
Sinh N. Tran
Supervisory Patent Examiner (ID: 18824, Phone: (571)272-7564 , Office: P/2661 )
| Most Active Art Unit | 2608 |
| Art Unit(s) | 2743, 2605, 2696, 2622, 2643, 2608, 2504, 2747, 2651, 2615, 2661, 2637, 2644 |
| Total Applications | 605 |
| Issued Applications | 455 |
| Pending Applications | 52 |
| Abandoned Applications | 100 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 5028277
[patent_doc_number] => 20070269724
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-11-22
[patent_title] => 'METHOD AND PROCESS FOR IMMERSION EXPOSURE OF A SUBSTRATE'
[patent_app_type] => utility
[patent_app_number] => 11/749347
[patent_app_country] => US
[patent_app_date] => 2007-05-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 2691
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0269/20070269724.pdf
[firstpage_image] =>[orig_patent_app_number] => 11749347
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/749347 | METHOD AND PROCESS FOR IMMERSION EXPOSURE OF A SUBSTRATE | May 15, 2007 | Abandoned |
Array
(
[id] => 4778977
[patent_doc_number] => 20080286975
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-11-20
[patent_title] => 'PLATINUM NANODET ETCH PROCESS'
[patent_app_type] => utility
[patent_app_number] => 11/748196
[patent_app_country] => US
[patent_app_date] => 2007-05-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 1511
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0286/20080286975.pdf
[firstpage_image] =>[orig_patent_app_number] => 11748196
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/748196 | Nano-crystal etch process | May 13, 2007 | Issued |
Array
(
[id] => 4517119
[patent_doc_number] => 07938974
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2011-05-10
[patent_title] => 'Method of fabricating printhead using metal film for protecting hydrophobic ink ejection face'
[patent_app_type] => utility
[patent_app_number] => 11/740925
[patent_app_country] => US
[patent_app_date] => 2007-04-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 25
[patent_figures_cnt] => 38
[patent_no_of_words] => 8685
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 104
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/938/07938974.pdf
[firstpage_image] =>[orig_patent_app_number] => 11740925
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/740925 | Method of fabricating printhead using metal film for protecting hydrophobic ink ejection face | Apr 26, 2007 | Issued |
Array
(
[id] => 4460483
[patent_doc_number] => 07879731
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2011-02-01
[patent_title] => 'Improving plasma process uniformity across a wafer by apportioning power among plural VHF sources'
[patent_app_type] => utility
[patent_app_number] => 11/733764
[patent_app_country] => US
[patent_app_date] => 2007-04-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 14
[patent_figures_cnt] => 15
[patent_no_of_words] => 10942
[patent_no_of_claims] => 28
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 221
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/879/07879731.pdf
[firstpage_image] =>[orig_patent_app_number] => 11733764
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/733764 | Improving plasma process uniformity across a wafer by apportioning power among plural VHF sources | Apr 10, 2007 | Issued |
Array
(
[id] => 4431986
[patent_doc_number] => 07968469
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2011-06-28
[patent_title] => 'Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity'
[patent_app_type] => utility
[patent_app_number] => 11/733984
[patent_app_country] => US
[patent_app_date] => 2007-04-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 14
[patent_figures_cnt] => 15
[patent_no_of_words] => 11063
[patent_no_of_claims] => 26
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 127
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/968/07968469.pdf
[firstpage_image] =>[orig_patent_app_number] => 11733984
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/733984 | Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity | Apr 10, 2007 | Issued |
Array
(
[id] => 4485981
[patent_doc_number] => 07884025
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2011-02-08
[patent_title] => 'Plasma process uniformity across a wafer by apportioning ground return path impedances among plural VHF sources'
[patent_app_type] => utility
[patent_app_number] => 11/733767
[patent_app_country] => US
[patent_app_date] => 2007-04-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 14
[patent_figures_cnt] => 15
[patent_no_of_words] => 10934
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 76
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/884/07884025.pdf
[firstpage_image] =>[orig_patent_app_number] => 11733767
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/733767 | Plasma process uniformity across a wafer by apportioning ground return path impedances among plural VHF sources | Apr 10, 2007 | Issued |
Array
(
[id] => 7997263
[patent_doc_number] => 08080479
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2011-12-20
