
Sin J. Lee
Examiner (ID: 7000, Phone: (571)272-1333 , Office: P/1722 )
| Most Active Art Unit | 1722 |
| Art Unit(s) | 1722, 1613, 1752, 1795 |
| Total Applications | 1756 |
| Issued Applications | 1186 |
| Pending Applications | 124 |
| Abandoned Applications | 462 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 167756
[patent_doc_number] => RE041128
[patent_country] => US
[patent_kind] => E1
[patent_issue_date] => 2010-02-16
[patent_title] => 'Organic anti-reflective coating compositions for advanced microlithography'
[patent_app_type] => reissue
[patent_app_number] => 11/657983
[patent_app_country] => US
[patent_app_date] => 2007-01-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[patent_no_of_words] => 4299
[patent_no_of_claims] => 38
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[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/RE/041/RE041128.pdf
[firstpage_image] =>[orig_patent_app_number] => 11657983
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/657983 | Organic anti-reflective coating compositions for advanced microlithography | Jan 24, 2007 | Issued |
Array
(
[id] => 5159716
[patent_doc_number] => 20070172760
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-07-26
[patent_title] => 'Photosensitive polymer and photoresist composition having the same'
[patent_app_type] => utility
[patent_app_number] => 11/655977
[patent_app_country] => US
[patent_app_date] => 2007-01-22
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0172/20070172760.pdf
[firstpage_image] =>[orig_patent_app_number] => 11655977
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/655977 | Photosensitive polymer and photoresist composition having the same | Jan 21, 2007 | Issued |
Array
(
[id] => 5175095
[patent_doc_number] => 20070176153
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-08-02
[patent_title] => 'ELECTROMAGNETIC WAVE SHIELDING FILM, METHOD OF MANUFACTURING THE SAME, ELECTROMAGNETIC WAVE SHIELDING FILM FOR PLASMA DISPLAY PANEL, AND OPTICAL FILM'
[patent_app_type] => utility
[patent_app_number] => 11/624793
[patent_app_country] => US
[patent_app_date] => 2007-01-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[patent_no_of_words] => 12352
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[pdf_file] => publications/A1/0176/20070176153.pdf
[firstpage_image] =>[orig_patent_app_number] => 11624793
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/624793 | ELECTROMAGNETIC WAVE SHIELDING FILM, METHOD OF MANUFACTURING THE SAME, ELECTROMAGNETIC WAVE SHIELDING FILM FOR PLASMA DISPLAY PANEL, AND OPTICAL FILM | Jan 18, 2007 | Abandoned |
Array
(
[id] => 5521306
[patent_doc_number] => 20090029287
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-01-29
[patent_title] => 'PHOTOSENSITIVE RESIN COMPOSITION'
[patent_app_type] => utility
[patent_app_number] => 12/097623
[patent_app_country] => US
[patent_app_date] => 2007-01-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[patent_no_of_words] => 3978
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[pdf_file] => publications/A1/0029/20090029287.pdf
[firstpage_image] =>[orig_patent_app_number] => 12097623
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/097623 | PHOTOSENSITIVE RESIN COMPOSITION | Jan 18, 2007 | Abandoned |
Array
(
[id] => 5188336
[patent_doc_number] => 20070166644
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-07-19
[patent_title] => 'Photoresist composition and method of forming a photoresist pattern using the same'
[patent_app_type] => utility
[patent_app_number] => 11/655158
[patent_app_country] => US
[patent_app_date] => 2007-01-19
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0166/20070166644.pdf
[firstpage_image] =>[orig_patent_app_number] => 11655158
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/655158 | Photoresist composition and method of forming a photoresist pattern using the same | Jan 18, 2007 | Abandoned |
Array
(
[id] => 4807692
[patent_doc_number] => 20080171270
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-07-17
[patent_title] => 'Polymers Useful in Photoresist Compositions and Compositions Thereof'
[patent_app_type] => utility
[patent_app_number] => 11/623335
[patent_app_country] => US
[patent_app_date] => 2007-01-16
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[firstpage_image] =>[orig_patent_app_number] => 11623335
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/623335 | Polymers Useful in Photoresist Compositions and Compositions Thereof | Jan 15, 2007 | Abandoned |
Array
(
[id] => 5095436
[patent_doc_number] => 20070117045
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-05-24
[patent_title] => 'CHEMICAL AMPLIFICATION TYPE POSITIVE PHOTORESIST COMPOSITION AND RESIST PATTERN FORMING METHOD'
[patent_app_type] => utility
[patent_app_number] => 11/622988
[patent_app_country] => US
[patent_app_date] => 2007-01-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 16858
[patent_no_of_claims] => 46
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[pdf_file] => publications/A1/0117/20070117045.pdf
