| Application number | Title of the application | Filing Date | Status |
|---|
Array
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[id] => 1541923
[patent_doc_number] => 06372405
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-04-16
[patent_title] => 'Method, article and composition for limiting particle aggregation in a mask deposited by a colloidal suspension'
[patent_app_type] => B1
[patent_app_number] => 09/650476
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Array
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[patent_doc_number] => 06372404
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-04-16
[patent_title] => 'Method, article and composition for limiting particle aggregation in a mask deposited by a colloidal suspension'
[patent_app_type] => B1
[patent_app_number] => 09/650473
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[firstpage_image] =>[orig_patent_app_number] => 09650473
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/650473 | Method, article and composition for limiting particle aggregation in a mask deposited by a colloidal suspension | Aug 28, 2000 | Issued |
Array
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[id] => 1487375
[patent_doc_number] => 06428943
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-08-06
[patent_title] => 'Method, article and composition for limiting particle aggregation in a mask deposited by a colloidal suspension'
[patent_app_type] => B1
[patent_app_number] => 09/648594
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[patent_app_date] => 2000-08-25
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/648594 | Method, article and composition for limiting particle aggregation in a mask deposited by a colloidal suspension | Aug 24, 2000 | Issued |
Array
(
[id] => 1202407
[patent_doc_number] => 06720114
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2004-04-13
[patent_title] => 'METHOD OF FORMING AN ALTERNATING PHASE SHIFT CIRCUITRY FABRICATION MASK, METHOD OF FORMING A CIRCUITRY FABRICATION MASK HAVING A SUBTRACTIVE ALTERNATING PHASE SHIFT REGION, AND ALTERNATING PHASE SHIFT MASK'
[patent_app_type] => B1
[patent_app_number] => 09/643005
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[patent_app_date] => 2000-08-21
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[firstpage_image] =>[orig_patent_app_number] => 09643005
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/643005 | METHOD OF FORMING AN ALTERNATING PHASE SHIFT CIRCUITRY FABRICATION MASK, METHOD OF FORMING A CIRCUITRY FABRICATION MASK HAVING A SUBTRACTIVE ALTERNATING PHASE SHIFT REGION, AND ALTERNATING PHASE SHIFT MASK | Aug 20, 2000 | Issued |
Array
(
[id] => 1276782
[patent_doc_number] => 06645676
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-11-11
[patent_title] => 'Electron beam exposure mask, electron beam exposure method, method of fabricating semiconductor device, and electron beam exposure apparatus'
[patent_app_type] => B1
[patent_app_number] => 09/641125
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[patent_app_date] => 2000-08-16
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[firstpage_image] =>[orig_patent_app_number] => 09641125
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/641125 | Electron beam exposure mask, electron beam exposure method, method of fabricating semiconductor device, and electron beam exposure apparatus | Aug 15, 2000 | Issued |
Array
(
[id] => 1364248
[patent_doc_number] => 06566017
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-05-20
[patent_title] => 'Semiconductor wafer imaging mask having uniform pattern features and method of making same'
[patent_app_type] => B1
[patent_app_number] => 09/638488
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[firstpage_image] =>[orig_patent_app_number] => 09638488
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/638488 | Semiconductor wafer imaging mask having uniform pattern features and method of making same | Aug 13, 2000 | Issued |
Array
(
[id] => 1544640
[patent_doc_number] => 06444404
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-09-03
[patent_title] => 'Method of fabricating ESD protection device by using the same photolithographic mask for both the ESD implantation and the silicide blocking regions'
[patent_app_type] => B1
[patent_app_number] => 09/635585
[patent_app_country] => US
[patent_app_date] => 2000-08-09
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[pdf_file] => patents/06/444/06444404.pdf
[firstpage_image] =>[orig_patent_app_number] => 09635585
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/635585 | Method of fabricating ESD protection device by using the same photolithographic mask for both the ESD implantation and the silicide blocking regions | Aug 8, 2000 | Issued |
| 09/635037 | Method of making projection screens and the like | Aug 3, 2000 | Abandoned |
Array
(
[id] => 1398789
[patent_doc_number] => 06534223
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-03-18
[patent_title] => 'Method of forming a circuitry fabrication mask having a subtractive alternating phase shift region'
[patent_app_type] => B1
[patent_app_number] => 09/629395
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[patent_app_date] => 2000-08-01
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[pdf_file] => patents/06/534/06534223.pdf
