Search

Sin J. Lee

Examiner (ID: 7000, Phone: (571)272-1333 , Office: P/1722 )

Most Active Art Unit
1722
Art Unit(s)
1722, 1613, 1752, 1795
Total Applications
1756
Issued Applications
1186
Pending Applications
124
Abandoned Applications
462

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 507758 [patent_doc_number] => 07198888 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2007-04-03 [patent_title] => 'Water-soluble material, chemically amplified resist and pattern formation method using the same' [patent_app_type] => utility [patent_app_number] => 11/013333 [patent_app_country] => US [patent_app_date] => 2004-12-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 20 [patent_no_of_words] => 4961 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 75 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/198/07198888.pdf [firstpage_image] =>[orig_patent_app_number] => 11013333 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/013333
Water-soluble material, chemically amplified resist and pattern formation method using the same Dec 16, 2004 Issued
Array ( [id] => 913920 [patent_doc_number] => 07326523 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-02-05 [patent_title] => 'Low refractive index polymers as underlayers for silicon-containing photoresists' [patent_app_type] => utility [patent_app_number] => 11/013971 [patent_app_country] => US [patent_app_date] => 2004-12-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4731 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 145 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/326/07326523.pdf [firstpage_image] =>[orig_patent_app_number] => 11013971 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/013971
Low refractive index polymers as underlayers for silicon-containing photoresists Dec 15, 2004 Issued
Array ( [id] => 671954 [patent_doc_number] => 07090962 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2006-08-15 [patent_title] => 'Alkali-soluble resin with polyaromatic group and photosensitive composition comprising the resin' [patent_app_type] => utility [patent_app_number] => 11/004374 [patent_app_country] => US [patent_app_date] => 2004-12-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4018 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 10 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/090/07090962.pdf [firstpage_image] =>[orig_patent_app_number] => 11004374 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/004374
Alkali-soluble resin with polyaromatic group and photosensitive composition comprising the resin Dec 2, 2004 Issued
Array ( [id] => 7251872 [patent_doc_number] => 20050142482 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-06-30 [patent_title] => 'Photoresist for spacer and manufacturing method of liquid crystal display using the same' [patent_app_type] => utility [patent_app_number] => 11/002653 [patent_app_country] => US [patent_app_date] => 2004-12-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 3554 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0142/20050142482.pdf [firstpage_image] =>[orig_patent_app_number] => 11002653 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/002653
Photoresist for spacer and manufacturing method of liquid crystal display using the same Dec 2, 2004 Abandoned
Array ( [id] => 5747747 [patent_doc_number] => 20060110678 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-05-25 [patent_title] => 'Low-temperature curable photosensitive compositions' [patent_app_type] => utility [patent_app_number] => 10/997701 [patent_app_country] => US [patent_app_date] => 2004-11-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 9899 [patent_no_of_claims] => 28 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0110/20060110678.pdf [firstpage_image] =>[orig_patent_app_number] => 10997701 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/997701
Low-temperature curable photosensitive compositions Nov 22, 2004 Issued
Array ( [id] => 299680 [patent_doc_number] => 07537879 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-05-26 [patent_title] => 'Photoresist composition for deep UV and process thereof' [patent_app_type] => utility [patent_app_number] => 10/994745 [patent_app_country] => US [patent_app_date] => 2004-11-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 12 [patent_no_of_words] => 9681 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 13 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/537/07537879.pdf [firstpage_image] =>[orig_patent_app_number] => 10994745 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/994745
Photoresist composition for deep UV and process thereof Nov 21, 2004 Issued
Array ( [id] => 7251868 [patent_doc_number] => 20050142481 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-06-30 [patent_title] => 'Cross-linking polymer for organic anti-reflective coating, organic anti-reflective coating composition comprising the same and method for forming photoresist pattern using the same' [patent_app_type] => utility [patent_app_number] => 10/989221 [patent_app_country] => US [patent_app_date] => 2004-11-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 3635 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0142/20050142481.pdf [firstpage_image] =>[orig_patent_app_number] => 10989221 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/989221
Cross-linking polymer for organic anti-reflective coating, organic anti-reflective coating composition comprising the same and method for forming photoresist pattern using the same Nov 14, 2004 Issued
Array ( [id] => 5776629 [patent_doc_number] => 20060105269 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-05-18 [patent_title] => 'Fluorinated photoresist materials with improved etch resistant properties' [patent_app_type] => utility [patent_app_number] => 10/988137 [patent_app_country] => US [patent_app_date] => 2004-11-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5380 [patent_no_of_claims] => 36 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0105/20060105269.pdf [firstpage_image] =>[orig_patent_app_number] => 10988137 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/988137
Fluorinated photoresist materials with improved etch resistant properties Nov 11, 2004 Issued
Array ( [id] => 7103774 [patent_doc_number] => 20050106500 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-05-19 [patent_title] => 'Nitrogen-containing organic compound, resist composition and patterning process' [patent_app_type] => utility [patent_app_number] => 10/984933 [patent_app_country] => US [patent_app_date] => 2004-11-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 12972 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 11 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0106/20050106500.pdf [firstpage_image] =>[orig_patent_app_number] => 10984933 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/984933
Nitrogen-containing organic compound, resist composition and patterning process Nov 9, 2004 Issued
Array ( [id] => 919560 [patent_doc_number] => 07320855 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-01-22 [patent_title] => 'Silicon containing TARC/barrier layer' [patent_app_type] => utility [patent_app_number] => 10/980365 [patent_app_country] => US [patent_app_date] => 2004-11-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3737 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 126 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/320/07320855.pdf [firstpage_image] =>[orig_patent_app_number] => 10980365 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/980365