[firstpage_image] =>[orig_patent_app_number] => 11622988
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/622988 | CHEMICAL AMPLIFICATION TYPE POSITIVE PHOTORESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | Jan 11, 2007 | Abandoned |
Array
(
[id] => 151465
[patent_doc_number] => 07678530
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-03-16
[patent_title] => 'Lactone-containing compound, polymer, resist composition, and patterning process'
[patent_app_type] => utility
[patent_app_number] => 11/649251
[patent_app_country] => US
[patent_app_date] => 2007-01-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[patent_no_of_words] => 19387
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[pdf_file] => patents/07/678/07678530.pdf
[firstpage_image] =>[orig_patent_app_number] => 11649251
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/649251 | Lactone-containing compound, polymer, resist composition, and patterning process | Jan 3, 2007 | Issued |
Array
(
[id] => 4971139
[patent_doc_number] => 20070111141
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-05-17
[patent_title] => 'Negative-working photosensitive resin composition and photosensitive resin plate using the same'
[patent_app_type] => utility
[patent_app_number] => 11/646326
[patent_app_country] => US
[patent_app_date] => 2006-12-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[patent_no_of_words] => 5064
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[pdf_file] => publications/A1/0111/20070111141.pdf
[firstpage_image] =>[orig_patent_app_number] => 11646326
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/646326 | Negative-working photosensitive resin composition and photosensitive resin plate using the same | Dec 27, 2006 | Abandoned |
Array
(
[id] => 111348
[patent_doc_number] => 07718342
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-05-18
[patent_title] => 'Polymers, resist compositions and patterning process'
[patent_app_type] => utility
[patent_app_number] => 11/645751
[patent_app_country] => US
[patent_app_date] => 2006-12-27
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[pdf_file] => patents/07/718/07718342.pdf
[firstpage_image] =>[orig_patent_app_number] => 11645751
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/645751 | Polymers, resist compositions and patterning process | Dec 26, 2006 | Issued |
Array
(
[id] => 6291974
[patent_doc_number] => 20100159389
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-06-24
[patent_title] => 'RESIN, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN'
[patent_app_type] => utility
[patent_app_number] => 12/160742
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/160742 | Resin, resist composition and method of forming resist pattern | Dec 25, 2006 | Issued |
Array
(
[id] => 5079520
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[patent_title] => 'Positive-working photoresist composition and photosensitive material using same'
[patent_app_type] => utility
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Array
(
[id] => 7689335
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[patent_title] => 'Antireflective Hardmask and Uses Thereof'
[patent_app_type] => utility
[patent_app_number] => 11/614799
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[firstpage_image] =>[orig_patent_app_number] => 11614799
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/614799 | Antireflective hardmask and uses thereof | Dec 20, 2006 | Issued |
Array
(
[id] => 359528
[patent_doc_number] => 07485407
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[patent_issue_date] => 2009-02-03
[patent_title] => 'Siloxane compound, photoresist composition including the siloxane compound and method of forming a pattern using the photoresist composition'
[patent_app_type] => utility
[patent_app_number] => 11/640172
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Array
(
[id] => 5545836
[patent_doc_number] => 20090155713
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[patent_title] => 'RESIST COMPOSITION AND PROCESS FOR PRODUCING SAME'
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Array
(
[id] => 52617
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Array
(
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[patent_issue_date] => 2014-03-25
[patent_title] => 'Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition'
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Array
(
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[patent_title] => 'Planographic printing plate precursor'
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Array
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/094399 | Resist composition for immersion exposure and method of forming resist pattern | Dec 7, 2006 | Issued |
Array
(
[id] => 326429
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[firstpage_image] =>[orig_patent_app_number] => 11633167
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/633167 | Hard mask composition for lithography process | Dec 3, 2006 | Issued |