
Sophia S. Chen
Examiner (ID: 18740, Phone: (571)272-2133 , Office: P/2852 )
| Most Active Art Unit | 2852 |
| Art Unit(s) | 2852, 2105, 2809 |
| Total Applications | 3640 |
| Issued Applications | 3454 |
| Pending Applications | 101 |
| Abandoned Applications | 111 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 239545
[patent_doc_number] => 07592262
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-09-22
[patent_title] => 'Method for manufacturing MOS transistors utilizing a hybrid hard mask'
[patent_app_type] => utility
[patent_app_number] => 11/689508
[patent_app_country] => US
[patent_app_date] => 2007-03-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
[patent_figures_cnt] => 16
[patent_no_of_words] => 3782
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[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/592/07592262.pdf
[firstpage_image] =>[orig_patent_app_number] => 11689508
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/689508 | Method for manufacturing MOS transistors utilizing a hybrid hard mask | Mar 20, 2007 | Issued |
Array
(
[id] => 4821472
[patent_doc_number] => 20080226991
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-09-18
[patent_title] => 'Fitting Methodology of Etching Times Determination for a Mask to Provide Critical Dimension and Phase Control'
[patent_app_type] => utility
[patent_app_number] => 11/686773
[patent_app_country] => US
[patent_app_date] => 2007-03-15
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0226/20080226991.pdf
[firstpage_image] =>[orig_patent_app_number] => 11686773
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/686773 | Fitting methodology of etching times determination for a mask to provide critical dimension and phase control | Mar 14, 2007 | Issued |
Array
(
[id] => 4842881
[patent_doc_number] => 20080179289
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-07-31
[patent_title] => 'PROCESS FOR WAFER BACKSIDE POLYMER REMOVAL WITH A PLASMA STREAM'
[patent_app_type] => utility
[patent_app_number] => 11/685769
[patent_app_country] => US
[patent_app_date] => 2007-03-14
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0179/20080179289.pdf
[firstpage_image] =>[orig_patent_app_number] => 11685769
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/685769 | PROCESS FOR WAFER BACKSIDE POLYMER REMOVAL WITH A PLASMA STREAM | Mar 13, 2007 | Abandoned |
Array
(
[id] => 4842882
[patent_doc_number] => 20080179290
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-07-31
[patent_title] => 'TEMPERATURE-SWITCHED PROCESS FOR WAFER BACKSIDE POLYMER REMOVAL AND FRONT SIDE PHOTORESIST STRIP'
[patent_app_type] => utility
[patent_app_number] => 11/685915
[patent_app_country] => US
[patent_app_date] => 2007-03-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 22
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[pdf_file] => publications/A1/0179/20080179290.pdf
[firstpage_image] =>[orig_patent_app_number] => 11685915
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/685915 | TEMPERATURE-SWITCHED PROCESS FOR WAFER BACKSIDE POLYMER REMOVAL AND FRONT SIDE PHOTORESIST STRIP | Mar 13, 2007 | Abandoned |
Array
(
[id] => 5022394
[patent_doc_number] => 20070148360
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-06-28
[patent_title] => 'LOW TEMPERATURE BUMPING PROCESS'
[patent_app_type] => utility
[patent_app_number] => 11/684739
[patent_app_country] => US
[patent_app_date] => 2007-03-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[pdf_file] => publications/A1/0148/20070148360.pdf
[firstpage_image] =>[orig_patent_app_number] => 11684739
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/684739 | Low temperature bumping process | Mar 11, 2007 | Issued |
Array
(
[id] => 4698360
[patent_doc_number] => 20080220544
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-09-11
[patent_title] => 'METHOD FOR UTILIZING HEAVILY DOPED SILICON FEEDSTOCK TO PRODUCE SUBSTRATES FOR PHOTOVOLTAIC APPLICATIONS BY DOPANT COMPENSATION DURING CRYSTAL GROWTH'
[patent_app_type] => utility
[patent_app_number] => 11/684599
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[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0220/20080220544.pdf
[firstpage_image] =>[orig_patent_app_number] => 11684599
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/684599 | METHOD FOR UTILIZING HEAVILY DOPED SILICON FEEDSTOCK TO PRODUCE SUBSTRATES FOR PHOTOVOLTAIC APPLICATIONS BY DOPANT COMPENSATION DURING CRYSTAL GROWTH | Mar 9, 2007 | Abandoned |
Array
(
[id] => 4455054
[patent_doc_number] => 07892442
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2011-02-22
[patent_title] => 'Method of manufacturing a thin-film magnetic head, thin-film magnetic head manufacturing apparatus, and thin-film magnetic head manufacturing system'
[patent_app_type] => utility
[patent_app_number] => 11/683611
[patent_app_country] => US
[patent_app_date] => 2007-03-08
