
Sin J. Lee
Examiner (ID: 7000, Phone: (571)272-1333 , Office: P/1722 )
| Most Active Art Unit | 1722 |
| Art Unit(s) | 1722, 1613, 1752, 1795 |
| Total Applications | 1756 |
| Issued Applications | 1186 |
| Pending Applications | 124 |
| Abandoned Applications | 462 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 6856033
[patent_doc_number] => 20030129534
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-07-10
[patent_title] => 'Method for forming photoresist pattern and photoresist laminate'
[patent_app_type] => new
[patent_app_number] => 10/307988
[patent_app_country] => US
[patent_app_date] => 2002-12-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[patent_no_of_words] => 5601
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[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0129/20030129534.pdf
[firstpage_image] =>[orig_patent_app_number] => 10307988
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/307988 | Method for forming photoresist pattern and photoresist laminate | Dec 2, 2002 | Abandoned |
Array
(
[id] => 6769807
[patent_doc_number] => 20030215747
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-11-20
[patent_title] => 'Photopolymerization type photosensitive electrode paste composition for plasma display panel and fabricating method thereof'
[patent_app_type] => new
[patent_app_number] => 10/304642
[patent_app_country] => US
[patent_app_date] => 2002-11-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
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[pdf_file] => publications/A1/0215/20030215747.pdf
[firstpage_image] =>[orig_patent_app_number] => 10304642
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/304642 | Photo-polymerization type photo-sensitive electrode paste composition for plasma display panel and fabricating method thereof | Nov 26, 2002 | Issued |
Array
(
[id] => 7465091
[patent_doc_number] => 20040101779
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-05-27
[patent_title] => 'Antireflective compositions for photoresists'
[patent_app_type] => new
[patent_app_number] => 10/301462
[patent_app_country] => US
[patent_app_date] => 2002-11-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[patent_no_of_words] => 9519
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[pdf_file] => publications/A1/0101/20040101779.pdf
[firstpage_image] =>[orig_patent_app_number] => 10301462
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/301462 | Antireflective compositions for photoresists | Nov 20, 2002 | Issued |
Array
(
[id] => 6791843
[patent_doc_number] => 20030087187
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-05-08
[patent_title] => 'Thick film photoresist layer laminate, method of manufacturing thick film resist pattern, and method of manufacturing connecting terminal'
[patent_app_type] => new
[patent_app_number] => 10/283513
[patent_app_country] => US
[patent_app_date] => 2002-10-30
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 10283513
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/283513 | Thick film photoresist layer laminate, method of manufacturing thick film resist pattern, and method of manufacturing connecting terminal | Oct 29, 2002 | Abandoned |
Array
(
[id] => 6710819
[patent_doc_number] => 20030170568
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-09-11
[patent_title] => 'UV curable powder suitable for use as a photoresist'
[patent_app_type] => new
[patent_app_number] => 10/283362
[patent_app_country] => US
[patent_app_date] => 2002-10-30
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0170/20030170568.pdf
[firstpage_image] =>[orig_patent_app_number] => 10283362
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/283362 | UV curable powder suitable for use as a photoresist | Oct 29, 2002 | Abandoned |
Array
(
[id] => 925586
[patent_doc_number] => 07316884
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-01-08
[patent_title] => '5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process'
[patent_app_type] => utility
[patent_app_number] => 10/492207
[patent_app_country] => US
[patent_app_date] => 2002-10-22
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/07/316/07316884.pdf
[firstpage_image] =>[orig_patent_app_number] => 10492207
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/492207 | 5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process | Oct 21, 2002 | Issued |
Array
(
[id] => 1145345
[patent_doc_number] => 06773862
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-08-10
[patent_title] => 'Negative resist composition'
[patent_app_type] => B2
[patent_app_number] => 10/274386
[patent_app_country] => US
[patent_app_date] => 2002-10-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[patent_no_of_words] => 11973
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[pdf_file] => patents/06/773/06773862.pdf
[firstpage_image] =>[orig_patent_app_number] => 10274386
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/274386 | Negative resist composition | Oct 20, 2002 | Issued |
Array
(
[id] => 1101336
[patent_doc_number] => 06815145
