Search

Saleha R. Mohamedulla

Examiner (ID: 15726)

Most Active Art Unit
1756
Art Unit(s)
1756
Total Applications
359
Issued Applications
310
Pending Applications
19
Abandoned Applications
30

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 6860903 [patent_doc_number] => 20030091911 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-05-15 [patent_title] => 'Photolithography mask and method of fabricating a photolithography mask' [patent_app_type] => new [patent_app_number] => 10/295735 [patent_app_country] => US [patent_app_date] => 2002-11-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 10 [patent_no_of_words] => 7114 [patent_no_of_claims] => 30 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 67 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0091/20030091911.pdf [firstpage_image] =>[orig_patent_app_number] => 10295735 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/295735
Photolithography mask and method of fabricating a photolithography mask Nov 14, 2002 Issued
Array ( [id] => 641582 [patent_doc_number] => 07122281 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2006-10-17 [patent_title] => 'Critical dimension control using full phase and trim masks' [patent_app_type] => utility [patent_app_number] => 10/295160 [patent_app_country] => US [patent_app_date] => 2002-11-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 22 [patent_no_of_words] => 4990 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 103 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/122/07122281.pdf [firstpage_image] =>[orig_patent_app_number] => 10295160 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/295160
Critical dimension control using full phase and trim masks Nov 13, 2002 Issued
Array ( [id] => 6817608 [patent_doc_number] => 20030068566 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-04-10 [patent_title] => 'Full phase shifting mask in damascene process' [patent_app_type] => new [patent_app_number] => 10/295575 [patent_app_country] => US [patent_app_date] => 2002-11-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 4523 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 46 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0068/20030068566.pdf [firstpage_image] =>[orig_patent_app_number] => 10295575 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/295575
Full phase shifting mask in damascene process Nov 13, 2002 Issued
Array ( [id] => 1212299 [patent_doc_number] => 06709793 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2004-03-23 [patent_title] => 'Method of manufacturing reticles using subresolution test patterns' [patent_app_type] => B1 [patent_app_number] => 10/284836 [patent_app_country] => US [patent_app_date] => 2002-10-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 1735 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 141 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/709/06709793.pdf [firstpage_image] =>[orig_patent_app_number] => 10284836 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/284836
Method of manufacturing reticles using subresolution test patterns Oct 30, 2002 Issued
Array ( [id] => 6801014 [patent_doc_number] => 20030096178 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-05-22 [patent_title] => 'Pellicle and producing method of mask with pellicle' [patent_app_type] => new [patent_app_number] => 10/284364 [patent_app_country] => US [patent_app_date] => 2002-10-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 4047 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 112 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0096/20030096178.pdf [firstpage_image] =>[orig_patent_app_number] => 10284364 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/284364
Pellicle and producing method of mask with pellicle Oct 30, 2002 Issued
Array ( [id] => 6860901 [patent_doc_number] => 20030091909 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-05-15 [patent_title] => 'Phase shift mask and fabrication method therefor' [patent_app_type] => new [patent_app_number] => 10/283807 [patent_app_country] => US [patent_app_date] => 2002-10-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 10 [patent_no_of_words] => 3020 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 83 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0091/20030091909.pdf [firstpage_image] =>[orig_patent_app_number] => 10283807 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/283807
Phase shift mask and fabrication method therefor Oct 29, 2002 Abandoned
Array ( [id] => 768537 [patent_doc_number] => 07005215 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2006-02-28 [patent_title] => 'Mask repair using multiple exposures' [patent_app_type] => utility [patent_app_number] => 10/282483 [patent_app_country] => US [patent_app_date] => 2002-10-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 15 [patent_no_of_words] => 4745 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 29 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/005/07005215.pdf [firstpage_image] =>[orig_patent_app_number] => 10282483 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/282483
Mask repair using multiple exposures Oct 27, 2002 Issued
Array ( [id] => 7165800 [patent_doc_number] => 20040076890 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-04-22 [patent_title] => 'Method for fabricating phase mask of photolithography process' [patent_app_type] => new [patent_app_number] => 10/274896 [patent_app_country] => US [patent_app_date] => 2002-10-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 2350 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 116 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0076/20040076890.pdf [firstpage_image] =>[orig_patent_app_number] => 10274896 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/274896
Method for fabricating phase mask of photolithography process Oct 21, 2002 Issued
Array ( [id] => 6791820 [patent_doc_number] => 20030087164 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-05-08 [patent_title] => 'Novel reticle design for alternating phase shift mask' [patent_app_type] => new [patent_app_number] => 10/274030 [patent_app_country] => US [patent_app_date] => 2002-10-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 2269 [patent_no_of_claims] => 33 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 63 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0087/20030087164.pdf [firstpage_image] =>[orig_patent_app_number] => 10274030 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/274030
Reticle design for alternating phase shift mask Oct 20, 2002 Issued
Array ( [id] => 985355 [patent_doc_number] => 06924083 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2005-08-02 [patent_title] => 'Mask layout and exposing method for reducing diffraction effects by using a single mask in the process of semiconductor production' [patent_app_type] => utility [patent_app_number] => 10/273267 [patent_app_country] => US [patent_app_date] => 2002-10-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 8 [patent_no_of_words] => 3502 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 159 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/924/06924083.pdf [firstpage_image] =>[orig_patent_app_number] => 10273267 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/273267
Mask layout and exposing method for reducing diffraction effects by using a single mask in the process of semiconductor production Oct 17, 2002 Issued
