Search

Sin J. Lee

Examiner (ID: 7000, Phone: (571)272-1333 , Office: P/1722 )

Most Active Art Unit
1722
Art Unit(s)
1722, 1613, 1752, 1795
Total Applications
1756
Issued Applications
1186
Pending Applications
124
Abandoned Applications
462

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 8612172 [patent_doc_number] => 20130017484 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2013-01-17 [patent_title] => 'POLYMERIZABLE ESTER COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS' [patent_app_type] => utility [patent_app_number] => 13/548654 [patent_app_country] => US [patent_app_date] => 2012-07-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 13812 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13548654 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/548654
Polymerizable ester compound, polymer, resist composition, and patterning process Jul 12, 2012 Issued
Array ( [id] => 8489390 [patent_doc_number] => 20120288797 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-11-15 [patent_title] => 'PHOTORESIST COMPOSITIONS AND METHODS OF USE IN HIGH INDEX IMMERSION LITHOGRAPHY' [patent_app_type] => utility [patent_app_number] => 13/543852 [patent_app_country] => US [patent_app_date] => 2012-07-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 11 [patent_no_of_words] => 9862 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13543852 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/543852
Photoresist compositions and methods of use in high index immersion lithography Jul 7, 2012 Issued
Array ( [id] => 8567398 [patent_doc_number] => 20120329969 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-12-27 [patent_title] => 'POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN' [patent_app_type] => utility [patent_app_number] => 13/539558 [patent_app_country] => US [patent_app_date] => 2012-07-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 31195 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13539558 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/539558
Positive resist composition and method of forming resist pattern Jul 1, 2012 Issued
Array ( [id] => 8464975 [patent_doc_number] => 20120270143 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-10-25 [patent_title] => 'RESIST UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICES USING THE SAME' [patent_app_type] => utility [patent_app_number] => 13/539894 [patent_app_country] => US [patent_app_date] => 2012-07-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 8038 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13539894 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/539894
RESIST UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICES USING THE SAME Jul 1, 2012 Abandoned
Array ( [id] => 8637451 [patent_doc_number] => 20130029254 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2013-01-31 [patent_title] => 'CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND RESIST FILM, RESIST-COATED MASK BLANK, RESIST PATTERN FORMING METHOD AND PHOTOMASK EACH USING THE COMPOSITION' [patent_app_type] => utility [patent_app_number] => 13/538216 [patent_app_country] => US [patent_app_date] => 2012-06-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 14485 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13538216 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/538216
Chemical amplification resist composition, and resist film, resist-coated mask blank, resist pattern forming method and photomask each using the composition Jun 28, 2012 Issued
Array ( [id] => 9469194 [patent_doc_number] => 08722825 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-05-13 [patent_title] => 'Surface active additive and photoresist composition comprising same' [patent_app_type] => utility [patent_app_number] => 13/482574 [patent_app_country] => US [patent_app_date] => 2012-05-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4982 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 27 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13482574 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/482574
Surface active additive and photoresist composition comprising same May 28, 2012 Issued
Array ( [id] => 9211958 [patent_doc_number] => 20140011135 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2014-01-09 [patent_title] => 'POLYMER COMPOUND COMPRISING DYE AND CURABLE RESIN COMPOSITION COMPRISING SAME' [patent_app_type] => utility [patent_app_number] => 14/006272 [patent_app_country] => US [patent_app_date] => 2012-05-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 5081 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14006272 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/006272
Polymer compound comprising dye and curable resin composition comprising same May 24, 2012 Issued
Array ( [id] => 8749255 [patent_doc_number] => 08415085 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-04-09 [patent_title] => 'Resist composition, method of forming resist pattern, novel compound, and acid generator' [patent_app_type] => utility [patent_app_number] => 13/478291 [patent_app_country] => US [patent_app_date] => 2012-05-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 42324 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 15 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13478291 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/478291
Resist composition, method of forming resist pattern, novel compound, and acid generator May 22, 2012 Issued
Array ( [id] => 8381761 [patent_doc_number] => 20120225383 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-09-06 [patent_title] => 'RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD OF FORMING RESIST PATTERN' [patent_app_type] => utility [patent_app_number] => 13/468747 [patent_app_country] => US [patent_app_date] => 2012-05-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 21039 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13468747 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/468747
Resist composition for immersion exposure and method of forming resist pattern May 9, 2012 Issued
Array ( [id] => 9463198 [patent_doc_number] => 20140127625 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2014-05-08 [patent_title] => 'ORTHOGONAL SOLVENTS AND COMPATIBLE PHOTORESISTS FOR THE PHOTOLITHOGRAPHIC PATTERNING OF ORGANIC ELECTRONIC DEVICES' [patent_app_type] => utility [patent_app_number] => 14/113408 [patent_app_country] => US [patent_app_date] => 2012-04-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 5711 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14113408 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/113408
