Search

Sin J. Lee

Examiner (ID: 7000, Phone: (571)272-1333 , Office: P/1722 )

Most Active Art Unit
1722
Art Unit(s)
1722, 1613, 1752, 1795
Total Applications
1756
Issued Applications
1186
Pending Applications
124
Abandoned Applications
462

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 167756 [patent_doc_number] => RE041128 [patent_country] => US [patent_kind] => E1 [patent_issue_date] => 2010-02-16 [patent_title] => 'Organic anti-reflective coating compositions for advanced microlithography' [patent_app_type] => reissue [patent_app_number] => 11/657983 [patent_app_country] => US [patent_app_date] => 2007-01-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 4299 [patent_no_of_claims] => 38 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 16 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/RE/041/RE041128.pdf [firstpage_image] =>[orig_patent_app_number] => 11657983 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/657983
Organic anti-reflective coating compositions for advanced microlithography Jan 24, 2007 Issued
Array ( [id] => 5159716 [patent_doc_number] => 20070172760 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-07-26 [patent_title] => 'Photosensitive polymer and photoresist composition having the same' [patent_app_type] => utility [patent_app_number] => 11/655977 [patent_app_country] => US [patent_app_date] => 2007-01-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3919 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0172/20070172760.pdf [firstpage_image] =>[orig_patent_app_number] => 11655977 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/655977
Photosensitive polymer and photoresist composition having the same Jan 21, 2007 Issued
Array ( [id] => 5175095 [patent_doc_number] => 20070176153 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-08-02 [patent_title] => 'ELECTROMAGNETIC WAVE SHIELDING FILM, METHOD OF MANUFACTURING THE SAME, ELECTROMAGNETIC WAVE SHIELDING FILM FOR PLASMA DISPLAY PANEL, AND OPTICAL FILM' [patent_app_type] => utility [patent_app_number] => 11/624793 [patent_app_country] => US [patent_app_date] => 2007-01-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 12352 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0176/20070176153.pdf [firstpage_image] =>[orig_patent_app_number] => 11624793 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/624793
ELECTROMAGNETIC WAVE SHIELDING FILM, METHOD OF MANUFACTURING THE SAME, ELECTROMAGNETIC WAVE SHIELDING FILM FOR PLASMA DISPLAY PANEL, AND OPTICAL FILM Jan 18, 2007 Abandoned
Array ( [id] => 5521306 [patent_doc_number] => 20090029287 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-01-29 [patent_title] => 'PHOTOSENSITIVE RESIN COMPOSITION' [patent_app_type] => utility [patent_app_number] => 12/097623 [patent_app_country] => US [patent_app_date] => 2007-01-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3978 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0029/20090029287.pdf [firstpage_image] =>[orig_patent_app_number] => 12097623 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/097623
PHOTOSENSITIVE RESIN COMPOSITION Jan 18, 2007 Abandoned
Array ( [id] => 5188336 [patent_doc_number] => 20070166644 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-07-19 [patent_title] => 'Photoresist composition and method of forming a photoresist pattern using the same' [patent_app_type] => utility [patent_app_number] => 11/655158 [patent_app_country] => US [patent_app_date] => 2007-01-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 7527 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0166/20070166644.pdf [firstpage_image] =>[orig_patent_app_number] => 11655158 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/655158
Photoresist composition and method of forming a photoresist pattern using the same Jan 18, 2007 Abandoned
Array ( [id] => 4807692 [patent_doc_number] => 20080171270 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-07-17 [patent_title] => 'Polymers Useful in Photoresist Compositions and Compositions Thereof' [patent_app_type] => utility [patent_app_number] => 11/623335 [patent_app_country] => US [patent_app_date] => 2007-01-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 9254 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0171/20080171270.pdf [firstpage_image] =>[orig_patent_app_number] => 11623335 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/623335
Polymers Useful in Photoresist Compositions and Compositions Thereof Jan 15, 2007 Abandoned
Array ( [id] => 5095436 [patent_doc_number] => 20070117045 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-05-24 [patent_title] => 'CHEMICAL AMPLIFICATION TYPE POSITIVE PHOTORESIST COMPOSITION AND RESIST PATTERN FORMING METHOD' [patent_app_type] => utility [patent_app_number] => 11/622988 [patent_app_country] => US [patent_app_date] => 2007-01-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 16858 [patent_no_of_claims] => 46 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0117/20070117045.pdf [firstpage_image] =>[orig_patent_app_number] => 11622988 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/622988
CHEMICAL AMPLIFICATION TYPE POSITIVE PHOTORESIST COMPOSITION AND RESIST PATTERN FORMING METHOD Jan 11, 2007 Abandoned
Array ( [id] => 151465 [patent_doc_number] => 07678530 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-03-16 [patent_title] => 'Lactone-containing compound, polymer, resist composition, and patterning process' [patent_app_type] => utility [patent_app_number] => 11/649251 [patent_app_country] => US [patent_app_date] => 2007-01-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 19387 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 10 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/678/07678530.pdf [firstpage_image] =>[orig_patent_app_number] => 11649251 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/649251
Lactone-containing compound, polymer, resist composition, and patterning process Jan 3, 2007 Issued
Array ( [id] => 4971139 [patent_doc_number] => 20070111141 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-05-17 [patent_title] => 'Negative-working photosensitive resin composition and photosensitive resin plate using the same' [patent_app_type] => utility [patent_app_number] => 11/646326 [patent_app_country] => US [patent_app_date] => 2006-12-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5064 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0111/20070111141.pdf [firstpage_image] =>[orig_patent_app_number] => 11646326 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/646326
Negative-working photosensitive resin composition and photosensitive resin plate using the same Dec 27, 2006 Abandoned
Array ( [id] => 111348 [patent_doc_number] => 07718342 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-05-18 [patent_title] => 'Polymers, resist compositions and patterning process' [patent_app_type] => utility [patent_app_number] => 11/645751 [patent_app_country] => US [patent_app_date] => 2006-12-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 16562 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 81 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/718/07718342.pdf [firstpage_image] =>[orig_patent_app_number] => 11645751 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/645751
