
Saleha R. Mohamedulla
Examiner (ID: 15726)
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1756 |
| Total Applications | 359 |
| Issued Applications | 310 |
| Pending Applications | 19 |
| Abandoned Applications | 30 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1180070
[patent_doc_number] => 06737198
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-05-18
[patent_title] => 'Photomask, fabrication method of photomask, and fabrication method of semiconductor integrated circuit'
[patent_app_type] => B2
[patent_app_number] => 09/320946
[patent_app_country] => US
[patent_app_date] => 1999-05-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 33
[patent_figures_cnt] => 129
[patent_no_of_words] => 11733
[patent_no_of_claims] => 34
[patent_no_of_ind_claims] => 24
[patent_words_short_claim] => 46
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/737/06737198.pdf
[firstpage_image] =>[orig_patent_app_number] => 09320946
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/320946 | Photomask, fabrication method of photomask, and fabrication method of semiconductor integrated circuit | May 25, 1999 | Issued |
Array
(
[id] => 1484569
[patent_doc_number] => 06365326
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-04-02
[patent_title] => 'Pattern density tailoring for etching of advanced lithographic mask'
[patent_app_type] => B1
[patent_app_number] => 09/307126
[patent_app_country] => US
[patent_app_date] => 1999-05-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 12
[patent_no_of_words] => 3903
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 157
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/365/06365326.pdf
[firstpage_image] =>[orig_patent_app_number] => 09307126
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/307126 | Pattern density tailoring for etching of advanced lithographic mask | May 6, 1999 | Issued |
Array
(
[id] => 6884791
[patent_doc_number] => 20010038952
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-11-08
[patent_title] => 'METHOD OF FABRICATING PHASE SHIFT MASK'
[patent_app_type] => new
[patent_app_number] => 09/295352
[patent_app_country] => US
[patent_app_date] => 1999-04-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 3615
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 62
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0038/20010038952.pdf
[firstpage_image] =>[orig_patent_app_number] => 09295352
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/295352 | Method of fabricating phase shift mask | Apr 20, 1999 | Issued |
Array
(
[id] => 7064791
[patent_doc_number] => 20010044077
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-11-22
[patent_title] => 'STABILIZATION OF CHEMICALLY AMPLIFIED RESIST COATING'
[patent_app_type] => new
[patent_app_number] => 09/293713
[patent_app_country] => US
[patent_app_date] => 1999-04-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 2017
[patent_no_of_claims] => 29
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 34
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0044/20010044077.pdf
[firstpage_image] =>[orig_patent_app_number] => 09293713
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/293713 | STABILIZATION OF CHEMICALLY AMPLIFIED RESIST COATING | Apr 15, 1999 | Abandoned |
| 09/291870 | EXPOSURE MASK AND EXPOSURE METHOD USING THE SAME | Apr 13, 1999 | Abandoned |
Array
(
[id] => 6876599
[patent_doc_number] => 20010006752
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-07-05
[patent_title] => 'RESIST COMPOSITION AND PATTERN FORMING PROCESS'
[patent_app_type] => new-utility
[patent_app_number] => 09/288781
[patent_app_country] => US
[patent_app_date] => 1999-04-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 2090
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 40
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0006/20010006752.pdf
[firstpage_image] =>[orig_patent_app_number] => 09288781
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/288781 | Resist composition and pattern forming process | Apr 8, 1999 | Issued |
Array
(
[id] => 1422625
[patent_doc_number] => 06503664
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-01-07
[patent_title] => 'Thin film materials for the preparation of attenuating phase shift masks'
[patent_app_type] => B2
[patent_app_number] => 09/289227
[patent_app_country] => US
[patent_app_date] => 1999-04-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 12
[patent_no_of_words] => 3003
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 101
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/503/06503664.pdf
[firstpage_image] =>[orig_patent_app_number] => 09289227
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/289227 | Thin film materials for the preparation of attenuating phase shift masks | Apr 8, 1999 | Issued |
