
Saleha R. Mohamedulla
Examiner (ID: 15726)
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1756 |
| Total Applications | 359 |
| Issued Applications | 310 |
| Pending Applications | 19 |
| Abandoned Applications | 30 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 6860903
[patent_doc_number] => 20030091911
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-05-15
[patent_title] => 'Photolithography mask and method of fabricating a photolithography mask'
[patent_app_type] => new
[patent_app_number] => 10/295735
[patent_app_country] => US
[patent_app_date] => 2002-11-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 10
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0091/20030091911.pdf
[firstpage_image] =>[orig_patent_app_number] => 10295735
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/295735 | Photolithography mask and method of fabricating a photolithography mask | Nov 14, 2002 | Issued |
Array
(
[id] => 641582
[patent_doc_number] => 07122281
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-10-17
[patent_title] => 'Critical dimension control using full phase and trim masks'
[patent_app_type] => utility
[patent_app_number] => 10/295160
[patent_app_country] => US
[patent_app_date] => 2002-11-14
[patent_effective_date] => 0000-00-00
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/122/07122281.pdf
[firstpage_image] =>[orig_patent_app_number] => 10295160
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/295160 | Critical dimension control using full phase and trim masks | Nov 13, 2002 | Issued |
Array
(
[id] => 6817608
[patent_doc_number] => 20030068566
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-04-10
[patent_title] => 'Full phase shifting mask in damascene process'
[patent_app_type] => new
[patent_app_number] => 10/295575
[patent_app_country] => US
[patent_app_date] => 2002-11-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
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[patent_no_of_words] => 4523
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[pdf_file] => publications/A1/0068/20030068566.pdf
[firstpage_image] =>[orig_patent_app_number] => 10295575
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/295575 | Full phase shifting mask in damascene process | Nov 13, 2002 | Issued |
Array
(
[id] => 1212299
[patent_doc_number] => 06709793
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2004-03-23
[patent_title] => 'Method of manufacturing reticles using subresolution test patterns'
[patent_app_type] => B1
[patent_app_number] => 10/284836
[patent_app_country] => US
[patent_app_date] => 2002-10-31
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/709/06709793.pdf
[firstpage_image] =>[orig_patent_app_number] => 10284836
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/284836 | Method of manufacturing reticles using subresolution test patterns | Oct 30, 2002 | Issued |
Array
(
[id] => 6801014
[patent_doc_number] => 20030096178
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-05-22
[patent_title] => 'Pellicle and producing method of mask with pellicle'
[patent_app_type] => new
[patent_app_number] => 10/284364
[patent_app_country] => US
[patent_app_date] => 2002-10-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[pdf_file] => publications/A1/0096/20030096178.pdf
[firstpage_image] =>[orig_patent_app_number] => 10284364
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/284364 | Pellicle and producing method of mask with pellicle | Oct 30, 2002 | Issued |
Array
(
[id] => 6860901
[patent_doc_number] => 20030091909
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-05-15
[patent_title] => 'Phase shift mask and fabrication method therefor'
[patent_app_type] => new
[patent_app_number] => 10/283807
[patent_app_country] => US
[patent_app_date] => 2002-10-30
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[pdf_file] => publications/A1/0091/20030091909.pdf
[firstpage_image] =>[orig_patent_app_number] => 10283807
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/283807 | Phase shift mask and fabrication method therefor | Oct 29, 2002 | Abandoned |
Array
(
[id] => 768537
[patent_doc_number] => 07005215
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-02-28
[patent_title] => 'Mask repair using multiple exposures'
[patent_app_type] => utility
[patent_app_number] => 10/282483
[patent_app_country] => US
[patent_app_date] => 2002-10-28
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/07/005/07005215.pdf
[firstpage_image] =>[orig_patent_app_number] => 10282483
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/282483 | Mask repair using multiple exposures | Oct 27, 2002 | Issued |
Array
(
[id] => 7165800
[patent_doc_number] => 20040076890
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-04-22
[patent_title] => 'Method for fabricating phase mask of photolithography process'
[patent_app_type] => new
[patent_app_number] => 10/274896
[patent_app_country] => US
[patent_app_date] => 2002-10-22
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[pdf_file] => publications/A1/0076/20040076890.pdf
[firstpage_image] =>[orig_patent_app_number] => 10274896
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/274896 | Method for fabricating phase mask of photolithography process | Oct 21, 2002 | Issued |
Array
(
[id] => 6791820
[patent_doc_number] => 20030087164
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-05-08
