
Rosemary E. Ashton
Examiner (ID: 16904)
| Most Active Art Unit | 1752 |
| Art Unit(s) | 1752, 1754, 1802 |
| Total Applications | 657 |
| Issued Applications | 602 |
| Pending Applications | 23 |
| Abandoned Applications | 32 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 4307865
[patent_doc_number] => 06316167
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-11-13
[patent_title] => 'Tunabale vapor deposited materials as antireflective coatings, hardmasks and as combined antireflective coating/hardmasks and methods of fabrication thereof and application thereof'
[patent_app_type] => 1
[patent_app_number] => 9/480442
[patent_app_country] => US
[patent_app_date] => 2000-01-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 18
[patent_no_of_words] => 7687
[patent_no_of_claims] => 50
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[patent_words_short_claim] => 83
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/316/06316167.pdf
[firstpage_image] =>[orig_patent_app_number] => 480442
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/480442 | Tunabale vapor deposited materials as antireflective coatings, hardmasks and as combined antireflective coating/hardmasks and methods of fabrication thereof and application thereof | Jan 9, 2000 | Issued |
Array
(
[id] => 1223319
[patent_doc_number] => 06699635
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2004-03-02
[patent_title] => 'Positive photosensitive composition'
[patent_app_type] => B1
[patent_app_number] => 09/471007
[patent_app_country] => US
[patent_app_date] => 1999-12-23
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[pdf_file] => patents/06/699/06699635.pdf
[firstpage_image] =>[orig_patent_app_number] => 09471007
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/471007 | Positive photosensitive composition | Dec 22, 1999 | Issued |
Array
(
[id] => 4232126
[patent_doc_number] => 06165652
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-12-26
[patent_title] => 'Pattern forming method and pattern forming apparatus'
[patent_app_type] => 1
[patent_app_number] => 9/461332
[patent_app_country] => US
[patent_app_date] => 1999-12-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[pdf_file] => patents/06/165/06165652.pdf
[firstpage_image] =>[orig_patent_app_number] => 461332
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/461332 | Pattern forming method and pattern forming apparatus | Dec 14, 1999 | Issued |
Array
(
[id] => 1484552
[patent_doc_number] => 06365322
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-04-02
[patent_title] => 'Photoresist composition for deep UV radiation'
[patent_app_type] => B1
[patent_app_number] => 09/455872
[patent_app_country] => US
[patent_app_date] => 1999-12-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[firstpage_image] =>[orig_patent_app_number] => 09455872
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/455872 | Photoresist composition for deep UV radiation | Dec 6, 1999 | Issued |
Array
(
[id] => 1514174
[patent_doc_number] => 06420090
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[patent_kind] => B1
[patent_issue_date] => 2002-07-16
[patent_title] => 'Liquid photocurable composition, water-based photocurable composition and resist pattern-forming method by use of the same'
[patent_app_type] => B1
[patent_app_number] => 09/453504
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[pdf_file] => patents/06/420/06420090.pdf
[firstpage_image] =>[orig_patent_app_number] => 09453504
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/453504 | Liquid photocurable composition, water-based photocurable composition and resist pattern-forming method by use of the same | Dec 2, 1999 | Issued |
Array
(
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[patent_doc_number] => 06489080
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[patent_kind] => B2
[patent_issue_date] => 2002-12-03
[patent_title] => 'Positive resist composition'
[patent_app_type] => B2
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Array
(
[id] => 4231064
[patent_doc_number] => 06117623
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[patent_kind] => NA
[patent_issue_date] => 2000-09-12
[patent_title] => 'Remover solvent for partial removal of photoresist layer'
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[patent_app_country] => US
[patent_app_date] => 1999-12-02
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[patent_drawing_sheets_cnt] => 0
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[pdf_file] => patents/06/117/06117623.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/453460 | Remover solvent for partial removal of photoresist layer | Dec 1, 1999 | Issued |
Array
(
[id] => 1446293
[patent_doc_number] => 06368773
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[patent_kind] => B1
[patent_issue_date] => 2002-04-09
[patent_title] => 'Photoresist cross-linker and photoresist composition comprising the same'
[patent_app_type] => B1
[patent_app_number] => 09/448916
[patent_app_country] => US
[patent_app_date] => 1999-11-24
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[pdf_file] => patents/06/368/06368773.pdf
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Array
(
[id] => 1588206
[patent_doc_number] => 06482565
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-11-19
[patent_title] => 'Photoresist cross-linker and photoresist composition comprising the same'
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Array
(
[id] => 4356244
[patent_doc_number] => 06255032
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[patent_kind] => NA
[patent_issue_date] => 2001-07-03
[patent_title] => 'Chemically amplified color resist composition'
[patent_app_type] => 1
[patent_app_number] => 9/447469
[patent_app_country] => US
[patent_app_date] => 1999-11-22
[patent_effective_date] => 0000-00-00
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Array
(
[id] => 1477294
[patent_doc_number] => 06344304
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[patent_kind] => B1
[patent_issue_date] => 2002-02-05
[patent_title] => 'Radiation sensitive material and method for forming pattern'
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[pdf_file] => patents/06/344/06344304.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/438416 | Radiation sensitive material and method for forming pattern | Nov 11, 1999 | Issued |
Array
(
[id] => 4406248
[patent_doc_number] => 06300037
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-10-09
[patent_title] => 'Photosensitive resin composition and adhesive'
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[patent_app_number] => 9/437232
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[patent_app_date] => 1999-11-10
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/437232 | Photosensitive resin composition and adhesive | Nov 9, 1999 | Issued |
| 09/436652 | NEGATIVE-WORKING PHOTORESIST COMPOSITION | Nov 8, 1999 | Abandoned |
Array
(
[id] => 1535722
[patent_doc_number] => 06337171
[patent_country] => US
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[patent_issue_date] => 2002-01-08
[patent_title] => 'Radiation-sensitive resin composition'
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Array
(
[id] => 4334956
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[patent_issue_date] => 2001-12-25
[patent_title] => 'Method for preparing a conductive polythiophene layer at low temperature'
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Array
(
[id] => 4326969
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[patent_title] => 'Ester compounds, polymers, resist compositions and patterning process'
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Array
(
[id] => 4153774
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Array
(
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Array
(
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Array
(
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