
Saleha R. Mohamedulla
Examiner (ID: 15726)
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1756 |
| Total Applications | 359 |
| Issued Applications | 310 |
| Pending Applications | 19 |
| Abandoned Applications | 30 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1171479
[patent_doc_number] => 06749974
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-06-15
[patent_title] => 'Disposable hard mask for photomask plasma etching'
[patent_app_type] => B2
[patent_app_number] => 10/234790
[patent_app_country] => US
[patent_app_date] => 2002-09-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 9
[patent_no_of_words] => 3173
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 185
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/749/06749974.pdf
[firstpage_image] =>[orig_patent_app_number] => 10234790
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/234790 | Disposable hard mask for photomask plasma etching | Sep 2, 2002 | Issued |
Array
(
[id] => 1085529
[patent_doc_number] => 06830873
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-12-14
[patent_title] => 'Method for adjusting and expposing the second level of a phase-shift mask'
[patent_app_type] => B2
[patent_app_number] => 10/233701
[patent_app_country] => US
[patent_app_date] => 2002-09-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 4
[patent_no_of_words] => 1770
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 180
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/830/06830873.pdf
[firstpage_image] =>[orig_patent_app_number] => 10233701
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/233701 | Method for adjusting and expposing the second level of a phase-shift mask | Sep 2, 2002 | Issued |
Array
(
[id] => 1104288
[patent_doc_number] => 06811934
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-11-02
[patent_title] => 'Field correction of overlay error'
[patent_app_type] => B2
[patent_app_number] => 10/228866
[patent_app_country] => US
[patent_app_date] => 2002-08-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 13
[patent_no_of_words] => 7130
[patent_no_of_claims] => 41
[patent_no_of_ind_claims] => 8
[patent_words_short_claim] => 147
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/811/06811934.pdf
[firstpage_image] =>[orig_patent_app_number] => 10228866
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/228866 | Field correction of overlay error | Aug 25, 2002 | Issued |
Array
(
[id] => 1014444
[patent_doc_number] => 06893786
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-05-17
[patent_title] => 'Field correction of overlay error'
[patent_app_type] => utility
[patent_app_number] => 10/228695
[patent_app_country] => US
[patent_app_date] => 2002-08-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 13
[patent_no_of_words] => 7140
[patent_no_of_claims] => 25
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 150
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/893/06893786.pdf
[firstpage_image] =>[orig_patent_app_number] => 10228695
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/228695 | Field correction of overlay error | Aug 25, 2002 | Issued |
Array
(
[id] => 6650146
[patent_doc_number] => 20030008221
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-01-09
[patent_title] => 'Photomask frame modification to eliminate process induced critical dimension control variation'
[patent_app_type] => new
[patent_app_number] => 10/222655
[patent_app_country] => US
[patent_app_date] => 2002-08-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 10
[patent_no_of_words] => 4719
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0008/20030008221.pdf
[firstpage_image] =>[orig_patent_app_number] => 10222655
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/222655 | Photomask frame modification to eliminate process induced critical dimension control variation | Aug 14, 2002 | Issued |
Array
(
[id] => 1085509
[patent_doc_number] => 06830853
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2004-12-14
[patent_title] => 'Chrome mask dry etching process to reduce loading effect and defects'
[patent_app_type] => B1
[patent_app_number] => 10/213609
[patent_app_country] => US
[patent_app_date] => 2002-08-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 12
[patent_no_of_words] => 2274
[patent_no_of_claims] => 20
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/830/06830853.pdf
[firstpage_image] =>[orig_patent_app_number] => 10213609
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/213609 | Chrome mask dry etching process to reduce loading effect and defects | Aug 6, 2002 | Issued |
Array
(
[id] => 6715711
[patent_doc_number] => 20030027059
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-02-06
[patent_title] => 'Method for producing a mask and method for fabricating a semiconductor device'
[patent_app_type] => new
[patent_app_number] => 10/210732
[patent_app_country] => US
[patent_app_date] => 2002-07-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 11
[patent_no_of_words] => 4361
[patent_no_of_claims] => 31
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 84
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0027/20030027059.pdf
[firstpage_image] =>[orig_patent_app_number] => 10210732
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/210732 | Method for producing a mask and method for fabricating a semiconductor device | Jul 30, 2002 | Abandoned |
Array
(
[id] => 6674086
[patent_doc_number] => 20030059689
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-03-27
[patent_title] => 'Method of producing a perforated mask for particle radiation'
[patent_app_type] => new
[patent_app_number] => 10/210011
[patent_app_country] => US
[patent_app_date] => 2002-07-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 6343
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 1
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[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0059/20030059689.pdf
[firstpage_image] =>[orig_patent_app_number] => 10210011
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/210011 | Method of producing a perforated mask for particle radiation | Jul 30, 2002 | Issued |
Array
(
[id] => 1073549
[patent_doc_number] => 06838213
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-01-04
[patent_title] => 'Process for fabricating a mask'
[patent_app_type] => utility
[patent_app_number] => 10/200233
[patent_app_country] => US
[patent_app_date] => 2002-07-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_no_of_words] => 2561
[patent_no_of_claims] => 17
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[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/838/06838213.pdf
[firstpage_image] =>[orig_patent_app_number] => 10200233
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/200233 | Process for fabricating a mask | Jul 22, 2002 | Issued |
Array
(
[id] => 1255801
[patent_doc_number] => 06667136
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-12-23
