Search

Saleha R. Mohamedulla

Examiner (ID: 15726)

Most Active Art Unit
1756
Art Unit(s)
1756
Total Applications
359
Issued Applications
310
Pending Applications
19
Abandoned Applications
30

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 1140721 [patent_doc_number] => 06777167 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-08-17 [patent_title] => 'Method of producing an etch-resistant polymer structure using electron beam lithography' [patent_app_type] => B2 [patent_app_number] => 10/103643 [patent_app_country] => US [patent_app_date] => 2002-03-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 6 [patent_no_of_words] => 4153 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 122 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/777/06777167.pdf [firstpage_image] =>[orig_patent_app_number] => 10103643 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/103643
Method of producing an etch-resistant polymer structure using electron beam lithography Mar 19, 2002 Issued
Array ( [id] => 1148170 [patent_doc_number] => 06770403 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-08-03 [patent_title] => 'Mask for a photolithography process and method of fabricating the same' [patent_app_type] => B2 [patent_app_number] => 10/100031 [patent_app_country] => US [patent_app_date] => 2002-03-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 16 [patent_no_of_words] => 4768 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 78 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/770/06770403.pdf [firstpage_image] =>[orig_patent_app_number] => 10100031 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/100031
Mask for a photolithography process and method of fabricating the same Mar 18, 2002 Issued
Array ( [id] => 1082711 [patent_doc_number] => 06833222 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2004-12-21 [patent_title] => 'Method and apparatus for trimming a pellicle film using a laser' [patent_app_type] => B1 [patent_app_number] => 10/100348 [patent_app_country] => US [patent_app_date] => 2002-03-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 5 [patent_no_of_words] => 3475 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 68 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/833/06833222.pdf [firstpage_image] =>[orig_patent_app_number] => 10100348 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/100348
Method and apparatus for trimming a pellicle film using a laser Mar 17, 2002 Issued
Array ( [id] => 6755598 [patent_doc_number] => 20030003375 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-01-02 [patent_title] => 'Block mask making method, block mask and exposure apparatus' [patent_app_type] => new [patent_app_number] => 10/093803 [patent_app_country] => US [patent_app_date] => 2002-03-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 23 [patent_figures_cnt] => 23 [patent_no_of_words] => 5440 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 47 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0003/20030003375.pdf [firstpage_image] =>[orig_patent_app_number] => 10093803 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/093803
Block mask making method, block mask and exposure apparatus Mar 10, 2002 Issued
Array ( [id] => 6846581 [patent_doc_number] => 20030165748 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-09-04 [patent_title] => 'Pattern mask with features to minimize the effect of aberrations' [patent_app_type] => new [patent_app_number] => 10/090073 [patent_app_country] => US [patent_app_date] => 2002-03-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 2845 [patent_no_of_claims] => 60 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 68 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0165/20030165748.pdf [firstpage_image] =>[orig_patent_app_number] => 10090073 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/090073
Pattern mask with features to minimize the effect of aberrations Feb 28, 2002 Issued
Array ( [id] => 5858813 [patent_doc_number] => 20020122993 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-09-05 [patent_title] => 'Stencil reticles for charged-particle-beam microlithography, and fabrication methods for making same' [patent_app_type] => new [patent_app_number] => 10/085209 [patent_app_country] => US [patent_app_date] => 2002-02-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 5560 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 94 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0122/20020122993.pdf [firstpage_image] =>[orig_patent_app_number] => 10085209 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/085209
Stencil reticles for charged-particle-beam microlithography, and fabrication methods for making same Feb 25, 2002 Abandoned
Array ( [id] => 999435 [patent_doc_number] => 06911283 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2005-06-28 [patent_title] => 'Method and apparatus for coupling a pellicle to a photomask using a non-distorting mechanism' [patent_app_type] => utility [patent_app_number] => 10/072204 [patent_app_country] => US [patent_app_date] => 2002-02-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 6 [patent_no_of_words] => 5588 [patent_no_of_claims] => 32 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 60 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/911/06911283.pdf [firstpage_image] =>[orig_patent_app_number] => 10072204 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/072204
Method and apparatus for coupling a pellicle to a photomask using a non-distorting mechanism Feb 6, 2002 Issued
Array ( [id] => 1188698 [patent_doc_number] => 06733929 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-05-11 [patent_title] => 'Phase shift masking for complex patterns with proximity adjustments' [patent_app_type] => B2 [patent_app_number] => 10/068513 [patent_app_country] => US [patent_app_date] => 2002-02-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 27 [patent_figures_cnt] => 47 [patent_no_of_words] => 15306 [patent_no_of_claims] => 37 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 122 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/733/06733929.pdf [firstpage_image] =>[orig_patent_app_number] => 10068513 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/068513
Phase shift masking for complex patterns with proximity adjustments Feb 5, 2002 Issued
Array ( [id] => 6841730 [patent_doc_number] => 20030147077 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-08-07 [patent_title] => 'Mask alignment method' [patent_app_type] => new [patent_app_number] => 10/067703 [patent_app_country] => US [patent_app_date] => 2002-02-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 1693 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 37 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0147/20030147077.pdf [firstpage_image] =>[orig_patent_app_number] => 10067703 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/067703
Mask alignment method Feb 4, 2002 Abandoned
Array ( [id] => 1115030 [patent_doc_number] => 06800402 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-10-05 [patent_title] => 'Phase-shifting mask and method of forming pattern using the same' [patent_app_type] => B2 [patent_app_number] => 10/061283 [patent_app_country] => US [patent_app_date] => 2002-02-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 20 [patent_figures_cnt] => 20 [patent_no_of_words] => 10004 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 204 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/800/06800402.pdf [firstpage_image] =>[orig_patent_app_number] => 10061283 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/061283
