
Saleha R. Mohamedulla
Examiner (ID: 15726)
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1756 |
| Total Applications | 359 |
| Issued Applications | 310 |
| Pending Applications | 19 |
| Abandoned Applications | 30 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 4392873
[patent_doc_number] => 06296988
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-10-02
[patent_title] => 'Method for forming a mental wiring pattern on a semiconductor device'
[patent_app_type] => 1
[patent_app_number] => 9/262789
[patent_app_country] => US
[patent_app_date] => 1999-03-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 11
[patent_no_of_words] => 1397
[patent_no_of_claims] => 30
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 82
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/296/06296988.pdf
[firstpage_image] =>[orig_patent_app_number] => 262789
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/262789 | Method for forming a mental wiring pattern on a semiconductor device | Mar 3, 1999 | Issued |
Array
(
[id] => 4403608
[patent_doc_number] => 06232047
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-05-15
[patent_title] => 'Fabricating high-Q RF components'
[patent_app_type] => 1
[patent_app_number] => 9/261093
[patent_app_country] => US
[patent_app_date] => 1999-03-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 11
[patent_no_of_words] => 1894
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 200
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/232/06232047.pdf
[firstpage_image] =>[orig_patent_app_number] => 261093
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/261093 | Fabricating high-Q RF components | Mar 1, 1999 | Issued |
Array
(
[id] => 1449413
[patent_doc_number] => 06455206
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-09-24
[patent_title] => 'Image forming method, image forming apparatus and image recording material'
[patent_app_type] => B1
[patent_app_number] => 09/258975
[patent_app_country] => US
[patent_app_date] => 1999-02-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 4
[patent_no_of_words] => 11338
[patent_no_of_claims] => 4
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 158
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/455/06455206.pdf
[firstpage_image] =>[orig_patent_app_number] => 09258975
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/258975 | Image forming method, image forming apparatus and image recording material | Feb 25, 1999 | Issued |
Array
(
[id] => 4406555
[patent_doc_number] => 06228540
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-05-08
[patent_title] => 'Method of forming a photomask of high dimensional accuracy utilizing heat treatment equipment'
[patent_app_type] => 1
[patent_app_number] => 9/256305
[patent_app_country] => US
[patent_app_date] => 1999-02-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 13
[patent_no_of_words] => 5253
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 170
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/228/06228540.pdf
[firstpage_image] =>[orig_patent_app_number] => 256305
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/256305 | Method of forming a photomask of high dimensional accuracy utilizing heat treatment equipment | Feb 23, 1999 | Issued |
Array
(
[id] => 1458342
[patent_doc_number] => 06426175
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2002-07-30
[patent_title] => 'Fabrication of a high density long channel DRAM gate with or without a grooved gate'
[patent_app_type] => B2
[patent_app_number] => 09/253455
[patent_app_country] => US
[patent_app_date] => 1999-02-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 29
[patent_figures_cnt] => 40
[patent_no_of_words] => 13069
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 2
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/426/06426175.pdf
[firstpage_image] =>[orig_patent_app_number] => 09253455
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/253455 | Fabrication of a high density long channel DRAM gate with or without a grooved gate | Feb 21, 1999 | Issued |
Array
(
[id] => 1439726
[patent_doc_number] => 06495296
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-12-17
[patent_title] => 'Method for limiting particle aggregation in a mask deposited by a colloidal suspension'
[patent_app_type] => B1
[patent_app_number] => 09/251766
[patent_app_country] => US
[patent_app_date] => 1999-02-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 8
[patent_no_of_words] => 2307
[patent_no_of_claims] => 17
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[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/495/06495296.pdf
[firstpage_image] =>[orig_patent_app_number] => 09251766