Array
(
[id] => 1469356
[patent_doc_number] => 06406818
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-06-18
[patent_title] => 'Method of manufacturing photomasks by plasma etching with resist stripped'
[patent_app_type] => B1
[patent_app_number] => 09/283087
[patent_app_country] => US
[patent_app_date] => 1999-03-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 5
[patent_no_of_words] => 2990
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 187
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/406/06406818.pdf
[firstpage_image] =>[orig_patent_app_number] => 09283087
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/283087 | Method of manufacturing photomasks by plasma etching with resist stripped | Mar 30, 1999 | Issued |
Array
(
[id] => 4350869
[patent_doc_number] => 06218056
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-04-17
[patent_title] => 'Method of making highly defined bilayer lift-off mask'
[patent_app_type] => 1
[patent_app_number] => 9/281248
[patent_app_country] => US
[patent_app_date] => 1999-03-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 17
[patent_no_of_words] => 5648
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 201
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/218/06218056.pdf
[firstpage_image] =>[orig_patent_app_number] => 281248
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/281248 | Method of making highly defined bilayer lift-off mask | Mar 29, 1999 | Issued |
Array
(
[id] => 4345084
[patent_doc_number] => 06214496
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-04-10
[patent_title] => 'Method for reducing corner rounding in mask fabrication utilizing elliptical energy beam'
[patent_app_type] => 1
[patent_app_number] => 9/280615
[patent_app_country] => US
[patent_app_date] => 1999-03-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 7
[patent_no_of_words] => 2859
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 130
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/214/06214496.pdf
[firstpage_image] =>[orig_patent_app_number] => 280615
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/280615 | Method for reducing corner rounding in mask fabrication utilizing elliptical energy beam | Mar 28, 1999 | Issued |
Array
(
[id] => 1398747
[patent_doc_number] => 06534221
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-03-18
[patent_title] => 'Method for fabricating continuous space variant attenuating lithography mask for fabrication of devices with three-dimensional structures and microelectronics'
[patent_app_type] => B2
[patent_app_number] => 09/277497
[patent_app_country] => US
[patent_app_date] => 1999-03-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 19
[patent_figures_cnt] => 44
[patent_no_of_words] => 5549
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 132
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/534/06534221.pdf
[firstpage_image] =>[orig_patent_app_number] => 09277497
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/277497 | Method for fabricating continuous space variant attenuating lithography mask for fabrication of devices with three-dimensional structures and microelectronics | Mar 25, 1999 | Issued |
Array
(
[id] => 6877540
[patent_doc_number] => 20010003026
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-06-07
[patent_title] => 'METHOD OF MANUFACTURING A STRONG PHASE SHIFTING MASK'
[patent_app_type] => new-utility
[patent_app_number] => 09/276621
[patent_app_country] => US
[patent_app_date] => 1999-03-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 10
[patent_no_of_words] => 2839
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 112
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0003/20010003026.pdf
[firstpage_image] =>[orig_patent_app_number] => 09276621
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/276621 | METHOD OF MANUFACTURING A STRONG PHASE SHIFTING MASK | Mar 24, 1999 | Abandoned |
Array
(
[id] => 4324614
[patent_doc_number] => 06319642
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-11-20
[patent_title] => 'Electron beam exposure apparatus'
[patent_app_type] => 1
[patent_app_number] => 9/275186
[patent_app_country] => US
[patent_app_date] => 1999-03-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 13
[patent_figures_cnt] => 18
[patent_no_of_words] => 8929
[patent_no_of_claims] => 6
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[patent_words_short_claim] => 115
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/319/06319642.pdf
[firstpage_image] =>[orig_patent_app_number] => 275186
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/275186 | Electron beam exposure apparatus | Mar 22, 1999 | Issued |
Array
(
[id] => 6884790
[patent_doc_number] => 20010038951