[patent_title] => 'Plasma process uniformity across a wafer by controlling a variable frequency coupled to a harmonic resonator'
[patent_app_type] => utility
[patent_app_number] => 11/733858
[patent_app_country] => US
[patent_app_date] => 2007-04-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 14
[patent_figures_cnt] => 15
[patent_no_of_words] => 10917
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 118
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/08/080/08080479.pdf
[firstpage_image] =>[orig_patent_app_number] => 11733858
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/733858 | Plasma process uniformity across a wafer by controlling a variable frequency coupled to a harmonic resonator | Apr 10, 2007 | Issued |
Array
(
[id] => 4843620
[patent_doc_number] => 20080180028
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-07-31
[patent_title] => 'PLASMA PROCESS UNIFORMITY ACROSS A WAFER BY CONTROLLING RF PHASE BETWEEN OPPOSING ELECTRODES'
[patent_app_type] => utility
[patent_app_number] => 11/733770
[patent_app_country] => US
[patent_app_date] => 2007-04-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 15
[patent_figures_cnt] => 15
[patent_no_of_words] => 10911
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0180/20080180028.pdf
[firstpage_image] =>[orig_patent_app_number] => 11733770
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/733770 | Plasma process uniformity across a wafer by controlling RF phase between opposing electrodes | Apr 10, 2007 | Issued |
Array
(
[id] => 217083
[patent_doc_number] => 07611993
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-11-03
[patent_title] => 'Plasma processing method and plasma processing apparatus'
[patent_app_type] => utility
[patent_app_number] => 11/696827
[patent_app_country] => US
[patent_app_date] => 2007-04-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 13
[patent_figures_cnt] => 19
[patent_no_of_words] => 9887
[patent_no_of_claims] => 2
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 299
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/611/07611993.pdf
[firstpage_image] =>[orig_patent_app_number] => 11696827
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/696827 | Plasma processing method and plasma processing apparatus | Apr 4, 2007 | Issued |
Array
(
[id] => 5247421
[patent_doc_number] => 20070243655
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-10-18
[patent_title] => 'Self-Aligned Process for Fabricating Imprint Templates Containing Variously Etched Features'
[patent_app_type] => utility
[patent_app_number] => 11/693236
[patent_app_country] => US
[patent_app_date] => 2007-03-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 2693
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0243/20070243655.pdf
[firstpage_image] =>[orig_patent_app_number] => 11693236
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/693236 | Self-aligned process for fabricating imprint templates containing variously etched features | Mar 28, 2007 | Issued |
Array
(
[id] => 5176229
[patent_doc_number] => 20070177287
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-08-02
[patent_title] => 'Method of manufacturing a mirror and a mirror device'
[patent_app_type] => utility
[patent_app_number] => 11/729754
[patent_app_country] => US
[patent_app_date] => 2007-03-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 9444
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0177/20070177287.pdf
[firstpage_image] =>[orig_patent_app_number] => 11729754
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/729754 | Method of manufacturing a mirror and a mirror device | Mar 27, 2007 | Abandoned |
Array
(
[id] => 4976983
[patent_doc_number] => 20070218215
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-09-20
[patent_title] => 'Plasma processing method and color filter manufactured by using the same and process for manufacturing color filter by using the same'
[patent_app_type] => utility
[patent_app_number] => 11/717617
[patent_app_country] => US
[patent_app_date] => 2007-03-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 4580
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0218/20070218215.pdf
[firstpage_image] =>[orig_patent_app_number] => 11717617
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/717617 | Plasma processing method and color filter manufactured by using the same and process for manufacturing color filter by using the same | Mar 13, 2007 | Abandoned |
Array
(
[id] => 5059988
[patent_doc_number] => 20070221624
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-09-27
[patent_title] => 'ELECTRON EMISSION DEVICE, METHOD OF MANUFACTURING THE ELECTRON EMISSION DEVICE, AND ELECTRON EMISSION DISPLAY USING THE ELECTRON EMISSION DEVICE'
[patent_app_type] => utility
[patent_app_number] => 11/686316
[patent_app_country] => US
[patent_app_date] => 2007-03-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 12
[patent_no_of_words] => 5178
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0221/20070221624.pdf
[firstpage_image] =>[orig_patent_app_number] => 11686316
