Search

Saleha R. Mohamedulla

Examiner (ID: 15726)

Most Active Art Unit
1756
Art Unit(s)
1756
Total Applications
359
Issued Applications
310
Pending Applications
19
Abandoned Applications
30

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 1235243 [patent_doc_number] => 06689541 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2004-02-10 [patent_title] => 'Process for forming a photoresist mask' [patent_app_type] => B1 [patent_app_number] => 09/884182 [patent_app_country] => US [patent_app_date] => 2001-06-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 10 [patent_no_of_words] => 2735 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 95 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/689/06689541.pdf [firstpage_image] =>[orig_patent_app_number] => 09884182 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/884182
Process for forming a photoresist mask Jun 18, 2001 Issued
Array ( [id] => 7092767 [patent_doc_number] => 20010033979 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-10-25 [patent_title] => 'Methods of patterning radiation, methods of forming radiation-patterning tools, and radiation-patterning tools' [patent_app_type] => new [patent_app_number] => 09/884290 [patent_app_country] => US [patent_app_date] => 2001-06-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 3318 [patent_no_of_claims] => 68 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 73 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0033/20010033979.pdf [firstpage_image] =>[orig_patent_app_number] => 09884290 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/884290
Methods of patterning radiation, methods of forming radiation-patterning tools, and radiation-patterning tools Jun 17, 2001 Issued
09/830482 Method and apparatus for producing mask Jun 17, 2001 Abandoned
Array ( [id] => 1415997 [patent_doc_number] => 06514672 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-02-04 [patent_title] => 'Dry development process for a bi-layer resist system' [patent_app_type] => B2 [patent_app_number] => 09/877325 [patent_app_country] => US [patent_app_date] => 2001-06-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 8 [patent_no_of_words] => 1987 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 212 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/514/06514672.pdf [firstpage_image] =>[orig_patent_app_number] => 09877325 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/877325
Dry development process for a bi-layer resist system Jun 10, 2001 Issued
Array ( [id] => 6838664 [patent_doc_number] => 20030036004 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-02-20 [patent_title] => 'Transfer sheet for transferring protective layer for photographic emulsion face and photomask with protective layer' [patent_app_type] => new [patent_app_number] => 10/048397 [patent_app_country] => US [patent_app_date] => 2002-01-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8807 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 37 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0036/20030036004.pdf [firstpage_image] =>[orig_patent_app_number] => 10048397 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/048397
Transfer sheet for transferring protective layer for photographic emulsion face and photomask with protective layer May 31, 2001 Issued
Array ( [id] => 1062620 [patent_doc_number] => 06849363 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2005-02-01 [patent_title] => 'Method for repairing a photomask, method for inspecting a photomask, method for manufacturing a photomask, and method for manufacturing a semiconductor device' [patent_app_type] => utility [patent_app_number] => 09/870702 [patent_app_country] => US [patent_app_date] => 2001-06-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 13 [patent_figures_cnt] => 26 [patent_no_of_words] => 8948 [patent_no_of_claims] => 34 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 71 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/849/06849363.pdf [firstpage_image] =>[orig_patent_app_number] => 09870702 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/870702
Method for repairing a photomask, method for inspecting a photomask, method for manufacturing a photomask, and method for manufacturing a semiconductor device May 31, 2001 Issued
Array ( [id] => 6986750 [patent_doc_number] => 20010036582 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-11-01 [patent_title] => 'Overlay measuring pattern, photomask, and overlay measuring method and apparatus' [patent_app_type] => new [patent_app_number] => 09/866742 [patent_app_country] => US [patent_app_date] => 2001-05-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 5324 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 30 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0036/20010036582.pdf [firstpage_image] =>[orig_patent_app_number] => 09866742 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/866742
Overlay measuring pattern, photomask, and overlay measuring method and apparatus May 29, 2001 Abandoned
Array ( [id] => 7027966 [patent_doc_number] => 20010014426 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-08-16 [patent_title] => 'Mask forming methods and a field emission display emitter mask forming method' [patent_app_type] => new [patent_app_number] => 09/819165 [patent_app_country] => US [patent_app_date] => 2001-03-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 4537 [patent_no_of_claims] => 73 [patent_no_of_ind_claims] => 12 [patent_words_short_claim] => 20 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0014/20010014426.pdf [firstpage_image] =>[orig_patent_app_number] => 09819165 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/819165
Mask forming methods and a field emission display emitter mask forming method Mar 26, 2001 Issued
Array ( [id] => 1269346 [patent_doc_number] => 06653027 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-11-25 [patent_title] => 'Attenuated embedded phase shift photomask blanks' [patent_app_type] => B2 [patent_app_number] => 09/793646 [patent_app_country] => US [patent_app_date] => 2001-02-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 16 [patent_no_of_words] => 4213 [patent_no_of_claims] => 41 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 21 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/653/06653027.pdf [firstpage_image] =>[orig_patent_app_number] => 09793646 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/793646
Attenuated embedded phase shift photomask blanks Feb 25, 2001 Issued
Array ( [id] => 1339879 [patent_doc_number] => 06586159 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-07-01 [patent_title] => 'Method for using a coated fluoropolymer substrate pellicle in semiconductor fabrication' [patent_app_type] => B2 [patent_app_number] => 09/772774 [patent_app_country] => US [patent_app_date] => 2001-01-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 5 [patent_no_of_words] => 2782 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 62 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/586/06586159.pdf [firstpage_image] =>[orig_patent_app_number] => 09772774 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/772774
Method for using a coated fluoropolymer substrate pellicle in semiconductor fabrication Jan 29, 2001 Issued
