
Saleha R. Mohamedulla
Examiner (ID: 15726)
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1756 |
| Total Applications | 359 |
| Issued Applications | 310 |
| Pending Applications | 19 |
| Abandoned Applications | 30 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1140721
[patent_doc_number] => 06777167
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-08-17
[patent_title] => 'Method of producing an etch-resistant polymer structure using electron beam lithography'
[patent_app_type] => B2
[patent_app_number] => 10/103643
[patent_app_country] => US
[patent_app_date] => 2002-03-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 6
[patent_no_of_words] => 4153
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 122
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/777/06777167.pdf
[firstpage_image] =>[orig_patent_app_number] => 10103643
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/103643 | Method of producing an etch-resistant polymer structure using electron beam lithography | Mar 19, 2002 | Issued |
Array
(
[id] => 1148170
[patent_doc_number] => 06770403
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-08-03
[patent_title] => 'Mask for a photolithography process and method of fabricating the same'
[patent_app_type] => B2
[patent_app_number] => 10/100031
[patent_app_country] => US
[patent_app_date] => 2002-03-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 16
[patent_no_of_words] => 4768
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 78
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/770/06770403.pdf
[firstpage_image] =>[orig_patent_app_number] => 10100031
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/100031 | Mask for a photolithography process and method of fabricating the same | Mar 18, 2002 | Issued |
Array
(
[id] => 1082711
[patent_doc_number] => 06833222
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2004-12-21
[patent_title] => 'Method and apparatus for trimming a pellicle film using a laser'
[patent_app_type] => B1
[patent_app_number] => 10/100348
[patent_app_country] => US
[patent_app_date] => 2002-03-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 5
[patent_no_of_words] => 3475
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 68
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/833/06833222.pdf
[firstpage_image] =>[orig_patent_app_number] => 10100348
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/100348 | Method and apparatus for trimming a pellicle film using a laser | Mar 17, 2002 | Issued |
Array
(
[id] => 6755598
[patent_doc_number] => 20030003375
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-01-02
[patent_title] => 'Block mask making method, block mask and exposure apparatus'
[patent_app_type] => new
[patent_app_number] => 10/093803
[patent_app_country] => US
[patent_app_date] => 2002-03-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 23
[patent_figures_cnt] => 23
[patent_no_of_words] => 5440
[patent_no_of_claims] => 13
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[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0003/20030003375.pdf
[firstpage_image] =>[orig_patent_app_number] => 10093803
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/093803 | Block mask making method, block mask and exposure apparatus | Mar 10, 2002 | Issued |
Array
(
[id] => 6846581
[patent_doc_number] => 20030165748
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-09-04
[patent_title] => 'Pattern mask with features to minimize the effect of aberrations'
[patent_app_type] => new
[patent_app_number] => 10/090073
[patent_app_country] => US
[patent_app_date] => 2002-03-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 2845
[patent_no_of_claims] => 60
[patent_no_of_ind_claims] => 2
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0165/20030165748.pdf
[firstpage_image] =>[orig_patent_app_number] => 10090073
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/090073 | Pattern mask with features to minimize the effect of aberrations | Feb 28, 2002 | Issued |
Array
(
[id] => 5858813
[patent_doc_number] => 20020122993
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-09-05
[patent_title] => 'Stencil reticles for charged-particle-beam microlithography, and fabrication methods for making same'
[patent_app_type] => new
[patent_app_number] => 10/085209
[patent_app_country] => US
[patent_app_date] => 2002-02-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 5560
[patent_no_of_claims] => 20
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[patent_words_short_claim] => 94
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[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0122/20020122993.pdf
[firstpage_image] =>[orig_patent_app_number] => 10085209
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/085209 | Stencil reticles for charged-particle-beam microlithography, and fabrication methods for making same | Feb 25, 2002 | Abandoned |
Array
(
[id] => 999435
[patent_doc_number] => 06911283
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2005-06-28
[patent_title] => 'Method and apparatus for coupling a pellicle to a photomask using a non-distorting mechanism'
[patent_app_type] => utility
[patent_app_number] => 10/072204
[patent_app_country] => US
[patent_app_date] => 2002-02-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 6
[patent_no_of_words] => 5588
[patent_no_of_claims] => 32
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 60
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/911/06911283.pdf
[firstpage_image] =>[orig_patent_app_number] => 10072204
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/072204 | Method and apparatus for coupling a pellicle to a photomask using a non-distorting mechanism | Feb 6, 2002 | Issued |
Array
(
[id] => 1188698
[patent_doc_number] => 06733929
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-05-11
[patent_title] => 'Phase shift masking for complex patterns with proximity adjustments'
[patent_app_type] => B2
[patent_app_number] => 10/068513
[patent_app_country] => US
[patent_app_date] => 2002-02-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 27
[patent_figures_cnt] => 47
[patent_no_of_words] => 15306
[patent_no_of_claims] => 37
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[patent_maintenance] => 1
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/733/06733929.pdf
[firstpage_image] =>[orig_patent_app_number] => 10068513
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/068513 | Phase shift masking for complex patterns with proximity adjustments | Feb 5, 2002 | Issued |
Array
(
[id] => 6841730
[patent_doc_number] => 20030147077
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-08-07
[patent_title] => 'Mask alignment method'
[patent_app_type] => new
[patent_app_number] => 10/067703
[patent_app_country] => US
[patent_app_date] => 2002-02-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[patent_no_of_words] => 1693
[patent_no_of_claims] => 13
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0147/20030147077.pdf
