
Saleha R. Mohamedulla
Examiner (ID: 15726)
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1756 |
| Total Applications | 359 |
| Issued Applications | 310 |
| Pending Applications | 19 |
| Abandoned Applications | 30 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 6724870
[patent_doc_number] => 20030207182
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-11-06
[patent_title] => 'Framed pellicle for protection of photolithographic photomask'
[patent_app_type] => new
[patent_app_number] => 10/419933
[patent_app_country] => US
[patent_app_date] => 2003-04-22
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0207/20030207182.pdf
[firstpage_image] =>[orig_patent_app_number] => 10419933
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/419933 | Framed pellicle for protection of photolithographic photomask | Apr 21, 2003 | Issued |
Array
(
[id] => 753832
[patent_doc_number] => 07018746
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-03-28
[patent_title] => 'Method of verifying the placement of sub-resolution assist features in a photomask layout'
[patent_app_type] => utility
[patent_app_number] => 10/249509
[patent_app_country] => US
[patent_app_date] => 2003-04-15
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[pdf_file] => patents/07/018/07018746.pdf
[firstpage_image] =>[orig_patent_app_number] => 10249509
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/249509 | Method of verifying the placement of sub-resolution assist features in a photomask layout | Apr 14, 2003 | Issued |
Array
(
[id] => 7397825
[patent_doc_number] => 20040023131
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[patent_kind] => A1
[patent_issue_date] => 2004-02-05
[patent_title] => 'Reticles in MEMS and IC processes'
[patent_app_type] => new
[patent_app_number] => 10/407938
[patent_app_country] => US
[patent_app_date] => 2003-04-07
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/407938 | Reticles in MEMS and IC processes | Apr 6, 2003 | Abandoned |
Array
(
[id] => 1098873
[patent_doc_number] => 06818361
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-11-16
[patent_title] => 'Photomasking'
[patent_app_type] => B2
[patent_app_number] => 10/389465
[patent_app_country] => US
[patent_app_date] => 2003-03-13
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 10389465
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/389465 | Photomasking | Mar 12, 2003 | Issued |
Array
(
[id] => 773019
[patent_doc_number] => 07001693
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[patent_issue_date] => 2006-02-21
[patent_title] => 'Binary OPC for assist feature layout optimization'
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[pdf_file] => patents/07/001/07001693.pdf
[firstpage_image] =>[orig_patent_app_number] => 10378575
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/378575 | Binary OPC for assist feature layout optimization | Feb 27, 2003 | Issued |
Array
(
[id] => 765804
[patent_doc_number] => 07008731
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-03-07
[patent_title] => 'Method of manufacturing a photomask and method of manufacturing a semiconductor device using the photomask'
[patent_app_type] => utility
[patent_app_number] => 10/374094
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[firstpage_image] =>[orig_patent_app_number] => 10374094
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/374094 | Method of manufacturing a photomask and method of manufacturing a semiconductor device using the photomask | Feb 26, 2003 | Issued |
Array
(
[id] => 6729947
[patent_doc_number] => 20030186137
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[patent_issue_date] => 2003-10-02
[patent_title] => 'Disposable hard mask for phase shift photomask plasma etching'
[patent_app_type] => new
[patent_app_number] => 10/370408
[patent_app_country] => US
[patent_app_date] => 2003-02-19
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[pdf_file] => publications/A1/0186/20030186137.pdf
[firstpage_image] =>[orig_patent_app_number] => 10370408
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/370408 | Disposable hard mask for phase shift photomask plasma etching | Feb 18, 2003 | Issued |
Array
(
[id] => 7427216
[patent_doc_number] => 20040161675
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[patent_issue_date] => 2004-08-19
[patent_title] => 'PHASE SHIFTING LITHOGRAPHIC PROCESS'
[patent_app_type] => new
[patent_app_number] => 10/248745
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[patent_app_date] => 2003-02-14
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[firstpage_image] =>[orig_patent_app_number] => 10248745
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/248745 | Phase shifting lithographic process | Feb 13, 2003 | Issued |
Array
(
[id] => 1223327
[patent_doc_number] => 06699639
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[patent_kind] => B2
[patent_issue_date] => 2004-03-02
[patent_title] => 'Projection-exposure methods and apparatus exhibiting increased throughput'
[patent_app_type] => B2
[patent_app_number] => 10/359524
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/359524 | Projection-exposure methods and apparatus exhibiting increased throughput | Feb 4, 2003 | Issued |
Array
(
[id] => 6851268
[patent_doc_number] => 20030143471
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-07-31
[patent_title] => 'Member for a mask film, process for producing a mask film using the member and process for producing a printing plate of a photosensitive resin using the mask'
[patent_app_type] => new
[patent_app_number] => 10/348560
[patent_app_country] => US
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/348560 | Member for a mask film, process for producing a mask film using the member and process for producing a printing plate of a photosensitive resin using the mask | Jan 20, 2003 | Issued |
Array
(
[id] => 1202411
[patent_doc_number] => 06720116
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2004-04-13
[patent_title] => 'Process flow and pellicle type for 157 nm mask making'
[patent_app_type] => B1
[patent_app_number] => 10/339186
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[patent_app_date] => 2003-01-09
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/339186 | Process flow and pellicle type for 157 nm mask making | Jan 8, 2003 | Issued |
Array
(
[id] => 765802
[patent_doc_number] => 07008730
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-03-07
[patent_title] => 'Application of high transmittance attenuating phase shifting mask with dark tone for sub-0.1 micrometer logic device contact hole pattern in 193 NM lithography'
[patent_app_type] => utility
[patent_app_number] => 10/338118
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/338118 | Application of high transmittance attenuating phase shifting mask with dark tone for sub-0.1 micrometer logic device contact hole pattern in 193 NM lithography | Jan 6, 2003 | Issued |
Array
(
[id] => 1196151
[patent_doc_number] => 06727029
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[patent_title] => 'Method for making reticles with reduced particle contamination and reticles formed'
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Array
(
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[patent_title] => 'Photomask and method of structuring a photoresist by double exposure with imaging auxiliary structures and different exposure tools'
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Array
(
[id] => 1053029
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[patent_title] => 'Method of generating large scale signal paths in a parallel processing system'
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Array
(
[id] => 6683056
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[patent_issue_date] => 2003-06-26
[patent_title] => 'Multi-tone photomask and method for manufacturing the same'
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Array
(
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[patent_title] => 'Mask set for use in phase shift photolithography technique which is suitable to form random patterns'
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Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/307850 | Method of forming a mask having nitride film | Dec 1, 2002 | Issued |
Array
(
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Array
(
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[firstpage_image] =>[orig_patent_app_number] => 10299692
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/299692 | Photo mask | Nov 19, 2002 | Issued |