
Sin J. Lee
Examiner (ID: 7000, Phone: (571)272-1333 , Office: P/1722 )
| Most Active Art Unit | 1722 |
| Art Unit(s) | 1722, 1613, 1752, 1795 |
| Total Applications | 1756 |
| Issued Applications | 1186 |
| Pending Applications | 124 |
| Abandoned Applications | 462 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 5569698
[patent_doc_number] => 20090253076
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-10-08
[patent_title] => 'Coating-type underlayer coating forming composition for lithography containing vinylnaphthalene resin derivative'
[patent_app_type] => utility
[patent_app_number] => 11/990855
[patent_app_country] => US
[patent_app_date] => 2006-08-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 10970
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0253/20090253076.pdf
[firstpage_image] =>[orig_patent_app_number] => 11990855
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/990855 | Coating-type underlayer coating forming composition for lithography containing vinylnaphthalene resin derivative | Aug 14, 2006 | Issued |
Array
(
[id] => 5888523
[patent_doc_number] => 20060275702
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-12-07
[patent_title] => 'Negative-working photosensitive resin composition and photosensitive resin plate using the same'
[patent_app_type] => utility
[patent_app_number] => 11/504080
[patent_app_country] => US
[patent_app_date] => 2006-08-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[patent_no_of_words] => 8404
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0275/20060275702.pdf
[firstpage_image] =>[orig_patent_app_number] => 11504080
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/504080 | Negative-working photosensitive resin composition and photosensitive resin plate using the same | Aug 14, 2006 | Abandoned |
Array
(
[id] => 239412
[patent_doc_number] => 07592128
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-09-22
[patent_title] => 'On-press developable negative-working imageable elements'
[patent_app_type] => utility
[patent_app_number] => 11/500261
[patent_app_country] => US
[patent_app_date] => 2006-08-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 14093
[patent_no_of_claims] => 13
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[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/592/07592128.pdf
[firstpage_image] =>[orig_patent_app_number] => 11500261
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/500261 | On-press developable negative-working imageable elements | Aug 6, 2006 | Issued |
Array
(
[id] => 196316
[patent_doc_number] => 07638256
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-12-29
[patent_title] => 'Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process'
[patent_app_type] => utility
[patent_app_number] => 11/480944
[patent_app_country] => US
[patent_app_date] => 2006-07-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 23537
[patent_no_of_claims] => 11
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[patent_maintenance] => 1
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/638/07638256.pdf
[firstpage_image] =>[orig_patent_app_number] => 11480944
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/480944 | Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process | Jul 5, 2006 | Issued |
Array
(
[id] => 8689671
[patent_doc_number] => 08389197
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2013-03-05
[patent_title] => 'Compound, positive resist composition and resist pattern forming method'
[patent_app_type] => utility
[patent_app_number] => 11/994602
[patent_app_country] => US
[patent_app_date] => 2006-06-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[patent_no_of_words] => 11996
[patent_no_of_claims] => 8
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[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 11994602
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/994602 | Compound, positive resist composition and resist pattern forming method | Jun 29, 2006 | Issued |
Array
(
[id] => 5075119
[patent_doc_number] => 20070015094
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-01-18
[patent_title] => 'ELECTROMAGNETIC WAVE SHIELDING MATERIAL, METHOD FOR MANUFACTURING THE SAME AND ELECTROMAGNETIC WAVE SHIELDING MATERIAL FOR PLASMA DISPLAY PANEL'
[patent_app_type] => utility
[patent_app_number] => 11/427614
[patent_app_country] => US
[patent_app_date] => 2006-06-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[patent_no_of_words] => 11831
[patent_no_of_claims] => 10
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[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0015/20070015094.pdf
[firstpage_image] =>[orig_patent_app_number] => 11427614
