
Sin J. Lee
Examiner (ID: 7000, Phone: (571)272-1333 , Office: P/1722 )
| Most Active Art Unit | 1722 |
| Art Unit(s) | 1722, 1613, 1752, 1795 |
| Total Applications | 1756 |
| Issued Applications | 1186 |
| Pending Applications | 124 |
| Abandoned Applications | 462 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 10876003
[patent_doc_number] => 08900788
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2014-12-02
[patent_title] => 'Resist composition for immersion exposure and method of forming resist pattern'
[patent_app_type] => utility
[patent_app_number] => 12/445192
[patent_app_country] => US
[patent_app_date] => 2007-10-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 25600
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 94
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12445192
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/445192 | Resist composition for immersion exposure and method of forming resist pattern | Oct 11, 2007 | Issued |
Array
(
[id] => 10870036
[patent_doc_number] => 08895229
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2014-11-25
[patent_title] => 'Composition for formation of upper layer film, and method for formation of photoresist pattern'
[patent_app_type] => utility
[patent_app_number] => 12/445152
[patent_app_country] => US
[patent_app_date] => 2007-10-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 3
[patent_no_of_words] => 18873
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 163
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12445152
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/445152 | Composition for formation of upper layer film, and method for formation of photoresist pattern | Oct 10, 2007 | Issued |
Array
(
[id] => 4573113
[patent_doc_number] => 07855045
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-12-21
[patent_title] => 'Immersion topcoat materials with improved performance'
[patent_app_type] => utility
[patent_app_number] => 11/868320
[patent_app_country] => US
[patent_app_date] => 2007-10-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 4087
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 43
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/855/07855045.pdf
[firstpage_image] =>[orig_patent_app_number] => 11868320
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/868320 | Immersion topcoat materials with improved performance | Oct 4, 2007 | Issued |
Array
(
[id] => 4745571
[patent_doc_number] => 20080090173
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-04-17
[patent_title] => 'POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS'
[patent_app_type] => utility
[patent_app_number] => 11/905726
[patent_app_country] => US
[patent_app_date] => 2007-10-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 18393
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0090/20080090173.pdf
[firstpage_image] =>[orig_patent_app_number] => 11905726
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/905726 | POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | Oct 2, 2007 | Abandoned |
Array
(
[id] => 4943967
[patent_doc_number] => 20080081292
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-04-03
[patent_title] => 'RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME'
[patent_app_type] => utility
[patent_app_number] => 11/863314
[patent_app_country] => US
[patent_app_date] => 2007-09-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 14804
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0081/20080081292.pdf
[firstpage_image] =>[orig_patent_app_number] => 11863314
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/863314 | RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | Sep 27, 2007 | Abandoned |
Array
(
[id] => 4692697
[patent_doc_number] => 20080085468
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-04-10
[patent_title] => 'RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME'
[patent_app_type] => utility
[patent_app_number] => 11/864049
[patent_app_country] => US
[patent_app_date] => 2007-09-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 22722
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0085/20080085468.pdf
[firstpage_image] =>[orig_patent_app_number] => 11864049
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/864049 | Resist composition and pattern forming method using the same | Sep 27, 2007 | Issued |
Array
(
[id] => 5508382
[patent_doc_number] => 20090081589
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-03-26
[patent_title] => 'THICK FILM RESISTS'
[patent_app_type] => utility
[patent_app_number] => 11/860675
[patent_app_country] => US
[patent_app_date] => 2007-09-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 10233
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0081/20090081589.pdf
[firstpage_image] =>[orig_patent_app_number] => 11860675
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/860675 | Thick film resists | Sep 24, 2007 | Issued |
Array
(
[id] => 8104375
[patent_doc_number] => 08153836
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2012-04-10
[patent_title] => 'Silsesquioxane compound mixture, hydrolyzable silane compound, making methods, resist composition, patterning process, and substrate processing'
[patent_app_type] => utility
[patent_app_number] => 11/860872
[patent_app_country] => US
[patent_app_date] => 2007-09-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 21219
[patent_no_of_claims] => 1
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 167
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/08/153/08153836.pdf
[firstpage_image] =>[orig_patent_app_number] => 11860872
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/860872 | Silsesquioxane compound mixture, hydrolyzable silane compound, making methods, resist composition, patterning process, and substrate processing | Sep 24, 2007 | Issued |
Array
(
[id] => 4943965
[patent_doc_number] => 20080081290
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-04-03
[patent_title] => 'RESIST COMPOSITION, RESIN FOR USE IN THE RESIST COMPOSITION, COMPOUND FOR USE IN THE SYNTHESIS OF THE RESIN, AND PATTERN-FORMING METHOD USING THE RESIST COMPOSITION'
[patent_app_type] => utility
[patent_app_number] => 11/860585
[patent_app_country] => US
[patent_app_date] => 2007-09-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 32596
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0081/20080081290.pdf
[firstpage_image] =>[orig_patent_app_number] => 11860585
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/860585 | Resist composition, resin for use in the resist composition, compound for use in the synthesis of the resin, and pattern-forming method using the resist composition | Sep 24, 2007 | Issued |
Array
(
[id] => 5508391
[patent_doc_number] => 20090081598
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-03-26
[patent_title] => 'FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME'
[patent_app_type] => utility
[patent_app_number] => 11/859804
[patent_app_country] => US
[patent_app_date] => 2007-09-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 7417
[patent_no_of_claims] => 2
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0081/20090081598.pdf
[firstpage_image] =>[orig_patent_app_number] => 11859804
