
Shane M. Thomas
Examiner (ID: 18171, Phone: (571)272-4188 , Office: P/3903 )
| Most Active Art Unit | 3903 |
| Art Unit(s) | 3903, 2186 |
| Total Applications | 32076 |
| Issued Applications | 205 |
| Pending Applications | 30482 |
| Abandoned Applications | 61 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 15181511
[patent_doc_number] => 20190361347
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-11-28
[patent_title] => MONOMER, POLYMER, NEGATIVE RESIST COMPOSITION, PHOTOMASK BLANK, AND RESIST PATTERN FORMING PROCESS
[patent_app_type] => utility
[patent_app_number] => 16/417909
[patent_app_country] => US
[patent_app_date] => 2019-05-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 13963
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -11
[patent_words_short_claim] => 76
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16417909
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/417909 | Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming process | May 20, 2019 | Issued |
Array
(
[id] => 16438675
[patent_doc_number] => 20200356001
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-11-12
[patent_title] => PHOTORESIST COMPOSITIONS AND METHODS OF FORMING RESIST PATTERNS WITH SUCH COMPOSITIONS
[patent_app_type] => utility
[patent_app_number] => 16/409093
[patent_app_country] => US
[patent_app_date] => 2019-05-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 7796
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -12
[patent_words_short_claim] => 383
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16409093
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/409093 | PHOTORESIST COMPOSITIONS AND METHODS OF FORMING RESIST PATTERNS WITH SUCH COMPOSITIONS | May 9, 2019 | Abandoned |
Array
(
[id] => 19212083
[patent_doc_number] => 12001141
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2024-06-04
[patent_title] => Photopolymer composition
[patent_app_type] => utility
[patent_app_number] => 16/976206
[patent_app_country] => US
[patent_app_date] => 2019-04-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 10076
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 251
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16976206
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/976206 | Photopolymer composition | Apr 28, 2019 | Issued |
Array
(
[id] => 16659014
[patent_doc_number] => 20210055651
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2021-02-25
[patent_title] => OPTICAL COMPONENT FORMING COMPOSITION AND CURED PRODUCT THEREOF
[patent_app_type] => utility
[patent_app_number] => 17/050640
[patent_app_country] => US
[patent_app_date] => 2019-04-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 12946
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -11
[patent_words_short_claim] => 152
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17050640
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/050640 | OPTICAL COMPONENT FORMING COMPOSITION AND CURED PRODUCT THEREOF | Apr 25, 2019 | Abandoned |
Array
(
[id] => 16779734
[patent_doc_number] => 20210116813
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2021-04-22
[patent_title] => COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, UNDERLAYER FILM FOR LITHOGRAPHY, AND PATTERN FORMATION METHOD
[patent_app_type] => utility
[patent_app_number] => 17/050737
[patent_app_country] => US
[patent_app_date] => 2019-04-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 16733
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -16
[patent_words_short_claim] => 30
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17050737
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/050737 | COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, UNDERLAYER FILM FOR LITHOGRAPHY, AND PATTERN FORMATION METHOD | Apr 25, 2019 | Abandoned |
Array
(
[id] => 14651165
[patent_doc_number] => 20190232711
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-08-01
[patent_title] => PRINTING DIFFRACTION GRATINGS ON PAPER AND BOARD
[patent_app_type] => utility
[patent_app_number] => 16/376756
[patent_app_country] => US
[patent_app_date] => 2019-04-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 14134
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -20
[patent_words_short_claim] => 2
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16376756
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/376756 | Printing diffraction gratings on paper and board | Apr 4, 2019 | Issued |
Array
(
[id] => 16621655
[patent_doc_number] => 20210040308
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2021-02-11
[patent_title] => BLOCK COPOLYMER COMPOSITION FOR FLEXOGRAPHIC PLATE
[patent_app_type] => utility
[patent_app_number] => 16/981279
[patent_app_country] => US
[patent_app_date] => 2019-03-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 17985
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -7
[patent_words_short_claim] => 193
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16981279
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/981279 | Block copolymer composition for flexographic plate | Mar 18, 2019 | Issued |
Array
(
[id] => 16584438
[patent_doc_number] => 20210018840
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2021-01-21
[patent_title] => SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION WHICH CONTAINS PROTECTED PHENOLIC GROUP AND NITRIC ACID
[patent_app_type] => utility
[patent_app_number] => 16/981801
[patent_app_country] => US
[patent_app_date] => 2019-03-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 15087
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -11
[patent_words_short_claim] => 223
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16981801
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/981801 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION WHICH CONTAINS PROTECTED PHENOLIC GROUP AND NITRIC ACID | Mar 17, 2019 | Pending |
Array
(
[id] => 14572881
[patent_doc_number] => 20190214048
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-07-11
[patent_title] => OPTICAL INFORMATION STORAGE MEDIUM
[patent_app_type] => utility
[patent_app_number] => 16/351166
[patent_app_country] => US
[patent_app_date] => 2019-03-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 13111
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 131
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16351166
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/351166 | Optical information storage medium | Mar 11, 2019 | Issued |
Array
(
[id] => 14776251
[patent_doc_number] => 20190263023
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-08-29
[patent_title] => SYSTEM AND METHOD FOR CONSTRUCTING A ROLLER-TYPE NANOIMPRINT LITHOGRAPHY (RNIL) MASTER
[patent_app_type] => utility
[patent_app_number] => 16/286127
[patent_app_country] => US
[patent_app_date] => 2019-02-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6709
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -18
[patent_words_short_claim] => 90
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16286127