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-11-09
[patent_title] => 'Resist materials for 157-nm lithography'
[patent_app_type] => B2
[patent_app_number] => 10/271807
[patent_app_country] => US
[patent_app_date] => 2002-10-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[patent_no_of_words] => 7437
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[pdf_file] => patents/06/815/06815145.pdf
[firstpage_image] =>[orig_patent_app_number] => 10271807
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/271807 | Resist materials for 157-nm lithography | Oct 15, 2002 | Issued |
Array
(
[id] => 6791729
[patent_doc_number] => 20030087073
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-05-08
[patent_title] => 'Methods for producing pattern-forming body'
[patent_app_type] => new
[patent_app_number] => 10/272096
[patent_app_country] => US
[patent_app_date] => 2002-10-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
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[pdf_file] => publications/A1/0087/20030087073.pdf
[firstpage_image] =>[orig_patent_app_number] => 10272096
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/272096 | Methods for producing pattern-forming body | Oct 15, 2002 | Issued |
Array
(
[id] => 1125971
[patent_doc_number] => 06790596
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-09-14
[patent_title] => 'Photoreactive resin composition and method of manufacturing circuit board and ceramic multilayer substrate using the resin composition'
[patent_app_type] => B2
[patent_app_number] => 10/268900
[patent_app_country] => US
[patent_app_date] => 2002-10-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[pdf_file] => patents/06/790/06790596.pdf
[firstpage_image] =>[orig_patent_app_number] => 10268900
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/268900 | Photoreactive resin composition and method of manufacturing circuit board and ceramic multilayer substrate using the resin composition | Oct 10, 2002 | Issued |
Array
(
[id] => 6804879
[patent_doc_number] => 20030232273
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-12-18
[patent_title] => 'Acetal/alicyclic polymers and photoresist compositions'
[patent_app_type] => new
[patent_app_number] => 10/268063
[patent_app_country] => US
[patent_app_date] => 2002-10-09
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0232/20030232273.pdf
[firstpage_image] =>[orig_patent_app_number] => 10268063
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/268063 | Acetal/alicyclic polymers and photoresist compositions | Oct 8, 2002 | Abandoned |
Array
(
[id] => 1110558
[patent_doc_number] => 06806040
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[patent_issue_date] => 2004-10-19
[patent_title] => 'Photosensitive composition for manufacturing optical waveguide, production method thereof and polymer optical waveguide pattern formation method using the same'
[patent_app_type] => B2
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/262777 | Photosensitive composition for manufacturing optical waveguide, production method thereof and polymer optical waveguide pattern formation method using the same | Oct 1, 2002 | Issued |
Array
(
[id] => 675501
[patent_doc_number] => 07087356
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-08-08
[patent_title] => '193nm resist with improved post-exposure properties'
[patent_app_type] => utility
[patent_app_number] => 10/261249
[patent_app_country] => US
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/261249 | 193nm resist with improved post-exposure properties | Sep 29, 2002 | Issued |
Array
(
[id] => 6761100
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[patent_issue_date] => 2003-07-03
[patent_title] => 'Aqueous developable photoimageable thick film compositions for making photoimageable black electrodes'
[patent_app_type] => new
[patent_app_number] => 10/256347
[patent_app_country] => US
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Array
(
[id] => 6791826
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[patent_title] => 'Aqueous developable photoimageable thick film compositions'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/256389 | Aqueous developable photoimageable thick film compositions | Sep 26, 2002 | Issued |
Array
(
[id] => 1155394
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[patent_issue_date] => 2004-07-13
[patent_title] => 'Aqueous developable photoimageable thick film compositions with photospeed enhancer'
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Array
(
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[patent_title] => 'Positive resist composition'
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Array
(
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Array
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Array
(
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[patent_title] => 'Composition for activation energy rays and method of forming pattern'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/488469 | Composition for activation energy rays and method of forming pattern | Sep 9, 2002 | Issued |