Search

Shelley A. Dodson

Examiner (ID: 18442)

Most Active Art Unit
1616
Art Unit(s)
1711, 1621, 1616, 1503, 1207
Total Applications
1756
Issued Applications
1438
Pending Applications
134
Abandoned Applications
184

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 1502893 [patent_doc_number] => 06465150 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-10-15 [patent_title] => 'Radiation-sensitive resin composition' [patent_app_type] => B1 [patent_app_number] => 09/686930 [patent_app_country] => US [patent_app_date] => 2000-10-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 11510 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 254 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/465/06465150.pdf [firstpage_image] =>[orig_patent_app_number] => 09686930 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/686930
Radiation-sensitive resin composition Oct 11, 2000 Issued
Array ( [id] => 7964563 [patent_doc_number] => 06680157 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2004-01-20 [patent_title] => 'Resist methods and materials for UV and electron-beam lithography with reduced outgassing' [patent_app_type] => B1 [patent_app_number] => 09/687189 [patent_app_country] => US [patent_app_date] => 2000-10-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 11294 [patent_no_of_claims] => 46 [patent_no_of_ind_claims] => 9 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/680/06680157.pdf [firstpage_image] =>[orig_patent_app_number] => 09687189 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/687189
Resist methods and materials for UV and electron-beam lithography with reduced outgassing Oct 11, 2000 Issued
Array ( [id] => 1376469 [patent_doc_number] => 06555287 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-04-29 [patent_title] => 'Non-subliming, difunctionalized ultraviolet dyes for use in anti-reflective coatings' [patent_app_type] => B1 [patent_app_number] => 09/684999 [patent_app_country] => US [patent_app_date] => 2000-10-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 1973 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 45 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/555/06555287.pdf [firstpage_image] =>[orig_patent_app_number] => 09684999 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/684999
Non-subliming, difunctionalized ultraviolet dyes for use in anti-reflective coatings Oct 9, 2000 Issued
Array ( [id] => 1323119 [patent_doc_number] => 06602646 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-08-05 [patent_title] => 'Positive-working resist composition' [patent_app_type] => B1 [patent_app_number] => 09/684888 [patent_app_country] => US [patent_app_date] => 2000-10-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 23026 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 286 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/602/06602646.pdf [firstpage_image] =>[orig_patent_app_number] => 09684888 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/684888
Positive-working resist composition Oct 5, 2000 Issued
Array ( [id] => 1489727 [patent_doc_number] => 06416928 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-07-09 [patent_title] => 'Onium salts, photoacid generators, resist compositions, and patterning process' [patent_app_type] => B1 [patent_app_number] => 09/680491 [patent_app_country] => US [patent_app_date] => 2000-10-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 19289 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 21 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/416/06416928.pdf [firstpage_image] =>[orig_patent_app_number] => 09680491 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/680491
Onium salts, photoacid generators, resist compositions, and patterning process Oct 4, 2000 Issued
Array ( [id] => 1439746 [patent_doc_number] => 06495305 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-12-17 [patent_title] => 'Halogenated anti-reflective coatings' [patent_app_type] => B1 [patent_app_number] => 09/679661 [patent_app_country] => US [patent_app_date] => 2000-10-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6399 [patent_no_of_claims] => 44 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 101 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/495/06495305.pdf [firstpage_image] =>[orig_patent_app_number] => 09679661 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/679661
Halogenated anti-reflective coatings Oct 3, 2000 Issued
Array ( [id] => 1489724 [patent_doc_number] => 06416927 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-07-09 [patent_title] => 'Chemically amplified resist compositions' [patent_app_type] => B1 [patent_app_number] => 09/675500 [patent_app_country] => US [patent_app_date] => 2000-09-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 4 [patent_no_of_words] => 2938 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 41 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/416/06416927.pdf [firstpage_image] =>[orig_patent_app_number] => 09675500 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/675500
Chemically amplified resist compositions Sep 28, 2000 Issued
Array ( [id] => 1473809 [patent_doc_number] => 06387590 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-05-14 [patent_title] => 'Positive photoresist composition' [patent_app_type] => B1 [patent_app_number] => 09/671177 [patent_app_country] => US [patent_app_date] => 2000-09-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 21190 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 57 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/387/06387590.pdf [firstpage_image] =>[orig_patent_app_number] => 09671177 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/671177
Positive photoresist composition Sep 27, 2000 Issued
Array ( [id] => 1531666 [patent_doc_number] => 06410204 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-06-25 [patent_title] => 'Positive photoresist composition' [patent_app_type] => B1 [patent_app_number] => 09/669907 [patent_app_country] => US [patent_app_date] => 2000-09-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 11834 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 78 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/410/06410204.pdf [firstpage_image] =>[orig_patent_app_number] => 09669907 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/669907
Positive photoresist composition Sep 26, 2000 Issued
Array ( [id] => 7640461 [patent_doc_number] => 06395451 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-05-28 [patent_title] => 'Photoresist composition containing photo base generator with photo acid generator' [patent_app_type] => B1 [patent_app_number] => 09/666932 [patent_app_country] => US [patent_app_date] => 2000-09-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 7 [patent_no_of_words] => 2506 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 5 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/395/06395451.pdf [firstpage_image] =>[orig_patent_app_number] => 09666932 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/666932
Photoresist composition containing photo base generator with photo acid generator Sep 20, 2000 Issued
