
Stephanie P. Duclair
Examiner (ID: 3451)
| Most Active Art Unit | 1713 |
| Art Unit(s) | 1713, 1792 |
| Total Applications | 879 |
| Issued Applications | 561 |
| Pending Applications | 96 |
| Abandoned Applications | 241 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 19939381
[patent_doc_number] => 12311497
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2025-05-27
[patent_title] => Method for chemical mechanical polishing of a SiC wafer based on a magnetorheological elastic metal contact corrosion polishing pad
[patent_app_type] => utility
[patent_app_number] => 18/986067
[patent_app_country] => US
[patent_app_date] => 2024-12-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 0
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 415
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18986067
[rel_patent_id] =>[rel_patent_doc_number] =>) 18/986067 | Method for chemical mechanical polishing of a SiC wafer based on a magnetorheological elastic metal contact corrosion polishing pad | Dec 17, 2024 | Issued |
Array
(
[id] => 20503798
[patent_doc_number] => 20260033264
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2026-01-29
[patent_title] => ETCHING SYSTEM FOR FORMING RECESSED FEATURES WITH HIGH ASPECT RATIO
[patent_app_type] => utility
[patent_app_number] => 18/781793
[patent_app_country] => US
[patent_app_date] => 2024-07-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 0
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 93
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18781793
[rel_patent_id] =>[rel_patent_doc_number] =>) 18/781793 | ETCHING SYSTEM FOR FORMING RECESSED FEATURES WITH HIGH ASPECT RATIO | Jul 22, 2024 | Pending |
Array
(
[id] => 20485881
[patent_doc_number] => 20260022079
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2026-01-22
[patent_title] => SELECTIVE ETCH OF TITANIUM CARBIDE MATERIALS USING OXIDATION
[patent_app_type] => utility
[patent_app_number] => 18/775333
[patent_app_country] => US
[patent_app_date] => 2024-07-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4431
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 97
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18775333
[rel_patent_id] =>[rel_patent_doc_number] =>) 18/775333 | SELECTIVE ETCH OF TITANIUM CARBIDE MATERIALS USING OXIDATION | Jul 16, 2024 | Pending |
Array
(
[id] => 19531687
[patent_doc_number] => 20240355589
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2024-10-24
[patent_title] => ETCHING METHOD AND PLASMA PROCESSING APPARATUS
[patent_app_type] => utility
[patent_app_number] => 18/757575
[patent_app_country] => US
[patent_app_date] => 2024-06-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 7208
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 68
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18757575
[rel_patent_id] =>[rel_patent_doc_number] =>) 18/757575 | ETCHING METHOD AND PLASMA PROCESSING APPARATUS | Jun 27, 2024 | Pending |
Array
(
[id] => 20448305
[patent_doc_number] => 20260005031
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2026-01-01
[patent_title] => System and Method for Improving Atomic Layer Etching Performance
[patent_app_type] => utility
[patent_app_number] => 18/758955
[patent_app_country] => US
[patent_app_date] => 2024-06-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 0
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 84
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18758955
[rel_patent_id] =>[rel_patent_doc_number] =>) 18/758955 | System and Method for Improving Atomic Layer Etching Performance | Jun 27, 2024 | Pending |
Array
(
[id] => 19684211
[patent_doc_number] => 20250002756
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2025-01-02
[patent_title] => POLISHING COMPOSITION AND POLISHING METHOD
[patent_app_type] => utility
[patent_app_number] => 18/756412
[patent_app_country] => US
[patent_app_date] => 2024-06-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5957
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -18
[patent_words_short_claim] => 35
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18756412
[rel_patent_id] =>[rel_patent_doc_number] =>) 18/756412 | POLISHING COMPOSITION AND POLISHING METHOD | Jun 26, 2024 | Pending |
Array
(
[id] => 20423012
[patent_doc_number] => 20250385097
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2025-12-18
[patent_title] => Dynamic Parameter Adjustment in Atomic Layer Etching for High Aspect Ratio Structure Formation
[patent_app_type] => utility
[patent_app_number] => 18/745269
[patent_app_country] => US
[patent_app_date] => 2024-06-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 0
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -18
[patent_words_short_claim] => 138
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18745269
[rel_patent_id] =>[rel_patent_doc_number] =>) 18/745269 | Dynamic Parameter Adjustment in Atomic Layer Etching for High Aspect Ratio Structure Formation | Jun 16, 2024 | Pending |
Array
(
[id] => 19683854
[patent_doc_number] => 20250002399
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2025-01-02
[patent_title] => WET ETCHING OF HIGH INDEX GLASS FOR SURFACE STRENGTH IMPROVEMENT
[patent_app_type] => utility
[patent_app_number] => 18/735717
[patent_app_country] => US
[patent_app_date] => 2024-06-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 16857
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -18
[patent_words_short_claim] => 64
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18735717
[rel_patent_id] =>[rel_patent_doc_number] =>) 18/735717 | WET ETCHING OF HIGH INDEX GLASS FOR SURFACE STRENGTH IMPROVEMENT | Jun 5, 2024 | Pending |
Array
(
[id] => 20393638
[patent_doc_number] => 20250369113
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2025-12-04
[patent_title] => NESTED-LOOP ATOMIC LAYER DEPOSITION WITH INHIBITION AND/OR ETCH
[patent_app_type] => utility
[patent_app_number] => 18/732353
[patent_app_country] => US
[patent_app_date] => 2024-06-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 2364
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 97
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18732353
[rel_patent_id] =>[rel_patent_doc_number] =>) 18/732353 | NESTED-LOOP ATOMIC LAYER DEPOSITION WITH INHIBITION AND/OR ETCH | Jun 2, 2024 | Pending |
Array
(
[id] => 19601312
[patent_doc_number] => 20240392192
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2024-11-28
[patent_title] => ETCHING GAS COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE SAME
[patent_app_type] => utility
[patent_app_number] => 18/670724
