Search

Sin J. Lee

Examiner (ID: 7000, Phone: (571)272-1333 , Office: P/1722 )

Most Active Art Unit
1722
Art Unit(s)
1722, 1613, 1752, 1795
Total Applications
1756
Issued Applications
1186
Pending Applications
124
Abandoned Applications
462

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 5569698 [patent_doc_number] => 20090253076 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-10-08 [patent_title] => 'Coating-type underlayer coating forming composition for lithography containing vinylnaphthalene resin derivative' [patent_app_type] => utility [patent_app_number] => 11/990855 [patent_app_country] => US [patent_app_date] => 2006-08-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10970 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0253/20090253076.pdf [firstpage_image] =>[orig_patent_app_number] => 11990855 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/990855
Coating-type underlayer coating forming composition for lithography containing vinylnaphthalene resin derivative Aug 14, 2006 Issued
Array ( [id] => 5888523 [patent_doc_number] => 20060275702 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-12-07 [patent_title] => 'Negative-working photosensitive resin composition and photosensitive resin plate using the same' [patent_app_type] => utility [patent_app_number] => 11/504080 [patent_app_country] => US [patent_app_date] => 2006-08-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8404 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0275/20060275702.pdf [firstpage_image] =>[orig_patent_app_number] => 11504080 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/504080
Negative-working photosensitive resin composition and photosensitive resin plate using the same Aug 14, 2006 Abandoned
Array ( [id] => 239412 [patent_doc_number] => 07592128 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-09-22 [patent_title] => 'On-press developable negative-working imageable elements' [patent_app_type] => utility [patent_app_number] => 11/500261 [patent_app_country] => US [patent_app_date] => 2006-08-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 14093 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 188 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/592/07592128.pdf [firstpage_image] =>[orig_patent_app_number] => 11500261 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/500261
On-press developable negative-working imageable elements Aug 6, 2006 Issued
Array ( [id] => 196316 [patent_doc_number] => 07638256 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-12-29 [patent_title] => 'Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process' [patent_app_type] => utility [patent_app_number] => 11/480944 [patent_app_country] => US [patent_app_date] => 2006-07-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 23537 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 14 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/638/07638256.pdf [firstpage_image] =>[orig_patent_app_number] => 11480944 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/480944
Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process Jul 5, 2006 Issued
Array ( [id] => 8689671 [patent_doc_number] => 08389197 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-03-05 [patent_title] => 'Compound, positive resist composition and resist pattern forming method' [patent_app_type] => utility [patent_app_number] => 11/994602 [patent_app_country] => US [patent_app_date] => 2006-06-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 11996 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 15 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 11994602 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/994602
Compound, positive resist composition and resist pattern forming method Jun 29, 2006 Issued
Array ( [id] => 5075119 [patent_doc_number] => 20070015094 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-01-18 [patent_title] => 'ELECTROMAGNETIC WAVE SHIELDING MATERIAL, METHOD FOR MANUFACTURING THE SAME AND ELECTROMAGNETIC WAVE SHIELDING MATERIAL FOR PLASMA DISPLAY PANEL' [patent_app_type] => utility [patent_app_number] => 11/427614 [patent_app_country] => US [patent_app_date] => 2006-06-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 11831 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0015/20070015094.pdf [firstpage_image] =>[orig_patent_app_number] => 11427614 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/427614
ELECTROMAGNETIC WAVE SHIELDING MATERIAL, METHOD FOR MANUFACTURING THE SAME AND ELECTROMAGNETIC WAVE SHIELDING MATERIAL FOR PLASMA DISPLAY PANEL Jun 28, 2006 Abandoned
Array ( [id] => 4795932 [patent_doc_number] => 20080007518 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-01-10 [patent_title] => 'Conductive polymer coating with improved aging stability' [patent_app_type] => utility [patent_app_number] => 11/474019 [patent_app_country] => US [patent_app_date] => 2006-06-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 14195 [patent_no_of_claims] => 38 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0007/20080007518.pdf [firstpage_image] =>[orig_patent_app_number] => 11474019 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/474019
Conductive polymer coating with improved aging stability Jun 22, 2006 Abandoned
Array ( [id] => 5022619 [patent_doc_number] => 20070148585 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-06-28 [patent_title] => 'Hyperbranched polymer, production method therefor and resist composition containing hyperbranched polymer' [patent_app_type] => utility [patent_app_number] => 11/473348 [patent_app_country] => US [patent_app_date] => 2006-06-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 23844 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0148/20070148585.pdf [firstpage_image] =>[orig_patent_app_number] => 11473348 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/473348
Hyperbranched polymer, production method therefor and resist composition containing hyperbranched polymer Jun 21, 2006 Abandoned
Array ( [id] => 341464 [patent_doc_number] => 07501222 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-03-10 [patent_title] => 'Photoresist monomer polymer thereof and photoresist composition including the same' [patent_app_type] => utility [patent_app_number] => 11/471838 [patent_app_country] => US [patent_app_date] => 2006-06-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 14 [patent_no_of_words] => 8318 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 9 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/501/07501222.pdf [firstpage_image] =>[orig_patent_app_number] => 11471838 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/471838
Photoresist monomer polymer thereof and photoresist composition including the same Jun 20, 2006 Issued
Array ( [id] => 5850969 [patent_doc_number] => 20060234160 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-10-19 [patent_title] => 'Novel ester compounds, polymers, resist compositions and patterning process' [patent_app_type] => utility [patent_app_number] => 11/453030 [patent_app_country] => US [patent_app_date] => 2006-06-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 17288 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0234/20060234160.pdf [firstpage_image] =>[orig_patent_app_number] => 11453030 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/453030
