Search

Shelley A. Dodson

Examiner (ID: 18442)

Most Active Art Unit
1616
Art Unit(s)
1711, 1621, 1616, 1503, 1207
Total Applications
1756
Issued Applications
1438
Pending Applications
134
Abandoned Applications
184

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 1260993 [patent_doc_number] => 06664022 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-12-16 [patent_title] => 'Photoacid generators and photoresists comprising same' [patent_app_type] => B1 [patent_app_number] => 09/648022 [patent_app_country] => US [patent_app_date] => 2000-08-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8268 [patent_no_of_claims] => 26 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 28 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/664/06664022.pdf [firstpage_image] =>[orig_patent_app_number] => 09648022 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/648022
Photoacid generators and photoresists comprising same Aug 24, 2000 Issued
Array ( [id] => 1494222 [patent_doc_number] => 06403281 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-06-11 [patent_title] => 'Cross-linker monomer comprising double bond and photoresist copolymer containing the same' [patent_app_type] => B1 [patent_app_number] => 09/643460 [patent_app_country] => US [patent_app_date] => 2000-08-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 3823 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 90 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/403/06403281.pdf [firstpage_image] =>[orig_patent_app_number] => 09643460 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/643460
Cross-linker monomer comprising double bond and photoresist copolymer containing the same Aug 21, 2000 Issued
Array ( [id] => 1469394 [patent_doc_number] => 06406829 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-06-18 [patent_title] => 'Negative-working photoresist composition' [patent_app_type] => B1 [patent_app_number] => 09/638872 [patent_app_country] => US [patent_app_date] => 2000-08-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6215 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 150 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/406/06406829.pdf [firstpage_image] =>[orig_patent_app_number] => 09638872 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/638872
Negative-working photoresist composition Aug 14, 2000 Issued
Array ( [id] => 1506727 [patent_doc_number] => 06440634 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-08-27 [patent_title] => 'Onium salts, photoacid generators for resist compositions, resist compositions, and patterning process' [patent_app_type] => B1 [patent_app_number] => 09/637363 [patent_app_country] => US [patent_app_date] => 2000-08-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 23062 [patent_no_of_claims] => 33 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 171 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/440/06440634.pdf [firstpage_image] =>[orig_patent_app_number] => 09637363 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/637363
Onium salts, photoacid generators for resist compositions, resist compositions, and patterning process Aug 14, 2000 Issued
Array ( [id] => 1413787 [patent_doc_number] => 06511783 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-01-28 [patent_title] => 'Negative resist composition' [patent_app_type] => B1 [patent_app_number] => 09/636811 [patent_app_country] => US [patent_app_date] => 2000-08-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7450 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 310 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/511/06511783.pdf [firstpage_image] =>[orig_patent_app_number] => 09636811 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/636811
Negative resist composition Aug 9, 2000 Issued
Array ( [id] => 1477369 [patent_doc_number] => 06451505 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-09-17 [patent_title] => 'Imageable element and method of preparation thereof' [patent_app_type] => B1 [patent_app_number] => 09/633029 [patent_app_country] => US [patent_app_date] => 2000-08-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8164 [patent_no_of_claims] => 36 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 72 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/451/06451505.pdf [firstpage_image] =>[orig_patent_app_number] => 09633029 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/633029
Imageable element and method of preparation thereof Aug 3, 2000 Issued
Array ( [id] => 1489721 [patent_doc_number] => 06416926 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-07-09 [patent_title] => 'Thiabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the same' [patent_app_type] => B1 [patent_app_number] => 09/630818 [patent_app_country] => US [patent_app_date] => 2000-08-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6811 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 60 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/416/06416926.pdf [firstpage_image] =>[orig_patent_app_number] => 09630818 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/630818
Thiabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the same Aug 1, 2000 Issued
Array ( [id] => 1511840 [patent_doc_number] => 06472120 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-10-29 [patent_title] => 'Photosensitive polymer and chemically amplified photoresist composition containing the same' [patent_app_type] => B1 [patent_app_number] => 09/628499 [patent_app_country] => US [patent_app_date] => 2000-07-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7216 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 105 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/472/06472120.pdf [firstpage_image] =>[orig_patent_app_number] => 09628499 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/628499
Photosensitive polymer and chemically amplified photoresist composition containing the same Jul 27, 2000 Issued
Array ( [id] => 1458328 [patent_doc_number] => 06426171 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-07-30 [patent_title] => 'Photoresist monomer, polymer thereof and photoresist composition containing it' [patent_app_type] => B1 [patent_app_number] => 09/627714 [patent_app_country] => US [patent_app_date] => 2000-07-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7099 [patent_no_of_claims] => 26 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 131 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/426/06426171.pdf [firstpage_image] =>[orig_patent_app_number] => 09627714 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/627714
Photoresist monomer, polymer thereof and photoresist composition containing it Jul 27, 2000 Issued
Array ( [id] => 1446290 [patent_doc_number] => 06368771 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-04-09 [patent_title] => 'Photoresist polymers and photoresist compositions containing the same' [patent_app_type] => B1 [patent_app_number] => 09/627627 [patent_app_country] => US [patent_app_date] => 2000-07-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 5 [patent_no_of_words] => 3377 [patent_no_of_claims] => 27 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 152 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/368/06368771.pdf [firstpage_image] =>[orig_patent_app_number] => 09627627 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/627627
