
Sin J. Lee
Examiner (ID: 7000, Phone: (571)272-1333 , Office: P/1722 )
| Most Active Art Unit | 1722 |
| Art Unit(s) | 1722, 1613, 1752, 1795 |
| Total Applications | 1756 |
| Issued Applications | 1186 |
| Pending Applications | 124 |
| Abandoned Applications | 462 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 326432
[patent_doc_number] => 07514203
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-04-07
[patent_title] => 'Positive photoresist composition'
[patent_app_type] => utility
[patent_app_number] => 11/884185
[patent_app_country] => US
[patent_app_date] => 2005-12-21
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/884185 | Positive photoresist composition | Dec 20, 2005 | Issued |
Array
(
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[patent_doc_number] => 07534549
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-05-19
[patent_title] => 'Photoresist polymer, and photoresist composition'
[patent_app_type] => utility
[patent_app_number] => 11/312106
[patent_app_country] => US
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/312106 | Photoresist polymer, and photoresist composition | Dec 19, 2005 | Issued |
Array
(
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[patent_doc_number] => 20070141516
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[patent_kind] => A1
[patent_issue_date] => 2007-06-21
[patent_title] => 'Ultra dark polymer'
[patent_app_type] => utility
[patent_app_number] => 11/304042
[patent_app_country] => US
[patent_app_date] => 2005-12-15
[patent_effective_date] => 0000-00-00
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/304042 | Ultra dark polymer | Dec 14, 2005 | Issued |
Array
(
[id] => 5446374
[patent_doc_number] => 20090047600
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[patent_kind] => A1
[patent_issue_date] => 2009-02-19
[patent_title] => 'POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD'
[patent_app_type] => utility
[patent_app_number] => 11/813765
[patent_app_country] => US
[patent_app_date] => 2005-12-14
[patent_effective_date] => 0000-00-00
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/813765 | Positive resist composition and resist pattern forming method | Dec 13, 2005 | Issued |
Array
(
[id] => 369716
[patent_doc_number] => 07476489
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[patent_issue_date] => 2009-01-13
[patent_title] => 'Low-temperature curable photosensitive compositions'
[patent_app_type] => utility
[patent_app_number] => 11/271267
[patent_app_country] => US
[patent_app_date] => 2005-11-10
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/271267 | Low-temperature curable photosensitive compositions | Nov 9, 2005 | Issued |
Array
(
[id] => 53416
[patent_doc_number] => 07767378
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[patent_issue_date] => 2010-08-03
[patent_title] => 'Method for producing resist composition and resist composition'
[patent_app_type] => utility
[patent_app_number] => 11/718388
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[firstpage_image] =>[orig_patent_app_number] => 11718388
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/718388 | Method for producing resist composition and resist composition | Nov 3, 2005 | Issued |
Array
(
[id] => 5827691
[patent_doc_number] => 20060063106
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[patent_issue_date] => 2006-03-23
[patent_title] => 'Spin bowl compatible polyamic acids/imides as wet developable polymer binders for anti-reflective coatings'
[patent_app_type] => utility
[patent_app_number] => 11/264858
[patent_app_country] => US
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/264858 | Spin bowl compatible polyamic acids/imides as wet developable polymer binders for anti-reflective coatings | Nov 1, 2005 | Issued |
Array
(
[id] => 5726735
[patent_doc_number] => 20060057495
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-03-16
[patent_title] => 'Negative-working photosensitive resin composition and photosensitive resin plate using the same'
[patent_app_type] => utility
[patent_app_number] => 11/263847
[patent_app_country] => US
[patent_app_date] => 2005-11-02
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[pdf_file] => publications/A1/0057/20060057495.pdf
[firstpage_image] =>[orig_patent_app_number] => 11263847
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/263847 | Negative-working photosensitive resin composition and photosensitive resin plate using the same | Nov 1, 2005 | Abandoned |
Array
(
[id] => 5727728
[patent_doc_number] => 20060058489
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-03-16
[patent_title] => 'Silicon-containing compositions for spin-on arc/hardmask materials'
[patent_app_type] => utility
[patent_app_number] => 11/263430
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/263430 | Silicon-containing compositions for spin-on arc/hardmask materials | Oct 30, 2005 | Issued |
Array
(
[id] => 5727711
[patent_doc_number] => 20060058472
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-03-16
[patent_title] => 'Functionalized polymer'
[patent_app_type] => utility
[patent_app_number] => 11/261308
[patent_app_country] => US
[patent_app_date] => 2005-10-28
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[firstpage_image] =>[orig_patent_app_number] => 11261308
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/261308 | Functionalized polymer | Oct 27, 2005 | Abandoned |
Array
(
[id] => 5230660
[patent_doc_number] => 20070292767
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-12-20
[patent_title] => 'Underlayer Coating Forming Composition For Lithography Containing Cyclodextrin Compound'
[patent_app_type] => utility
[patent_app_number] => 11/666342
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/666342 | Underlayer coating forming composition for lithography containing cyclodextrin compound | Oct 24, 2005 | Issued |
Array
(
[id] => 4965151
[patent_doc_number] => 20080107971
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-05-08
[patent_title] => 'Silylphenylene Polymer Composition For The Formation Of Interlayers And Process For The Formation Of Patterns By Using The Same'
[patent_app_type] => utility
[patent_app_number] => 11/795521
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/795521 | Silylphenylene Polymer Composition For The Formation Of Interlayers And Process For The Formation Of Patterns By Using The Same | Oct 24, 2005 | Abandoned |
Array
(
[id] => 894483
[patent_doc_number] => 07341821
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[patent_title] => 'Method for manufacture of lithographic printing plate precursor no dampening water'
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Array
(
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[patent_title] => 'Silicon-containing resist composition and patterning process'
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Array
(
[id] => 38875
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[patent_title] => 'Lactone-containing compounds, polymers, resist compositions, and patterning method'
[patent_app_type] => reissue
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Array
(
[id] => 5793429
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[patent_title] => 'Photoresist stripping solution and a method of stripping photoresists using the same'
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Array
(
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Array
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Array
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Array
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