Search

Sin J. Lee

Examiner (ID: 7000, Phone: (571)272-1333 , Office: P/1722 )

Most Active Art Unit
1722
Art Unit(s)
1722, 1613, 1752, 1795
Total Applications
1756
Issued Applications
1186
Pending Applications
124
Abandoned Applications
462

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 9046604 [patent_doc_number] => 08541158 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-09-24 [patent_title] => 'Positive resist compositions and patterning process' [patent_app_type] => utility [patent_app_number] => 13/013143 [patent_app_country] => US [patent_app_date] => 2011-01-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 4 [patent_no_of_words] => 14542 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 78 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13013143 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/013143
Positive resist compositions and patterning process Jan 24, 2011 Issued
Array ( [id] => 8493079 [patent_doc_number] => 20120292487 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-11-22 [patent_title] => 'POSITIVE RESIST COMPOSITION AND METHOD FOR PRODUCING MICROLENS' [patent_app_type] => utility [patent_app_number] => 13/574938 [patent_app_country] => US [patent_app_date] => 2011-01-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 13017 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13574938 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/574938
Positive resist composition and method for producing microlens Jan 18, 2011 Issued
Array ( [id] => 6175610 [patent_doc_number] => 20110177455 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-07-21 [patent_title] => 'POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS' [patent_app_type] => utility [patent_app_number] => 13/006598 [patent_app_country] => US [patent_app_date] => 2011-01-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 15250 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0177/20110177455.pdf [firstpage_image] =>[orig_patent_app_number] => 13006598 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/006598
Polymer, resist composition, and patterning process Jan 13, 2011 Issued
Array ( [id] => 6081114 [patent_doc_number] => 20110143279 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-06-16 [patent_title] => 'RADIATION-SENSITIVE RESIN COMPOSITION' [patent_app_type] => utility [patent_app_number] => 13/005539 [patent_app_country] => US [patent_app_date] => 2011-01-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 16304 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0143/20110143279.pdf [firstpage_image] =>[orig_patent_app_number] => 13005539 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/005539
RADIATION-SENSITIVE RESIN COMPOSITION Jan 12, 2011 Abandoned
Array ( [id] => 8955612 [patent_doc_number] => 08501384 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-08-06 [patent_title] => 'Positive resist composition and patterning process' [patent_app_type] => utility [patent_app_number] => 12/986791 [patent_app_country] => US [patent_app_date] => 2011-01-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 17697 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 29 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12986791 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/986791
Positive resist composition and patterning process Jan 6, 2011 Issued
Array ( [id] => 8858316 [patent_doc_number] => 08460851 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-06-11 [patent_title] => 'Salt and photoresist composition containing the same' [patent_app_type] => utility [patent_app_number] => 12/985838 [patent_app_country] => US [patent_app_date] => 2011-01-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 16197 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 8 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12985838 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/985838
Salt and photoresist composition containing the same Jan 5, 2011 Issued
Array ( [id] => 7573653 [patent_doc_number] => 20110269309 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-11-03 [patent_title] => 'PHOTORESIST COMPOSITION, METHOD OF FORMING PATTERN BY USING THE PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING THIN-FILM TRANSISTOR SUBSTRATE' [patent_app_type] => utility [patent_app_number] => 12/981304 [patent_app_country] => US [patent_app_date] => 2010-12-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 7647 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0269/20110269309.pdf [firstpage_image] =>[orig_patent_app_number] => 12981304 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/981304
PHOTORESIST COMPOSITION, METHOD OF FORMING PATTERN BY USING THE PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING THIN-FILM TRANSISTOR SUBSTRATE Dec 28, 2010 Abandoned
Array ( [id] => 7488324 [patent_doc_number] => 20110236824 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-09-29 [patent_title] => 'POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN' [patent_app_type] => utility [patent_app_number] => 12/979067 [patent_app_country] => US [patent_app_date] => 2010-12-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 32621 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0236/20110236824.pdf [firstpage_image] =>[orig_patent_app_number] => 12979067 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/979067
Positive resist composition and method of forming resist pattern Dec 26, 2010 Issued
Array ( [id] => 8065279 [patent_doc_number] => 20110244392 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-10-06 [patent_title] => 'POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND' [patent_app_type] => utility [patent_app_number] => 12/979076 [patent_app_country] => US [patent_app_date] => 2010-12-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 30289 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0244/20110244392.pdf [firstpage_image] =>[orig_patent_app_number] => 12979076 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/979076
Positive resist composition, method of forming resist pattern and polymeric compound Dec 26, 2010 Issued
Array ( [id] => 6175621 [patent_doc_number] => 20110177459 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-07-21 [patent_title] => 'RESIST UNDERLAYER FILM-FORMING COMPOSITION, PROCESS FOR FORMING RESIST UNDERLAYER FILM AND PATTERNING PROCESS' [patent_app_type] => utility [patent_app_number] => 12/978978 [patent_app_country] => US [patent_app_date] => 2010-12-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 14439 [patent_no_of_claims] => 34 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0177/20110177459.pdf [firstpage_image] =>[orig_patent_app_number] => 12978978 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/978978