Photoresist polymers and photoresist compositions containing the same Jul 27, 2000 Issued
Array ( [id] => 1602431 [patent_doc_number] => 06432609 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-08-13 [patent_title] => 'Photoacid generators, photoresists containing the same, and method of undergoing a photoacid-catalyzed reaction in a resin system using the same' [patent_app_type] => B1 [patent_app_number] => 09/621632 [patent_app_country] => US [patent_app_date] => 2000-07-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 2 [patent_no_of_words] => 4753 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 59 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/432/06432609.pdf [firstpage_image] =>[orig_patent_app_number] => 09621632 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/621632
Photoacid generators, photoresists containing the same, and method of undergoing a photoacid-catalyzed reaction in a resin system using the same Jul 20, 2000 Issued
Array ( [id] => 1446288 [patent_doc_number] => 06368770 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-04-09 [patent_title] => 'Photoresist monomers, polymers thereof, and photoresist compositions containing the same' [patent_app_type] => B1 [patent_app_number] => 09/621125 [patent_app_country] => US [patent_app_date] => 2000-07-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4527 [patent_no_of_claims] => 31 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 93 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/368/06368770.pdf [firstpage_image] =>[orig_patent_app_number] => 09621125 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/621125
Photoresist monomers, polymers thereof, and photoresist compositions containing the same Jul 20, 2000 Issued
Array ( [id] => 1580642 [patent_doc_number] => 06423471 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-07-23 [patent_title] => 'Photosensitive composition and method of making lithographic printing plate' [patent_app_type] => B1 [patent_app_number] => 09/620990 [patent_app_country] => US [patent_app_date] => 2000-07-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 18662 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 51 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/423/06423471.pdf [firstpage_image] =>[orig_patent_app_number] => 09620990 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/620990
Photosensitive composition and method of making lithographic printing plate Jul 19, 2000 Issued
Array ( [id] => 1577426 [patent_doc_number] => 06447980 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-09-10 [patent_title] => 'Photoresist composition for deep UV and process thereof' [patent_app_type] => B1 [patent_app_number] => 09/619336 [patent_app_country] => US [patent_app_date] => 2000-07-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6654 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 56 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/447/06447980.pdf [firstpage_image] =>[orig_patent_app_number] => 09619336 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/619336
Photoresist composition for deep UV and process thereof Jul 18, 2000 Issued
Array ( [id] => 1021169 [patent_doc_number] => 06887646 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2005-05-03 [patent_title] => 'Chemical amplification resist composition' [patent_app_type] => utility [patent_app_number] => 10/030430 [patent_app_country] => US [patent_app_date] => 2000-07-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6645 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 63 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/887/06887646.pdf [firstpage_image] =>[orig_patent_app_number] => 10030430 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/030430
Chemical amplification resist composition Jul 10, 2000 Issued
Array ( [id] => 1584743 [patent_doc_number] => 06358665 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-03-19 [patent_title] => 'Radiation-sensitive composition of chemical amplification type' [patent_app_type] => B1 [patent_app_number] => 09/529371 [patent_app_country] => US [patent_app_date] => 2000-07-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 38649 [patent_no_of_claims] => 42 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 15 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/358/06358665.pdf [firstpage_image] =>[orig_patent_app_number] => 09529371 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/529371
Radiation-sensitive composition of chemical amplification type Jul 2, 2000 Issued
Array ( [id] => 1413679 [patent_doc_number] => 06517991 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-02-11 [patent_title] => 'Positive photosensitive composition' [patent_app_type] => B1 [patent_app_number] => 09/606681 [patent_app_country] => US [patent_app_date] => 2000-06-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 22282 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 488 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/517/06517991.pdf [firstpage_image] =>[orig_patent_app_number] => 09606681 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/606681
Positive photosensitive composition Jun 29, 2000 Issued
Array ( [id] => 4307740 [patent_doc_number] => 06316159 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-11-13 [patent_title] => 'Chemical amplified photoresist composition' [patent_app_type] => 1 [patent_app_number] => 9/608604 [patent_app_country] => US [patent_app_date] => 2000-06-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3613 [patent_no_of_claims] => 28 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 26 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/316/06316159.pdf [firstpage_image] =>[orig_patent_app_number] => 608604 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/608604
Chemical amplified photoresist composition Jun 29, 2000 Issued
Array ( [id] => 4379268 [patent_doc_number] => 06294309 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-09-25 [patent_title] => 'Positive photoresist composition containing alicyclic dissolution inhibitors' [patent_app_type] => 1 [patent_app_number] => 9/607943 [patent_app_country] => US [patent_app_date] => 2000-06-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3048 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 108 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/294/06294309.pdf [firstpage_image] =>[orig_patent_app_number] => 607943 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/607943
Positive photoresist composition containing alicyclic dissolution inhibitors Jun 29, 2000 Issued
Array ( [id] => 1593667 [patent_doc_number] => 06383715 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-05-07 [patent_title] => 'Strongly water-soluble photoacid generator resist compositions' [patent_app_type] => B1 [patent_app_number] => 09/605571 [patent_app_country] => US [patent_app_date] => 2000-06-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 1495 [patent_no_of_claims] => 2 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 48 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/383/06383715.pdf [firstpage_image] =>[orig_patent_app_number] => 09605571 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/605571
Strongly water-soluble photoacid generator resist compositions Jun 27, 2000 Issued
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