[patent_title] => 'Novel reticle design for alternating phase shift mask'
[patent_app_type] => new
[patent_app_number] => 10/274030
[patent_app_country] => US
[patent_app_date] => 2002-10-21
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[pdf_file] => publications/A1/0087/20030087164.pdf
[firstpage_image] =>[orig_patent_app_number] => 10274030
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/274030 | Reticle design for alternating phase shift mask | Oct 20, 2002 | Issued |
Array
(
[id] => 985355
[patent_doc_number] => 06924083
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-08-02
[patent_title] => 'Mask layout and exposing method for reducing diffraction effects by using a single mask in the process of semiconductor production'
[patent_app_type] => utility
[patent_app_number] => 10/273267
[patent_app_country] => US
[patent_app_date] => 2002-10-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[pdf_file] => patents/06/924/06924083.pdf
[firstpage_image] =>[orig_patent_app_number] => 10273267
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/273267 | Mask layout and exposing method for reducing diffraction effects by using a single mask in the process of semiconductor production | Oct 17, 2002 | Issued |
Array
(
[id] => 7158231
[patent_doc_number] => 20040074868
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-04-22
[patent_title] => 'Tri-tone attenuated phase shift trim mask for double exposure alternating phase shift mask process'
[patent_app_type] => new
[patent_app_number] => 10/272627
[patent_app_country] => US
[patent_app_date] => 2002-10-17
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[pdf_file] => publications/A1/0074/20040074868.pdf
[firstpage_image] =>[orig_patent_app_number] => 10272627
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/272627 | Tri-tone attenuated phase shift trim mask for double exposure alternating phase shift mask process | Oct 16, 2002 | Issued |
Array
(
[id] => 6813460
[patent_doc_number] => 20030073010
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[patent_kind] => A1
[patent_issue_date] => 2003-04-17
[patent_title] => 'Photomask inspecting method'
[patent_app_type] => new
[patent_app_number] => 10/270246
[patent_app_country] => US
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[firstpage_image] =>[orig_patent_app_number] => 10270246
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/270246 | Photomask inspecting method | Oct 14, 2002 | Issued |
Array
(
[id] => 6692470
[patent_doc_number] => 20030039902
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-02-27
[patent_title] => 'Method of machining glass'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/272246 | Method of machining glass | Oct 14, 2002 | Issued |
Array
(
[id] => 7448012
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[patent_title] => 'Apparatus and method to improve the resolution of photolithography systems by improving the temperature stability of the reticle'
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[patent_app_number] => 10/265856
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[firstpage_image] =>[orig_patent_app_number] => 10265856
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/265856 | Apparatus and method to improve the resolution of photolithography systems by improving the temperature stability of the reticle | Oct 6, 2002 | Issued |
Array
(
[id] => 6657293
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[patent_title] => 'Method of fabricating a microstructure and photolithography trimming mask'
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Array
(
[id] => 1040436
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[patent_issue_date] => 2005-03-22
[patent_title] => 'Pellicle with anti-static/dissipative material coating to prevent electrostatic damage on masks'
[patent_app_type] => utility
[patent_app_number] => 10/261289
[patent_app_country] => US
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[firstpage_image] =>[orig_patent_app_number] => 10261289
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/261289 | Pellicle with anti-static/dissipative material coating to prevent electrostatic damage on masks | Sep 29, 2002 | Issued |
Array
(
[id] => 1241032
[patent_doc_number] => 06682873
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[patent_issue_date] => 2004-01-27
[patent_title] => 'Semiconductive substrate processing methods and methods of processing a semiconductive substrate'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/253550 | Semiconductive substrate processing methods and methods of processing a semiconductive substrate | Sep 22, 2002 | Issued |
Array
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Array
(
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Array
(
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[patent_title] => 'Methods for manufacturing reticles and reticle blanks exhibiting reduced warp and resist stress for use in charged-particle-beam microlithography'
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[firstpage_image] =>[orig_patent_app_number] => 10236779
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/236779 | Methods for manufacturing reticles and reticle blanks exhibiting reduced warp and resist stress for use in charged-particle-beam microlithography | Sep 5, 2002 | Abandoned |