Sin J. Lee

Array ( [id] => 8277513 [patent_doc_number] => 20120171379 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-07-05 [patent_title] => 'RADIATION-SENSITIVE COMPOSITION' [patent_app_type] => utility [patent_app_number] => 13/339662 [patent_app_country] => US [patent_app_date] => 2011-12-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 61193 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13339662 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 8301342 [patent_doc_number] => 20120183902 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-07-19 [patent_title] => 'RADIATION-SENSITIVE RESIN COMPOSITION' [patent_app_type] => utility [patent_app_number] => 13/338260 [patent_app_country] => US [patent_app_date] => 2011-12-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 14544 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13338260 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 8139405 [patent_doc_number] => 20120094236 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-04-19 [patent_title] => 'RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST PATTERN, AND FLUORINE-CONTAINING POLYMERIC COMPOUND' [patent_app_type] => utility [patent_app_number] => 13/336131 [patent_app_country] => US [patent_app_date] => 2011-12-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 35769 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0094/20120094236.pdf [firstpage_image] =>[orig_patent_app_number] => 13336131 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9026290 [patent_doc_number] => 08535871 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-09-17 [patent_title] => 'Radiation-sensitive resin composition, method for forming a resist pattern, compound, and polymer' [patent_app_type] => utility [patent_app_number] => 13/325056 [patent_app_country] => US [patent_app_date] => 2011-12-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 22476 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 9 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13325056 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 8221162 [patent_doc_number] => 20120135357 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-05-31 [patent_title] => 'POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS' [patent_app_type] => utility [patent_app_number] => 13/303283 [patent_app_country] => US [patent_app_date] => 2011-11-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 11134 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13303283 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9496234 [patent_doc_number] => 08735046 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-05-27 [patent_title] => 'Positive resist composition and patterning process' [patent_app_type] => utility [patent_app_number] => 13/300894 [patent_app_country] => US [patent_app_date] => 2011-11-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 14244 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 54 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13300894 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 8209779 [patent_doc_number] => 20120129105 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-05-24 [patent_title] => 'PHOTOSENSITIVE COPOLYMER AND PHOTORESIST COMPOSITION' [patent_app_type] => utility [patent_app_number] => 13/298761 [patent_app_country] => US [patent_app_date] => 2011-11-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 9397 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0129/20120129105.pdf [firstpage_image] =>[orig_patent_app_number] => 13298761 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 8227740 [patent_doc_number] => 20120141936 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-06-07 [patent_title] => 'PHOTO-CURING POLYSILOXANE COMPOSITION AND PROTECTIVE FILM FORMED FROM THE SAME' [patent_app_type] => utility [patent_app_number] => 13/291305 [patent_app_country] => US [patent_app_date] => 2011-11-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 9790 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13291305 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9227278 [patent_doc_number] => 08632946 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-01-21 [patent_title] => 'Positive-type photoresist composition' [patent_app_type] => utility [patent_app_number] => 13/884807 [patent_app_country] => US [patent_app_date] => 2011-10-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5345 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 40 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13884807 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9003832 [patent_doc_number] => 20130224957 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2013-08-29 [patent_title] => 'SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION HAVING FLUORINE-BASED ADDITIVE' [patent_app_type] => utility [patent_app_number] => 13/880787 [patent_app_country] => US [patent_app_date] => 2011-10-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 23006 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13880787 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9977273 [patent_doc_number] => 09023583 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2015-05-05 [patent_title] => 'Monolayer or multilayer forming composition' [patent_app_type] => utility [patent_app_number] => 13/879125 [patent_app_country] => US [patent_app_date] => 2011-10-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 5181 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 22 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13879125 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 8158943 [patent_doc_number] => 20120100486 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-04-26 [patent_title] => 'SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS' [patent_app_type] => utility [patent_app_number] => 13/243204 [patent_app_country] => US [patent_app_date] => 2011-09-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8883 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0100/20120100486.pdf [firstpage_image] =>[orig_patent_app_number] => 13243204 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 7766812 [patent_doc_number] => 20120034561 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-02-09 [patent_title] => 'RESIST POLYMER AND RESIST COMPOSITION' [patent_app_type] => utility [patent_app_number] => 13/242879 [patent_app_country] => US [patent_app_date] => 2011-09-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 35293 [patent_no_of_claims] => 55 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0034/20120034561.pdf [firstpage_image] =>[orig_patent_app_number] => 13242879 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 8055209 [patent_doc_number] => 20120077343 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-03-29 [patent_title] => 'RESIST COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE' [patent_app_type] => utility [patent_app_number] => 13/238004 [patent_app_country] => US [patent_app_date] => 2011-09-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 7616 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0077/20120077343.pdf [firstpage_image] =>[orig_patent_app_number] => 13238004 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 7720189 [patent_doc_number] => 20120009524 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-01-12 [patent_title] => 'MATERIAL AND METHOD FOR PHOTOLITHOGRAPHY' [patent_app_type] => utility [patent_app_number] => 13/238335 [patent_app_country] => US [patent_app_date] => 2011-09-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 4176 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0009/20120009524.pdf [firstpage_image] =>[orig_patent_app_number] => 13238335 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 8829133 [patent_doc_number] => 20130130178 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2013-05-23 [patent_title] => 'ACTINIC-RAY-OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH' [patent_app_type] => utility [patent_app_number] => 13/807623 [patent_app_country] => US [patent_app_date] => 2011-08-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 36950 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13807623 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9015838 [patent_doc_number] => 20130230802 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2013-09-05 [patent_title] => 'ACRYLAMIDE DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION' [patent_app_type] => utility [patent_app_number] => 13/876298 [patent_app_country] => US [patent_app_date] => 2011-08-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 12789 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13876298 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 7784168 [patent_doc_number] => 20120045724 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-02-23 [patent_title] => 'SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS' [patent_app_type] => utility [patent_app_number] => 13/214295 [patent_app_country] => US [patent_app_date] => 2011-08-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 7937 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0045/20120045724.pdf [firstpage_image] =>[orig_patent_app_number] => 13214295 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 8989671 [patent_doc_number] => 20130216952 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2013-08-22 [patent_title] => 'POSITIVE PHOTOSENSITIVE SILOXANE COMPOSITION' [patent_app_type] => utility [patent_app_number] => 13/814686 [patent_app_country] => US [patent_app_date] => 2011-08-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 22655 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13814686 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 11430511 [patent_doc_number] => 09568824 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2017-02-14 [patent_title] => 'Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith' [patent_app_type] => utility [patent_app_number] => 13/193235 [patent_app_country] => US [patent_app_date] => 2011-07-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 38455 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 107 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13193235 [rel_patent_id] =>[rel_patent_doc_number] =>)