Sin J. Lee

Array ( [id] => 8829130 [patent_doc_number] => 20130130175 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2013-05-23 [patent_title] => 'Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method' [patent_app_type] => utility [patent_app_number] => 13/744013 [patent_app_country] => US [patent_app_date] => 2013-01-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 15276 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13744013 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10313876 [patent_doc_number] => 20150198879 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2015-07-16 [patent_title] => 'Fluorine-Containing Sulfonic Acid Salt, Fluorine-Containing Sulfonic Acid Salt Resin, Resist Composition, and Pattern Forming Method Using Same' [patent_app_type] => utility [patent_app_number] => 14/374010 [patent_app_country] => US [patent_app_date] => 2013-01-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 33050 [patent_no_of_claims] => 38 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14374010 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9995629 [patent_doc_number] => 09040222 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2015-05-26 [patent_title] => 'Polymerizable tertiary ester compound, polymer, resist composition, and patterning process' [patent_app_type] => utility [patent_app_number] => 13/743019 [patent_app_country] => US [patent_app_date] => 2013-01-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 19061 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 15 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13743019 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10507253 [patent_doc_number] => 09235124 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2016-01-12 [patent_title] => 'Planarization over topography with molecular glass materials' [patent_app_type] => utility [patent_app_number] => 13/736512 [patent_app_country] => US [patent_app_date] => 2013-01-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 7 [patent_no_of_words] => 4957 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 40 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13736512 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10630080 [patent_doc_number] => 09348228 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2016-05-24 [patent_title] => 'Acid-strippable silicon-containing antireflective coating' [patent_app_type] => utility [patent_app_number] => 13/733182 [patent_app_country] => US [patent_app_date] => 2013-01-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10365 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 59 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13733182 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9620689 [patent_doc_number] => 08790861 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-07-29 [patent_title] => 'Cycloaliphatic monomer, polymer comprising the same, and photoresist composition comprising the polymer' [patent_app_type] => utility [patent_app_number] => 13/723973 [patent_app_country] => US [patent_app_date] => 2012-12-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5921 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 7 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13723973 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9869028 [patent_doc_number] => 08956799 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2015-02-17 [patent_title] => 'Photoacid generator and photoresist comprising same' [patent_app_type] => utility [patent_app_number] => 13/711679 [patent_app_country] => US [patent_app_date] => 2012-12-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6705 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 8 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13711679 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9090912 [patent_doc_number] => 20130270223 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2013-10-17 [patent_title] => 'PHOTORESIST COMPOSITION, METHOD OF MANUFACTURING A POLARIZER AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME' [patent_app_type] => utility [patent_app_number] => 13/710759 [patent_app_country] => US [patent_app_date] => 2012-12-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 7829 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13710759 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10130549 [patent_doc_number] => 09164380 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2015-10-20 [patent_title] => 'Resist composition and method of forming resist pattern' [patent_app_type] => utility [patent_app_number] => 13/710809 [patent_app_country] => US [patent_app_date] => 2012-12-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 52807 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 51 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13710809 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 11800963 [patent_doc_number] => 09541834 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2017-01-10 [patent_title] => 'Ionic thermal acid generators for low temperature applications' [patent_app_type] => utility [patent_app_number] => 13/691689 [patent_app_country] => US [patent_app_date] => 2012-11-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 8529 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 68 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13691689 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10642421 [patent_doc_number] => 09359276 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2016-06-07 [patent_title] => 'Monomer for hardmask composition, hardmask composition including monomer, and pattern forming method using hardmask composition' [patent_app_type] => utility [patent_app_number] => 14/365751 [patent_app_country] => US [patent_app_date] => 2012-11-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4669 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 14 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14365751 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9589055 [patent_doc_number] => 08778595 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-07-15 [patent_title] => 'Resist composition, method of forming resist pattern, and polymeric compound' [patent_app_type] => utility [patent_app_number] => 13/678955 [patent_app_country] => US [patent_app_date] => 2012-11-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 55291 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 27 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13678955 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10926156 [patent_doc_number] => 20140329177 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2014-11-06 [patent_title] => 'CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN FORMATION METHOD' [patent_app_type] => utility [patent_app_number] => 14/359073 [patent_app_country] => US [patent_app_date] => 2012-11-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 22596 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14359073 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 8814509 [patent_doc_number] => 20130115554 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2013-05-09 [patent_title] => 'RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND' [patent_app_type] => utility [patent_app_number] => 13/670106 [patent_app_country] => US [patent_app_date] => 2012-11-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 43670 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13670106 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9454909 [patent_doc_number] => 08715913 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-05-06 [patent_title] => 'Silicon-containing resist underlayer film-forming composition and patterning process' [patent_app_type] => utility [patent_app_number] => 13/669183 [patent_app_country] => US [patent_app_date] => 2012-11-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 23410 [patent_no_of_claims] => 26 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 209 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13669183 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9983364 [patent_doc_number] => 09029070 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2015-05-12 [patent_title] => 'Resist composition and method of forming resist pattern' [patent_app_type] => utility [patent_app_number] => 13/667237 [patent_app_country] => US [patent_app_date] => 2012-11-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 59162 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 281 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13667237 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9449302 [patent_doc_number] => 20140120471 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2014-05-01 [patent_title] => 'PHOTOACID GENERATING COMPOUND AND PHOTORESIST COMPOSITION COMPRISING SAME, COATED ARTICLE COMPRISING THE PHOTORESIST AND METHOD OF MAKING AN ARTICLE' [patent_app_type] => utility [patent_app_number] => 13/661553 [patent_app_country] => US [patent_app_date] => 2012-10-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6188 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13661553 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9691544 [patent_doc_number] => 08822136 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-09-02 [patent_title] => 'Patterning process and resist composition' [patent_app_type] => utility [patent_app_number] => 13/661267 [patent_app_country] => US [patent_app_date] => 2012-10-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 20 [patent_no_of_words] => 17150 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 62 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13661267 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9720131 [patent_doc_number] => 20140255832 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2014-09-11 [patent_title] => 'HARDCOAT COMPOSITIONS' [patent_app_type] => utility [patent_app_number] => 14/350481 [patent_app_country] => US [patent_app_date] => 2012-10-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10543 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14350481 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 8916222 [patent_doc_number] => 20130177847 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2013-07-11 [patent_title] => 'PHOTORESIST FOR IMPROVED LITHOGRAPHIC CONTROL' [patent_app_type] => utility [patent_app_number] => 13/633252 [patent_app_country] => US [patent_app_date] => 2012-10-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 6347 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13633252 [rel_patent_id] =>[rel_patent_doc_number] =>)