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/686316 | ELECTRON EMISSION DEVICE, METHOD OF MANUFACTURING THE ELECTRON EMISSION DEVICE, AND ELECTRON EMISSION DISPLAY USING THE ELECTRON EMISSION DEVICE | Mar 13, 2007 | Abandoned |
Array
(
[id] => 7691965
[patent_doc_number] => 20070232068
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-10-04
[patent_title] => 'Slurry for touch-up CMP and method of manufacturing semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 11/717045
[patent_app_country] => US
[patent_app_date] => 2007-03-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 8295
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0232/20070232068.pdf
[firstpage_image] =>[orig_patent_app_number] => 11717045
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/717045 | Slurry for touch-up CMP and method of manufacturing semiconductor device | Mar 12, 2007 | Abandoned |
Array
(
[id] => 22607
[patent_doc_number] => 07794613
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-09-14
[patent_title] => 'Method of fabricating printhead having hydrophobic ink ejection face'
[patent_app_type] => utility
[patent_app_number] => 11/685084
[patent_app_country] => US
[patent_app_date] => 2007-03-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 23
[patent_figures_cnt] => 35
[patent_no_of_words] => 8442
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 165
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/794/07794613.pdf
[firstpage_image] =>[orig_patent_app_number] => 11685084
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/685084 | Method of fabricating printhead having hydrophobic ink ejection face | Mar 11, 2007 | Issued |
Array
(
[id] => 4695111
[patent_doc_number] => 20080217295
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-09-11
[patent_title] => 'PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD'
[patent_app_type] => utility
[patent_app_number] => 11/683014
[patent_app_country] => US
[patent_app_date] => 2007-03-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 4998
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0217/20080217295.pdf
[firstpage_image] =>[orig_patent_app_number] => 11683014
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/683014 | Plasma processing apparatus and plasma processing method | Mar 6, 2007 | Issued |
Array
(
[id] => 5131217
[patent_doc_number] => 20070207614
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-09-06
[patent_title] => 'Semiconductor device and method of manufacturing the same'
[patent_app_type] => utility
[patent_app_number] => 11/712422
[patent_app_country] => US
[patent_app_date] => 2007-03-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 4338
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0207/20070207614.pdf
[firstpage_image] =>[orig_patent_app_number] => 11712422
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/712422 | Semiconductor device and method of manufacturing the same | Feb 28, 2007 | Issued |
Array
(
[id] => 4727550
[patent_doc_number] => 20080207094
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-08-28
[patent_title] => 'Method and apparatus for ultra thin wafer backside processing'
[patent_app_type] => utility
[patent_app_number] => 11/712846
[patent_app_country] => US
[patent_app_date] => 2007-02-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 10
[patent_no_of_words] => 2325
[patent_no_of_claims] => 46
[patent_no_of_ind_claims] => 8
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0207/20080207094.pdf
[firstpage_image] =>[orig_patent_app_number] => 11712846
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/712846 | Method and apparatus for ultra thin wafer backside processing | Feb 27, 2007 | Issued |
Array
(
[id] => 5216991
[patent_doc_number] => 20070158302
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-07-12
[patent_title] => 'Systems and methods for gas assisted resist removal'
[patent_app_type] => utility
[patent_app_number] => 11/711304
[patent_app_country] => US
[patent_app_date] => 2007-02-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 4061
[patent_no_of_claims] => 28
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0158/20070158302.pdf
[firstpage_image] =>[orig_patent_app_number] => 11711304
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/711304 | Systems and methods for gas assisted resist removal | Feb 26, 2007 | Abandoned |
Array
(
[id] => 4723463
[patent_doc_number] => 20080203057
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-08-28
[patent_title] => 'WET CLEANING PROCESS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SAME'
[patent_app_type] => utility
[patent_app_number] => 11/679677
[patent_app_country] => US
[patent_app_date] => 2007-02-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 3935
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0203/20080203057.pdf
[firstpage_image] =>[orig_patent_app_number] => 11679677
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/679677 | Wet cleaning process and method for fabricating semiconductor device using the same | Feb 26, 2007 | Issued |