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/427614 | ELECTROMAGNETIC WAVE SHIELDING MATERIAL, METHOD FOR MANUFACTURING THE SAME AND ELECTROMAGNETIC WAVE SHIELDING MATERIAL FOR PLASMA DISPLAY PANEL | Jun 28, 2006 | Abandoned |
Array
(
[id] => 4795932
[patent_doc_number] => 20080007518
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-01-10
[patent_title] => 'Conductive polymer coating with improved aging stability'
[patent_app_type] => utility
[patent_app_number] => 11/474019
[patent_app_country] => US
[patent_app_date] => 2006-06-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 14195
[patent_no_of_claims] => 38
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0007/20080007518.pdf
[firstpage_image] =>[orig_patent_app_number] => 11474019
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/474019 | Conductive polymer coating with improved aging stability | Jun 22, 2006 | Abandoned |
Array
(
[id] => 5022619
[patent_doc_number] => 20070148585
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-06-28
[patent_title] => 'Hyperbranched polymer, production method therefor and resist composition containing hyperbranched polymer'
[patent_app_type] => utility
[patent_app_number] => 11/473348
[patent_app_country] => US
[patent_app_date] => 2006-06-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 23844
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 4
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0148/20070148585.pdf
[firstpage_image] =>[orig_patent_app_number] => 11473348
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/473348 | Hyperbranched polymer, production method therefor and resist composition containing hyperbranched polymer | Jun 21, 2006 | Abandoned |
Array
(
[id] => 341464
[patent_doc_number] => 07501222
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-03-10
[patent_title] => 'Photoresist monomer polymer thereof and photoresist composition including the same'
[patent_app_type] => utility
[patent_app_number] => 11/471838
[patent_app_country] => US
[patent_app_date] => 2006-06-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 14
[patent_no_of_words] => 8318
[patent_no_of_claims] => 15
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[patent_maintenance] => 1
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/501/07501222.pdf
[firstpage_image] =>[orig_patent_app_number] => 11471838
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/471838 | Photoresist monomer polymer thereof and photoresist composition including the same | Jun 20, 2006 | Issued |
Array
(
[id] => 5850969
[patent_doc_number] => 20060234160
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-10-19
[patent_title] => 'Novel ester compounds, polymers, resist compositions and patterning process'
[patent_app_type] => utility
[patent_app_number] => 11/453030
[patent_app_country] => US
[patent_app_date] => 2006-06-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[patent_no_of_words] => 17288
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0234/20060234160.pdf
[firstpage_image] =>[orig_patent_app_number] => 11453030
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/453030 | Novel ester compounds, polymers, resist compositions and patterning process | Jun 14, 2006 | Abandoned |
Array
(
[id] => 81137
[patent_doc_number] => 07745100
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-06-29
[patent_title] => 'Polymers, methods of use thereof, and methods of decomposition thereof'
[patent_app_type] => utility
[patent_app_number] => 11/451144
[patent_app_country] => US
[patent_app_date] => 2006-06-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 15
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[pdf_file] => patents/07/745/07745100.pdf
[firstpage_image] =>[orig_patent_app_number] => 11451144
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/451144 | Polymers, methods of use thereof, and methods of decomposition thereof | Jun 11, 2006 | Issued |
Array
(
[id] => 5416236
[patent_doc_number] => 20090042123
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-02-12
[patent_title] => 'CALIXRESORCINARENE COMPOUND, PHOTORESIST BASE COMPRISING THE SAME, AND COMPOSITION THEREOF'
[patent_app_type] => utility
[patent_app_number] => 11/915754
[patent_app_country] => US
[patent_app_date] => 2006-05-26
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0042/20090042123.pdf
[firstpage_image] =>[orig_patent_app_number] => 11915754
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/915754 | CALIXRESORCINARENE COMPOUND, PHOTORESIST BASE COMPRISING THE SAME, AND COMPOSITION THEREOF | May 25, 2006 | Abandoned |
Array
(
[id] => 5337183
[patent_doc_number] => 20090053647
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-02-26
