
Saleha R. Mohamedulla
Examiner (ID: 15726)
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1756 |
| Total Applications | 359 |
| Issued Applications | 310 |
| Pending Applications | 19 |
| Abandoned Applications | 30 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1239172
[patent_doc_number] => 06686098
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-02-03
[patent_title] => 'Lithography method and lithography mask'
[patent_app_type] => B2
[patent_app_number] => 09/729062
[patent_app_country] => US
[patent_app_date] => 2000-12-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 4
[patent_no_of_words] => 3102
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 30
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/686/06686098.pdf
[firstpage_image] =>[orig_patent_app_number] => 09729062
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/729062 | Lithography method and lithography mask | Dec 3, 2000 | Issued |
Array
(
[id] => 1399243
[patent_doc_number] => 06534244
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-03-18
[patent_title] => 'Apparatus and method for forming features on a substrate'
[patent_app_type] => B1
[patent_app_number] => 09/718580
[patent_app_country] => US
[patent_app_date] => 2000-11-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[patent_no_of_words] => 3691
[patent_no_of_claims] => 20
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[patent_maintenance] => 1
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/534/06534244.pdf
[firstpage_image] =>[orig_patent_app_number] => 09718580
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/718580 | Apparatus and method for forming features on a substrate | Nov 20, 2000 | Issued |
Array
(
[id] => 1286439
[patent_doc_number] => 06635390
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-10-21
[patent_title] => 'Method and system for reducing particulate contamination in a pellicle air space'
[patent_app_type] => B1
[patent_app_number] => 09/711037
[patent_app_country] => US
[patent_app_date] => 2000-11-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 3
[patent_no_of_words] => 1614
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[pdf_file] => patents/06/635/06635390.pdf
[firstpage_image] =>[orig_patent_app_number] => 09711037
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/711037 | Method and system for reducing particulate contamination in a pellicle air space | Nov 8, 2000 | Issued |
Array
(
[id] => 1286432
[patent_doc_number] => 06635389
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-10-21
[patent_title] => 'Method of defining and forming membrane regions in a substrate for stencil or membrane marks'
[patent_app_type] => B1
[patent_app_number] => 09/707303
[patent_app_country] => US
[patent_app_date] => 2000-11-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 20
[patent_no_of_words] => 2178
[patent_no_of_claims] => 39
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[pdf_file] => patents/06/635/06635389.pdf
[firstpage_image] =>[orig_patent_app_number] => 09707303
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/707303 | Method of defining and forming membrane regions in a substrate for stencil or membrane marks | Nov 6, 2000 | Issued |
Array
(
[id] => 1334421
[patent_doc_number] => 06593034
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-07-15
[patent_title] => 'Framed pellicle for protection of photolithographic photomask'
[patent_app_type] => B1
[patent_app_number] => 09/706757
[patent_app_country] => US
[patent_app_date] => 2000-11-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
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[pdf_file] => patents/06/593/06593034.pdf
[firstpage_image] =>[orig_patent_app_number] => 09706757
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/706757 | Framed pellicle for protection of photolithographic photomask | Nov 6, 2000 | Issued |
Array
(
[id] => 1506747
[patent_doc_number] => 06440640
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-08-27
[patent_title] => 'Thin resist with transition metal hard mask for via etch application'
[patent_app_type] => B1
[patent_app_number] => 09/703092
[patent_app_country] => US
[patent_app_date] => 2000-10-31
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/440/06440640.pdf
[firstpage_image] =>[orig_patent_app_number] => 09703092
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/703092 | Thin resist with transition metal hard mask for via etch application | Oct 30, 2000 | Issued |
Array
(
[id] => 1174196
[patent_doc_number] => 06746805
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2004-06-08
[patent_title] => 'Methods for fabricating lithography apparatus'
[patent_app_type] => B1
[patent_app_number] => 09/698706
[patent_app_country] => US
[patent_app_date] => 2000-10-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 17
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[patent_no_of_words] => 3930
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[pdf_file] => patents/06/746/06746805.pdf
[firstpage_image] =>[orig_patent_app_number] => 09698706
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/698706 | Methods for fabricating lithography apparatus | Oct 26, 2000 | Issued |
Array
(
[id] => 1176399
[patent_doc_number] => 06743571
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2004-06-01
[patent_title] => 'Mask for differential curing and process for making same'
[patent_app_type] => B1
[patent_app_number] => 09/695155
[patent_app_country] => US
[patent_app_date] => 2000-10-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 27
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[patent_no_of_words] => 31380
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[pdf_file] => patents/06/743/06743571.pdf
[firstpage_image] =>[orig_patent_app_number] => 09695155
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/695155 | Mask for differential curing and process for making same | Oct 23, 2000 | Issued |
Array
(
[id] => 1040454
[patent_doc_number] => 06869751
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2005-03-22
[patent_title] => 'Method of manufacturing metal electrode'
[patent_app_type] => utility
[patent_app_number] => 09/857721
[patent_app_country] => US
[patent_app_date] => 2000-10-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
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[pdf_file] => patents/06/869/06869751.pdf