Array ( [id] => 1373467 [patent_doc_number] => 06558871 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-05-06 [patent_title] => 'Photocurable composition containing iodonium salt compound' [patent_app_type] => B1 [patent_app_number] => 09/646700 [patent_app_country] => US [patent_app_date] => 2000-09-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10754 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 289 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/558/06558871.pdf [firstpage_image] =>[orig_patent_app_number] => 09646700 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/646700
Photocurable composition containing iodonium salt compound Sep 18, 2000 Issued
Array ( [id] => 1514164 [patent_doc_number] => 06420085 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-07-16 [patent_title] => 'Resist compositions and patterning process' [patent_app_type] => B1 [patent_app_number] => 09/663830 [patent_app_country] => US [patent_app_date] => 2000-09-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10782 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 551 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/420/06420085.pdf [firstpage_image] =>[orig_patent_app_number] => 09663830 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/663830
Resist compositions and patterning process Sep 14, 2000 Issued
Array ( [id] => 1409559 [patent_doc_number] => 06524770 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-02-25 [patent_title] => 'Hexaaryl biimidazole compounds as photoinitiators, photosensitive composition and method of manufacturing patterns using the compounds' [patent_app_type] => B1 [patent_app_number] => 09/663370 [patent_app_country] => US [patent_app_date] => 2000-09-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 9135 [patent_no_of_claims] => 34 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 35 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/524/06524770.pdf [firstpage_image] =>[orig_patent_app_number] => 09663370 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/663370
Hexaaryl biimidazole compounds as photoinitiators, photosensitive composition and method of manufacturing patterns using the compounds Sep 14, 2000 Issued
Array ( [id] => 1588216 [patent_doc_number] => 06482568 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-11-19 [patent_title] => 'Radiation-sensitive resin composition' [patent_app_type] => B1 [patent_app_number] => 09/662160 [patent_app_country] => US [patent_app_date] => 2000-09-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 19880 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 318 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/482/06482568.pdf [firstpage_image] =>[orig_patent_app_number] => 09662160 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/662160
Radiation-sensitive resin composition Sep 13, 2000 Issued
Array ( [id] => 1477352 [patent_doc_number] => 06451501 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-09-17 [patent_title] => 'Acid sensitive copolymer, resist composition and resist pattern forming method' [patent_app_type] => B1 [patent_app_number] => 09/661027 [patent_app_country] => US [patent_app_date] => 2000-09-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7839 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 44 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/451/06451501.pdf [firstpage_image] =>[orig_patent_app_number] => 09661027 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/661027
Acid sensitive copolymer, resist composition and resist pattern forming method Sep 12, 2000 Issued
Array ( [id] => 4341343 [patent_doc_number] => 06284430 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-09-04 [patent_title] => 'Positive-working chemical-amplification photoresist composition and method for forming a resist pattern using the same' [patent_app_type] => 1 [patent_app_number] => 9/657228 [patent_app_country] => US [patent_app_date] => 2000-09-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4641 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 187 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/284/06284430.pdf [firstpage_image] =>[orig_patent_app_number] => 657228 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/657228
Positive-working chemical-amplification photoresist composition and method for forming a resist pattern using the same Sep 6, 2000 Issued
Array ( [id] => 1417547 [patent_doc_number] => 06506534 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-01-14 [patent_title] => 'Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices' [patent_app_type] => B1 [patent_app_number] => 09/654433 [patent_app_country] => US [patent_app_date] => 2000-09-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 15 [patent_no_of_words] => 30755 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 56 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/506/06506534.pdf [firstpage_image] =>[orig_patent_app_number] => 09654433 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/654433
Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices Aug 31, 2000 Issued
Array ( [id] => 1477297 [patent_doc_number] => 06344305 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-02-05 [patent_title] => 'Radiation sensitive silicon-containing resists' [patent_app_type] => B1 [patent_app_number] => 09/654350 [patent_app_country] => US [patent_app_date] => 2000-09-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4976 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 99 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/344/06344305.pdf [firstpage_image] =>[orig_patent_app_number] => 09654350 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/654350
Radiation sensitive silicon-containing resists Aug 31, 2000 Issued
Array ( [id] => 4324743 [patent_doc_number] => 06319651 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-11-20 [patent_title] => 'Acid sensitive ARC and method of use' [patent_app_type] => 1 [patent_app_number] => 9/650007 [patent_app_country] => US [patent_app_date] => 2000-08-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 8046 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 40 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/319/06319651.pdf [firstpage_image] =>[orig_patent_app_number] => 650007 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/650007
Acid sensitive ARC and method of use Aug 27, 2000 Issued
Array ( [id] => 1588212 [patent_doc_number] => 06482567 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-11-19 [patent_title] => 'Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same' [patent_app_type] => B1 [patent_app_number] => 09/645198 [patent_app_country] => US [patent_app_date] => 2000-08-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6100 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 8 [patent_words_short_claim] => 24 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/482/06482567.pdf [firstpage_image] =>[orig_patent_app_number] => 09645198 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/645198
Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same Aug 24, 2000 Issued
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