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/859804 | FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME | Sep 23, 2007 | Abandoned |
Array
(
[id] => 5508372
[patent_doc_number] => 20090081579
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-03-26
[patent_title] => 'FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME'
[patent_app_type] => utility
[patent_app_number] => 11/859805
[patent_app_country] => US
[patent_app_date] => 2007-09-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 7413
[patent_no_of_claims] => 2
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0081/20090081579.pdf
[firstpage_image] =>[orig_patent_app_number] => 11859805
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/859805 | FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME | Sep 23, 2007 | Abandoned |
Array
(
[id] => 8176664
[patent_doc_number] => 08178284
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2012-05-15
[patent_title] => 'Method of forming pattern'
[patent_app_type] => utility
[patent_app_number] => 12/440711
[patent_app_country] => US
[patent_app_date] => 2007-09-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 9
[patent_no_of_words] => 22900
[patent_no_of_claims] => 3
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 182
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/08/178/08178284.pdf
[firstpage_image] =>[orig_patent_app_number] => 12440711
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/440711 | Method of forming pattern | Sep 20, 2007 | Issued |
Array
(
[id] => 8151883
[patent_doc_number] => 08168372
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2012-05-01
[patent_title] => 'Method of creating photolithographic structures with developer-trimmed hard mask'
[patent_app_type] => utility
[patent_app_number] => 11/858546
[patent_app_country] => US
[patent_app_date] => 2007-09-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 13
[patent_no_of_words] => 6484
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 7
[patent_words_short_claim] => 12
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/08/168/08168372.pdf
[firstpage_image] =>[orig_patent_app_number] => 11858546
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/858546 | Method of creating photolithographic structures with developer-trimmed hard mask | Sep 19, 2007 | Issued |
Array
(
[id] => 4943963
[patent_doc_number] => 20080081288
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-04-03
[patent_title] => 'PHOTOSENSITIVE COMPOSITION, COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION, AND PATTERN-FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION'
[patent_app_type] => utility
[patent_app_number] => 11/857645
[patent_app_country] => US
[patent_app_date] => 2007-09-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 24562
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0081/20080081288.pdf
[firstpage_image] =>[orig_patent_app_number] => 11857645
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/857645 | Photosensitive composition, compound for use in the photosensitive composition, and pattern-forming method using the photosensitive composition | Sep 18, 2007 | Issued |
Array
(
[id] => 4921848
[patent_doc_number] => 20080070163
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-03-20
[patent_title] => 'PROCESSLESS LITHOGRAPHIC PRINTING PLATE PRECURSOR'
[patent_app_type] => utility
[patent_app_number] => 11/854596
[patent_app_country] => US
[patent_app_date] => 2007-09-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 13718
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0070/20080070163.pdf
[firstpage_image] =>[orig_patent_app_number] => 11854596
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/854596 | PROCESSLESS LITHOGRAPHIC PRINTING PLATE PRECURSOR | Sep 12, 2007 | Abandoned |
Array
(
[id] => 4921840
[patent_doc_number] => 20080070155
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-03-20
[patent_title] => 'INCLUSION COMPLEX, PHOTORESIST COMPOSITION HAVING THE INCLUSION COMPLEX AND METHOD OF FORMING A PATTERN USING THE PHOTORESIST COMPOSITION'
[patent_app_type] => utility
[patent_app_number] => 11/853075
[patent_app_country] => US
[patent_app_date] => 2007-09-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 6672
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0070/20080070155.pdf
[firstpage_image] =>[orig_patent_app_number] => 11853075
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/853075 | INCLUSION COMPLEX, PHOTORESIST COMPOSITION HAVING THE INCLUSION COMPLEX AND METHOD OF FORMING A PATTERN USING THE PHOTORESIST COMPOSITION | Sep 10, 2007 | Abandoned |
Array
(
[id] => 4921846
[patent_doc_number] => 20080070161
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-03-20
[patent_title] => 'MONOMER, POLYMER AND COMPOSITION FOR PHOTORESIST'
[patent_app_type] => utility
[patent_app_number] => 11/852664
[patent_app_country] => US
[patent_app_date] => 2007-09-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 8827
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0070/20080070161.pdf
[firstpage_image] =>[orig_patent_app_number] => 11852664
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/852664 | Monomer, polymer and composition for photoresist | Sep 9, 2007 | Issued |
Array
(
[id] => 4959996
[patent_doc_number] => 20080274421
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-11-06
[patent_title] => 'PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME'
[patent_app_type] => utility
[patent_app_number] => 11/847629
[patent_app_country] => US
[patent_app_date] => 2007-08-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 26595
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0274/20080274421.pdf
[firstpage_image] =>[orig_patent_app_number] => 11847629
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/847629 | Photosensitive composition and pattern forming method using the same | Aug 29, 2007 | Issued |
Array
(
[id] => 5569696
[patent_doc_number] => 20090253074
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-10-08
[patent_title] => 'FLUORINATED POLYMERS FOR USE IN IMMERSION LITHOGRAPHY'
[patent_app_type] => utility
[patent_app_number] => 12/305265
[patent_app_country] => US
[patent_app_date] => 2007-08-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5965
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0253/20090253074.pdf
[firstpage_image] =>[orig_patent_app_number] => 12305265
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/305265 | Fluorinated polymers for use in immersion lithography | Aug 13, 2007 | Issued |
Array
(
[id] => 4651408
[patent_doc_number] => 20080038664
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-02-14
[patent_title] => 'Silsesquioxane compound mixture, method of making, resist composition, and patterning process'
[patent_app_type] => utility
[patent_app_number] => 11/882664
[patent_app_country] => US
[patent_app_date] => 2007-08-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 16277
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0038/20080038664.pdf
[firstpage_image] =>[orig_patent_app_number] => 11882664
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/882664 | Silsesquioxane compound mixture, method of making, resist composition, and patterning process | Aug 2, 2007 | Abandoned |