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/251766 | Method for limiting particle aggregation in a mask deposited by a colloidal suspension | Feb 16, 1999 | Issued |
Array
(
[id] => 1484565
[patent_doc_number] => 06365325
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-04-02
[patent_title] => 'Aperture width reduction method for forming a patterned photoresist layer'
[patent_app_type] => B1
[patent_app_number] => 09/247791
[patent_app_country] => US
[patent_app_date] => 1999-02-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 3
[patent_no_of_words] => 4879
[patent_no_of_claims] => 46
[patent_no_of_ind_claims] => 6
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[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/365/06365325.pdf
[firstpage_image] =>[orig_patent_app_number] => 09247791
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/247791 | Aperture width reduction method for forming a patterned photoresist layer | Feb 9, 1999 | Issued |
Array
(
[id] => 1449429
[patent_doc_number] => 06455211
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-09-24
[patent_title] => 'Pattern transfer method and apparatus, and device manufacturing method'
[patent_app_type] => B1
[patent_app_number] => 09/243135
[patent_app_country] => US
[patent_app_date] => 1999-02-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 43
[patent_figures_cnt] => 53
[patent_no_of_words] => 21415
[patent_no_of_claims] => 40
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 134
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/455/06455211.pdf
[firstpage_image] =>[orig_patent_app_number] => 09243135
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/243135 | Pattern transfer method and apparatus, and device manufacturing method | Feb 2, 1999 | Issued |
Array
(
[id] => 1458506
[patent_doc_number] => 06391501
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-05-21
[patent_title] => 'Pattern generating method and apparatus'
[patent_app_type] => B1
[patent_app_number] => 09/236234
[patent_app_country] => US
[patent_app_date] => 1999-01-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 19
[patent_figures_cnt] => 39
[patent_no_of_words] => 9731
[patent_no_of_claims] => 10
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/391/06391501.pdf
[firstpage_image] =>[orig_patent_app_number] => 09236234
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/236234 | Pattern generating method and apparatus | Jan 21, 1999 | Issued |
Array
(
[id] => 7064766
[patent_doc_number] => 20010044052
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-11-22
[patent_title] => 'GLASS SUBSTRATE FOR AN ELECTRON DEVICE, PHOTOMASK BLANK AND PHOTOMASK USING THE SAME'
[patent_app_type] => new
[patent_app_number] => 09/220361
[patent_app_country] => US
[patent_app_date] => 1998-12-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 6267
[patent_no_of_claims] => 23
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 33
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0044/20010044052.pdf
[firstpage_image] =>[orig_patent_app_number] => 09220361
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/220361 | Glass substrate for an electron device, photomask blank and photomask using the same | Dec 23, 1998 | Issued |
Array
(
[id] => 4403568
[patent_doc_number] => 06171739
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-01-09
[patent_title] => 'Method of determining focus and coma of a lens at various locations in an imaging field'
[patent_app_type] => 1
[patent_app_number] => 9/205792
[patent_app_country] => US
[patent_app_date] => 1998-12-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 19
[patent_no_of_words] => 7046
[patent_no_of_claims] => 27
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 201
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/171/06171739.pdf
[firstpage_image] =>[orig_patent_app_number] => 205792
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/205792 | Method of determining focus and coma of a lens at various locations in an imaging field | Dec 3, 1998 | Issued |
Array
(
[id] => 4264332
[patent_doc_number] => 06306560
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-10-23
[patent_title] => 'Ultra-thin resist and SiON/oxide hard mask for metal etch'
[patent_app_type] => 1
[patent_app_number] => 9/204630
[patent_app_country] => US
[patent_app_date] => 1998-12-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[patent_no_of_words] => 5381
[patent_no_of_claims] => 28
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/306/06306560.pdf
[firstpage_image] =>[orig_patent_app_number] => 204630
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/204630 | Ultra-thin resist and SiON/oxide hard mask for metal etch | Dec 1, 1998 | Issued |
Array
(
[id] => 4082326
