Sin J. Lee

Array ( [id] => 6119064 [patent_doc_number] => 20110076622 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-03-31 [patent_title] => 'POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN-FORMING METHOD USING THE SAME' [patent_app_type] => utility [patent_app_number] => 12/917953 [patent_app_country] => US [patent_app_date] => 2010-11-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 22839 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0076/20110076622.pdf [firstpage_image] =>[orig_patent_app_number] => 12917953 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 8772153 [patent_doc_number] => 08426106 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-04-23 [patent_title] => 'Photoresist composition' [patent_app_type] => utility [patent_app_number] => 12/903146 [patent_app_country] => US [patent_app_date] => 2010-10-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 19851 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 9 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12903146 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 8591660 [patent_doc_number] => 08349535 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-01-08 [patent_title] => 'Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern therewith' [patent_app_type] => utility [patent_app_number] => 12/895504 [patent_app_country] => US [patent_app_date] => 2010-09-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 12920 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 54 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12895504 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9020150 [patent_doc_number] => 08530135 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-09-10 [patent_title] => 'Photoresist composition' [patent_app_type] => utility [patent_app_number] => 12/888243 [patent_app_country] => US [patent_app_date] => 2010-09-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 14757 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 48 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12888243 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 6001532 [patent_doc_number] => 20110117501 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-05-19 [patent_title] => 'RESIST UNDERLAYER POLYMER, RESIST UNDERLAYER COMPOSITION INCLUDING THE SAME, AND METHOD OF PATTERNING USING THE SAME' [patent_app_type] => utility [patent_app_number] => 12/886808 [patent_app_country] => US [patent_app_date] => 2010-09-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8263 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0117/20110117501.pdf [firstpage_image] =>[orig_patent_app_number] => 12886808 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 7777089 [patent_doc_number] => 20120040289 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-02-16 [patent_title] => 'CHEMICALLY AMPLIFIED SILSESQUIOXANE RESIST COMPOSITIONS' [patent_app_type] => utility [patent_app_number] => 12/856338 [patent_app_country] => US [patent_app_date] => 2010-08-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 4195 [patent_no_of_claims] => 29 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0040/20120040289.pdf [firstpage_image] =>[orig_patent_app_number] => 12856338 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 7515130 [patent_doc_number] => 08039200 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2011-10-18 [patent_title] => 'Photosensitive composition and pattern-forming method using the photosensitive composition' [patent_app_type] => utility [patent_app_number] => 12/853947 [patent_app_country] => US [patent_app_date] => 2010-08-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 22675 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 110 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/08/039/08039200.pdf [firstpage_image] =>[orig_patent_app_number] => 12853947 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 7755440 [patent_doc_number] => 20120028195 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-02-02 [patent_title] => 'Composition for Coating over a Photoresist Pattern' [patent_app_type] => utility [patent_app_number] => 12/845236 [patent_app_country] => US [patent_app_date] => 2010-07-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 9817 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0028/20120028195.pdf [firstpage_image] =>[orig_patent_app_number] => 12845236 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9983355 [patent_doc_number] => 09029062 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2015-05-12 [patent_title] => 'Photoresist and patterning process' [patent_app_type] => utility [patent_app_number] => 12/827635 [patent_app_country] => US [patent_app_date] => 2010-06-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 4 [patent_no_of_words] => 3727 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 154 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12827635 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 6343363 [patent_doc_number] => 20100248167 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-09-30 [patent_title] => 'PATTERN-FORMING METHOD' [patent_app_type] => utility [patent_app_number] => 12/814476 [patent_app_country] => US [patent_app_date] => 2010-06-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 14118 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0248/20100248167.pdf [firstpage_image] =>[orig_patent_app_number] => 12814476 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 6294270 [patent_doc_number] => 20100239982 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-09-23 [patent_title] => 'Photoresist composition with high etching resistance' [patent_app_type] => utility [patent_app_number] => 12/801146 [patent_app_country] => US [patent_app_date] => 2010-05-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4466 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0239/20100239982.pdf [firstpage_image] =>[orig_patent_app_number] => 12801146 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 8689675 [patent_doc_number] => 08389201 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-03-05 [patent_title] => 'Positive resist composition and pattern forming process' [patent_app_type] => utility [patent_app_number] => 12/786013 [patent_app_country] => US [patent_app_date] => 2010-05-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 20399 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 208 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12786013 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 6522684 [patent_doc_number] => 20100203294 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-08-12 [patent_title] => 'Polymers, Methods Of Use Thereof, And Methods Of Decomposition Thereof' [patent_app_type] => utility [patent_app_number] => 12/766982 [patent_app_country] => US [patent_app_date] => 2010-04-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 16 [patent_figures_cnt] => 16 [patent_no_of_words] => 9906 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0203/20100203294.pdf [firstpage_image] =>[orig_patent_app_number] => 12766982 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 8802112 [patent_doc_number] => 08440384 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-05-14 [patent_title] => 'Compound, salt, and radiation-sensitive resin composition' [patent_app_type] => utility [patent_app_number] => 12/760509 [patent_app_country] => US [patent_app_date] => 2010-04-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 16096 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 15 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12760509 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 6508771 [patent_doc_number] => 20100261097 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-10-14 [patent_title] => 'Photo-imageable Hardmask with Positive Tone for Microphotolithography' [patent_app_type] => utility [patent_app_number] => 12/758419 [patent_app_country] => US [patent_app_date] => 2010-04-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 7855 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0261/20100261097.pdf [firstpage_image] =>[orig_patent_app_number] => 12758419 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 6272667 [patent_doc_number] => 20100255412 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-10-07 [patent_title] => 'Photo-imaging Hardmask with Negative Tone for Microphotolithography' [patent_app_type] => utility [patent_app_number] => 12/754402 [patent_app_country] => US [patent_app_date] => 2010-04-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 7306 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0255/20100255412.pdf [firstpage_image] =>[orig_patent_app_number] => 12754402 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9413310 [patent_doc_number] => 08697345 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-04-15 [patent_title] => 'Photoresist stripping solution and a method of stripping photoresists using the same' [patent_app_type] => utility [patent_app_number] => 12/662151 [patent_app_country] => US [patent_app_date] => 2010-04-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7115 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 16 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12662151 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9482761 [patent_doc_number] => 08728710 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-05-20 [patent_title] => 'Photo-imageable hardmask with dual tones for microphotolithography' [patent_app_type] => utility [patent_app_number] => 12/749893 [patent_app_country] => US [patent_app_date] => 2010-03-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 13 [patent_no_of_words] => 5656 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 25 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12749893 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9413296 [patent_doc_number] => 08697332 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-04-15 [patent_title] => 'Base generator, photosensitive resin composition, pattern forming material comprising the photosensitive resin composition, pattern forming method using the photosensitive resin composition and products comprising the same' [patent_app_type] => utility [patent_app_number] => 13/259586 [patent_app_country] => US [patent_app_date] => 2010-03-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 33694 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 24 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13259586 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9046608 [patent_doc_number] => 08541161 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-09-24 [patent_title] => 'Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same and pattern forming method' [patent_app_type] => utility [patent_app_number] => 13/257069 [patent_app_country] => US [patent_app_date] => 2010-03-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 9574 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 95 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13257069 [rel_patent_id] =>[rel_patent_doc_number] =>)