[firstpage_image] =>[orig_patent_app_number] => 10067703
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/067703 | Mask alignment method | Feb 4, 2002 | Abandoned |
Array
(
[id] => 1115030
[patent_doc_number] => 06800402
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-10-05
[patent_title] => 'Phase-shifting mask and method of forming pattern using the same'
[patent_app_type] => B2
[patent_app_number] => 10/061283
[patent_app_country] => US
[patent_app_date] => 2002-02-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 20
[patent_figures_cnt] => 20
[patent_no_of_words] => 10004
[patent_no_of_claims] => 11
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/800/06800402.pdf
[firstpage_image] =>[orig_patent_app_number] => 10061283
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/061283 | Phase-shifting mask and method of forming pattern using the same | Feb 3, 2002 | Issued |
Array
(
[id] => 1071727
[patent_doc_number] => 06841309
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2005-01-11
[patent_title] => 'Damage resistant photomask construction'
[patent_app_type] => utility
[patent_app_number] => 10/044076
[patent_app_country] => US
[patent_app_date] => 2002-01-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[patent_no_of_words] => 3844
[patent_no_of_claims] => 22
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/841/06841309.pdf
[firstpage_image] =>[orig_patent_app_number] => 10044076
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/044076 | Damage resistant photomask construction | Jan 10, 2002 | Issued |
Array
(
[id] => 6015463
[patent_doc_number] => 20020102476
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-08-01
[patent_title] => 'Method of manufacturing photomask and method of manufacturing semiconductor integrated circuit device'
[patent_app_type] => new
[patent_app_number] => 10/025457
[patent_app_country] => US
[patent_app_date] => 2001-12-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 33
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0102/20020102476.pdf
[firstpage_image] =>[orig_patent_app_number] => 10025457
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/025457 | Method of manufacturing photomask and method of manufacturing semiconductor integrated circuit device | Dec 25, 2001 | Issued |
Array
(
[id] => 6524517
[patent_doc_number] => 20020192573
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-12-19
[patent_title] => 'Exposure mask, method for manufacturing the mask, and exposure method'
[patent_app_type] => new
[patent_app_number] => 10/168963
[patent_app_country] => US
[patent_app_date] => 2002-06-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 27
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0192/20020192573.pdf
[firstpage_image] =>[orig_patent_app_number] => 10168963
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/168963 | Exposure mask, method for manufacturing the mask, and exposure method | Dec 25, 2001 | Issued |
Array
(
[id] => 6750174
[patent_doc_number] => 20030044694
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-03-06
[patent_title] => 'Method of fabricating an exposure mask for semiconductor manufacture'
[patent_app_type] => new
[patent_app_number] => 10/003287
[patent_app_country] => US
[patent_app_date] => 2001-12-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[pdf_file] => publications/A1/0044/20030044694.pdf
[firstpage_image] =>[orig_patent_app_number] => 10003287
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/003287 | Method of fabricating an exposure mask for semiconductor manufacture | Dec 5, 2001 | Issued |
Array
(
[id] => 5825790
[patent_doc_number] => 20020066870
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-06-06
[patent_title] => 'Mask for electron beam projection lithography and method of fabricating the same'
[patent_app_type] => new
[patent_app_number] => 09/996733
[patent_app_country] => US
[patent_app_date] => 2001-11-30
[patent_effective_date] => 0000-00-00
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0066/20020066870.pdf
[firstpage_image] =>[orig_patent_app_number] => 09996733
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/996733 | Mask for electron beam projection lithography and method of fabricating the same | Nov 29, 2001 | Abandoned |
Array
(
[id] => 985343
[patent_doc_number] => 06924071
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2005-08-02
[patent_title] => 'Photomask and method for reducing exposure times of high density patterns on the same'
[patent_app_type] => utility
[patent_app_number] => 09/996333
[patent_app_country] => US
[patent_app_date] => 2001-11-28
[patent_effective_date] => 0000-00-00
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/924/06924071.pdf
[firstpage_image] =>[orig_patent_app_number] => 09996333
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/996333 | Photomask and method for reducing exposure times of high density patterns on the same | Nov 27, 2001 | Issued |
Array
(
[id] => 985340
[patent_doc_number] => 06924068
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-08-02
[patent_title] => 'Photomask fabrication method, photomask, and exposure method thereof'
[patent_app_type] => utility
[patent_app_number] => 09/982305
[patent_app_country] => US
[patent_app_date] => 2001-10-17
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[pdf_file] => patents/06/924/06924068.pdf
[firstpage_image] =>[orig_patent_app_number] => 09982305
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/982305 | Photomask fabrication method, photomask, and exposure method thereof | Oct 16, 2001 | Issued |
Array
(
[id] => 5999609
[patent_doc_number] => 20020028396
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[patent_kind] => A1
[patent_issue_date] => 2002-03-07
[patent_title] => 'Pattern density tailoring for etching of advanced lithographic masks'
[patent_app_type] => new
[patent_app_number] => 09/981033
[patent_app_country] => US
[patent_app_date] => 2001-10-17
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[pdf_file] => publications/A1/0028/20020028396.pdf
[firstpage_image] =>[orig_patent_app_number] => 09981033
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/981033 | Pattern density tailoring for etching of advanced lithographic masks | Oct 16, 2001 | Issued |
| 09/869121 | Method and apparatus for producing mask | Oct 14, 2001 | Abandoned |
Array
(
[id] => 5873703
[patent_doc_number] => 20020048708
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-04-25
[patent_title] => 'Method of patterning sub-0.25lambda line features with high transmission, \"attenuated\" phase shift masks'
[patent_app_type] => new
[patent_app_number] => 09/976336
[patent_app_country] => US
[patent_app_date] => 2001-10-15
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[pdf_file] => publications/A1/0048/20020048708.pdf
[firstpage_image] =>[orig_patent_app_number] => 09976336
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/976336 | Method of patterning sub-0.25 line features with high transmission, attenuated phase shift masks | Oct 14, 2001 | Issued |