[patent_title] => 'Coating-type underlayer coating forming composition for lithography containing naphthalene resin derivative'
[patent_app_type] => utility
[patent_app_number] => 11/921790
[patent_app_country] => US
[patent_app_date] => 2006-05-24
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0053/20090053647.pdf
[firstpage_image] =>[orig_patent_app_number] => 11921790
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/921790 | Coating-type underlayer coating forming composition for lithography containing naphthalene resin derivative | May 23, 2006 | Issued |
Array
(
[id] => 5360902
[patent_doc_number] => 20090035696
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-02-05
[patent_title] => 'PHOTORESIST COMPOSITION'
[patent_app_type] => utility
[patent_app_number] => 11/913331
[patent_app_country] => US
[patent_app_date] => 2006-05-17
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[pdf_file] => publications/A1/0035/20090035696.pdf
[firstpage_image] =>[orig_patent_app_number] => 11913331
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/913331 | PHOTORESIST COMPOSITION | May 16, 2006 | Abandoned |
Array
(
[id] => 5785058
[patent_doc_number] => 20060204893
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-09-14
[patent_title] => 'Novel fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer'
[patent_app_type] => utility
[patent_app_number] => 11/434917
[patent_app_country] => US
[patent_app_date] => 2006-05-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[pdf_file] => publications/A1/0204/20060204893.pdf
[firstpage_image] =>[orig_patent_app_number] => 11434917
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/434917 | Novel fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer | May 16, 2006 | Abandoned |
Array
(
[id] => 330683
[patent_doc_number] => 07511179
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-03-31
[patent_title] => 'Fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer'
[patent_app_type] => utility
[patent_app_number] => 11/438669
[patent_app_country] => US
[patent_app_date] => 2006-05-17
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/07/511/07511179.pdf
[firstpage_image] =>[orig_patent_app_number] => 11438669
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/438669 | Fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer | May 16, 2006 | Issued |
Array
(
[id] => 5028289
[patent_doc_number] => 20070269736
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-11-22
[patent_title] => 'NEW SUB 40 NM RESOLUTION Si CONTAINING RESIST SYSTEM'
[patent_app_type] => utility
[patent_app_number] => 11/383548
[patent_app_country] => US
[patent_app_date] => 2006-05-16
[patent_effective_date] => 0000-00-00
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/383548 | NEW SUB 40 NM RESOLUTION Si CONTAINING RESIST SYSTEM | May 15, 2006 | Abandoned |
Array
(
[id] => 7965119
[patent_doc_number] => 07939241
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2011-05-10
[patent_title] => '(Meth)acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method'
[patent_app_type] => utility
[patent_app_number] => 11/919891
[patent_app_country] => US
[patent_app_date] => 2006-05-12
[patent_effective_date] => 0000-00-00
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/919891 | (Meth)acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method | May 11, 2006 | Issued |
Array
(
[id] => 4988498
[patent_doc_number] => 20070154837
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-07-05
[patent_title] => 'Composition for hard mask and method for manufacturing semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 11/416271
[patent_app_country] => US
[patent_app_date] => 2006-05-02
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0154/20070154837.pdf
[firstpage_image] =>[orig_patent_app_number] => 11416271
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/416271 | Composition for hard mask and method for manufacturing semiconductor device | May 1, 2006 | Abandoned |
Array
(
[id] => 5224970
[patent_doc_number] => 20070254236
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-11-01
[patent_title] => 'HIGH CONTACT ANGLE TOPCOAT MATERIAL AND USE THEREOF IN LITHOGRAPHY PROCESS'
[patent_app_type] => utility
[patent_app_number] => 11/380744
[patent_app_country] => US
[patent_app_date] => 2006-04-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
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[pdf_file] => publications/A1/0254/20070254236.pdf
[firstpage_image] =>[orig_patent_app_number] => 11380744
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/380744 | High contact angle topcoat material and use thereof in lithography process | Apr 27, 2006 | Issued |