[patent_app_country] => US
[patent_app_date] => 2024-05-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6871
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 13
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18670724
[rel_patent_id] =>[rel_patent_doc_number] =>) 18/670724 | ETCHING GAS COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE SAME | May 20, 2024 | Pending |
Array
(
[id] => 19816896
[patent_doc_number] => 20250075103
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2025-03-06
[patent_title] => SLURRY SOLUTION, METHOD FOR FABRICATING THE SLURRY SOLUTION, AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SLURRY SOLUTION
[patent_app_type] => utility
[patent_app_number] => 18/640617
[patent_app_country] => US
[patent_app_date] => 2024-04-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5207
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 51
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18640617
[rel_patent_id] =>[rel_patent_doc_number] =>) 18/640617 | SLURRY SOLUTION, METHOD FOR FABRICATING THE SLURRY SOLUTION, AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SLURRY SOLUTION | Apr 18, 2024 | Pending |
Array
(
[id] => 20311902
[patent_doc_number] => 20250329531
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2025-10-23
[patent_title] => SELECTIVE CHEMICAL METHOD FOR CONTACT HOLE SHRINKING
[patent_app_type] => utility
[patent_app_number] => 18/639705
[patent_app_country] => US
[patent_app_date] => 2024-04-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4875
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 43
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18639705
[rel_patent_id] =>[rel_patent_doc_number] =>) 18/639705 | SELECTIVE CHEMICAL METHOD FOR CONTACT HOLE SHRINKING | Apr 17, 2024 | Pending |
Array
(
[id] => 20484206
[patent_doc_number] => 12532687
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2026-01-20
[patent_title] => Cleaning solution and method of cleaning wafer
[patent_app_type] => utility
[patent_app_number] => 18/634408
[patent_app_country] => US
[patent_app_date] => 2024-04-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
[patent_figures_cnt] => 16
[patent_no_of_words] => 13516
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 116
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18634408
[rel_patent_id] =>[rel_patent_doc_number] =>) 18/634408 | Cleaning solution and method of cleaning wafer | Apr 11, 2024 | Issued |
Array
(
[id] => 20283708
[patent_doc_number] => 20250308950
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2025-10-02
[patent_title] => WAFER PROCESSING METHOD AND SYSTEM USING HEATED FUNCTIONAL PLATE
[patent_app_type] => utility
[patent_app_number] => 18/621435
[patent_app_country] => US
[patent_app_date] => 2024-03-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 0
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -18
[patent_words_short_claim] => 71
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18621435
[rel_patent_id] =>[rel_patent_doc_number] =>) 18/621435 | WAFER PROCESSING METHOD AND SYSTEM USING HEATED FUNCTIONAL PLATE | Mar 28, 2024 | Pending |
Array
(
[id] => 19527963
[patent_doc_number] => 20240351865
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2024-10-24
[patent_title] => MANUFACTURING METHOD OF MEMS DEVICE
[patent_app_type] => utility
[patent_app_number] => 18/622059
[patent_app_country] => US
[patent_app_date] => 2024-03-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 3101
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -18
[patent_words_short_claim] => 104
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18622059
[rel_patent_id] =>[rel_patent_doc_number] =>) 18/622059 | MANUFACTURING METHOD OF MEMS DEVICE | Mar 28, 2024 | Pending |
Array
(
[id] => 20283618
[patent_doc_number] => 20250308860
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2025-10-02
[patent_title] => CONTROLLING ETCH EDGE EFFECTS
[patent_app_type] => utility
[patent_app_number] => 18/620762
[patent_app_country] => US
[patent_app_date] => 2024-03-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 3434
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 109
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18620762
[rel_patent_id] =>[rel_patent_doc_number] =>) 18/620762 | CONTROLLING ETCH EDGE EFFECTS | Mar 27, 2024 | Pending |
Array
(
[id] => 19464408
[patent_doc_number] => 20240318077
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2024-09-26
[patent_title] => ETCHING COMPOSITION, METAL-CONTAINING FILM ETCHING METHOD USING THE SAME AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME
[patent_app_type] => utility
[patent_app_number] => 18/612457
[patent_app_country] => US
[patent_app_date] => 2024-03-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 9681
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -19
[patent_words_short_claim] => 308
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18612457
[rel_patent_id] =>[rel_patent_doc_number] =>) 18/612457 | ETCHING COMPOSITION, METAL-CONTAINING FILM ETCHING METHOD USING THE SAME AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME | Mar 20, 2024 | Pending |
Array
(
[id] => 19464370
[patent_doc_number] => 20240318039
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2024-09-26
[patent_title] => CHEMICAL MECHANICAL POLISHING SLURRY AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME
[patent_app_type] => utility
[patent_app_number] => 18/603614
[patent_app_country] => US
[patent_app_date] => 2024-03-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6535
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 69
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18603614
[rel_patent_id] =>[rel_patent_doc_number] =>) 18/603614 | CHEMICAL MECHANICAL POLISHING SLURRY AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME | Mar 12, 2024 | Pending |
| 18/690918 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD | Mar 10, 2024 | Pending |
Array
(
[id] => 19943590
[patent_doc_number] => 12315726
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2025-05-27
[patent_title] => Semiconductor device and method
[patent_app_type] => utility
[patent_app_number] => 18/595554
[patent_app_country] => US
[patent_app_date] => 2024-03-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 21
[patent_figures_cnt] => 31
[patent_no_of_words] => 4068
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 108
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18595554
[rel_patent_id] =>[rel_patent_doc_number] =>) 18/595554 | Semiconductor device and method | Mar 4, 2024 | Issued |