[firstpage_image] =>[orig_patent_app_number] => 09629395
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/629395 | Method of forming a circuitry fabrication mask having a subtractive alternating phase shift region | Jul 31, 2000 | Issued |
Array
(
[id] => 1302109
[patent_doc_number] => 06620557
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[patent_kind] => B1
[patent_issue_date] => 2003-09-16
[patent_title] => 'Photo-mask, photo-mask pair, semiconductor device and method of manufacturing a semiconductor device'
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[patent_app_number] => 09/627012
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[firstpage_image] =>[orig_patent_app_number] => 09627012
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/627012 | Photo-mask, photo-mask pair, semiconductor device and method of manufacturing a semiconductor device | Jul 26, 2000 | Issued |
Array
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[patent_kind] => B1
[patent_issue_date] => 2002-12-10
[patent_title] => 'Electron beam exposure mask and method for manufacturing electron beam exposure mask'
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[firstpage_image] =>[orig_patent_app_number] => 09626117
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/626117 | Electron beam exposure mask and method for manufacturing electron beam exposure mask | Jul 25, 2000 | Issued |
Array
(
[id] => 1280078
[patent_doc_number] => 06641978
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-11-04
[patent_title] => 'Dry multilayer inorganic alloy thermal resist for lithographic processing and image creation'
[patent_app_type] => B1
[patent_app_number] => 09/618065
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/618065 | Dry multilayer inorganic alloy thermal resist for lithographic processing and image creation | Jul 16, 2000 | Issued |
Array
(
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[patent_doc_number] => 06514647
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[patent_kind] => B1
[patent_issue_date] => 2003-02-04
[patent_title] => 'Photomask, resist pattern formation method, method of determining alignment accuracy and method of fabricating semiconductor device'
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Array
(
[id] => 4272404
[patent_doc_number] => 06280888
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[patent_kind] => NA
[patent_issue_date] => 2001-08-28
[patent_title] => 'Phase-shifting mask with multiple phase-shift regions'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/608168 | Phase-shifting mask with multiple phase-shift regions | Jun 29, 2000 | Issued |
Array
(
[id] => 1352366
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[patent_kind] => B1
[patent_issue_date] => 2003-06-10
[patent_title] => 'Mask blank and method of fabricating phase shift mask from the same'
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[firstpage_image] =>[orig_patent_app_number] => 09605429
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/605429 | Mask blank and method of fabricating phase shift mask from the same | Jun 28, 2000 | Issued |
Array
(
[id] => 1359626
[patent_doc_number] => 06569605
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[patent_kind] => B1
[patent_issue_date] => 2003-05-27
[patent_title] => 'Photomask and method for forming micro patterns of semiconductor device using the same'
[patent_app_type] => B1
[patent_app_number] => 09/606462
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/606462 | Photomask and method for forming micro patterns of semiconductor device using the same | Jun 27, 2000 | Issued |
Array
(
[id] => 1364240
[patent_doc_number] => 06566016
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-05-20
[patent_title] => 'Apparatus and method for compensating critical dimension deviations across photomask'
[patent_app_type] => B1
[patent_app_number] => 09/606374
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[patent_app_date] => 2000-06-28
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/606374 | Apparatus and method for compensating critical dimension deviations across photomask | Jun 27, 2000 | Issued |
Array
(
[id] => 1394273
[patent_doc_number] => 06531249
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-03-11
[patent_title] => 'Reticle blanks for charged-particle-beam microlithography and methods for making same'
[patent_app_type] => B1
[patent_app_number] => 09/602435
[patent_app_country] => US
[patent_app_date] => 2000-06-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/602435 | Reticle blanks for charged-particle-beam microlithography and methods for making same | Jun 22, 2000 | Issued |
| 09/602193 | PHOTOMASK PRODUCING METHOD AND APPARATUS AND DEVICE MANUFACTURING METHOD | Jun 21, 2000 | Abandoned |
Array
(
[id] => 1502858
[patent_doc_number] => 06465139
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[patent_kind] => B1
[patent_issue_date] => 2002-10-15
[patent_title] => 'Mask pattern for defining a floating gate region'
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[firstpage_image] =>[orig_patent_app_number] => 09588156
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/588156 | Mask pattern for defining a floating gate region | Jun 4, 2000 | Issued |