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/07/892/07892442.pdf
[firstpage_image] =>[orig_patent_app_number] => 11683611
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/683611 | Method of manufacturing a thin-film magnetic head, thin-film magnetic head manufacturing apparatus, and thin-film magnetic head manufacturing system | Mar 7, 2007 | Issued |
Array
(
[id] => 4695112
[patent_doc_number] => 20080217296
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-09-11
[patent_title] => 'ETCHING APPARATUS FOR SEMICONDUCTOR PROCESSING APPARATUS AND METHOD THEREOF FOR RECYCLING ETCHANT SOLUTIONS'
[patent_app_type] => utility
[patent_app_number] => 11/683039
[patent_app_country] => US
[patent_app_date] => 2007-03-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[pdf_file] => publications/A1/0217/20080217296.pdf
[firstpage_image] =>[orig_patent_app_number] => 11683039
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/683039 | ETCHING APPARATUS FOR SEMICONDUCTOR PROCESSING APPARATUS AND METHOD THEREOF FOR RECYCLING ETCHANT SOLUTIONS | Mar 6, 2007 | Abandoned |
Array
(
[id] => 8737692
[patent_doc_number] => 08409458
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2013-04-02
[patent_title] => 'Process for reactive ion etching a layer of diamond like carbon'
[patent_app_type] => utility
[patent_app_number] => 11/681483
[patent_app_country] => US
[patent_app_date] => 2007-03-02
[patent_effective_date] => 0000-00-00
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[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 11681483
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/681483 | Process for reactive ion etching a layer of diamond like carbon | Mar 1, 2007 | Issued |
Array
(
[id] => 4490383
[patent_doc_number] => 07955515
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2011-06-07
[patent_title] => 'Method of plasma etching transition metal oxides'
[patent_app_type] => utility
[patent_app_number] => 11/681022
[patent_app_country] => US
[patent_app_date] => 2007-03-01
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[pdf_file] => patents/07/955/07955515.pdf
[firstpage_image] =>[orig_patent_app_number] => 11681022
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/681022 | Method of plasma etching transition metal oxides | Feb 28, 2007 | Issued |
Array
(
[id] => 4727452
[patent_doc_number] => 20080206996
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-08-28
[patent_title] => 'SIDEWALL IMAGE TRANSFER PROCESSES FOR FORMING MULTIPLE LINE-WIDTHS'
[patent_app_type] => utility
[patent_app_number] => 11/680204
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/680204 | Sidewall image transfer processes for forming multiple line-widths | Feb 27, 2007 | Issued |
Array
(
[id] => 5069136
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[patent_title] => 'Method of manufacturing a wiring substrate'
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Array
(
[id] => 4918838
[patent_doc_number] => 20080067148
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[patent_issue_date] => 2008-03-20
[patent_title] => 'ETCHANT FOR PATTERNING COMPOSITE LAYER AND METHOD OF FABRICATING PATTERNED CONDUCTIVE LAYER OF ELECTRONIC DEVICE USING THE SAME'
[patent_app_type] => utility
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[firstpage_image] =>[orig_patent_app_number] => 11670424
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/670424 | Method of fabricating a thin film transistor | Feb 1, 2007 | Issued |
Array
(
[id] => 177575
[patent_doc_number] => 07655282
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[patent_issue_date] => 2010-02-02
[patent_title] => 'Method of forming patterned film'
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Array
(
[id] => 4842885
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[patent_title] => 'APPARATUS AND METHOD FOR CONTROLLING SILICON NITRIDE ETCHING TANK'
[patent_app_type] => utility
[patent_app_number] => 11/627030
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/627030 | Apparatus and method for controlling silicon nitride etching tank | Jan 24, 2007 | Issued |
Array
(
[id] => 5095790
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[patent_issue_date] => 2007-05-24
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Array
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Array
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Array
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/621660 | Methods of manufacturing semiconductor structures using RIE process | Jan 9, 2007 | Issued |
Array
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[patent_title] => 'Process for etching a metal layer suitable for use in photomask fabrication'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/616990 | Process for etching a metal layer suitable for use in photomask fabrication | Dec 27, 2006 | Issued |