Phase-shifting mask and method of forming pattern using the same Feb 3, 2002 Issued
Array ( [id] => 1071727 [patent_doc_number] => 06841309 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2005-01-11 [patent_title] => 'Damage resistant photomask construction' [patent_app_type] => utility [patent_app_number] => 10/044076 [patent_app_country] => US [patent_app_date] => 2002-01-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 19 [patent_no_of_words] => 3844 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 54 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/841/06841309.pdf [firstpage_image] =>[orig_patent_app_number] => 10044076 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/044076
Damage resistant photomask construction Jan 10, 2002 Issued
Array ( [id] => 6015463 [patent_doc_number] => 20020102476 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-08-01 [patent_title] => 'Method of manufacturing photomask and method of manufacturing semiconductor integrated circuit device' [patent_app_type] => new [patent_app_number] => 10/025457 [patent_app_country] => US [patent_app_date] => 2001-12-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 33 [patent_figures_cnt] => 33 [patent_no_of_words] => 16784 [patent_no_of_claims] => 32 [patent_no_of_ind_claims] => 8 [patent_words_short_claim] => 43 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0102/20020102476.pdf [firstpage_image] =>[orig_patent_app_number] => 10025457 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/025457
Method of manufacturing photomask and method of manufacturing semiconductor integrated circuit device Dec 25, 2001 Issued
Array ( [id] => 6524517 [patent_doc_number] => 20020192573 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-12-19 [patent_title] => 'Exposure mask, method for manufacturing the mask, and exposure method' [patent_app_type] => new [patent_app_number] => 10/168963 [patent_app_country] => US [patent_app_date] => 2002-06-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 27 [patent_figures_cnt] => 27 [patent_no_of_words] => 21836 [patent_no_of_claims] => 43 [patent_no_of_ind_claims] => 9 [patent_words_short_claim] => 49 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0192/20020192573.pdf [firstpage_image] =>[orig_patent_app_number] => 10168963 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/168963
Exposure mask, method for manufacturing the mask, and exposure method Dec 25, 2001 Issued
Array ( [id] => 6750174 [patent_doc_number] => 20030044694 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-03-06 [patent_title] => 'Method of fabricating an exposure mask for semiconductor manufacture' [patent_app_type] => new [patent_app_number] => 10/003287 [patent_app_country] => US [patent_app_date] => 2001-12-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 1587 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 172 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0044/20030044694.pdf [firstpage_image] =>[orig_patent_app_number] => 10003287 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/003287
Method of fabricating an exposure mask for semiconductor manufacture Dec 5, 2001 Issued
Array ( [id] => 5825790 [patent_doc_number] => 20020066870 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-06-06 [patent_title] => 'Mask for electron beam projection lithography and method of fabricating the same' [patent_app_type] => new [patent_app_number] => 09/996733 [patent_app_country] => US [patent_app_date] => 2001-11-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 2875 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 50 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0066/20020066870.pdf [firstpage_image] =>[orig_patent_app_number] => 09996733 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/996733
Mask for electron beam projection lithography and method of fabricating the same Nov 29, 2001 Abandoned
Array ( [id] => 985343 [patent_doc_number] => 06924071 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2005-08-02 [patent_title] => 'Photomask and method for reducing exposure times of high density patterns on the same' [patent_app_type] => utility [patent_app_number] => 09/996333 [patent_app_country] => US [patent_app_date] => 2001-11-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 9 [patent_no_of_words] => 6030 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 98 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/924/06924071.pdf [firstpage_image] =>[orig_patent_app_number] => 09996333 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/996333
Photomask and method for reducing exposure times of high density patterns on the same Nov 27, 2001 Issued
Array ( [id] => 985340 [patent_doc_number] => 06924068 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2005-08-02 [patent_title] => 'Photomask fabrication method, photomask, and exposure method thereof' [patent_app_type] => utility [patent_app_number] => 09/982305 [patent_app_country] => US [patent_app_date] => 2001-10-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 15 [patent_no_of_words] => 4996 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 30 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/924/06924068.pdf [firstpage_image] =>[orig_patent_app_number] => 09982305 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/982305
Photomask fabrication method, photomask, and exposure method thereof Oct 16, 2001 Issued
Array ( [id] => 5999609 [patent_doc_number] => 20020028396 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-03-07 [patent_title] => 'Pattern density tailoring for etching of advanced lithographic masks' [patent_app_type] => new [patent_app_number] => 09/981033 [patent_app_country] => US [patent_app_date] => 2001-10-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 3920 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 79 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0028/20020028396.pdf [firstpage_image] =>[orig_patent_app_number] => 09981033 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/981033
Pattern density tailoring for etching of advanced lithographic masks Oct 16, 2001 Issued
09/869121 Method and apparatus for producing mask Oct 14, 2001 Abandoned
Array ( [id] => 5873703 [patent_doc_number] => 20020048708 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-04-25 [patent_title] => 'Method of patterning sub-0.25lambda line features with high transmission, \"attenuated\" phase shift masks' [patent_app_type] => new [patent_app_number] => 09/976336 [patent_app_country] => US [patent_app_date] => 2001-10-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 6215 [patent_no_of_claims] => 32 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 109 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0048/20020048708.pdf [firstpage_image] =>[orig_patent_app_number] => 09976336 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/976336
Method of patterning sub-0.25 line features with high transmission, attenuated phase shift masks Oct 14, 2001 Issued
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