Search

Saleha R. Mohamedulla

Examiner (ID: 15726)

Most Active Art Unit
1756
Art Unit(s)
1756
Total Applications
359
Issued Applications
310
Pending Applications
19
Abandoned Applications
30

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 1541923 [patent_doc_number] => 06372405 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-04-16 [patent_title] => 'Method, article and composition for limiting particle aggregation in a mask deposited by a colloidal suspension' [patent_app_type] => B1 [patent_app_number] => 09/650476 [patent_app_country] => US [patent_app_date] => 2000-08-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 8 [patent_no_of_words] => 2371 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 74 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/372/06372405.pdf [firstpage_image] =>[orig_patent_app_number] => 09650476 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/650476
Method, article and composition for limiting particle aggregation in a mask deposited by a colloidal suspension Aug 28, 2000 Issued
Array ( [id] => 1541919 [patent_doc_number] => 06372404 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-04-16 [patent_title] => 'Method, article and composition for limiting particle aggregation in a mask deposited by a colloidal suspension' [patent_app_type] => B1 [patent_app_number] => 09/650473 [patent_app_country] => US [patent_app_date] => 2000-08-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 8 [patent_no_of_words] => 2370 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 71 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/372/06372404.pdf [firstpage_image] =>[orig_patent_app_number] => 09650473 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/650473
Method, article and composition for limiting particle aggregation in a mask deposited by a colloidal suspension Aug 28, 2000 Issued
Array ( [id] => 1487375 [patent_doc_number] => 06428943 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-08-06 [patent_title] => 'Method, article and composition for limiting particle aggregation in a mask deposited by a colloidal suspension' [patent_app_type] => B1 [patent_app_number] => 09/648594 [patent_app_country] => US [patent_app_date] => 2000-08-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 8 [patent_no_of_words] => 2373 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 103 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/428/06428943.pdf [firstpage_image] =>[orig_patent_app_number] => 09648594 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/648594
Method, article and composition for limiting particle aggregation in a mask deposited by a colloidal suspension Aug 24, 2000 Issued
Array ( [id] => 1202407 [patent_doc_number] => 06720114 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2004-04-13 [patent_title] => 'METHOD OF FORMING AN ALTERNATING PHASE SHIFT CIRCUITRY FABRICATION MASK, METHOD OF FORMING A CIRCUITRY FABRICATION MASK HAVING A SUBTRACTIVE ALTERNATING PHASE SHIFT REGION, AND ALTERNATING PHASE SHIFT MASK' [patent_app_type] => B1 [patent_app_number] => 09/643005 [patent_app_country] => US [patent_app_date] => 2000-08-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 9 [patent_no_of_words] => 3715 [patent_no_of_claims] => 45 [patent_no_of_ind_claims] => 8 [patent_words_short_claim] => 74 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/720/06720114.pdf [firstpage_image] =>[orig_patent_app_number] => 09643005 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/643005
METHOD OF FORMING AN ALTERNATING PHASE SHIFT CIRCUITRY FABRICATION MASK, METHOD OF FORMING A CIRCUITRY FABRICATION MASK HAVING A SUBTRACTIVE ALTERNATING PHASE SHIFT REGION, AND ALTERNATING PHASE SHIFT MASK Aug 20, 2000 Issued
Array ( [id] => 1276782 [patent_doc_number] => 06645676 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-11-11 [patent_title] => 'Electron beam exposure mask, electron beam exposure method, method of fabricating semiconductor device, and electron beam exposure apparatus' [patent_app_type] => B1 [patent_app_number] => 09/641125 [patent_app_country] => US [patent_app_date] => 2000-08-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 10 [patent_no_of_words] => 6370 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 105 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/645/06645676.pdf [firstpage_image] =>[orig_patent_app_number] => 09641125 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/641125
Electron beam exposure mask, electron beam exposure method, method of fabricating semiconductor device, and electron beam exposure apparatus Aug 15, 2000 Issued
Array ( [id] => 1364248 [patent_doc_number] => 06566017 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-05-20 [patent_title] => 'Semiconductor wafer imaging mask having uniform pattern features and method of making same' [patent_app_type] => B1 [patent_app_number] => 09/638488 [patent_app_country] => US [patent_app_date] => 2000-08-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 4 [patent_no_of_words] => 2897 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 136 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/566/06566017.pdf [firstpage_image] =>[orig_patent_app_number] => 09638488 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/638488