Novel ester compounds, polymers, resist compositions and patterning process Jun 14, 2006 Abandoned
Array ( [id] => 81137 [patent_doc_number] => 07745100 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-06-29 [patent_title] => 'Polymers, methods of use thereof, and methods of decomposition thereof' [patent_app_type] => utility [patent_app_number] => 11/451144 [patent_app_country] => US [patent_app_date] => 2006-06-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 15 [patent_figures_cnt] => 40 [patent_no_of_words] => 9949 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 125 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/745/07745100.pdf [firstpage_image] =>[orig_patent_app_number] => 11451144 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/451144
Polymers, methods of use thereof, and methods of decomposition thereof Jun 11, 2006 Issued
Array ( [id] => 5416236 [patent_doc_number] => 20090042123 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-02-12 [patent_title] => 'CALIXRESORCINARENE COMPOUND, PHOTORESIST BASE COMPRISING THE SAME, AND COMPOSITION THEREOF' [patent_app_type] => utility [patent_app_number] => 11/915754 [patent_app_country] => US [patent_app_date] => 2006-05-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 5063 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0042/20090042123.pdf [firstpage_image] =>[orig_patent_app_number] => 11915754 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/915754
CALIXRESORCINARENE COMPOUND, PHOTORESIST BASE COMPRISING THE SAME, AND COMPOSITION THEREOF May 25, 2006 Abandoned
Array ( [id] => 5337183 [patent_doc_number] => 20090053647 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-02-26 [patent_title] => 'Coating-type underlayer coating forming composition for lithography containing naphthalene resin derivative' [patent_app_type] => utility [patent_app_number] => 11/921790 [patent_app_country] => US [patent_app_date] => 2006-05-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 9119 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0053/20090053647.pdf [firstpage_image] =>[orig_patent_app_number] => 11921790 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/921790
Coating-type underlayer coating forming composition for lithography containing naphthalene resin derivative May 23, 2006 Issued
Array ( [id] => 5360902 [patent_doc_number] => 20090035696 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-02-05 [patent_title] => 'PHOTORESIST COMPOSITION' [patent_app_type] => utility [patent_app_number] => 11/913331 [patent_app_country] => US [patent_app_date] => 2006-05-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10279 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0035/20090035696.pdf [firstpage_image] =>[orig_patent_app_number] => 11913331 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/913331
PHOTORESIST COMPOSITION May 16, 2006 Abandoned
Array ( [id] => 5785058 [patent_doc_number] => 20060204893 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-09-14 [patent_title] => 'Novel fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer' [patent_app_type] => utility [patent_app_number] => 11/434917 [patent_app_country] => US [patent_app_date] => 2006-05-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 26934 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0204/20060204893.pdf [firstpage_image] =>[orig_patent_app_number] => 11434917 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/434917
Novel fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer May 16, 2006 Abandoned
Array ( [id] => 330683 [patent_doc_number] => 07511179 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-03-31 [patent_title] => 'Fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer' [patent_app_type] => utility [patent_app_number] => 11/438669 [patent_app_country] => US [patent_app_date] => 2006-05-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 26962 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 13 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/511/07511179.pdf [firstpage_image] =>[orig_patent_app_number] => 11438669 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/438669
Fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer May 16, 2006 Issued
Array ( [id] => 5028289 [patent_doc_number] => 20070269736 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-11-22 [patent_title] => 'NEW SUB 40 NM RESOLUTION Si CONTAINING RESIST SYSTEM' [patent_app_type] => utility [patent_app_number] => 11/383548 [patent_app_country] => US [patent_app_date] => 2006-05-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7333 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0269/20070269736.pdf [firstpage_image] =>[orig_patent_app_number] => 11383548 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/383548
NEW SUB 40 NM RESOLUTION Si CONTAINING RESIST SYSTEM May 15, 2006 Abandoned
Array ( [id] => 7965119 [patent_doc_number] => 07939241 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2011-05-10 [patent_title] => '(Meth)acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method' [patent_app_type] => utility [patent_app_number] => 11/919891 [patent_app_country] => US [patent_app_date] => 2006-05-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 11010 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 12 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/939/07939241.pdf [firstpage_image] =>[orig_patent_app_number] => 11919891 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/919891
(Meth)acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method May 11, 2006 Issued
Array ( [id] => 4988498 [patent_doc_number] => 20070154837 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-07-05 [patent_title] => 'Composition for hard mask and method for manufacturing semiconductor device' [patent_app_type] => utility [patent_app_number] => 11/416271 [patent_app_country] => US [patent_app_date] => 2006-05-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 3021 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0154/20070154837.pdf [firstpage_image] =>[orig_patent_app_number] => 11416271 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/416271
Composition for hard mask and method for manufacturing semiconductor device May 1, 2006 Abandoned
Array ( [id] => 5224970 [patent_doc_number] => 20070254236 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-11-01 [patent_title] => 'HIGH CONTACT ANGLE TOPCOAT MATERIAL AND USE THEREOF IN LITHOGRAPHY PROCESS' [patent_app_type] => utility [patent_app_number] => 11/380744 [patent_app_country] => US [patent_app_date] => 2006-04-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 8100 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0254/20070254236.pdf [firstpage_image] =>[orig_patent_app_number] => 11380744 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/380744
High contact angle topcoat material and use thereof in lithography process Apr 27, 2006 Issued
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