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-11-08
[patent_title] => 'PHOTOMASK AND METHOD OF MANUFACTURING SAME'
[patent_app_type] => new
[patent_app_number] => 09/272576
[patent_app_country] => US
[patent_app_date] => 1999-03-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 1326
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 2
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[patent_maintenance] => 1
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0038/20010038951.pdf
[firstpage_image] =>[orig_patent_app_number] => 09272576
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/272576 | Photomask and method of manufacturing same | Mar 18, 1999 | Issued |
Array
(
[id] => 4326758
[patent_doc_number] => 06312854
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-11-06
[patent_title] => 'Method of patterning sub-0.25 lambda line features with high transmission, \"attenuated\" phase shift masks'
[patent_app_type] => 1
[patent_app_number] => 9/270052
[patent_app_country] => US
[patent_app_date] => 1999-03-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 22
[patent_no_of_words] => 6316
[patent_no_of_claims] => 32
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 114
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/312/06312854.pdf
[firstpage_image] =>[orig_patent_app_number] => 270052
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/270052 | Method of patterning sub-0.25 lambda line features with high transmission, "attenuated" phase shift masks | Mar 15, 1999 | Issued |
Array
(
[id] => 4301226
[patent_doc_number] => 06326106
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-12-04
[patent_title] => 'Overlay measuring pattern, and photomask'
[patent_app_type] => 1
[patent_app_number] => 9/265858
[patent_app_country] => US
[patent_app_date] => 1999-03-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 21
[patent_no_of_words] => 5348
[patent_no_of_claims] => 2
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/326/06326106.pdf
[firstpage_image] =>[orig_patent_app_number] => 265858
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/265858 | Overlay measuring pattern, and photomask | Mar 10, 1999 | Issued |
Array
(
[id] => 1580657
[patent_doc_number] => 06423475
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-07-23
[patent_title] => 'Sidewall formation for sidewall patterning of sub 100 nm structures'
[patent_app_type] => B1
[patent_app_number] => 09/266367
[patent_app_country] => US
[patent_app_date] => 1999-03-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 5
[patent_no_of_words] => 5057
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 181
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[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/423/06423475.pdf
[firstpage_image] =>[orig_patent_app_number] => 09266367
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/266367 | Sidewall formation for sidewall patterning of sub 100 nm structures | Mar 10, 1999 | Issued |
Array
(
[id] => 6878146
[patent_doc_number] => 20010002301
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-05-31
[patent_title] => 'PROJECTION-EXPOSURE METHODS AND APPARATUS EXHIBITING INCREASED THROUGHPUT'
[patent_app_type] => new-utility
[patent_app_number] => 09/265047
[patent_app_country] => US
[patent_app_date] => 1999-03-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 7143
[patent_no_of_claims] => 22
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[patent_words_short_claim] => 183
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[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0002/20010002301.pdf
[firstpage_image] =>[orig_patent_app_number] => 09265047
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/265047 | PROJECTION-EXPOSURE METHODS AND APPARATUS EXHIBITING INCREASED THROUGHPUT | Mar 8, 1999 | Abandoned |
| 09/263937 | METHOD FOR INSPECTING AND REPAIRING A PHOTOMASK BY SMOOTHING THE BRIGHTNESS DISTRIBUTION OF A LASER BEAM | Mar 7, 1999 | Abandoned |
Array
(
[id] => 4378333
[patent_doc_number] => 06261723
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-07-17
[patent_title] => 'Transfer layer repair process for attenuated masks'
[patent_app_type] => 1
[patent_app_number] => 9/262370
[patent_app_country] => US
[patent_app_date] => 1999-03-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 15
[patent_no_of_words] => 3465
[patent_no_of_claims] => 9
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[patent_words_short_claim] => 225
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/261/06261723.pdf
[firstpage_image] =>[orig_patent_app_number] => 262370
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/262370 | Transfer layer repair process for attenuated masks | Mar 3, 1999 | Issued |