
Saleha R. Mohamedulla
Examiner (ID: 15726)
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1756 |
| Total Applications | 359 |
| Issued Applications | 310 |
| Pending Applications | 19 |
| Abandoned Applications | 30 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1594594
[patent_doc_number] => 06492067
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-12-10
[patent_title] => 'Removable pellicle for lithographic mask protection and handling'
[patent_app_type] => B1
[patent_app_number] => 09/454674
[patent_app_country] => US
[patent_app_date] => 1999-12-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 8
[patent_no_of_words] => 6359
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 88
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/492/06492067.pdf
[firstpage_image] =>[orig_patent_app_number] => 09454674
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/454674 | Removable pellicle for lithographic mask protection and handling | Dec 2, 1999 | Issued |
Array
(
[id] => 1286425
[patent_doc_number] => 06635388
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-10-21
[patent_title] => 'Contact hole fabrication with the aid of mutually crossing sudden phase shift edges of a single phase shift mask'
[patent_app_type] => B1
[patent_app_number] => 09/429837
[patent_app_country] => US
[patent_app_date] => 1999-10-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 4
[patent_no_of_words] => 2182
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 133
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/635/06635388.pdf
[firstpage_image] =>[orig_patent_app_number] => 09429837
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/429837 | Contact hole fabrication with the aid of mutually crossing sudden phase shift edges of a single phase shift mask | Oct 28, 1999 | Issued |
Array
(
[id] => 1369259
[patent_doc_number] => 06562522
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-05-13
[patent_title] => 'Photomasking'
[patent_app_type] => B1
[patent_app_number] => 09/430689
[patent_app_country] => US
[patent_app_date] => 1999-10-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 17
[patent_no_of_words] => 2280
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 151
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/562/06562522.pdf
[firstpage_image] =>[orig_patent_app_number] => 09430689
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/430689 | Photomasking | Oct 28, 1999 | Issued |
Array
(
[id] => 1417703
[patent_doc_number] => 06506544
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-01-14
[patent_title] => 'Exposure method and exposure apparatus and mask'
[patent_app_type] => B1
[patent_app_number] => 09/430179
[patent_app_country] => US
[patent_app_date] => 1999-10-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 25
[patent_figures_cnt] => 69
[patent_no_of_words] => 19237
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 140
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/506/06506544.pdf
[firstpage_image] =>[orig_patent_app_number] => 09430179
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/430179 | Exposure method and exposure apparatus and mask | Oct 28, 1999 | Issued |
Array
(
[id] => 1422635
[patent_doc_number] => 06503665
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-01-07
[patent_title] => 'Phase shift mask and semiconductor device fabricated with the phase shift mask'
[patent_app_type] => B1
[patent_app_number] => 09/428479
[patent_app_country] => US
[patent_app_date] => 1999-10-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 14
[patent_figures_cnt] => 32
[patent_no_of_words] => 4598
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 65
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/503/06503665.pdf
[firstpage_image] =>[orig_patent_app_number] => 09428479
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/428479 | Phase shift mask and semiconductor device fabricated with the phase shift mask | Oct 27, 1999 | Issued |
Array
(
[id] => 1280125
[patent_doc_number] => 06641985
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-11-04
[patent_title] => 'Method for making element'
[patent_app_type] => B2
[patent_app_number] => 09/427743
[patent_app_country] => US
[patent_app_date] => 1999-10-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 22
[patent_no_of_words] => 3117
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 80
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/641/06641985.pdf
[firstpage_image] =>[orig_patent_app_number] => 09427743
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/427743 | Method for making element | Oct 26, 1999 | Issued |
Array
(
[id] => 1544547
[patent_doc_number] => 06444372
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-09-03
[patent_title] => 'Non absorbing reticle and method of making same'
[patent_app_type] => B1
[patent_app_number] => 09/426250
[patent_app_country] => US
[patent_app_date] => 1999-10-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 12
