| Application number | Title of the application | Filing Date | Status |
|---|
Array
(
[id] => 10117170
[patent_doc_number] => 09152051
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2015-10-06
[patent_title] => 'Antireflective coating composition and process thereof'
[patent_app_type] => utility
[patent_app_number] => 13/917022
[patent_app_country] => US
[patent_app_date] => 2013-06-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 9302
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 69
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13917022
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/917022 | Antireflective coating composition and process thereof | Jun 12, 2013 | Issued |
Array
(
[id] => 9565449
[patent_doc_number] => 20140183162
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2014-07-03
[patent_title] => 'PHOTORESIST COMPOSITION AND METHOD FOR FORMING A METAL PATTERN'
[patent_app_type] => utility
[patent_app_number] => 13/911984
[patent_app_country] => US
[patent_app_date] => 2013-06-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 7101
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13911984
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/911984 | Photoresist composition and method for forming a metal pattern | Jun 5, 2013 | Issued |
Array
(
[id] => 10157084
[patent_doc_number] => 09188857
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2015-11-17
[patent_title] => 'Resist polymer, process for production thereof, resist composition, and process for production of substrates with patterns thereon'
[patent_app_type] => utility
[patent_app_number] => 13/899921
[patent_app_country] => US
[patent_app_date] => 2013-05-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 22334
[patent_no_of_claims] => 1
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 46
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13899921
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/899921 | Resist polymer, process for production thereof, resist composition, and process for production of substrates with patterns thereon | May 21, 2013 | Issued |
Array
(
[id] => 9174301
[patent_doc_number] => 20130316285
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2013-11-28
[patent_title] => 'RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND AND METHOD OF PRODUCING POLYMERIC COMPOUND'
[patent_app_type] => utility
[patent_app_number] => 13/899170
[patent_app_country] => US
[patent_app_date] => 2013-05-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 25564
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13899170
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/899170 | Resist composition, method of forming resist pattern, polymeric compound and method of producing polymeric compound | May 20, 2013 | Issued |
Array
(
[id] => 9869034
[patent_doc_number] => 08956805
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2015-02-17
[patent_title] => 'Polymers, methods of use thereof, and methods of decomposition thereof'
[patent_app_type] => utility
[patent_app_number] => 13/888563
[patent_app_country] => US
[patent_app_date] => 2013-05-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 15
[patent_figures_cnt] => 40
[patent_no_of_words] => 9986
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 70
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13888563
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/888563 | Polymers, methods of use thereof, and methods of decomposition thereof | May 6, 2013 | Issued |
Array
(
[id] => 10589075
[patent_doc_number] => 09310683
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2016-04-12
[patent_title] => 'Monomer, polymer, positive resist composition and patterning process'
[patent_app_type] => utility
[patent_app_number] => 13/856017
[patent_app_country] => US
[patent_app_date] => 2013-04-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 13248
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 18
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13856017
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/856017 | Monomer, polymer, positive resist composition and patterning process | Apr 2, 2013 | Issued |
Array
(
[id] => 9823765
[patent_doc_number] => 08933251
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2015-01-13
[patent_title] => 'Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process'
[patent_app_type] => utility
[patent_app_number] => 13/847667
[patent_app_country] => US
[patent_app_date] => 2013-03-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 34363
[patent_no_of_claims] => 2
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 13
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13847667
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/847667 | Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process | Mar 19, 2013 | Issued |
Array
(
[id] => 10416438
[patent_doc_number] => 20150301448
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2015-10-22
[patent_title] => 'MONOMER, HARD MASK COMPOSITION COMPRISING SAID MONOMER, AND METHOD FOR FORMING PATTERN USING SAID HARD MASK COMPOSITION'
[patent_app_type] => utility
[patent_app_number] => 14/441294
[patent_app_country] => US
[patent_app_date] => 2013-03-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4249
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14441294
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/441294 | Monomer, hard mask composition comprising said monomer, and method for forming pattern using said hard mask composition | Mar 18, 2013 | Issued |
Array
(
[id] => 9245041
[patent_doc_number] => 08609321
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2013-12-17
[patent_title] => 'Radiation-sensitive resin composition, polymer and compound'
[patent_app_type] => utility
[patent_app_number] => 13/789701
[patent_app_country] => US
[patent_app_date] => 2013-03-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 12352
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 8
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13789701
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/789701 | Radiation-sensitive resin composition, polymer and compound | Mar 7, 2013 | Issued |
Array
(
[id] => 9607943
[patent_doc_number] => 08785106
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2014-07-22
[patent_title] => 'Resist composition and method of forming resist pattern'
[patent_app_type] => utility
[patent_app_number] => 13/772658
[patent_app_country] => US
[patent_app_date] => 2013-02-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 43713
[patent_no_of_claims] => 3
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 53
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13772658
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/772658 | Resist composition and method of forming resist pattern | Feb 20, 2013 | Issued |
Array
(
[id] => 9869387
[patent_doc_number] => 08957160