Polymers, resist compositions and patterning process Dec 26, 2006 Issued
Array ( [id] => 6291974 [patent_doc_number] => 20100159389 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-06-24 [patent_title] => 'RESIN, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN' [patent_app_type] => utility [patent_app_number] => 12/160742 [patent_app_country] => US [patent_app_date] => 2006-12-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 20202 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0159/20100159389.pdf [firstpage_image] =>[orig_patent_app_number] => 12160742 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/160742
Resin, resist composition and method of forming resist pattern Dec 25, 2006 Issued
Array ( [id] => 5079520 [patent_doc_number] => 20070122744 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-05-31 [patent_title] => 'Positive-working photoresist composition and photosensitive material using same' [patent_app_type] => utility [patent_app_number] => 11/644940 [patent_app_country] => US [patent_app_date] => 2006-12-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4881 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0122/20070122744.pdf [firstpage_image] =>[orig_patent_app_number] => 11644940 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/644940
Positive-working photoresist composition and photosensitive material using same Dec 25, 2006 Abandoned
Array ( [id] => 7689335 [patent_doc_number] => 20070105363 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-05-10 [patent_title] => 'Antireflective Hardmask and Uses Thereof' [patent_app_type] => utility [patent_app_number] => 11/614799 [patent_app_country] => US [patent_app_date] => 2006-12-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 6639 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0105/20070105363.pdf [firstpage_image] =>[orig_patent_app_number] => 11614799 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/614799
Antireflective hardmask and uses thereof Dec 20, 2006 Issued
Array ( [id] => 359528 [patent_doc_number] => 07485407 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-02-03 [patent_title] => 'Siloxane compound, photoresist composition including the siloxane compound and method of forming a pattern using the photoresist composition' [patent_app_type] => utility [patent_app_number] => 11/640172 [patent_app_country] => US [patent_app_date] => 2006-12-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 4 [patent_no_of_words] => 5041 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 8 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/485/07485407.pdf [firstpage_image] =>[orig_patent_app_number] => 11640172 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/640172
Siloxane compound, photoresist composition including the siloxane compound and method of forming a pattern using the photoresist composition Dec 17, 2006 Issued
Array ( [id] => 5545836 [patent_doc_number] => 20090155713 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-06-18 [patent_title] => 'RESIST COMPOSITION AND PROCESS FOR PRODUCING SAME' [patent_app_type] => utility [patent_app_number] => 12/097866 [patent_app_country] => US [patent_app_date] => 2006-12-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 14963 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0155/20090155713.pdf [firstpage_image] =>[orig_patent_app_number] => 12097866 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/097866
RESIST COMPOSITION AND PROCESS FOR PRODUCING SAME Dec 10, 2006 Abandoned
Array ( [id] => 52617 [patent_doc_number] => 07771912 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-08-10 [patent_title] => 'Positive resist composition and pattern forming method using the same' [patent_app_type] => utility [patent_app_number] => 11/636517 [patent_app_country] => US [patent_app_date] => 2006-12-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 5 [patent_no_of_words] => 24230 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 106 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/771/07771912.pdf [firstpage_image] =>[orig_patent_app_number] => 11636517 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/636517
Positive resist composition and pattern forming method using the same Dec 10, 2006 Issued
Array ( [id] => 9375462 [patent_doc_number] => 08679724 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-03-25 [patent_title] => 'Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition' [patent_app_type] => utility [patent_app_number] => 11/636482 [patent_app_country] => US [patent_app_date] => 2006-12-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 26845 [patent_no_of_claims] => 33 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 90 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 11636482 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/636482
Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition Dec 10, 2006 Issued
Array ( [id] => 5079519 [patent_doc_number] => 20070122743 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-05-31 [patent_title] => 'Planographic printing plate precursor' [patent_app_type] => utility [patent_app_number] => 11/635481 [patent_app_country] => US [patent_app_date] => 2006-12-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 36040 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0122/20070122743.pdf [firstpage_image] =>[orig_patent_app_number] => 11635481 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/635481
Planographic printing plate precursor Dec 7, 2006 Abandoned
Array ( [id] => 8213734 [patent_doc_number] => 08192914 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2012-06-05 [patent_title] => 'Resist composition for immersion exposure and method of forming resist pattern' [patent_app_type] => utility [patent_app_number] => 12/094399 [patent_app_country] => US [patent_app_date] => 2006-12-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 21020 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 123 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/08/192/08192914.pdf [firstpage_image] =>[orig_patent_app_number] => 12094399 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/094399
Resist composition for immersion exposure and method of forming resist pattern Dec 7, 2006 Issued
Array ( [id] => 326429 [patent_doc_number] => 07514200 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-04-07 [patent_title] => 'Hard mask composition for lithography process' [patent_app_type] => utility [patent_app_number] => 11/633167 [patent_app_country] => US [patent_app_date] => 2006-12-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 11 [patent_no_of_words] => 2924 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 21 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/514/07514200.pdf [firstpage_image] =>[orig_patent_app_number] => 11633167 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/633167
Hard mask composition for lithography process Dec 3, 2006 Issued
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