
Sin J. Lee
Examiner (ID: 7000, Phone: (571)272-1333 , Office: P/1722 )
| Most Active Art Unit | 1722 |
| Art Unit(s) | 1722, 1613, 1752, 1795 |
| Total Applications | 1756 |
| Issued Applications | 1186 |
| Pending Applications | 124 |
| Abandoned Applications | 462 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 5193808
[patent_doc_number] => 20070082292
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-04-12
[patent_title] => 'Water-soluble material, chemically amplified resist and pattern formation method using the same'
[patent_app_type] => utility
[patent_app_number] => 11/602377
[patent_app_country] => US
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/602377 | Water-soluble material, chemically amplified resist and pattern formation method using the same | Nov 20, 2006 | Abandoned |
Array
(
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[patent_title] => 'NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS'
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[patent_app_country] => US
[patent_app_date] => 2006-11-15
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Array
(
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[patent_issue_date] => 2010-03-30
[patent_title] => 'Positive resist composition and pattern formation method using the positive resist composition'
[patent_app_type] => utility
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Array
(
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[patent_issue_date] => 2010-03-16
[patent_title] => 'Silicon-containing film forming composition, silicon-containing film serving as etching mask, substrate processing intermediate, and substrate processing method'
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[patent_app_number] => 11/594176
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Array
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[patent_title] => 'Resist composition and patterning process'
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Array
(
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[patent_title] => 'Photonic crystal EUV photoresists'
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Array
(
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[patent_doc_number] => 07560222
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[patent_title] => 'Si-containing polymers for nano-pattern device fabrication'
[patent_app_type] => utility
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/554877 | Si-containing polymers for nano-pattern device fabrication | Oct 30, 2006 | Issued |
Array
(
[id] => 5034573
[patent_doc_number] => 20070099112
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[patent_issue_date] => 2007-05-03
[patent_title] => 'Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process'
[patent_app_type] => utility
[patent_app_number] => 11/588413
[patent_app_country] => US
[patent_app_date] => 2006-10-27
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/588413 | Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Oct 26, 2006 | Issued |
Array
(
[id] => 5193813
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[patent_title] => 'Polymer, top coating layer, top coating composition and immersion lithography process using the same'
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Array
(
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[patent_title] => 'Photoacid generators and lithographic resists comprising the same'
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Array
(
[id] => 4692692
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[patent_title] => 'PHOTOACTIVE COMPOUNDS'
[patent_app_type] => utility
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Array
(
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Array
(
[id] => 4938719
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/534289 | Surface switchable photoresist | Sep 21, 2006 | Issued |
Array
(
[id] => 5539082
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Array
(
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Array
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Array
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Array
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