Array ( [id] => 6908116 [patent_doc_number] => 20010010883 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-08-02 [patent_title] => 'Dust cover for use in semiconductor fabrication' [patent_app_type] => new [patent_app_number] => 09/772777 [patent_app_country] => US [patent_app_date] => 2001-01-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 2765 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 39 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0010/20010010883.pdf [firstpage_image] =>[orig_patent_app_number] => 09772777 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/772777
Dust cover for use in semiconductor fabrication Jan 29, 2001 Issued
Array ( [id] => 6015456 [patent_doc_number] => 20020102469 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-08-01 [patent_title] => 'Method for aligning a contact or a line to adjacent phase-shifter on a mask' [patent_app_type] => new [patent_app_number] => 09/770385 [patent_app_country] => US [patent_app_date] => 2001-01-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 11 [patent_no_of_words] => 3360 [patent_no_of_claims] => 44 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 21 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0102/20020102469.pdf [firstpage_image] =>[orig_patent_app_number] => 09770385 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/770385
Method for aligning a contact or a line to adjacent phase-shifter on a mask Jan 28, 2001 Issued
Array ( [id] => 6015457 [patent_doc_number] => 20020102470 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-08-01 [patent_title] => 'Information storage on masks for microlithographic tools' [patent_app_type] => new [patent_app_number] => 09/770732 [patent_app_country] => US [patent_app_date] => 2001-01-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 2624 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 35 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0102/20020102470.pdf [firstpage_image] =>[orig_patent_app_number] => 09770732 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/770732
Information storage on masks for microlithographic tools Jan 25, 2001 Issued
Array ( [id] => 5858807 [patent_doc_number] => 20020122989 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-09-05 [patent_title] => 'Method for fabricating reticles for EUV lithography without the use of a patterned absorber' [patent_app_type] => new [patent_app_number] => 09/752887 [patent_app_country] => US [patent_app_date] => 2000-12-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 3856 [patent_no_of_claims] => 33 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 55 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0122/20020122989.pdf [firstpage_image] =>[orig_patent_app_number] => 09752887 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/752887
Method for fabricating reticles for EUV lithography without the use of a patterned absorber Dec 27, 2000 Issued
Array ( [id] => 5921461 [patent_doc_number] => 20020114999 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-08-22 [patent_title] => 'Thin tantalum silicon composite film formation and annealing for use as electron projection scatterer' [patent_app_type] => new [patent_app_number] => 09/745576 [patent_app_country] => US [patent_app_date] => 2000-12-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 9372 [patent_no_of_claims] => 51 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 45 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0114/20020114999.pdf [firstpage_image] =>[orig_patent_app_number] => 09745576 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/745576
Thin tantalum silicon composite film formation and annealing for use as electron projection scatterer Dec 20, 2000 Issued
Array ( [id] => 1413545 [patent_doc_number] => 06517982 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-02-11 [patent_title] => 'Mask set for use in phase shift photolithography technique which is suitable to form random patterns, and method of exposure process using the same' [patent_app_type] => B2 [patent_app_number] => 09/741375 [patent_app_country] => US [patent_app_date] => 2000-12-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 16 [patent_figures_cnt] => 38 [patent_no_of_words] => 6338 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 158 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/517/06517982.pdf [firstpage_image] =>[orig_patent_app_number] => 09741375 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/741375
Mask set for use in phase shift photolithography technique which is suitable to form random patterns, and method of exposure process using the same Dec 20, 2000 Issued
Array ( [id] => 1352774 [patent_doc_number] => 06576404 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-06-10 [patent_title] => 'Carbon-doped hard mask and method of passivating structures during semiconductor device fabrication' [patent_app_type] => B2 [patent_app_number] => 09/741568 [patent_app_country] => US [patent_app_date] => 2000-12-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 9 [patent_no_of_words] => 3140 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 108 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/576/06576404.pdf [firstpage_image] =>[orig_patent_app_number] => 09741568 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/741568
Carbon-doped hard mask and method of passivating structures during semiconductor device fabrication Dec 18, 2000 Issued
Array ( [id] => 6880119 [patent_doc_number] => 20010031406 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-10-18 [patent_title] => 'Photomask and exposure method' [patent_app_type] => new [patent_app_number] => 09/737598 [patent_app_country] => US [patent_app_date] => 2000-12-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 6433 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 29 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0031/20010031406.pdf [firstpage_image] =>[orig_patent_app_number] => 09737598 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/737598
Photomask and exposure method Dec 17, 2000 Abandoned
Array ( [id] => 1269336 [patent_doc_number] => 06653025 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-11-25 [patent_title] => 'Mask producing method' [patent_app_type] => B2 [patent_app_number] => 09/736423 [patent_app_country] => US [patent_app_date] => 2000-12-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 21 [patent_figures_cnt] => 54 [patent_no_of_words] => 22410 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 122 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/653/06653025.pdf [firstpage_image] =>[orig_patent_app_number] => 09736423 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/736423
Mask producing method Dec 14, 2000 Issued
Array ( [id] => 7118384 [patent_doc_number] => 20010001694 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-05-24 [patent_title] => 'Semiconductive material stencil mask, methods of manufacturing stencil masks from semiconductive material, and methods for maintaining dimensions of openings in semiconductive materials stencil masks' [patent_app_type] => new-utility [patent_app_number] => 09/735431 [patent_app_country] => US [patent_app_date] => 2000-12-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 2634 [patent_no_of_claims] => 45 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 41 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0001/20010001694.pdf [firstpage_image] =>[orig_patent_app_number] => 09735431 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/735431
Semiconductive material stencil mask, methods of manufacturing stencil masks from semiconductive material, and methods for maintaining dimensions of openings in semiconductive materials stencil masks Dec 11, 2000 Issued
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