Semiconductor wafer imaging mask having uniform pattern features and method of making same Aug 13, 2000 Issued
Array ( [id] => 1544640 [patent_doc_number] => 06444404 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-09-03 [patent_title] => 'Method of fabricating ESD protection device by using the same photolithographic mask for both the ESD implantation and the silicide blocking regions' [patent_app_type] => B1 [patent_app_number] => 09/635585 [patent_app_country] => US [patent_app_date] => 2000-08-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 17 [patent_figures_cnt] => 17 [patent_no_of_words] => 3347 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 332 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/444/06444404.pdf [firstpage_image] =>[orig_patent_app_number] => 09635585 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/635585
Method of fabricating ESD protection device by using the same photolithographic mask for both the ESD implantation and the silicide blocking regions Aug 8, 2000 Issued
09/635037 Method of making projection screens and the like Aug 3, 2000 Abandoned
Array ( [id] => 1398789 [patent_doc_number] => 06534223 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-03-18 [patent_title] => 'Method of forming a circuitry fabrication mask having a subtractive alternating phase shift region' [patent_app_type] => B1 [patent_app_number] => 09/629395 [patent_app_country] => US [patent_app_date] => 2000-08-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 7 [patent_no_of_words] => 2587 [patent_no_of_claims] => 36 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 188 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/534/06534223.pdf [firstpage_image] =>[orig_patent_app_number] => 09629395 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/629395
Method of forming a circuitry fabrication mask having a subtractive alternating phase shift region Jul 31, 2000 Issued
Array ( [id] => 1302109 [patent_doc_number] => 06620557 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-09-16 [patent_title] => 'Photo-mask, photo-mask pair, semiconductor device and method of manufacturing a semiconductor device' [patent_app_type] => B1 [patent_app_number] => 09/627012 [patent_app_country] => US [patent_app_date] => 2000-07-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 16 [patent_figures_cnt] => 40 [patent_no_of_words] => 6015 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 8 [patent_words_short_claim] => 77 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/620/06620557.pdf [firstpage_image] =>[orig_patent_app_number] => 09627012 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/627012
Photo-mask, photo-mask pair, semiconductor device and method of manufacturing a semiconductor device Jul 26, 2000 Issued
Array ( [id] => 1594611 [patent_doc_number] => 06492070 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-12-10 [patent_title] => 'Electron beam exposure mask and method for manufacturing electron beam exposure mask' [patent_app_type] => B1 [patent_app_number] => 09/626117 [patent_app_country] => US [patent_app_date] => 2000-07-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 13 [patent_no_of_words] => 4341 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 96 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/492/06492070.pdf [firstpage_image] =>[orig_patent_app_number] => 09626117 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/626117
Electron beam exposure mask and method for manufacturing electron beam exposure mask Jul 25, 2000 Issued
Array ( [id] => 1280078 [patent_doc_number] => 06641978 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-11-04 [patent_title] => 'Dry multilayer inorganic alloy thermal resist for lithographic processing and image creation' [patent_app_type] => B1 [patent_app_number] => 09/618065 [patent_app_country] => US [patent_app_date] => 2000-07-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 22 [patent_no_of_words] => 7173 [patent_no_of_claims] => 31 [patent_no_of_ind_claims] => 9 [patent_words_short_claim] => 70 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/641/06641978.pdf [firstpage_image] =>[orig_patent_app_number] => 09618065 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/618065
Dry multilayer inorganic alloy thermal resist for lithographic processing and image creation Jul 16, 2000 Issued
Array ( [id] => 1415647 [patent_doc_number] => 06514647 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-02-04 [patent_title] => 'Photomask, resist pattern formation method, method of determining alignment accuracy and method of fabricating semiconductor device' [patent_app_type] => B1 [patent_app_number] => 09/615744 [patent_app_country] => US [patent_app_date] => 2000-07-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 13 [patent_figures_cnt] => 43 [patent_no_of_words] => 10594 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 111 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/514/06514647.pdf [firstpage_image] =>[orig_patent_app_number] => 09615744 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/615744