[patent_title] => 'Method to control nested to isolated line printing'
[patent_app_type] => B2
[patent_app_number] => 10/200912
[patent_app_country] => US
[patent_app_date] => 2002-07-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 5
[patent_no_of_words] => 2928
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 115
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/667/06667136.pdf
[firstpage_image] =>[orig_patent_app_number] => 10200912
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/200912 | Method to control nested to isolated line printing | Jul 21, 2002 | Issued |
Array
(
[id] => 6838665
[patent_doc_number] => 20030036005
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-02-20
[patent_title] => 'Method for producing a photomask and corresponding photomask'
[patent_app_type] => new
[patent_app_number] => 10/199193
[patent_app_country] => US
[patent_app_date] => 2002-07-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 1374
[patent_no_of_claims] => 8
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[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0036/20030036005.pdf
[firstpage_image] =>[orig_patent_app_number] => 10199193
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/199193 | Method for producing a photomask and corresponding photomask | Jul 18, 2002 | Issued |
Array
(
[id] => 1053026
[patent_doc_number] => 06858353
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-02-22
[patent_title] => 'Increased-contrast film for high-transmittance attenuated phase-shaft masks'
[patent_app_type] => utility
[patent_app_number] => 10/196974
[patent_app_country] => US
[patent_app_date] => 2002-07-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[patent_no_of_words] => 2480
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/858/06858353.pdf
[firstpage_image] =>[orig_patent_app_number] => 10196974
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/196974 | Increased-contrast film for high-transmittance attenuated phase-shaft masks | Jul 16, 2002 | Issued |
Array
(
[id] => 6404802
[patent_doc_number] => 20020182519
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-12-05
[patent_title] => 'Non absorbing reticle and method of making same'
[patent_app_type] => new
[patent_app_number] => 10/198332
[patent_app_country] => US
[patent_app_date] => 2002-07-17
[patent_effective_date] => 0000-00-00
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0182/20020182519.pdf
[firstpage_image] =>[orig_patent_app_number] => 10198332
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/198332 | Non absorbing reticle and method of making same | Jul 16, 2002 | Issued |
Array
(
[id] => 1245449
[patent_doc_number] => 06677088
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-01-13
[patent_title] => 'Photomask producing method and apparatus and device manufacturing method'
[patent_app_type] => B2
[patent_app_number] => 10/195425
[patent_app_country] => US
[patent_app_date] => 2002-07-16
[patent_effective_date] => 0000-00-00
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/677/06677088.pdf
[firstpage_image] =>[orig_patent_app_number] => 10195425
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/195425 | Photomask producing method and apparatus and device manufacturing method | Jul 15, 2002 | Issued |
Array
(
[id] => 1080344
[patent_doc_number] => 06835502
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-12-28
[patent_title] => 'In-situ pellicle monitor'
[patent_app_type] => B2
[patent_app_number] => 10/064442
[patent_app_country] => US
[patent_app_date] => 2002-07-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/835/06835502.pdf
[firstpage_image] =>[orig_patent_app_number] => 10064442
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/064442 | In-situ pellicle monitor | Jul 14, 2002 | Issued |
Array
(
[id] => 7442644
[patent_doc_number] => 20040009409
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-01-15
[patent_title] => 'Optical proximity correction method'
[patent_app_type] => new
[patent_app_number] => 10/064413
[patent_app_country] => US
[patent_app_date] => 2002-07-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0009/20040009409.pdf
[firstpage_image] =>[orig_patent_app_number] => 10064413
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/064413 | Optical proximity correction method | Jul 10, 2002 | Abandoned |
Array
(
[id] => 6524551
[patent_doc_number] => 20020192575
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-12-19
[patent_title] => 'Method for designing and making photolithographic reticle, reticle, and photolithographic process'
[patent_app_type] => new
[patent_app_number] => 10/188146
[patent_app_country] => US
[patent_app_date] => 2002-07-03
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0192/20020192575.pdf
[firstpage_image] =>[orig_patent_app_number] => 10188146
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/188146 | Method for designing and making photolithographic reticle, reticle, and photolithographic process | Jul 2, 2002 | Abandoned |
Array
(
[id] => 1049902
[patent_doc_number] => 06861179
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2005-03-01
[patent_title] => 'Charge effect and electrostatic damage prevention method on photo-mask'
[patent_app_type] => utility
[patent_app_number] => 10/187675
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[patent_app_date] => 2002-07-02
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/861/06861179.pdf
[firstpage_image] =>[orig_patent_app_number] => 10187675
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/187675 | Charge effect and electrostatic damage prevention method on photo-mask | Jul 1, 2002 | Issued |
Array
(
[id] => 1164052
[patent_doc_number] => 06756164
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-06-29
[patent_title] => 'Exposure mask with repaired dummy structure and method of repairing an exposure mask'
[patent_app_type] => B2
[patent_app_number] => 10/186113
[patent_app_country] => US
[patent_app_date] => 2002-06-28
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/756/06756164.pdf
[firstpage_image] =>[orig_patent_app_number] => 10186113
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/186113 | Exposure mask with repaired dummy structure and method of repairing an exposure mask | Jun 27, 2002 | Issued |
Array
(
[id] => 1071734
[patent_doc_number] => 06841316
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-01-11
[patent_title] => 'Method for producing a phase shift mask'
[patent_app_type] => utility
[patent_app_number] => 10/185281
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[patent_effective_date] => 0000-00-00
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[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/841/06841316.pdf
[firstpage_image] =>[orig_patent_app_number] => 10185281
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/185281 | Method for producing a phase shift mask | Jun 26, 2002 | Issued |