[patent_no_of_words] => 2327
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 47
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/444/06444372.pdf
[firstpage_image] =>[orig_patent_app_number] => 09426250
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/426250 | Non absorbing reticle and method of making same | Oct 24, 1999 | Issued |
Array
(
[id] => 1167502
[patent_doc_number] => 06753131
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2004-06-22
[patent_title] => 'Transparent elastomeric, contact-mode photolithography mask, sensor, and wavefront engineering element'
[patent_app_type] => B1
[patent_app_number] => 09/422611
[patent_app_country] => US
[patent_app_date] => 1999-10-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 19
[patent_figures_cnt] => 48
[patent_no_of_words] => 15885
[patent_no_of_claims] => 77
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 45
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/753/06753131.pdf
[firstpage_image] =>[orig_patent_app_number] => 09422611
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/422611 | Transparent elastomeric, contact-mode photolithography mask, sensor, and wavefront engineering element | Oct 20, 1999 | Issued |
Array
(
[id] => 1359128
[patent_doc_number] => 06569574
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-05-27
[patent_title] => 'Methods of patterning radiation, methods of forming radiation-patterning tools, and radiation-patterning tools'
[patent_app_type] => B2
[patent_app_number] => 09/420205
[patent_app_country] => US
[patent_app_date] => 1999-10-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 7
[patent_no_of_words] => 3284
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 154
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/569/06569574.pdf
[firstpage_image] =>[orig_patent_app_number] => 09420205
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/420205 | Methods of patterning radiation, methods of forming radiation-patterning tools, and radiation-patterning tools | Oct 17, 1999 | Issued |
Array
(
[id] => 1588157
[patent_doc_number] => 06482552
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2002-11-19
[patent_title] => 'Reticle forming methods'
[patent_app_type] => B2
[patent_app_number] => 09/420336
[patent_app_country] => US
[patent_app_date] => 1999-10-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 17
[patent_no_of_words] => 3879
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 65
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/482/06482552.pdf
[firstpage_image] =>[orig_patent_app_number] => 09420336
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/420336 | Reticle forming methods | Oct 17, 1999 | Issued |
Array
(
[id] => 7640479
[patent_doc_number] => 06395433
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-05-28
[patent_title] => 'Photomask for projection lithography at or below about 160 nm and a method thereof'
[patent_app_type] => B1
[patent_app_number] => 09/415149
[patent_app_country] => US
[patent_app_date] => 1999-10-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 20
[patent_no_of_words] => 5681
[patent_no_of_claims] => 63
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 4
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/395/06395433.pdf
[firstpage_image] =>[orig_patent_app_number] => 09415149
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/415149 | Photomask for projection lithography at or below about 160 nm and a method thereof | Oct 7, 1999 | Issued |
Array
(
[id] => 1331127
[patent_doc_number] => 06596465
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-07-22
[patent_title] => 'Method of manufacturing a semiconductor component'
[patent_app_type] => B1
[patent_app_number] => 09/414735
[patent_app_country] => US
[patent_app_date] => 1999-10-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 2
[patent_no_of_words] => 2858
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 68
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/596/06596465.pdf
[firstpage_image] =>[orig_patent_app_number] => 09414735
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/414735 | Method of manufacturing a semiconductor component | Oct 7, 1999 | Issued |
Array
(
[id] => 1499707
[patent_doc_number] => 06485869
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2002-11-26
[patent_title] => 'Photomask frame modification to eliminate process induced critical dimension control variation'
[patent_app_type] => B2
[patent_app_number] => 09/411729
[patent_app_country] => US
[patent_app_date] => 1999-10-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 16
[patent_no_of_words] => 4612
[patent_no_of_claims] => 49
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 56
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/485/06485869.pdf
[firstpage_image] =>[orig_patent_app_number] => 09411729
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/411729 | Photomask frame modification to eliminate process induced critical dimension control variation | Sep 30, 1999 | Issued |