Array ( [id] => 7158231 [patent_doc_number] => 20040074868 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-04-22 [patent_title] => 'Tri-tone attenuated phase shift trim mask for double exposure alternating phase shift mask process' [patent_app_type] => new [patent_app_number] => 10/272627 [patent_app_country] => US [patent_app_date] => 2002-10-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 2123 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 52 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0074/20040074868.pdf [firstpage_image] =>[orig_patent_app_number] => 10272627 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/272627
Tri-tone attenuated phase shift trim mask for double exposure alternating phase shift mask process Oct 16, 2002 Issued
Array ( [id] => 6813460 [patent_doc_number] => 20030073010 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-04-17 [patent_title] => 'Photomask inspecting method' [patent_app_type] => new [patent_app_number] => 10/270246 [patent_app_country] => US [patent_app_date] => 2002-10-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 3218 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 147 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0073/20030073010.pdf [firstpage_image] =>[orig_patent_app_number] => 10270246 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/270246
Photomask inspecting method Oct 14, 2002 Issued
Array ( [id] => 6692470 [patent_doc_number] => 20030039902 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-02-27 [patent_title] => 'Method of machining glass' [patent_app_type] => new [patent_app_number] => 10/272246 [patent_app_country] => US [patent_app_date] => 2002-10-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 3469 [patent_no_of_claims] => 53 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 46 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0039/20030039902.pdf [firstpage_image] =>[orig_patent_app_number] => 10272246 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/272246
Method of machining glass Oct 14, 2002 Issued
Array ( [id] => 7448012 [patent_doc_number] => 20040067421 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-04-08 [patent_title] => 'Apparatus and method to improve the resolution of photolithography systems by improving the temperature stability of the reticle' [patent_app_type] => new [patent_app_number] => 10/265856 [patent_app_country] => US [patent_app_date] => 2002-10-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 3749 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 55 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0067/20040067421.pdf [firstpage_image] =>[orig_patent_app_number] => 10265856 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/265856
Apparatus and method to improve the resolution of photolithography systems by improving the temperature stability of the reticle Oct 6, 2002 Issued
Array ( [id] => 6657293 [patent_doc_number] => 20030077908 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-04-24 [patent_title] => 'Method of fabricating a microstructure and photolithography trimming mask' [patent_app_type] => new [patent_app_number] => 10/262117 [patent_app_country] => US [patent_app_date] => 2002-10-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 2364 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 38 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0077/20030077908.pdf [firstpage_image] =>[orig_patent_app_number] => 10262117 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/262117
Method of fabricating a microstructure and photolithography trimming mask Sep 30, 2002 Issued
Array ( [id] => 1040436 [patent_doc_number] => 06869733 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2005-03-22 [patent_title] => 'Pellicle with anti-static/dissipative material coating to prevent electrostatic damage on masks' [patent_app_type] => utility [patent_app_number] => 10/261289 [patent_app_country] => US [patent_app_date] => 2002-09-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 13 [patent_no_of_words] => 6091 [patent_no_of_claims] => 30 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 112 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/869/06869733.pdf [firstpage_image] =>[orig_patent_app_number] => 10261289 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/261289
Pellicle with anti-static/dissipative material coating to prevent electrostatic damage on masks Sep 29, 2002 Issued
Array ( [id] => 1241032 [patent_doc_number] => 06682873 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-01-27 [patent_title] => 'Semiconductive substrate processing methods and methods of processing a semiconductive substrate' [patent_app_type] => B2 [patent_app_number] => 10/253550 [patent_app_country] => US [patent_app_date] => 2002-09-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 14 [patent_no_of_words] => 4605 [patent_no_of_claims] => 35 [patent_no_of_ind_claims] => 11 [patent_words_short_claim] => 52 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/682/06682873.pdf [firstpage_image] =>[orig_patent_app_number] => 10253550 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/253550
Semiconductive substrate processing methods and methods of processing a semiconductive substrate Sep 22, 2002 Issued
Array ( [id] => 1049903 [patent_doc_number] => 06861180 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2005-03-01 [patent_title] => 'Contact printing as second exposure of double exposure attenuated phase shift mask process' [patent_app_type] => utility [patent_app_number] => 10/241675 [patent_app_country] => US [patent_app_date] => 2002-09-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 13 [patent_figures_cnt] => 37 [patent_no_of_words] => 3244 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 57 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/861/06861180.pdf [firstpage_image] =>[orig_patent_app_number] => 10241675 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/241675
Contact printing as second exposure of double exposure attenuated phase shift mask process Sep 9, 2002 Issued
Array ( [id] => 1073550 [patent_doc_number] => 06838214 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2005-01-04 [patent_title] => 'Method of fabrication of rim-type phase shift mask' [patent_app_type] => utility [patent_app_number] => 10/238268 [patent_app_country] => US [patent_app_date] => 2002-09-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 19 [patent_no_of_words] => 4509 [patent_no_of_claims] => 29 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 98 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/838/06838214.pdf [firstpage_image] =>[orig_patent_app_number] => 10238268 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/238268
Method of fabrication of rim-type phase shift mask Sep 9, 2002 Issued
Array ( [id] => 6778464 [patent_doc_number] => 20030049545 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-03-13 [patent_title] => 'Methods for manufacturing reticles and reticle blanks exhibiting reduced warp and resist stress for use in charged-particle-beam microlithography' [patent_app_type] => new [patent_app_number] => 10/236779 [patent_app_country] => US [patent_app_date] => 2002-09-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 6159 [patent_no_of_claims] => 41 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 50 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0049/20030049545.pdf [firstpage_image] =>[orig_patent_app_number] => 10236779 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/236779
Methods for manufacturing reticles and reticle blanks exhibiting reduced warp and resist stress for use in charged-particle-beam microlithography Sep 5, 2002 Abandoned
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