
Sin J. Lee
Examiner (ID: 7000, Phone: (571)272-1333 , Office: P/1722 )
| Most Active Art Unit | 1722 |
| Art Unit(s) | 1722, 1613, 1752, 1795 |
| Total Applications | 1756 |
| Issued Applications | 1186 |
| Pending Applications | 124 |
| Abandoned Applications | 462 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 5527988
[patent_doc_number] => 20090198065
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-08-06
[patent_title] => 'RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION, AND STARTING COMPOUNDS FOR PRODUCTION OF THE RESIST POLYMER'
[patent_app_type] => utility
[patent_app_number] => 12/411703
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/411703 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | Mar 25, 2009 | Issued |
Array
(
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[patent_doc_number] => 20090246686
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-10-01
[patent_title] => 'POLYMER, POLYMER PREPARATION METHOD, RESIST COMPOSITION AND PATTERNING PROCESS'
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Array
(
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[patent_doc_number] => 20090246695
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[patent_kind] => A1
[patent_issue_date] => 2009-10-01
[patent_title] => 'ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE SAME, POLYMERIZABLE COMPOUND AND POLYMER COMPOUND OBTAINED BY POLYMERIZING THE POLYMERIZABLE COMPOUND'
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[firstpage_image] =>[orig_patent_app_number] => 12409825
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/409825 | Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound | Mar 23, 2009 | Issued |
Array
(
[id] => 5403865
[patent_doc_number] => 20090239179
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-09-24
[patent_title] => 'HYDROXYL-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS'
[patent_app_type] => utility
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/405670 | Hydroxyl-containing monomer, polymer, resist composition, and patterning process | Mar 16, 2009 | Issued |
Array
(
[id] => 5976655
[patent_doc_number] => 20110070544
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-03-24
[patent_title] => 'Novel Salt Having Fluorine-Containing Carbanion Structure, Derivative Thereof, Photoacid Generator, Resist Material Using the Photoacid Generator, and Pattern Forming Method'
[patent_app_type] => utility
[patent_app_number] => 12/922300
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/922300 | Salt having fluorine-containing carbanion structure, derivative thereof, photoacid generator, resist material using the photoacid generator, and pattern forming method | Mar 9, 2009 | Issued |
Array
(
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[patent_title] => 'RADIATION-SENSITIVE RESIN COMPOSITION'
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Array
(
[id] => 6220910
[patent_doc_number] => 20100055851
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[patent_issue_date] => 2010-03-04
[patent_title] => 'PHOTORESIST COMPOSTION, METHOD FOR FORMING THIN FILM PATTERNS, AND METHOD FOR MANUFACTURING A THIN FILM TRANSISTOR USING THE SAME'
[patent_app_type] => utility
[patent_app_number] => 12/389031
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/389031 | PHOTORESIST COMPOSTION, METHOD FOR FORMING THIN FILM PATTERNS, AND METHOD FOR MANUFACTURING A THIN FILM TRANSISTOR USING THE SAME | Feb 18, 2009 | Abandoned |
Array
(
[id] => 5514675
[patent_doc_number] => 20090214982
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[patent_kind] => A1
[patent_issue_date] => 2009-08-27
[patent_title] => 'POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND'
[patent_app_type] => utility
[patent_app_number] => 12/372964
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Array
(
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Array
(
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[patent_title] => 'Resist Composition, Resist Protective Coating Composition, and Patterning Process'
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Array
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Array
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Array
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