Search

Shelley A. Dodson

Examiner (ID: 18442)

Most Active Art Unit
1616
Art Unit(s)
1711, 1621, 1616, 1503, 1207
Total Applications
1756
Issued Applications
1438
Pending Applications
134
Abandoned Applications
184

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 1276884 [patent_doc_number] => 06645692 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-11-11 [patent_title] => 'Photoresist composition' [patent_app_type] => B2 [patent_app_number] => 09/882049 [patent_app_country] => US [patent_app_date] => 2001-06-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4392 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 26 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/645/06645692.pdf [firstpage_image] =>[orig_patent_app_number] => 09882049 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/882049
Photoresist composition Jun 17, 2001 Issued
Array ( [id] => 1407491 [patent_doc_number] => 06534671 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-03-18 [patent_title] => 'Photocurable halofluorinated acrylates' [patent_app_type] => B2 [patent_app_number] => 09/880435 [patent_app_country] => US [patent_app_date] => 2001-06-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7650 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 117 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/534/06534671.pdf [firstpage_image] =>[orig_patent_app_number] => 09880435 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/880435
Photocurable halofluorinated acrylates Jun 12, 2001 Issued
Array ( [id] => 7065662 [patent_doc_number] => 20010044481 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-11-22 [patent_title] => 'New photocurable halofluorinated acrylates' [patent_app_type] => new [patent_app_number] => 09/880466 [patent_app_country] => US [patent_app_date] => 2001-06-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7726 [patent_no_of_claims] => 26 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 7 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0044/20010044481.pdf [firstpage_image] =>[orig_patent_app_number] => 09880466 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/880466
New photocurable halofluorinated acrylates Jun 12, 2001 Abandoned
Array ( [id] => 1417598 [patent_doc_number] => 06506537 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-01-14 [patent_title] => 'Radiation-sensitive resin composition' [patent_app_type] => B2 [patent_app_number] => 09/878274 [patent_app_country] => US [patent_app_date] => 2001-06-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10372 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 92 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/506/06506537.pdf [firstpage_image] =>[orig_patent_app_number] => 09878274 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/878274
Radiation-sensitive resin composition Jun 11, 2001 Issued
Array ( [id] => 1167421 [patent_doc_number] => 06753124 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-06-22 [patent_title] => 'Radiation-sensitive resin composition' [patent_app_type] => B2 [patent_app_number] => 09/874977 [patent_app_country] => US [patent_app_date] => 2001-06-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 16379 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 93 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/753/06753124.pdf [firstpage_image] =>[orig_patent_app_number] => 09874977 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/874977
Radiation-sensitive resin composition Jun 6, 2001 Issued
Array ( [id] => 1544624 [patent_doc_number] => 06444397 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-09-03 [patent_title] => 'Negative-working photoresist composition' [patent_app_type] => B1 [patent_app_number] => 09/865530 [patent_app_country] => US [patent_app_date] => 2001-05-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5798 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 27 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/444/06444397.pdf [firstpage_image] =>[orig_patent_app_number] => 09865530 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/865530
Negative-working photoresist composition May 28, 2001 Issued
Array ( [id] => 5951197 [patent_doc_number] => 20020006578 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-01-17 [patent_title] => 'Positive resist composition' [patent_app_type] => new [patent_app_number] => 09/860440 [patent_app_country] => US [patent_app_date] => 2001-05-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 15113 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 10 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0006/20020006578.pdf [firstpage_image] =>[orig_patent_app_number] => 09860440 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/860440
Positive resist composition May 20, 2001 Issued
Array ( [id] => 1179320 [patent_doc_number] => 06740467 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-05-25 [patent_title] => 'Photoresist compositions comprising blends of ionic and non-ionic photoacid generators' [patent_app_type] => B2 [patent_app_number] => 09/860938 [patent_app_country] => US [patent_app_date] => 2001-05-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7115 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 121 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/740/06740467.pdf [firstpage_image] =>[orig_patent_app_number] => 09860938 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/860938
Photoresist compositions comprising blends of ionic and non-ionic photoacid generators May 17, 2001 Issued
Array ( [id] => 6592364 [patent_doc_number] => 20020042022 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-04-11 [patent_title] => 'Alkylphenylbisacylphosphine oxides and photoinitiator mixtures' [patent_app_type] => new [patent_app_number] => 09/861433 [patent_app_country] => US [patent_app_date] => 2001-05-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 13257 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 7 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0042/20020042022.pdf [firstpage_image] =>[orig_patent_app_number] => 09861433 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/861433
Photoinitiator mixtures and compositions with alkylphenylbisacylphosphine oxides May 17, 2001 Issued
Array ( [id] => 1252965 [patent_doc_number] => 06670093 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-12-30 [patent_title] => 'Silicon-containing copolymer and photosensitive resin composition containing the same' [patent_app_type] => B2 [patent_app_number] => 09/858697 [patent_app_country] => US [patent_app_date] => 2001-05-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4496 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 217 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/670/06670093.pdf [firstpage_image] =>[orig_patent_app_number] => 09858697 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/858697
Silicon-containing copolymer and photosensitive resin composition containing the same May 15, 2001 Issued