Resist underlayer film-forming composition, process for forming resist underlayer film and patterning process Dec 26, 2010 Issued
Array ( [id] => 6001522 [patent_doc_number] => 20110117496 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-05-19 [patent_title] => 'NEGATIVE PHOTOSENSITIVE FLUORINATED AROMATIC RESIN COMPOSITION' [patent_app_type] => utility [patent_app_number] => 12/976583 [patent_app_country] => US [patent_app_date] => 2010-12-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 19079 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0117/20110117496.pdf [firstpage_image] =>[orig_patent_app_number] => 12976583 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/976583
NEGATIVE PHOTOSENSITIVE FLUORINATED AROMATIC RESIN COMPOSITION Dec 21, 2010 Abandoned
Array ( [id] => 9020151 [patent_doc_number] => 08530136 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-09-10 [patent_title] => 'Fluoroalcohol containing molecular photoresist materials and processes of use' [patent_app_type] => utility [patent_app_number] => 12/971292 [patent_app_country] => US [patent_app_date] => 2010-12-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 5700 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 26 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12971292 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/971292
Fluoroalcohol containing molecular photoresist materials and processes of use Dec 16, 2010 Issued
Array ( [id] => 14329791 [patent_doc_number] => 10295910 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2019-05-21 [patent_title] => Photoresists and methods of use thereof [patent_app_type] => utility [patent_app_number] => 12/969236 [patent_app_country] => US [patent_app_date] => 2010-12-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4050 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 76 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12969236 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/969236
Photoresists and methods of use thereof Dec 14, 2010 Issued
Array ( [id] => 7508203 [patent_doc_number] => 20110255061 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-10-20 [patent_title] => 'COMPOSITIONS COMPRISING BASE-REACTIVE COMPONENT AND PROCESSES FOR PHOTOLITHOGRAPHY' [patent_app_type] => utility [patent_app_number] => 12/966928 [patent_app_country] => US [patent_app_date] => 2010-12-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8506 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0255/20110255061.pdf [firstpage_image] =>[orig_patent_app_number] => 12966928 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/966928
Compositions comprising base-reactive component and processes for photolithography Dec 12, 2010 Issued
Array ( [id] => 9059624 [patent_doc_number] => 08546059 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-10-01 [patent_title] => 'Photoresist composition' [patent_app_type] => utility [patent_app_number] => 12/953606 [patent_app_country] => US [patent_app_date] => 2010-11-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 19621 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 18 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12953606 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/953606
Photoresist composition Nov 23, 2010 Issued
Array ( [id] => 6184911 [patent_doc_number] => 20110123925 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-05-26 [patent_title] => 'POLYMER FOR PROTECTIVE LAYER OF RESIST, AND POLYMER COMPOSITION INCLUDING THE SAME' [patent_app_type] => utility [patent_app_number] => 12/950369 [patent_app_country] => US [patent_app_date] => 2010-11-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5935 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0123/20110123925.pdf [firstpage_image] =>[orig_patent_app_number] => 12950369 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/950369
POLYMER FOR PROTECTIVE LAYER OF RESIST, AND POLYMER COMPOSITION INCLUDING THE SAME Nov 18, 2010 Abandoned
Array ( [id] => 6007582 [patent_doc_number] => 20110059613 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-03-10 [patent_title] => 'MASK PATTERN FOR SEMICONDUCTOR DEVICE FABRICATION, METHOD OF FORMING THE SAME, AND METHOD OF FABRICATING FINELY PATTERNED SEMICONDUCTOR DEVICE' [patent_app_type] => utility [patent_app_number] => 12/946964 [patent_app_country] => US [patent_app_date] => 2010-11-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 10203 [patent_no_of_claims] => 59 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0059/20110059613.pdf [firstpage_image] =>[orig_patent_app_number] => 12946964 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/946964
Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor device Nov 15, 2010 Issued
Array ( [id] => 8489388 [patent_doc_number] => 20120288795 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-11-15 [patent_title] => 'COMPOSITION FOR FORMATION OF PHOTOSENSITIVE RESIST UNDERLAYER FILM AND METHOD FOR FORMATION OF RESIST PATTERN' [patent_app_type] => utility [patent_app_number] => 13/522392 [patent_app_country] => US [patent_app_date] => 2010-11-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 8139 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13522392 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/522392
COMPOSITION FOR FORMATION OF PHOTOSENSITIVE RESIST UNDERLAYER FILM AND METHOD FOR FORMATION OF RESIST PATTERN Nov 15, 2010 Abandoned
Array ( [id] => 8834290 [patent_doc_number] => 08450044 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-05-28 [patent_title] => 'Positive resist composition and method of forming resist pattern' [patent_app_type] => utility [patent_app_number] => 12/945526 [patent_app_country] => US [patent_app_date] => 2010-11-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 2 [patent_no_of_words] => 40312 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 76 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12945526 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/945526
Positive resist composition and method of forming resist pattern Nov 11, 2010 Issued
Array ( [id] => 8560025 [patent_doc_number] => 08334088 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2012-12-18 [patent_title] => 'Functionalized carbosilane polymers and photoresist compositions containing the same' [patent_app_type] => utility [patent_app_number] => 12/938459 [patent_app_country] => US [patent_app_date] => 2010-11-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 7408 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 53 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12938459 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/938459
Functionalized carbosilane polymers and photoresist compositions containing the same Nov 2, 2010 Issued
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