
Sin J. Lee
Examiner (ID: 7000, Phone: (571)272-1333 , Office: P/1722 )
| Most Active Art Unit | 1722 |
| Art Unit(s) | 1722, 1613, 1752, 1795 |
| Total Applications | 1756 |
| Issued Applications | 1186 |
| Pending Applications | 124 |
| Abandoned Applications | 462 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 5485212
[patent_doc_number] => 20090274977
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-11-05
[patent_title] => 'COMPOUND AND RADIATION-SENSITIVE COMPOSITION'
[patent_app_type] => utility
[patent_app_number] => 12/519519
[patent_app_country] => US
[patent_app_date] => 2008-01-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 13074
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0274/20090274977.pdf
[firstpage_image] =>[orig_patent_app_number] => 12519519
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/519519 | Compound and radiation-sensitive composition | Jan 7, 2008 | Issued |
Array
(
[id] => 11598330
[patent_doc_number] => 09645494
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2017-05-09
[patent_title] => 'Resist underlayer film forming composition containing low molecular weight dissolution accelerator'
[patent_app_type] => utility
[patent_app_number] => 12/448130
[patent_app_country] => US
[patent_app_date] => 2007-12-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 11356
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 169
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12448130
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/448130 | Resist underlayer film forming composition containing low molecular weight dissolution accelerator | Dec 10, 2007 | Issued |
Array
(
[id] => 9626266
[patent_doc_number] => 08795942
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2014-08-05
[patent_title] => 'Positive resist composition and patterning process'
[patent_app_type] => utility
[patent_app_number] => 12/000284
[patent_app_country] => US
[patent_app_date] => 2007-12-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 31041
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 22
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12000284
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/000284 | Positive resist composition and patterning process | Dec 10, 2007 | Issued |
Array
(
[id] => 5575332
[patent_doc_number] => 20090142694
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-06-04
[patent_title] => 'SILOXANE POLYMER COMPOSITIONS AND METHODS OF USING THE SAME'
[patent_app_type] => utility
[patent_app_number] => 11/948274
[patent_app_country] => US
[patent_app_date] => 2007-11-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 9428
[patent_no_of_claims] => 26
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0142/20090142694.pdf
[firstpage_image] =>[orig_patent_app_number] => 11948274
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/948274 | SILOXANE POLYMER COMPOSITIONS AND METHODS OF USING THE SAME | Nov 29, 2007 | Abandoned |
Array
(
[id] => 4899261
[patent_doc_number] => 20080118875
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-05-22
[patent_title] => 'Hardmask composition and associated methods'
[patent_app_type] => utility
[patent_app_number] => 11/984741
[patent_app_country] => US
[patent_app_date] => 2007-11-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 7752
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0118/20080118875.pdf
[firstpage_image] =>[orig_patent_app_number] => 11984741
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/984741 | Hardmask composition and associated methods | Nov 20, 2007 | Issued |
Array
(
[id] => 6374149
[patent_doc_number] => 20100081082
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-04-01
[patent_title] => 'COMPOSITION FOR RESIST UNDER LAYER FILM FORMATION AND METHOD FOR PATTERN FORMATION'
[patent_app_type] => utility
[patent_app_number] => 12/515061
[patent_app_country] => US
[patent_app_date] => 2007-11-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 11319
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0081/20100081082.pdf
[firstpage_image] =>[orig_patent_app_number] => 12515061
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/515061 | Pattern-forming method | Nov 18, 2007 | Issued |
Array
(
[id] => 4899249
[patent_doc_number] => 20080118863
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-05-22
[patent_title] => 'Positive resist compositions and patterning process'
[patent_app_type] => utility
[patent_app_number] => 11/984508
[patent_app_country] => US
[patent_app_date] => 2007-11-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 16104
[patent_no_of_claims] => 4
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0118/20080118863.pdf
[firstpage_image] =>[orig_patent_app_number] => 11984508
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/984508 | Positive resist compositions and patterning process | Nov 18, 2007 | Abandoned |
Array
(
[id] => 4879653
[patent_doc_number] => 20080153036
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-06-26
[patent_title] => 'Chemically amplified positive resist compostion'
[patent_app_type] => utility
[patent_app_number] => 11/984098
[patent_app_country] => US
[patent_app_date] => 2007-11-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 12030
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0153/20080153036.pdf
[firstpage_image] =>[orig_patent_app_number] => 11984098
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/984098 | Chemically amplified positive resist composition | Nov 12, 2007 | Issued |
Array
(
[id] => 4921845
[patent_doc_number] => 20080070160
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-03-20
[patent_title] => 'Negative-working photosensitive resin composition and photosensitive resin plate using the same'
[patent_app_type] => utility
[patent_app_number] => 11/979512
[patent_app_country] => US
[patent_app_date] => 2007-11-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5080
[patent_no_of_claims] => 4
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0070/20080070160.pdf
[firstpage_image] =>[orig_patent_app_number] => 11979512
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/979512 | Negative-working photosensitive resin composition and photosensitive resin plate using the same | Nov 4, 2007 | Abandoned |
Array
(
[id] => 4727138
[patent_doc_number] => 20080206680
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-08-28
[patent_title] => 'Composition for forming anti-reflective coating for use in lithography'
[patent_app_type] => utility
[patent_app_number] => 11/979448
[patent_app_country] => US
[patent_app_date] => 2007-11-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 19587
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0206/20080206680.pdf
[firstpage_image] =>[orig_patent_app_number] => 11979448