Array
(
[id] => 1511804
[patent_doc_number] => 06472107
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-10-29
[patent_title] => 'Disposable hard mask for photomask plasma etching'
[patent_app_type] => B1
[patent_app_number] => 09/409454
[patent_app_country] => US
[patent_app_date] => 1999-09-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 9
[patent_no_of_words] => 3121
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 147
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/472/06472107.pdf
[firstpage_image] =>[orig_patent_app_number] => 09409454
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/409454 | Disposable hard mask for photomask plasma etching | Sep 29, 1999 | Issued |
Array
(
[id] => 4403532
[patent_doc_number] => 06171736
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-01-09
[patent_title] => 'Projection-microlithography alignment method utilizing mask with separate mask substrates'
[patent_app_type] => 1
[patent_app_number] => 9/404917
[patent_app_country] => US
[patent_app_date] => 1999-09-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 17
[patent_no_of_words] => 9662
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 409
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/171/06171736.pdf
[firstpage_image] =>[orig_patent_app_number] => 404917
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/404917 | Projection-microlithography alignment method utilizing mask with separate mask substrates | Sep 23, 1999 | Issued |
Array
(
[id] => 1302095
[patent_doc_number] => 06620555
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-09-16
[patent_title] => 'Pellicle, method of preparing the same and exposure method'
[patent_app_type] => B1
[patent_app_number] => 09/404241
[patent_app_country] => US
[patent_app_date] => 1999-09-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 7917
[patent_no_of_claims] => 2
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 214
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/620/06620555.pdf
[firstpage_image] =>[orig_patent_app_number] => 09404241
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/404241 | Pellicle, method of preparing the same and exposure method | Sep 21, 1999 | Issued |
Array
(
[id] => 1334416
[patent_doc_number] => 06593033
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-07-15
[patent_title] => 'Attenuated rim phase shift mask'
[patent_app_type] => B1
[patent_app_number] => 09/399840
[patent_app_country] => US
[patent_app_date] => 1999-09-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 12
[patent_no_of_words] => 2700
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 48
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/593/06593033.pdf
[firstpage_image] =>[orig_patent_app_number] => 09399840
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/399840 | Attenuated rim phase shift mask | Sep 20, 1999 | Issued |
Array
(
[id] => 1506628
[patent_doc_number] => 06440613
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-08-27
[patent_title] => 'Method of fabricating attenuated phase shift mask'
[patent_app_type] => B1
[patent_app_number] => 09/389870
[patent_app_country] => US
[patent_app_date] => 1999-09-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 12
[patent_no_of_words] => 2923
[patent_no_of_claims] => 55
[patent_no_of_ind_claims] => 10
[patent_words_short_claim] => 96
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/440/06440613.pdf
[firstpage_image] =>[orig_patent_app_number] => 09389870
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/389870 | Method of fabricating attenuated phase shift mask | Sep 1, 1999 | Issued |
Array
(
[id] => 1506624
[patent_doc_number] => 06440612
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-08-27
[patent_title] => 'Field correction of overlay error'
[patent_app_type] => B1
[patent_app_number] => 09/388055
[patent_app_country] => US
[patent_app_date] => 1999-09-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 13
[patent_no_of_words] => 7092
[patent_no_of_claims] => 28
[patent_no_of_ind_claims] => 14
[patent_words_short_claim] => 121
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/440/06440612.pdf
[firstpage_image] =>[orig_patent_app_number] => 09388055
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/388055 | Field correction of overlay error | Aug 31, 1999 | Issued |
Array
(
[id] => 1446255
[patent_doc_number] => 06368753
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-04-09
[patent_title] => 'Mask repair'
[patent_app_type] => B1
[patent_app_number] => 09/384395
[patent_app_country] => US
[patent_app_date] => 1999-08-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 4
[patent_no_of_words] => 4402
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 53
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/368/06368753.pdf
[firstpage_image] =>[orig_patent_app_number] => 09384395
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/384395 | Mask repair | Aug 26, 1999 | Issued |