Array ( [id] => 1417657 [patent_doc_number] => 06506540 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-01-14 [patent_title] => 'Photopolymerizable composition' [patent_app_type] => B2 [patent_app_number] => 09/855785 [patent_app_country] => US [patent_app_date] => 2001-05-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3949 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 134 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/506/06506540.pdf [firstpage_image] =>[orig_patent_app_number] => 09855785 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/855785
Photopolymerizable composition May 14, 2001 Issued
Array ( [id] => 6934382 [patent_doc_number] => 20010055726 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-12-27 [patent_title] => 'Positive radiation-sensitive composition' [patent_app_type] => new [patent_app_number] => 09/851113 [patent_app_country] => US [patent_app_date] => 2001-05-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 9413 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 56 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0055/20010055726.pdf [firstpage_image] =>[orig_patent_app_number] => 09851113 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/851113
Positive radiation-sensitive composition May 8, 2001 Issued
Array ( [id] => 5951201 [patent_doc_number] => 20020006582 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-01-17 [patent_title] => 'Chemical amplification type positive resist compositions and sulfonium salts' [patent_app_type] => new [patent_app_number] => 09/849523 [patent_app_country] => US [patent_app_date] => 2001-05-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8149 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 11 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0006/20020006582.pdf [firstpage_image] =>[orig_patent_app_number] => 09849523 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/849523
Chemical amplification type positive resist compositions and sulfonium salts May 6, 2001 Issued
Array ( [id] => 1399137 [patent_doc_number] => 06534239 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-03-18 [patent_title] => 'Resist compositions with polymers having pendant groups containing plural acid labile moieties' [patent_app_type] => B2 [patent_app_number] => 09/844848 [patent_app_country] => US [patent_app_date] => 2001-04-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5698 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 59 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/534/06534239.pdf [firstpage_image] =>[orig_patent_app_number] => 09844848 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/844848
Resist compositions with polymers having pendant groups containing plural acid labile moieties Apr 26, 2001 Issued
Array ( [id] => 6225671 [patent_doc_number] => 20020004569 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-01-10 [patent_title] => 'Polymer, chemically amplified resist composition and patterning process' [patent_app_type] => new [patent_app_number] => 09/842114 [patent_app_country] => US [patent_app_date] => 2001-04-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10691 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 12 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0004/20020004569.pdf [firstpage_image] =>[orig_patent_app_number] => 09842114 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/842114
Polymer, chemically amplified resist composition and patterning process Apr 25, 2001 Issued
Array ( [id] => 5999622 [patent_doc_number] => 20020028405 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-03-07 [patent_title] => 'Photoresist composition for resist flow process, and process for forming contact hole using the same' [patent_app_type] => new [patent_app_number] => 09/837394 [patent_app_country] => US [patent_app_date] => 2001-04-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 3237 [patent_no_of_claims] => 27 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 60 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0028/20020028405.pdf [firstpage_image] =>[orig_patent_app_number] => 09837394 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/837394
Photoresist composition for resist flow process, and process for forming contact hole using the same Apr 17, 2001 Issued
Array ( [id] => 1230877 [patent_doc_number] => 06692889 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2004-02-17 [patent_title] => 'Photoresist polymeric compound and photoresist resin composition' [patent_app_type] => B1 [patent_app_number] => 09/806857 [patent_app_country] => US [patent_app_date] => 2001-04-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 38089 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 251 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/692/06692889.pdf [firstpage_image] =>[orig_patent_app_number] => 09806857 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/806857
Photoresist polymeric compound and photoresist resin composition Apr 4, 2001 Issued
Array ( [id] => 1345844 [patent_doc_number] => 06579659 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-06-17 [patent_title] => 'Chemically amplified positive resist composition' [patent_app_type] => B2 [patent_app_number] => 09/824227 [patent_app_country] => US [patent_app_date] => 2001-04-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7292 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 258 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/579/06579659.pdf [firstpage_image] =>[orig_patent_app_number] => 09824227 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/824227
Chemically amplified positive resist composition Apr 2, 2001 Issued
Array ( [id] => 6782868 [patent_doc_number] => 20030064315 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-04-03 [patent_title] => 'Reactive photo acid-generating agent and heat-resistant photoresist composition with polyamide precursor' [patent_app_type] => new [patent_app_number] => 09/817273 [patent_app_country] => US [patent_app_date] => 2001-03-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7166 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 12 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0064/20030064315.pdf [firstpage_image] =>[orig_patent_app_number] => 09817273 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/817273
Reactive photo acid-generating agent and heat-resistant photoresist composition with polyamide precursor Mar 26, 2001 Issued
Array ( [id] => 1390769 [patent_doc_number] => 06541179 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-04-01 [patent_title] => 'Resist compositions and patterning process' [patent_app_type] => B2 [patent_app_number] => 09/811695 [patent_app_country] => US [patent_app_date] => 2001-03-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 11400 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 101 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/541/06541179.pdf [firstpage_image] =>[orig_patent_app_number] => 09811695 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/811695
Resist compositions and patterning process Mar 19, 2001 Issued
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