Search

Sin J. Lee

Examiner (ID: 7000, Phone: (571)272-1333 , Office: P/1722 )

Most Active Art Unit
1722
Art Unit(s)
1722, 1613, 1752, 1795
Total Applications
1756
Issued Applications
1186
Pending Applications
124
Abandoned Applications
462

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 5527988 [patent_doc_number] => 20090198065 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-08-06 [patent_title] => 'RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION, AND STARTING COMPOUNDS FOR PRODUCTION OF THE RESIST POLYMER' [patent_app_type] => utility [patent_app_number] => 12/411703 [patent_app_country] => US [patent_app_date] => 2009-03-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 26942 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0198/20090198065.pdf [firstpage_image] =>[orig_patent_app_number] => 12411703 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/411703
Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer Mar 25, 2009 Issued
Array ( [id] => 5473520 [patent_doc_number] => 20090246686 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-10-01 [patent_title] => 'POLYMER, POLYMER PREPARATION METHOD, RESIST COMPOSITION AND PATTERNING PROCESS' [patent_app_type] => utility [patent_app_number] => 12/411206 [patent_app_country] => US [patent_app_date] => 2009-03-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 19065 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0246/20090246686.pdf [firstpage_image] =>[orig_patent_app_number] => 12411206 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/411206
Polymer, polymer preparation method, resist composition and patterning process Mar 24, 2009 Issued
Array ( [id] => 5473529 [patent_doc_number] => 20090246695 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-10-01 [patent_title] => 'ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE SAME, POLYMERIZABLE COMPOUND AND POLYMER COMPOUND OBTAINED BY POLYMERIZING THE POLYMERIZABLE COMPOUND' [patent_app_type] => utility [patent_app_number] => 12/409825 [patent_app_country] => US [patent_app_date] => 2009-03-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 30150 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0246/20090246695.pdf [firstpage_image] =>[orig_patent_app_number] => 12409825 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/409825
Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound Mar 23, 2009 Issued
Array ( [id] => 5403865 [patent_doc_number] => 20090239179 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-09-24 [patent_title] => 'HYDROXYL-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS' [patent_app_type] => utility [patent_app_number] => 12/405670 [patent_app_country] => US [patent_app_date] => 2009-03-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 21120 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0239/20090239179.pdf [firstpage_image] =>[orig_patent_app_number] => 12405670 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/405670
Hydroxyl-containing monomer, polymer, resist composition, and patterning process Mar 16, 2009 Issued
Array ( [id] => 5976655 [patent_doc_number] => 20110070544 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-03-24 [patent_title] => 'Novel Salt Having Fluorine-Containing Carbanion Structure, Derivative Thereof, Photoacid Generator, Resist Material Using the Photoacid Generator, and Pattern Forming Method' [patent_app_type] => utility [patent_app_number] => 12/922300 [patent_app_country] => US [patent_app_date] => 2009-03-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 16718 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 9 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0070/20110070544.pdf [firstpage_image] =>[orig_patent_app_number] => 12922300 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/922300
Salt having fluorine-containing carbanion structure, derivative thereof, photoacid generator, resist material using the photoacid generator, and pattern forming method Mar 9, 2009 Issued
Array ( [id] => 6031817 [patent_doc_number] => 20110081613 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-04-07 [patent_title] => 'RADIATION-SENSITIVE RESIN COMPOSITION' [patent_app_type] => utility [patent_app_number] => 12/922241 [patent_app_country] => US [patent_app_date] => 2009-03-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 6700 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0081/20110081613.pdf [firstpage_image] =>[orig_patent_app_number] => 12922241 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/922241
RADIATION-SENSITIVE RESIN COMPOSITION Mar 8, 2009 Abandoned
Array ( [id] => 6220910 [patent_doc_number] => 20100055851 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-03-04 [patent_title] => 'PHOTORESIST COMPOSTION, METHOD FOR FORMING THIN FILM PATTERNS, AND METHOD FOR MANUFACTURING A THIN FILM TRANSISTOR USING THE SAME' [patent_app_type] => utility [patent_app_number] => 12/389031 [patent_app_country] => US [patent_app_date] => 2009-02-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 10 [patent_no_of_words] => 6330 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0055/20100055851.pdf [firstpage_image] =>[orig_patent_app_number] => 12389031 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/389031
PHOTORESIST COMPOSTION, METHOD FOR FORMING THIN FILM PATTERNS, AND METHOD FOR MANUFACTURING A THIN FILM TRANSISTOR USING THE SAME Feb 18, 2009 Abandoned
Array ( [id] => 5514675 [patent_doc_number] => 20090214982 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-08-27 [patent_title] => 'POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND' [patent_app_type] => utility [patent_app_number] => 12/372964 [patent_app_country] => US [patent_app_date] => 2009-02-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 24726 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0214/20090214982.pdf [firstpage_image] =>[orig_patent_app_number] => 12372964 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/372964
Positive resist composition, method of forming resist pattern, and polymeric compound Feb 17, 2009 Issued
Array ( [id] => 5391560 [patent_doc_number] => 20090208873 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-08-20 [patent_title] => 'POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS' [patent_app_type] => utility [patent_app_number] => 12/371455 [patent_app_country] => US [patent_app_date] => 2009-02-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 20497 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0208/20090208873.pdf [firstpage_image] =>[orig_patent_app_number] => 12371455 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/371455
Polymer, resist composition, and patterning process Feb 12, 2009 Issued
Array ( [id] => 5391554 [patent_doc_number] => 20090208867 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-08-20 [patent_title] => 'Resist Composition, Resist Protective Coating Composition, and Patterning Process' [patent_app_type] => utility [patent_app_number] => 12/371347 [patent_app_country] => US [patent_app_date] => 2009-02-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 23258 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0208/20090208867.pdf [firstpage_image] =>[orig_patent_app_number] => 12371347 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/371347