ORTHOGONAL SOLVENTS AND COMPATIBLE PHOTORESISTS FOR THE PHOTOLITHOGRAPHIC PATTERNING OF ORGANIC ELECTRONIC DEVICES Apr 23, 2012 Abandoned
Array ( [id] => 8381758 [patent_doc_number] => 20120225386 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-09-06 [patent_title] => 'CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS' [patent_app_type] => utility [patent_app_number] => 13/406684 [patent_app_country] => US [patent_app_date] => 2012-02-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 13418 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13406684 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/406684
Chemically amplified resist composition and patterning process Feb 27, 2012 Issued
Array ( [id] => 9086074 [patent_doc_number] => 08557500 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-10-15 [patent_title] => 'Salt and photoresist composition comprising the same' [patent_app_type] => utility [patent_app_number] => 13/406634 [patent_app_country] => US [patent_app_date] => 2012-02-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 17521 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 8 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13406634 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/406634
Salt and photoresist composition comprising the same Feb 27, 2012 Issued
Array ( [id] => 9273297 [patent_doc_number] => 08637226 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-01-28 [patent_title] => 'Method of forming an image having multiple phases' [patent_app_type] => utility [patent_app_number] => 13/368401 [patent_app_country] => US [patent_app_date] => 2012-02-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 9 [patent_no_of_words] => 5641 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 173 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13368401 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/368401
Method of forming an image having multiple phases Feb 7, 2012 Issued
Array ( [id] => 9148468 [patent_doc_number] => 20130302991 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2013-11-14 [patent_title] => 'COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, CONTAINING SILICON THAT BEARS DIKETONE-STRUCTURE-CONTAINING ORGANIC GROUP' [patent_app_type] => utility [patent_app_number] => 13/981142 [patent_app_country] => US [patent_app_date] => 2012-01-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 20705 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13981142 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/981142
Composition for forming resist underlayer film, containing silicon that bears diketone-structure-containing organic group Jan 23, 2012 Issued
Array ( [id] => 8301543 [patent_doc_number] => 20120184100 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-07-19 [patent_title] => 'CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS' [patent_app_type] => utility [patent_app_number] => 13/353700 [patent_app_country] => US [patent_app_date] => 2012-01-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 9435 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13353700 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/353700
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS Jan 18, 2012 Abandoned
Array ( [id] => 8240214 [patent_doc_number] => 20120148952 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-06-14 [patent_title] => 'RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND' [patent_app_type] => utility [patent_app_number] => 13/351586 [patent_app_country] => US [patent_app_date] => 2012-01-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 15390 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13351586 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/351586
Radiation-sensitive resin composition and compound Jan 16, 2012 Issued
Array ( [id] => 10177331 [patent_doc_number] => 09207534 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2015-12-08 [patent_title] => 'Nitrogen-containing monomer, polymer, resist composition, and patterning process' [patent_app_type] => utility [patent_app_number] => 13/349754 [patent_app_country] => US [patent_app_date] => 2012-01-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 13122 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 135 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13349754 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/349754
Nitrogen-containing monomer, polymer, resist composition, and patterning process Jan 12, 2012 Issued
Array ( [id] => 8187153 [patent_doc_number] => 20120116038 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-05-10 [patent_title] => 'RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST PATTERN, AND FLUORINE-CONTAINING RESIN' [patent_app_type] => utility [patent_app_number] => 13/348989 [patent_app_country] => US [patent_app_date] => 2012-01-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 53878 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0116/20120116038.pdf [firstpage_image] =>[orig_patent_app_number] => 13348989 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/348989
Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing resin Jan 11, 2012 Issued
Array ( [id] => 8909184 [patent_doc_number] => 08481243 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-07-09 [patent_title] => 'Resin and photoresist composition comprising the same' [patent_app_type] => utility [patent_app_number] => 13/345941 [patent_app_country] => US [patent_app_date] => 2012-01-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 19256 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 8 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13345941 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/345941
Resin and photoresist composition comprising the same Jan 8, 2012 Issued
Array ( [id] => 9523816 [patent_doc_number] => 08748076 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-06-10 [patent_title] => 'Resist composition and patterning process using the same' [patent_app_type] => utility [patent_app_number] => 13/345355 [patent_app_country] => US [patent_app_date] => 2012-01-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 21319 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 242 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13345355 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/345355
Resist composition and patterning process using the same Jan 5, 2012 Issued
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