
Sin J. Lee
Examiner (ID: 7000, Phone: (571)272-1333 , Office: P/1722 )
| Most Active Art Unit | 1722 |
| Art Unit(s) | 1722, 1613, 1752, 1795 |
| Total Applications | 1756 |
| Issued Applications | 1186 |
| Pending Applications | 124 |
| Abandoned Applications | 462 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 11780337
[patent_doc_number] => 09389510
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[patent_title] => 'Patterning process and chemical amplified photoresist composition'
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[patent_app_country] => US
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Array
(
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[patent_issue_date] => 2015-04-21
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Array
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Array
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[patent_title] => 'RESIST UNDERLAYER COMPOSITION, METHOD OF FORMING PATTERNS, AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING THE PATTERN'
[patent_app_type] => utility
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Array
(
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[patent_title] => 'COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERN-FORMING METHOD'
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Array
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[patent_issue_date] => 2015-11-05
[patent_title] => 'RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVING ESTER GROUP'
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Array
(
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[patent_title] => 'POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM'
[patent_app_type] => utility
[patent_app_number] => 14/057959
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[rel_patent_id] =>[rel_patent_doc_number] =>) 14/057959 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM | Oct 17, 2013 | Abandoned |
Array
(
[id] => 10416437
[patent_doc_number] => 20150301446
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[patent_kind] => A1
[patent_issue_date] => 2015-10-22
[patent_title] => 'MONOMER FOR HARDMASK COMPOSITION, HARDMASK COMPOSITION INCLUDING SAID MONOMER, AND METHOD FOR FORMING PATTERN USING SAID HARDMASK COMPOSITION'
[patent_app_type] => utility
[patent_app_number] => 14/441338
[patent_app_country] => US
[patent_app_date] => 2013-10-02
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[rel_patent_id] =>[rel_patent_doc_number] =>) 14/441338 | Monomer for hardmask composition, hardmask composition including said monomer, and method for forming pattern using said hardmask composition | Oct 1, 2013 | Issued |
Array
(
[id] => 11903127
[patent_doc_number] => 09772558
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[patent_issue_date] => 2017-09-26
[patent_title] => 'Sulfonic acid ester containing polymers for organic solvent based dual-tone photoresists'
[patent_app_type] => utility
[patent_app_number] => 14/035891
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Array
(
[id] => 10374315
[patent_doc_number] => 20150259321
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[patent_issue_date] => 2015-09-17
[patent_title] => 'FLUORENE-TYPE COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPRISING SAID FLUORENE-TYPE COMPOUND, AND PHOTOSENSITIVE COMPOSITION CONTAINING SAID PHOTOPOLYMERIZATION INITIATOR'
[patent_app_type] => utility
[patent_app_number] => 14/431813
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[rel_patent_id] =>[rel_patent_doc_number] =>) 14/431813 | Fluorene-type compound, photopolymerization initiator comprising said fluorene-type compound, and photosensitive composition containing said photopolymerization initiator | Sep 19, 2013 | Issued |
Array
(
[id] => 10974672
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[patent_title] => 'COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM, RESIST PATTERN-FORMING METHOD, POLYMER, AND COMPOUND'
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Array
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Array
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Array
(
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Array
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Array
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Array
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