Resist composition, resist protective coating composition, and patterning process Feb 12, 2009 Issued
Array ( [id] => 7550496 [patent_doc_number] => 08062828 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2011-11-22 [patent_title] => 'Positive resist composition and patterning process' [patent_app_type] => utility [patent_app_number] => 12/370652 [patent_app_country] => US [patent_app_date] => 2009-02-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 16949 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 25 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/08/062/08062828.pdf [firstpage_image] =>[orig_patent_app_number] => 12370652 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/370652
Positive resist composition and patterning process Feb 12, 2009 Issued
Array ( [id] => 8772151 [patent_doc_number] => 08426103 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-04-23 [patent_title] => 'Positive resist composition for use with electron beam, X-ray or EUV and pattern forming method using the same' [patent_app_type] => utility [patent_app_number] => 12/370368 [patent_app_country] => US [patent_app_date] => 2009-02-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 17768 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 125 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12370368 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/370368
Positive resist composition for use with electron beam, X-ray or EUV and pattern forming method using the same Feb 11, 2009 Issued
Array ( [id] => 7795605 [patent_doc_number] => 08124311 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2012-02-28 [patent_title] => 'Photosensitive molecular compound and photoresist composition including the same' [patent_app_type] => utility [patent_app_number] => 12/361833 [patent_app_country] => US [patent_app_date] => 2009-01-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4838 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 9 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/08/124/08124311.pdf [firstpage_image] =>[orig_patent_app_number] => 12361833 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/361833
Photosensitive molecular compound and photoresist composition including the same Jan 28, 2009 Issued
Array ( [id] => 7811129 [patent_doc_number] => 08133659 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2012-03-13 [patent_title] => 'On-track process for patterning hardmask by multiple dark field exposures' [patent_app_type] => utility [patent_app_number] => 12/362268 [patent_app_country] => US [patent_app_date] => 2009-01-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 20 [patent_no_of_words] => 8517 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 46 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/08/133/08133659.pdf [firstpage_image] =>[orig_patent_app_number] => 12362268 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/362268
On-track process for patterning hardmask by multiple dark field exposures Jan 28, 2009 Issued
Array ( [id] => 5379646 [patent_doc_number] => 20090191485 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-07-30 [patent_title] => 'MONOMER, RESIN, RESIST COMPOSITION USING THE RESIN, AND METHOD PRODUCING SEMICONDUCTOR DEVICE USING THE RESIST COMPOSITION' [patent_app_type] => utility [patent_app_number] => 12/360292 [patent_app_country] => US [patent_app_date] => 2009-01-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 8224 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0191/20090191485.pdf [firstpage_image] =>[orig_patent_app_number] => 12360292 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/360292
Monomer, resin, resist composition using the resin, and method producing semiconductor device using the resist composition Jan 26, 2009 Issued
Array ( [id] => 4527530 [patent_doc_number] => 07923195 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2011-04-12 [patent_title] => 'Positive resist composition and patterning process using the same' [patent_app_type] => utility [patent_app_number] => 12/320266 [patent_app_country] => US [patent_app_date] => 2009-01-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 24330 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 41 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/923/07923195.pdf [firstpage_image] =>[orig_patent_app_number] => 12320266 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/320266
Positive resist composition and patterning process using the same Jan 21, 2009 Issued
Array ( [id] => 4531809 [patent_doc_number] => 07887991 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2011-02-15 [patent_title] => 'Positive resist composition and patterning process using the same' [patent_app_type] => utility [patent_app_number] => 12/320265 [patent_app_country] => US [patent_app_date] => 2009-01-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 24523 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 41 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/887/07887991.pdf [firstpage_image] =>[orig_patent_app_number] => 12320265 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/320265
Positive resist composition and patterning process using the same Jan 21, 2009 Issued
Array ( [id] => 6229271 [patent_doc_number] => 20100183851 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-07-22 [patent_title] => 'Photoresist Image-forming Process Using Double Patterning' [patent_app_type] => utility [patent_app_number] => 12/356568 [patent_app_country] => US [patent_app_date] => 2009-01-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 10713 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0183/20100183851.pdf [firstpage_image] =>[orig_patent_app_number] => 12356568 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/356568
Photoresist Image-forming Process Using Double Patterning Jan 20, 2009 Abandoned
Array ( [id] => 5354954 [patent_doc_number] => 20090186298 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-07-23 [patent_title] => 'POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS' [patent_app_type] => utility [patent_app_number] => 12/355446 [patent_app_country] => US [patent_app_date] => 2009-01-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 10 [patent_no_of_words] => 19883 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0186/20090186298.pdf [firstpage_image] =>[orig_patent_app_number] => 12355446 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/355446
Positive resist compositions and patterning process Jan 15, 2009 Issued
Array ( [id] => 4431572 [patent_doc_number] => 07968276 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2011-06-28 [patent_title] => 'Positive resist composition and method of forming resist pattern' [patent_app_type] => utility [patent_app_number] => 12/351759 [patent_app_country] => US [patent_app_date] => 2009-01-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 28022 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 197 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/968/07968276.pdf [firstpage_image] =>[orig_patent_app_number] => 12351759 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/351759
Positive resist composition and method of forming resist pattern Jan 8, 2009 Issued
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