[firstpage_image] =>[orig_patent_app_number] => 09857721
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/857721 | Method of manufacturing metal electrode | Oct 17, 2000 | Issued |
Array
(
[id] => 1325990
[patent_doc_number] => 06599665
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-07-29
[patent_title] => 'Method of making a semiconductor wafer imaging mask having uniform pattern features'
[patent_app_type] => B1
[patent_app_number] => 09/686099
[patent_app_country] => US
[patent_app_date] => 2000-10-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[patent_no_of_words] => 3738
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/599/06599665.pdf
[firstpage_image] =>[orig_patent_app_number] => 09686099
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/686099 | Method of making a semiconductor wafer imaging mask having uniform pattern features | Oct 9, 2000 | Issued |
Array
(
[id] => 1352376
[patent_doc_number] => 06576375
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-06-10
[patent_title] => 'Photomask'
[patent_app_type] => B1
[patent_app_number] => 09/671678
[patent_app_country] => US
[patent_app_date] => 2000-09-28
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/576/06576375.pdf
[firstpage_image] =>[orig_patent_app_number] => 09671678
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/671678 | Photomask | Sep 27, 2000 | Issued |
Array
(
[id] => 1359158
[patent_doc_number] => 06569576
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-05-27
[patent_title] => 'Reticle cover for preventing ESD damage'
[patent_app_type] => B1
[patent_app_number] => 09/672167
[patent_app_country] => US
[patent_app_date] => 2000-09-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[pdf_file] => patents/06/569/06569576.pdf
[firstpage_image] =>[orig_patent_app_number] => 09672167
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/672167 | Reticle cover for preventing ESD damage | Sep 26, 2000 | Issued |
Array
(
[id] => 1594620
[patent_doc_number] => 06492071
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-12-10
[patent_title] => 'Wafer scale encapsulation for integrated flip chip and surface mount technology assembly'
[patent_app_type] => B1
[patent_app_number] => 09/670410
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[patent_app_date] => 2000-09-26
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[pdf_file] => patents/06/492/06492071.pdf
[firstpage_image] =>[orig_patent_app_number] => 09670410
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/670410 | Wafer scale encapsulation for integrated flip chip and surface mount technology assembly | Sep 25, 2000 | Issued |
Array
(
[id] => 1439727
[patent_doc_number] => 06495297
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-12-17
[patent_title] => 'Type mask for combining off axis illumination and attenuating phase shifting mask patterns'
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[patent_app_number] => 09/666314
[patent_app_country] => US
[patent_app_date] => 2000-09-21
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[pdf_file] => patents/06/495/06495297.pdf
[firstpage_image] =>[orig_patent_app_number] => 09666314
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/666314 | Type mask for combining off axis illumination and attenuating phase shifting mask patterns | Sep 20, 2000 | Issued |
Array
(
[id] => 1283990
[patent_doc_number] => 06638670
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-10-28
[patent_title] => 'Exposure mask and exposure method using the same'
[patent_app_type] => B1
[patent_app_number] => 09/664030
[patent_app_country] => US
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[firstpage_image] =>[orig_patent_app_number] => 09664030
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/664030 | Exposure mask and exposure method using the same | Sep 18, 2000 | Issued |
Array
(
[id] => 1296522
[patent_doc_number] => 06627365
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-09-30
[patent_title] => 'Photomask and projection exposure apparatus'
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[patent_app_number] => 09/664056
[patent_app_country] => US
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[pdf_file] => patents/06/627/06627365.pdf
[firstpage_image] =>[orig_patent_app_number] => 09664056
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/664056 | Photomask and projection exposure apparatus | Sep 17, 2000 | Issued |
Array
(
[id] => 1276786
[patent_doc_number] => 06645677
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-11-11
[patent_title] => 'Dual layer reticle blank and manufacturing process'
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[patent_app_number] => 09/664288
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[patent_app_date] => 2000-09-18
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[pdf_file] => patents/06/645/06645677.pdf
[firstpage_image] =>[orig_patent_app_number] => 09664288
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/664288 | Dual layer reticle blank and manufacturing process | Sep 17, 2000 | Issued |
Array
(
[id] => 1373142
[patent_doc_number] => 06558853
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[patent_title] => 'Method for manufacturing exposure mask, exposure apparatus and semiconductor device'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/661553 | Method for manufacturing exposure mask, exposure apparatus and semiconductor device | Sep 13, 2000 | Issued |
Array
(
[id] => 1245486
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[patent_issue_date] => 2004-01-13
[patent_title] => 'Method for manufacturing semiconductor integrated circuit device, optical mask used therefor, method for manufacturing the same, and mask blanks used therefor'
[patent_app_type] => B1
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/646036 | Method for manufacturing semiconductor integrated circuit device, optical mask used therefor, method for manufacturing the same, and mask blanks used therefor | Sep 12, 2000 | Issued |
Array
(
[id] => 1287764
[patent_doc_number] => 06632575
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[patent_kind] => B1
[patent_issue_date] => 2003-10-14
[patent_title] => 'Precision fiducial'
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[firstpage_image] =>[orig_patent_app_number] => 09654107
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/654107 | Precision fiducial | Aug 30, 2000 | Issued |