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/979448 | Composition for forming anti-reflective coating for use in lithography | Nov 1, 2007 | Issued |
Array
(
[id] => 7751110
[patent_doc_number] => 08110334
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2012-02-07
[patent_title] => 'Radiation-sensitive composition'
[patent_app_type] => utility
[patent_app_number] => 12/312258
[patent_app_country] => US
[patent_app_date] => 2007-11-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 60871
[patent_no_of_claims] => 4
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 10
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/08/110/08110334.pdf
[firstpage_image] =>[orig_patent_app_number] => 12312258
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/312258 | Radiation-sensitive composition | Oct 31, 2007 | Issued |
Array
(
[id] => 5330578
[patent_doc_number] => 20090111055
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-04-30
[patent_title] => 'METHOD OF FORMING AN IMAGE HAVING MULTIPLE PHASES'
[patent_app_type] => utility
[patent_app_number] => 11/930800
[patent_app_country] => US
[patent_app_date] => 2007-10-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 5604
[patent_no_of_claims] => 25
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0111/20090111055.pdf
[firstpage_image] =>[orig_patent_app_number] => 11930800
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/930800 | Method of forming an image having multiple phases | Oct 30, 2007 | Issued |
Array
(
[id] => 8270110
[patent_doc_number] => 08211615
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2012-07-03
[patent_title] => 'Copolymer for immersion lithography and compositions'
[patent_app_type] => utility
[patent_app_number] => 12/445948
[patent_app_country] => US
[patent_app_date] => 2007-10-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 11883
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 126
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12445948
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/445948 | Copolymer for immersion lithography and compositions | Oct 29, 2007 | Issued |
Array
(
[id] => 4893305
[patent_doc_number] => 20080102403
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-05-01
[patent_title] => 'Photoresist compositions and methods of forming a pattern using the same'
[patent_app_type] => utility
[patent_app_number] => 11/977893
[patent_app_country] => US
[patent_app_date] => 2007-10-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 7326
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0102/20080102403.pdf
[firstpage_image] =>[orig_patent_app_number] => 11977893
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/977893 | Photoresist compositions and methods of forming a pattern using the same | Oct 25, 2007 | Abandoned |
Array
(
[id] => 263568
[patent_doc_number] => 07569326
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-08-04
[patent_title] => 'Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process'
[patent_app_type] => utility
[patent_app_number] => 11/976564
[patent_app_country] => US
[patent_app_date] => 2007-10-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 23727
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 11
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/569/07569326.pdf
[firstpage_image] =>[orig_patent_app_number] => 11976564
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/976564 | Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process | Oct 24, 2007 | Issued |
Array
(
[id] => 6593871
[patent_doc_number] => 20100062371
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-03-11
[patent_title] => 'Copolymer and composition for semiconductor lithography and process for producing the copolymer'
[patent_app_type] => utility
[patent_app_number] => 12/311993
[patent_app_country] => US
[patent_app_date] => 2007-10-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 12426
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 10
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0062/20100062371.pdf
[firstpage_image] =>[orig_patent_app_number] => 12311993
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/311993 | Copolymer and composition for semiconductor lithography and process for producing the copolymer | Oct 18, 2007 | Issued |
Array
(
[id] => 10831022
[patent_doc_number] => 08859187
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2014-10-14
[patent_title] => 'Method of forming resist pattern and negative resist composition'
[patent_app_type] => utility
[patent_app_number] => 12/438906
[patent_app_country] => US
[patent_app_date] => 2007-10-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 6
[patent_no_of_words] => 28222
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 198
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12438906
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/438906 | Method of forming resist pattern and negative resist composition | Oct 18, 2007 | Issued |
Array
(
[id] => 4688048
[patent_doc_number] => 20080032229
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-02-07
[patent_title] => 'BOTTOM ANTIREFLECTIVE COATINGS'
[patent_app_type] => utility
[patent_app_number] => 11/873522
[patent_app_country] => US
[patent_app_date] => 2007-10-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4126
[patent_no_of_claims] => 25
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0032/20080032229.pdf
[firstpage_image] =>[orig_patent_app_number] => 11873522
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/873522 | BOTTOM ANTIREFLECTIVE COATINGS | Oct 16, 2007 | Abandoned |
Array
(
[id] => 52622
[patent_doc_number] => 07771914
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-08-10
[patent_title] => 'Resist composition and patterning process'
[patent_app_type] => utility
[patent_app_number] => 11/872952
[patent_app_country] => US
[patent_app_date] => 2007-10-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 19468
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 23
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/771/07771914.pdf
[firstpage_image] =>[orig_patent_app_number] => 11872952
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/872952 | Resist composition and patterning process | Oct 15, 2007 | Issued |
Array
(
[id] => 6370729
[patent_doc_number] => 20100075249
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-03-25
[patent_title] => 'POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN'
[patent_app_type] => utility
[patent_app_number] => 12/447432
[patent_app_country] => US
[patent_app_date] => 2007-10-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 27839
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0075/20100075249.pdf
[firstpage_image] =>[orig_patent_app_number] => 12447432
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/447432 | Positive resist composition and method of forming resist pattern | Oct 14, 2007 | Issued |