[patent_doc_number] => 06162587
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-12-19
[patent_title] => 'Thin resist with transition metal hard mask for via etch application'
[patent_app_type] => 1
[patent_app_number] => 9/203450
[patent_app_country] => US
[patent_app_date] => 1998-12-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
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[patent_no_of_words] => 6467
[patent_no_of_claims] => 14
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[pdf_file] => patents/06/162/06162587.pdf
[firstpage_image] =>[orig_patent_app_number] => 203450
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/203450 | Thin resist with transition metal hard mask for via etch application | Nov 30, 1998 | Issued |
Array
(
[id] => 4232742
[patent_doc_number] => 06165695
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-12-26
[patent_title] => 'Thin resist with amorphous silicon hard mask for via etch application'
[patent_app_type] => 1
[patent_app_number] => 9/203150
[patent_app_country] => US
[patent_app_date] => 1998-12-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 26
[patent_no_of_words] => 6263
[patent_no_of_claims] => 32
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/165/06165695.pdf
[firstpage_image] =>[orig_patent_app_number] => 203150
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/203150 | Thin resist with amorphous silicon hard mask for via etch application | Nov 30, 1998 | Issued |
Array
(
[id] => 4291335
[patent_doc_number] => 06183915
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-02-06
[patent_title] => 'Method of forming a phase shifting reticle'
[patent_app_type] => 1
[patent_app_number] => 9/200030
[patent_app_country] => US
[patent_app_date] => 1998-11-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/183/06183915.pdf
[firstpage_image] =>[orig_patent_app_number] => 200030
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/200030 | Method of forming a phase shifting reticle | Nov 24, 1998 | Issued |
Array
(
[id] => 6884811
[patent_doc_number] => 20010038972
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-11-08
[patent_title] => 'ULTRA-THIN RESIST SHALLOW TRENCH PROCESS USING METAL HARD MASK'
[patent_app_type] => new
[patent_app_number] => 09/197383
[patent_app_country] => US
[patent_app_date] => 1998-11-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 4717
[patent_no_of_claims] => 36
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0038/20010038972.pdf
[firstpage_image] =>[orig_patent_app_number] => 09197383
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/197383 | ULTRA-THIN RESIST SHALLOW TRENCH PROCESS USING METAL HARD MASK | Nov 19, 1998 | Abandoned |
Array
(
[id] => 4405565
[patent_doc_number] => 06238845
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-05-29
[patent_title] => 'Method of forming lead frames with preformation support'
[patent_app_type] => 1
[patent_app_number] => 9/191973
[patent_app_country] => US
[patent_app_date] => 1998-11-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/238/06238845.pdf
[firstpage_image] =>[orig_patent_app_number] => 191973
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/191973 | Method of forming lead frames with preformation support | Nov 12, 1998 | Issued |
Array
(
[id] => 4374787
[patent_doc_number] => 06303272
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-10-16
[patent_title] => 'Process for self-alignment of sub-critical contacts to wiring'
[patent_app_type] => 1
[patent_app_number] => 9/192140
[patent_app_country] => US
[patent_app_date] => 1998-11-13
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/303/06303272.pdf
[firstpage_image] =>[orig_patent_app_number] => 192140
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/192140 | Process for self-alignment of sub-critical contacts to wiring | Nov 12, 1998 | Issued |
Array
(
[id] => 4327072
[patent_doc_number] => 06312874
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-11-06
[patent_title] => 'Method for forming a dual damascene trench and underlying borderless via in low dielectric constant materials'
[patent_app_type] => 1
[patent_app_number] => 9/187232
[patent_app_country] => US
[patent_app_date] => 1998-11-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 25
[patent_no_of_words] => 4402
[patent_no_of_claims] => 16
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/312/06312874.pdf
[firstpage_image] =>[orig_patent_app_number] => 187232
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/187232 | Method for forming a dual damascene trench and underlying borderless via in low dielectric constant materials | Nov 5, 1998 | Issued |
| 09/181820 | PHOTOMASK AND EXPOSURE METHOD | Oct 28, 1998 | Abandoned |