Photomask, resist pattern formation method, method of determining alignment accuracy and method of fabricating semiconductor device Jul 12, 2000 Issued
Array ( [id] => 4272404 [patent_doc_number] => 06280888 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-08-28 [patent_title] => 'Phase-shifting mask with multiple phase-shift regions' [patent_app_type] => 1 [patent_app_number] => 9/608168 [patent_app_country] => US [patent_app_date] => 2000-06-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 24 [patent_no_of_words] => 7213 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 196 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/280/06280888.pdf [firstpage_image] =>[orig_patent_app_number] => 608168 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/608168
Phase-shifting mask with multiple phase-shift regions Jun 29, 2000 Issued
Array ( [id] => 1352366 [patent_doc_number] => 06576374 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-06-10 [patent_title] => 'Mask blank and method of fabricating phase shift mask from the same' [patent_app_type] => B1 [patent_app_number] => 09/605429 [patent_app_country] => US [patent_app_date] => 2000-06-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 16 [patent_no_of_words] => 4692 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 155 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/576/06576374.pdf [firstpage_image] =>[orig_patent_app_number] => 09605429 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/605429
Mask blank and method of fabricating phase shift mask from the same Jun 28, 2000 Issued
Array ( [id] => 1359626 [patent_doc_number] => 06569605 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-05-27 [patent_title] => 'Photomask and method for forming micro patterns of semiconductor device using the same' [patent_app_type] => B1 [patent_app_number] => 09/606462 [patent_app_country] => US [patent_app_date] => 2000-06-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 23 [patent_no_of_words] => 3999 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 315 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/569/06569605.pdf [firstpage_image] =>[orig_patent_app_number] => 09606462 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/606462
Photomask and method for forming micro patterns of semiconductor device using the same Jun 27, 2000 Issued
Array ( [id] => 1364240 [patent_doc_number] => 06566016 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-05-20 [patent_title] => 'Apparatus and method for compensating critical dimension deviations across photomask' [patent_app_type] => B1 [patent_app_number] => 09/606374 [patent_app_country] => US [patent_app_date] => 2000-06-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 10 [patent_no_of_words] => 5527 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 31 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/566/06566016.pdf [firstpage_image] =>[orig_patent_app_number] => 09606374 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/606374
Apparatus and method for compensating critical dimension deviations across photomask Jun 27, 2000 Issued
Array ( [id] => 1394273 [patent_doc_number] => 06531249 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-03-11 [patent_title] => 'Reticle blanks for charged-particle-beam microlithography and methods for making same' [patent_app_type] => B1 [patent_app_number] => 09/602435 [patent_app_country] => US [patent_app_date] => 2000-06-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 12 [patent_no_of_words] => 3540 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 88 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/531/06531249.pdf [firstpage_image] =>[orig_patent_app_number] => 09602435 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/602435
Reticle blanks for charged-particle-beam microlithography and methods for making same Jun 22, 2000 Issued
09/602193 PHOTOMASK PRODUCING METHOD AND APPARATUS AND DEVICE MANUFACTURING METHOD Jun 21, 2000 Abandoned
Array ( [id] => 1502858 [patent_doc_number] => 06465139 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-10-15 [patent_title] => 'Mask pattern for defining a floating gate region' [patent_app_type] => B1 [patent_app_number] => 09/588156 [patent_app_country] => US [patent_app_date] => 2000-06-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 16 [patent_no_of_words] => 1882 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 95 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/465/06465139.pdf [firstpage_image] =>[orig_patent_app_number] => 09588156 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/588156
Mask pattern for defining a floating gate region Jun 4, 2000 Issued
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