_app_country] => US
[patent_app_date] => 2000-06-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 3978
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 149
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/340/06340553.pdf
[firstpage_image] =>[orig_patent_app_number] => 09585616
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/585616 | Positive-working photoresist composition | Jun 1, 2000 | Issued |
Array
(
[id] => 1446294
[patent_doc_number] => 06368774
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-04-09
[patent_title] => 'Radiation sensitive composition'
[patent_app_type] => B1
[patent_app_number] => 09/585623
[patent_app_country] => US
[patent_app_date] => 2000-06-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 10272
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 42
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/368/06368774.pdf
[firstpage_image] =>[orig_patent_app_number] => 09585623
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/585623 | Radiation sensitive composition | Jun 1, 2000 | Issued |
Array
(
[id] => 7640462
[patent_doc_number] => 06395450
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-05-28
[patent_title] => 'Positive working photoresist composition'
[patent_app_type] => B1
[patent_app_number] => 09/583547
[patent_app_country] => US
[patent_app_date] => 2000-06-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4035
[patent_no_of_claims] => 31
[patent_no_of_ind_claims] => 9
[patent_words_short_claim] => 7
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/395/06395450.pdf
[firstpage_image] =>[orig_patent_app_number] => 09583547
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/583547 | Positive working photoresist composition | May 31, 2000 | Issued |
Array
(
[id] => 1359460
[patent_doc_number] => 06569596
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-05-27
[patent_title] => 'Negative working chemical amplification type resist compositions'
[patent_app_type] => B1
[patent_app_number] => 09/584149
[patent_app_country] => US
[patent_app_date] => 2000-05-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5601
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 87
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/569/06569596.pdf
[firstpage_image] =>[orig_patent_app_number] => 09584149
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/584149 | Negative working chemical amplification type resist compositions | May 30, 2000 | Issued |
Array
(
[id] => 1593660
[patent_doc_number] => 06383714
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-05-07
[patent_title] => 'Image recording material and planographic printing plate using same'
[patent_app_type] => B1
[patent_app_number] => 09/580525
[patent_app_country] => US
[patent_app_date] => 2000-05-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 20534
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 304
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/383/06383714.pdf
[firstpage_image] =>[orig_patent_app_number] => 09580525
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/580525 | Image recording material and planographic printing plate using same | May 29, 2000 | Issued |
Array
(
[id] => 4406406
[patent_doc_number] => 06309789
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-10-30
[patent_title] => 'Composition for reflection reducing coating'
[patent_app_type] => 1
[patent_app_number] => 9/485087
[patent_app_country] => US
[patent_app_date] => 2000-05-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 7255
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 106
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/309/06309789.pdf
[firstpage_image] =>[orig_patent_app_number] => 485087
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/485087 | Composition for reflection reducing coating | May 24, 2000 | Issued |
Array
(
[id] => 1415011
[patent_doc_number] => 06509137
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-01-21
[patent_title] => 'Multilayer photoresist process in photolithography'
[patent_app_type] => B1
[patent_app_number] => 09/578105
[patent_app_country] => US
[patent_app_date] => 2000-05-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 16
[patent_no_of_words] => 2861
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 108
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/509/06509137.pdf
[firstpage_image] =>[orig_patent_app_number] => 09578105
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/578105 | Multilayer photoresist process in photolithography | May 23, 2000 | Issued |
Array
(
[id] => 1413664
[patent_doc_number] => 06517990
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-02-11
[patent_title] => 'Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same'
[patent_app_type] => B1
[patent_app_number] => 09/576053
[patent_app_country] => US
[patent_app_date] => 2000-05-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 7838
[patent_no_of_claims] => 40
[patent_no_of_ind_claims] => 9
[patent_words_short_claim] => 76
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/517/06517990.pdf
[firstpage_image] =>[orig_patent_app_number] => 09576053
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/576053 | Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same | May 22, 2000 | Issued |
| 09/576146 | Radiation sensitive copolymers, photoresist compositions thereof and deep UV bilayer systems thereof | May 21, 2000 | Abandoned |
Array
(
[id] => 1520390
[patent_doc_number] => 06413695
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-07-02
[patent_title] => 'Resist compositions and patterning process'
[patent_app_type] => B1
[patent_app_number] => 09/572973
[patent_app_country] => US
[patent_app_date] => 2000-05-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 14502
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 170
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/413/06413695.pdf
[firstpage_image] =>[orig_patent_app_number] => 09572973
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/572973 | Resist compositions and patterning process | May 17, 2000 | Issued |