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2015-02-17
[patent_title] => 'Preparation of polymer, resulting polymer, resist composition, and patterning process'
[patent_app_type] => utility
[patent_app_number] => 13/768861
[patent_app_country] => US
[patent_app_date] => 2013-02-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 15092
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 55
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13768861
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/768861 | Preparation of polymer, resulting polymer, resist composition, and patterning process | Feb 14, 2013 | Issued |
Array
(
[id] => 10876011
[patent_doc_number] => 08900796
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2014-12-02
[patent_title] => 'Acid generator, chemically amplified resist composition, and patterning process'
[patent_app_type] => utility
[patent_app_number] => 13/768377
[patent_app_country] => US
[patent_app_date] => 2013-02-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 14
[patent_figures_cnt] => 14
[patent_no_of_words] => 16197
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 23
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13768377
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/768377 | Acid generator, chemically amplified resist composition, and patterning process | Feb 14, 2013 | Issued |
Array
(
[id] => 9950841
[patent_doc_number] => 08999625
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2015-04-07
[patent_title] => 'Silicon-containing antireflective coatings including non-polymeric silsesquioxanes'
[patent_app_type] => utility
[patent_app_number] => 13/767114
[patent_app_country] => US
[patent_app_date] => 2013-02-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 9
[patent_no_of_words] => 6052
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 67
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13767114
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/767114 | Silicon-containing antireflective coatings including non-polymeric silsesquioxanes | Feb 13, 2013 | Issued |
Array
(
[id] => 10850745
[patent_doc_number] => 08877424
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2014-11-04
[patent_title] => 'Monomer, polymer, resist composition, and patterning process'
[patent_app_type] => utility
[patent_app_number] => 13/762859
[patent_app_country] => US
[patent_app_date] => 2013-02-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 3
[patent_no_of_words] => 13551
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 15
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13762859
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/762859 | Monomer, polymer, resist composition, and patterning process | Feb 7, 2013 | Issued |
Array
(
[id] => 8841269
[patent_doc_number] => 20130136897
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2013-05-30
[patent_title] => 'RESISTS FOR LITHOGRAPHY'
[patent_app_type] => utility
[patent_app_number] => 13/748267
[patent_app_country] => US
[patent_app_date] => 2013-01-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 7520
[patent_no_of_claims] => 38
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13748267
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/748267 | RESISTS FOR LITHOGRAPHY | Jan 22, 2013 | Abandoned |
Array
(
[id] => 8976806
[patent_doc_number] => 20130210236
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2013-08-15
[patent_title] => 'SILICON-CONTAINING SURFACE MODIFIER, RESIST UNDERLAYER FILM COMPOSITION CONTAINING THIS, AND PATTERNING PROCESS'
[patent_app_type] => utility
[patent_app_number] => 13/747154
[patent_app_country] => US
[patent_app_date] => 2013-01-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 24014
[patent_no_of_claims] => 27
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13747154
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/747154 | Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process | Jan 21, 2013 | Issued |
Array
(
[id] => 10027349
[patent_doc_number] => 09069247
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2015-06-30
[patent_title] => 'Silicon-containing surface modifier, resist lower layer film-forming composition containing the same, and patterning process'
[patent_app_type] => utility
[patent_app_number] => 13/747125
[patent_app_country] => US
[patent_app_date] => 2013-01-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 17283
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 68
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13747125
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/747125 | Silicon-containing surface modifier, resist lower layer film-forming composition containing the same, and patterning process | Jan 21, 2013 | Issued |
Array
(
[id] => 10313876
[patent_doc_number] => 20150198879
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2015-07-16
[patent_title] => 'Fluorine-Containing Sulfonic Acid Salt, Fluorine-Containing Sulfonic Acid Salt Resin, Resist Composition, and Pattern Forming Method Using Same'
[patent_app_type] => utility
[patent_app_number] => 14/374010
[patent_app_country] => US
[patent_app_date] => 2013-01-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 33050
[patent_no_of_claims] => 38
[patent_no_of_ind_claims] => 7
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14374010
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/374010 | Fluorine-containing sulfonic acid salt, fluorine-containing sulfonic acid salt resin, resist composition, and pattern forming method using same | Jan 16, 2013 | Issued |
Array
(
[id] => 8829130
[patent_doc_number] => 20130130175
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2013-05-23
[patent_title] => 'Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method'
[patent_app_type] => utility
[patent_app_number] => 13/744013
[patent_app_country] => US
[patent_app_date] => 2013-01-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 15276
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 7
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13744013
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/744013 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | Jan 16, 2013 | Abandoned |
Array
(
[id] => 9995629
[patent_doc_number] => 09040222
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2015-05-26
[patent_title] => 'Polymerizable tertiary ester compound, polymer, resist composition, and patterning process'
[patent_app_type] => utility
[patent_app_number] => 13/743019
[patent_app_country] => US
[patent_app_date] => 2013-01-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 19061
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 15
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13743019
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/743019 | Polymerizable tertiary ester compound, polymer, resist composition, and patterning process | Jan 15, 2013 | Issued |