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/286127 | SYSTEM AND METHOD FOR CONSTRUCTING A ROLLER-TYPE NANOIMPRINT LITHOGRAPHY (RNIL) MASTER | Feb 25, 2019 | Abandoned |
Array
(
[id] => 16255144
[patent_doc_number] => 20200264518
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-08-20
[patent_title] => LARGE AREA HIGH RESOLUTION FEATURE REDUCTION LITHOGRAPHY TECHNIQUE
[patent_app_type] => utility
[patent_app_number] => 16/276860
[patent_app_country] => US
[patent_app_date] => 2019-02-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6341
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 152
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16276860
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/276860 | Large area high resolution feature reduction lithography technique | Feb 14, 2019 | Issued |
Array
(
[id] => 16524429
[patent_doc_number] => 20200398509
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-12-24
[patent_title] => Method for Producing an XUV and X-Ray Diffractive Optic
[patent_app_type] => utility
[patent_app_number] => 16/979121
[patent_app_country] => US
[patent_app_date] => 2019-02-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 11768
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -21
[patent_words_short_claim] => 2
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16979121
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/979121 | Method for Producing an XUV and X-Ray Diffractive Optic | Feb 14, 2019 | Pending |
Array
(
[id] => 18275743
[patent_doc_number] => 11614686
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2023-03-28
[patent_title] => Resist composition and patterning process
[patent_app_type] => utility
[patent_app_number] => 16/274416
[patent_app_country] => US
[patent_app_date] => 2019-02-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 11969
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 404
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16274416
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/274416 | Resist composition and patterning process | Feb 12, 2019 | Issued |
Array
(
[id] => 17698603
[patent_doc_number] => 11372324
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2022-06-28
[patent_title] => Method for correcting mask pattern and mask pattern thereof
[patent_app_type] => utility
[patent_app_number] => 16/272889
[patent_app_country] => US
[patent_app_date] => 2019-02-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 2870
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 252
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16272889
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/272889 | Method for correcting mask pattern and mask pattern thereof | Feb 10, 2019 | Issued |
Array
(
[id] => 14410513
[patent_doc_number] => 20190171100
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-06-06
[patent_title] => PHOTOSENSITIVE COMPOSITIONS, QUANTUM DOT POLYMER COMPOSITE PATTERN PREPARED THEREFROM, AND ELECTRONIC DEVICES INCLUDING THE SAME
[patent_app_type] => utility
[patent_app_number] => 16/268992
[patent_app_country] => US
[patent_app_date] => 2019-02-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 11601
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -18
[patent_words_short_claim] => 2
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16268992
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/268992 | Photosensitive compositions, quantum dot polymer composite pattern prepared therefrom, and electronic devices including the same | Feb 5, 2019 | Issued |
Array
(
[id] => 14745357
[patent_doc_number] => 20190255852
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-08-22
[patent_title] => MANUFACTURING METHOD OF LIQUID EJECTION HEAD
[patent_app_type] => utility
[patent_app_number] => 16/267660
[patent_app_country] => US
[patent_app_date] => 2019-02-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 7954
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -8
[patent_words_short_claim] => 217
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16267660
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/267660 | MANUFACTURING METHOD OF LIQUID EJECTION HEAD | Feb 4, 2019 | Abandoned |
Array
(
[id] => 17150879
[patent_doc_number] => 11143951
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2021-10-12
[patent_title] => Pellicle for an EUV lithography mask and a method of manufacturing thereof
[patent_app_type] => utility
[patent_app_number] => 16/266577
[patent_app_country] => US
[patent_app_date] => 2019-02-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 31
[patent_no_of_words] => 7804
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 78
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16266577
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/266577 | Pellicle for an EUV lithography mask and a method of manufacturing thereof | Feb 3, 2019 | Issued |
Array
(
[id] => 14749959
[patent_doc_number] => 20190258153
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-08-22
[patent_title] => METHOD FOR PROCESSING A MASK SUBSTRATE TO ENABLE BETTER FILM QUALITY
[patent_app_type] => utility
[patent_app_number] => 16/262102
[patent_app_country] => US
[patent_app_date] => 2019-01-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5497
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 46
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16262102
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/262102 | METHOD FOR PROCESSING A MASK SUBSTRATE TO ENABLE BETTER FILM QUALITY | Jan 29, 2019 | Pending |
Array
(
[id] => 14442709
[patent_doc_number] => 20190179227
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-06-13
[patent_title] => PHOTORESIST COMPOSITIONS, INTERMEDIATE PRODUCTS, AND METHODS OF MANUFACTURING PATTERNED DEVICES AND SEMICONDUCTOR DEVICES
[patent_app_type] => utility
[patent_app_number] => 16/256827
[patent_app_country] => US
[patent_app_date] => 2019-01-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 10312
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -11
[patent_words_short_claim] => 125
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16256827
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/256827 | Photoresist compositions, intermediate products, and methods of manufacturing patterned devices and semiconductor devices | Jan 23, 2019 | Issued |
Array
(
[id] => 15713955
[patent_doc_number] => 20200103744
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-04-02
[patent_title] => MASK FOR LITHOGRAPHY PROCESS AND METHOD FOR MANUFACTURING THE SAME
[patent_app_type] => utility
[patent_app_number] => 16/255654
[patent_app_country] => US
[patent_app_date] => 2019-01-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5912
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 60
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16255654
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/255654 | Mask for lithography process and method for manufacturing the same | Jan 22, 2019 | Issued |