Silicon containing TARC/barrier layer Nov 2, 2004 Issued
Array ( [id] => 10892715 [patent_doc_number] => 08916327 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-12-23 [patent_title] => 'Underlayer coating forming composition containing dextrin ester compound' [patent_app_type] => utility [patent_app_number] => 10/577854 [patent_app_country] => US [patent_app_date] => 2004-10-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 8910 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 36 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 10577854 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/577854
Underlayer coating forming composition containing dextrin ester compound Oct 28, 2004 Issued
Array ( [id] => 871727 [patent_doc_number] => 07361448 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-04-22 [patent_title] => 'Resist pattern thickening material and process for forming the same, and semiconductor device and process for manufacturing the same' [patent_app_type] => utility [patent_app_number] => 10/975047 [patent_app_country] => US [patent_app_date] => 2004-10-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 17 [patent_figures_cnt] => 47 [patent_no_of_words] => 17125 [patent_no_of_claims] => 30 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 78 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/361/07361448.pdf [firstpage_image] =>[orig_patent_app_number] => 10975047 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/975047
Resist pattern thickening material and process for forming the same, and semiconductor device and process for manufacturing the same Oct 27, 2004 Issued
Array ( [id] => 7127196 [patent_doc_number] => 20050058940 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-03-17 [patent_title] => 'Photoresists and processes for microlithography' [patent_app_type] => utility [patent_app_number] => 10/970133 [patent_app_country] => US [patent_app_date] => 2004-10-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 19878 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0058/20050058940.pdf [firstpage_image] =>[orig_patent_app_number] => 10970133 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/970133
Photoresists and processes for microlithography Oct 20, 2004 Issued
Array ( [id] => 7004964 [patent_doc_number] => 20050170277 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-08-04 [patent_title] => 'Fluorinated photoresists prepared, deposited, developed and removed in carbon dioxide' [patent_app_type] => utility [patent_app_number] => 10/968390 [patent_app_country] => US [patent_app_date] => 2004-10-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6158 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0170/20050170277.pdf [firstpage_image] =>[orig_patent_app_number] => 10968390 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/968390
Fluorinated photoresists prepared, deposited, developed and removed in carbon dioxide Oct 18, 2004 Abandoned
Array ( [id] => 7097602 [patent_doc_number] => 20050130061 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-06-16 [patent_title] => 'Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same' [patent_app_type] => utility [patent_app_number] => 10/962867 [patent_app_country] => US [patent_app_date] => 2004-10-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 3324 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0130/20050130061.pdf [firstpage_image] =>[orig_patent_app_number] => 10962867 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/962867
Light absorbent agent polymer for organic anti-reflective coating and preparation method and organic anti-reflective coating composition comprising the same Oct 11, 2004 Issued
Array ( [id] => 7162078 [patent_doc_number] => 20050085078 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-04-21 [patent_title] => 'Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same' [patent_app_type] => utility [patent_app_number] => 10/963316 [patent_app_country] => US [patent_app_date] => 2004-10-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 3380 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0085/20050085078.pdf [firstpage_image] =>[orig_patent_app_number] => 10963316 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/963316
Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same Oct 11, 2004 Issued
Array ( [id] => 551583 [patent_doc_number] => 07160668 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2007-01-09 [patent_title] => 'Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same' [patent_app_type] => utility [patent_app_number] => 10/962847 [patent_app_country] => US [patent_app_date] => 2004-10-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 3380 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 18 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/160/07160668.pdf [firstpage_image] =>[orig_patent_app_number] => 10962847 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/962847
Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same Oct 11, 2004 Issued
Array ( [id] => 7232985 [patent_doc_number] => 20050079443 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-04-14 [patent_title] => 'Radiation-sensitive polymer composition and pattern forming method using the same' [patent_app_type] => utility [patent_app_number] => 10/959200 [patent_app_country] => US [patent_app_date] => 2004-10-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 5768 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0079/20050079443.pdf [firstpage_image] =>[orig_patent_app_number] => 10959200 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/959200
Radiation-sensitive polymer composition and pattern forming method using the same Oct 6, 2004 Abandoned
Array ( [id] => 7050614 [patent_doc_number] => 20050186501 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-08-25 [patent_title] => 'Polymer compound, resist material and pattern formation method' [patent_app_type] => utility [patent_app_number] => 10/954374 [patent_app_country] => US [patent_app_date] => 2004-10-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 12664 [patent_no_of_claims] => 26 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0186/20050186501.pdf [firstpage_image] =>[orig_patent_app_number] => 10954374 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/954374
Polymer compound, resist material and pattern formation method Sep 30, 2004 Issued
Array ( [id] => 386486 [patent_doc_number] => 07303855 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2007-12-04 [patent_title] => 'Photoresist undercoat-forming material and patterning process' [patent_app_type] => utility [patent_app_number] => 10/952834 [patent_app_country] => US [patent_app_date] => 2004-09-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 16 [patent_no_of_words] => 14141 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 12 [patent_words_short_claim] => 24 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/303/07303855.pdf [firstpage_image] =>[orig_patent_app_number] => 10952834 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/952834
Photoresist undercoat-forming material and patterning process Sep 29, 2004 Issued
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